Download or read book Electron Beam Nanolithography Using PMMA and Metal Halide Resists written by Andrew Julius Muray and published by . This book was released on 1985 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Nanolithography written by M. Gentili and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

Download or read book Nanostructure Engineering Using Electron Beam Lithography written by Paul Bernard Fischer and published by . This book was released on 1993 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Ph. D. thesis addresses nanostructure fabrication techniques based on electron beam lithography and their application to: the creation of ultra-fast metal-semiconductor-metal photodetectors and quantum effect transistors, the investigation of light emission from silicon, and the enhancement of resolution in magnetic force microscopy. Specifically, this thesis covers the following topics. (1) The implementation and characterization of an ultra-high resolution electron beam lithography (EBL) system created by modifying a scanning electron microscope. (2) The exploration of minimum achievable feature sizes using ultra-high resolution EBL and a lift-off process with polymethyl-methacrylate resists. 10 nm features, which are among the smallest ever achieved using EBL, have been obtained using a double shadow evaporation technique, a ultra-high resolution EBL technique, and a technique utilizing EBL, reactive ion etching, and subsequent wet etching. (3) The application of ultra-high resolution EBL technology to the fabrication of ultra-fast metal-semiconductor-metal (MSM) photodetectors. The fastest response time reported to date has been achieved in this project. (4) The fabrication and characterization of modulation doped field effect transistors. Quantum effects have been observed in a point contact device. (5) The fabrication of sub-50 nm Si structures using EBL, reactive ion etching (RIE) and subsequent wet etching for the study of photoluminescence (PL) from Si. PL has been observed from an array of 20 nm diameter pillars. And finally, (6) the application of high resolution EBL to the study of magnetic materials. Single domain magnetic particles and novel MFM tips have been fabricated.

Download or read book Advances in Imaging and Electron Physics written by and published by Academic Press. This book was released on 1997-10-08 with total page 347 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

Download or read book Evaluation of Resolution and Limits for PMMA as a Resist for Low Voltage Electron Beam Lithography written by Srividya Jayaram and published by . This book was released on 2005 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Macromolecules Containing Metal and Metal Like Elements Volume 2 written by Alaa S. Abd-El-Aziz and published by John Wiley & Sons. This book was released on 2003-12-04 with total page 305 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal- and metalloid-containing macromolecules are defined as large molecules (i.e., polymers, DNA, proteins) that contain a metal or metalloid group affiliated with the molecule. Compiled by an all-star cast of macromolecular experts, Macromolecules Containing Metal and Metal-Like Elements, Volume 2, Organoiron-Containing Polymers: Provides useful descriptions of applications for the reader to apply in his/her research into materials, polymers, and medicine/drug development. Covers non-linear optical materials, speciality magnetic materials, liquid crystals, anticancer and antiviral drugs, treatment of arthritis, antibacterial drugs, antifouling materials, treatment of certain vitamin deficiencies, electrical conductors and semiconductors, piezoelectronic materials, electrodes, UV absorption applications, super-strength materials, special lubricants and gaskets, selective catalytic and multisite catalytic agents.

Download or read book Comprehensive Nanoscience and Technology written by and published by Academic Press. This book was released on 2010-10-29 with total page 2785 pages. Available in PDF, EPUB and Kindle. Book excerpt: From the Introduction: Nanotechnology and its underpinning sciences are progressing with unprecedented rapidity. With technical advances in a variety of nanoscale fabrication and manipulation technologies, the whole topical area is maturing into a vibrant field that is generating new scientific research and a burgeoning range of commercial applications, with an annual market already at the trillion dollar threshold. The means of fabricating and controlling matter on the nanoscale afford striking and unprecedented opportunities to exploit a variety of exotic phenomena such as quantum, nanophotonic and nanoelectromechanical effects. Moreover, researchers are elucidating new perspectives on the electronic and optical properties of matter because of the way that nanoscale materials bridge the disparate theories describing molecules and bulk matter. Surface phenomena also gain a greatly increased significance; even the well-known link between chemical reactivity and surface-to-volume ratio becomes a major determinant of physical properties, when it operates over nanoscale dimensions. Against this background, this comprehensive work is designed to address the need for a dynamic, authoritative and readily accessible source of information, capturing the full breadth of the subject. Its six volumes, covering a broad spectrum of disciplines including material sciences, chemistry, physics and life sciences, have been written and edited by an outstanding team of international experts. Addressing an extensive, cross-disciplinary audience, each chapter aims to cover key developments in a scholarly, readable and critical style, providing an indispensible first point of entry to the literature for scientists and technologists from interdisciplinary fields. The work focuses on the major classes of nanomaterials in terms of their synthesis, structure and applications, reviewing nanomaterials and their respective technologies in well-structured and comprehensive articles with extensive cross-references. It has been a constant surprise and delight to have found, amongst the rapidly escalating number who work in nanoscience and technology, so many highly esteemed authors willing to contribute. Sharing our anticipation of a major addition to the literature, they have also captured the excitement of the field itself in each carefully crafted chapter. Along with our painstaking and meticulous volume editors, full credit for the success of this enterprise must go to these individuals, together with our thanks for (largely) adhering to the given deadlines. Lastly, we record our sincere thanks and appreciation for the skills and professionalism of the numerous Elsevier staff who have been involved in this project, notably Fiona Geraghty, Megan Palmer and Greg Harris, and especially Donna De Weerd-Wilson who has steered it through from its inception. We have greatly enjoyed working with them all, as we have with each other.

Download or read book Fast Electron Scattering as a Probe of the Radiation Chemistry of Organic Materials written by Herbert Fisk Johnson and published by . This book was released on 1986 with total page 492 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Physics of Micro Nano Fabrication written by Ivor Brodie and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 661 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.

Download or read book Beam Processing Technologies written by Norman G. Einspruch and published by Academic Press. This book was released on 2014-12-01 with total page 559 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beam Processing Technologies is a collection of papers that deals with the miniaturization of devices that will be faster, consume less power, and cost less per operation or fabrication. One paper discusses metal oxide semiconductor (MOS) integrated circuit technology including the operation of devices whose lateral and vertical dimensions are scaled down. If the devices' silicon doping profiles are increased by the same scale factor, they can operate on lower voltages and currents, with the same performance. Another paper describes laser beam processing and wafer-scale integration as techniques to increase the number of devices on a silicon chip. Electron beam technologies can be used in many fabrication processes such as in microlithography, selective oxidation, doping, metrology. Ion beam applications depend on the presence of the ion introduced into the device (e.g. implantation doping), on pseudoelastic collisions (e.g. physical sputtering or crystal damage), and on inelastic scattering (e.g. polymer resist exposure). Silicon molecular beam epitaxy (SiMBE) can also grow high-quality layers at low temperature, particularly concerning germanium, especially as reagrds the growth system design and utilization of n- and p-type doping. Chemical beam epitaxy (CBE) is another epitaxial growth technique that can surpass MBE and metal organic chemical vapor deposition (MO-CVD). The collection is suitable chemical engineers, industrial physicists, and researchers whose work involve micro-fabrication and development of integrated circuits.

Download or read book Methodologies to Enhance the Resolution of Electron Beam Lithography for Nanostructure Fabrication written by and published by . This book was released on 2007 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron beam lithography, benefiting from the electron's shorter wavelength, is believed to be the next generation of lithography that will be used for manufacturing of ultra-large scale integrated circuits. In this dissertation, we investigated methodologies to enhance the resolution of electron beam lithography for nanostructure fabrication. The research was conducted at a writing voltage of 15 kV in order to demonstrate technologies that can be readily adapted to the future generations of commercialized electron beam lithography tools. It is expected that these new instrument will use low writing voltages in order to minimize the substrate damage and to reduce the instrument cost. Based on the studies presented in this dissertation, we demonstrate sub-10 nm linewidth isolated patterns and sub-10 nm linewidth dense patterns writing at a voltage of 15 kV. In addition, we successfully demonstrated a nano-pattern transfer process by using electron beam direct writing on a "modified" resist (in our case, a mixture of nanoparticles and PMMA photo resist). The successful demonstration of the electron beam direct writing on a modified resist can potentially open a new window of resist modification engineering for lithographic applications. The details of the development of novel methodologies will be presented in this thesis. We also demonstrate a 5 nm gold nano-gap, which can be used to study the electronic properties of nanoparticles trapped in the gap. Metal molds with minimum linewidths of 10 nm can be used for nanoimprint lithography was also demonstrated. In addition, silicon nanowires with a minimum linewidth of 10 nm that can be used for the fabrication of single electron transistor working at a high temperature were demonstrated. Finally, a 5 nm gold nanoparticle confined in a 30 nm resist island, which can be used for the single/multiple dot spectroscopy study was fabricated.

Download or read book Investigation Into the Lithographic Development Process of PMMA an Electron Beam Resist written by Kathleen Elliott Rankin and published by . This book was released on 1991 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Foundations of Nanomechanics written by Andrew N. Cleland and published by Springer Science & Business Media. This book was released on 2002-10-18 with total page 452 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text provides an introduction, at the level of an advanced student in engineering or physics, to the field of nanomechanics and nanomechanical devices. It provides a unified discussion of solid mechanics, transducer applications, and sources of noise and nonlinearity in such devices. Demonstrated applications of these devices, as well as an introduction to fabrication techniques, are also discussed. The text concludes with an overview of future technologies, including the potential use of carbon nanotubes and other molecular assemblies.

Download or read book IBM Journal of Research and Development written by and published by . This book was released on 1988 with total page 880 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Dissertation Abstracts International written by and published by . This book was released on 1985-07 with total page 598 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Deposition Characterization Patterning and Mechanistic Study of Inorganic Resists for Next generation Nanolithography written by Feixiang Luo and published by . This book was released on 2016 with total page 182 pages. Available in PDF, EPUB and Kindle. Book excerpt: The semiconductor industry has witnessed a continuous decrease in the size of logic, memory and other computer chip components since its birth over half a century ago. The shrinking (scaling) of components has to a large extent been enabled by the development of micro- and now nano-lithographic techniques. This thesis focuses on one central component of lithography, the resist, which is essentially a thin film that when appropriately exposed enables a pattern to be printed onto a surface. Smaller features require an ever more precisely focused photon, electron or ion beam with which to expose the resist. The likely next generation source of radiation that will enable sub-20nm features to be written will employ extreme ultraviolet radiation (EUV), 92eV (13.5nm). The work discussed here involves a novel class of inorganic resists (including a solution processed Hf-based resist called HafSOx), as the organic resists that have dominated the microlithography industry for the past few decades have approached fundamental scaling limits. In order to maintain the high throughput required by high volume semiconductor manufacturing, metal oxide resists have been proposed and developed to meet the resolution and sensitivity in EUV lithography. One can think of our resists as the nano-lithographic analog to the silver halide film that dominated the photographic print industry for a century. In this thesis, we mainly describe our work on HafSOx, a "first generation" metal oxide EUV resist system. HafSOx thin films can be deposited by spin-coating a mixed solution of HfOCl2, H2O2, and H2SO4. Various materials characterization techniques have been employed to achieve a comprehensive understanding of film composition and structure at both surface and bulk level, as well as a mechanistic understanding of the film radiation chemistry. Taking advantage of the high energy x-rays used in the XPS experiment, we developed an experiment to dynamically monitor the photochemistry within the HafSOx films. Based on this experiment, we found that an insoluble Hf-O-Hf network is eventually formed after film exposure and development by the removal of SOx, OH, and H2O, and the cross-linking of HfxOy nanoparticles. Using photoemission and complementary Raman results, and knowing that both free and bound peroxide co-exist in the precursor solution, we confirmed that there is a specific peroxide stoichiometry needed in the film to chelate to Hf. Sulfate groups were found to act as the spacers between metal oxide nanoparticles to prevent early stage nanoparticle aggregation in the as-deposited films. Too much sulfate sacrifices resist sensitivity, while too little promotes undesired nanoparticle cross-linking during film preparation. In EUV lithography, low energy secondary electron activation had been suggested as a mechanism explaining how film exposure to EUV photons through a mask can result in a patterned film, but this hypothesis lacked experimental evidence. We constructed a low energy electron beam exposure system, exposed HafSOx resists with electrons with energy ranging from 2 eV to 100 eV, and then characterized the film changes after the exposure. Surprisingly, we found electrons with an energy as low as 2 eV can activate the film if given a sufficient electron dose. Electrons with a lower energy require higher doses to fully activate the resist. Our results strongly support the hypothesis that relatively low energy secondary electrons are central in the mechanism responsible for patterning, in this case by interacting with peroxyl species bound to Hf in the films. With the recent arrival of a state-of-art Zeiss-Orion helium ion beam microscope at Rutgers, we also tested the patterning performance of a HafSOx resist with 30 keV He+ ions. (HIBL = helium ion beam lithography). 30 keV He ions were found to be 50-100 more sensitive than 30 keV electrons at patterning HafSOx, and this boost was attributed to the higher stopping power of helium ions compared with electrons. Sub-10 nm critical dimensions were achieved with fairly good line edge roughness (a key metric in assessing lithographic performance). Additionally, Monte Carlo simulations were conducted to compare the ion and electron trajectories in the solid films and to investigate energy loss in the HafSOx films. In summary, a systematic approach has been developed to understand the mechanism behind HafSOx as an EUV resist. Our work helps lead to a more comprehensive mechanistic understanding of how metal oxide EUV photoresists work in general, and suggests ways to optimize their performance.