Download or read book Direct Simulation Monte Carlo Modeling of Effusion Source Vapor Plumes Used in Thin film Deposition Processes written by Brandon D. Morrison and published by . This book was released on 2002 with total page 57 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Direct Simulation Monte Carlo Modeling of Silicon Thin Film Deposition Using Supersonic Beams written by Gang Chen and published by . This book was released on 1998 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Numerical Modeling of Vapor Behavior in Effusion Sources Used in Thin film Deposition Processes written by Mark J. Pavol and published by . This book was released on 2002 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Combining Monte Carlo Transport and Level Set Surface Evolution for Modeling Vapor Phase Deposition of Thin Films Over Sub micron Features written by John Lewis Smith and published by . This book was released on 2014 with total page 58 pages. Available in PDF, EPUB and Kindle. Book excerpt: A hybrid scheme is used to model the vapor phase deposition of thin films at the feature scale. The transport of the chemical species to the substrate surface is modeled with a Collisionless Direct Simulation Monte Carlo (DSMC) method. The Level Set Method is used to model the growth of the thin-film on the substrate. The convergence criteria for these methods were not found in literature. The governing equations for the Level Set Method are, in general, non-linear partial differential equations. The coupling of the DSMC Method with the Level Set Method results in a set of non-Gaussian stochastic non-linear partial differential equations. Developing general convergence criteria proved exceedingly difficult, and only qualitative results are presented to support our convergence criteria. Simulation results are in qualitative agreement with experiments and other results from literature.

Download or read book Monte Carlo Modeling of Thin Film Deposition written by and published by . This book was released on 2002 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this paper we discuss the use of atomistic Monte Carlo simulations to predict film microstructure evolution. We discuss physical vapor deposition, and are primarily concerned with films that are formed by the nucleation and coalescence of 3D islands. Multi-scale modeling is used in the sense that information obtained from molecular dynamics and first principles calculations provide atomic interaction energies, surface and grain boundary properties and diffusion rates for use in the Monte Carlo model. In this paper, we discuss some fundamental issues associated with thin film formation, together with an assessment of the sensitivity of the film morphology to the deposition conditions and materials properties.

Download or read book Monte Carlo Modeling of YBCO Vapor Deposition written by and published by . This book was released on 2000 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: A three dimensional electron beam physical vapor deposition process of super-conducting films of YBa2Cu3O7-(sub delta) in a vacuum chamber is investigated both computationally and experimentally. The numerical analysis employs the direct simulation Monte Carlo (DSMC) method. Some important modeling issues such as atomic collision cross-sections for metal vapors and hyperfine electronic structure of the atomic absorption spectra are addressed. Film deposition thickness profiles and atomic absorption spectra given by the DSMC method and experiment for pure yttrium evaporation are in excellent agreement. Interaction between the vapor jets is found to have a significant effect on the film growth rate and species molar ratio that are key factors of the film technology.

Download or read book Direct Simulation Monte Carlo Method of Deposition Processes written by Chee Hong Tan and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition Modeling Using Direct Simulation Monte Carlo with Non linear Chemistry and Level Set Profile Evolution written by Husain Ali Al-Mohssen and published by . This book was released on 2003 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Direct Simulation Monte Carlo Modeling of Condensation in Supersonic Plume Expansions of Small Polyatomic Systems written by Zheng Li and published by . This book was released on 2009 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Enabling the Direct Simulation Monte Carlo of Physical Vapor Deposition written by and published by . This book was released on 2008 with total page 139 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book How to Use the Monte Carlo Simulation Technique Application written by Fethi Khelfaoui and published by . This book was released on 2018 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many physical phenomena can be modeled using Monte Carlo simulation (MCS) because it is a powerful tool to study thermodynamic properties. MCS can be used to simulate interactions between several particles or bodies in the presence of local or external fields. The main idea is to create a high number of different random configurations; statistics can be taken according to appropriate algorithms (Metropolis algorithm). In this chapter, we present basic techniques of MCS as the choice of potential, reaction rates, simulation cell, random configurations, and algorithms. We present some principal ideas of MCS used to study particle-particle collisions in the gas and in plasmas. Other MCS techniques are presented briefly. A numerical application is presented for collisions in gas phase during thin film deposition by plasma-enhanced chemical vapor deposition (PECVD) processes. Parameters and results of the simulation are studied according to a chosen reactor and mixture.

Download or read book Direct Simulation Monte Carlo Modelling of Physical Vapour Deposition written by Robert Charles Buxton and published by . This book was released on 2005 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book A Hybrid CFD DSMC Model Designed to Simulate Rapidly Rarefying Flow Fields and Its Application to Physical Vapor Deposition written by Kevin Gott and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This research endeavors to better understand the physical vapor deposition (PVD) vapor transport process by determining the most appropriate fluidic model to design PVD coating manufacturing. An initial analysis was completed based on the calculation of Knudsen number from titanium vapor properties. The results show a dense Navier-Stokes solver best describes flow near the evaporative source, but the material properties suggest expansion into the chamber may result in a strong drop in density and a rarefied flow close to the substrate.A hybrid CFD-DSMC solver is constructed in OpenFOAM for rapidly rarefying flow fields such as PVD vapor transport. The models are patched together combined using a new patching methodology designed to take advantage of the one-way motion of vapor from the CFD region to the DSMC region. Particles do not return to the dense CFD region, therefore the temperature and velocity can be solved independently in each domain. This novel technique allows a hybrid method to be applied to rapidly rarefying PVD flow fields in a stable manner.Parameter studies are performed on a CFD, Navier-Stokes continuum based compressible solver, a Direct Simulation Monte Carlo (DSMC) rarefied particle solver, a collisionless free molecular solver and the hybrid CFD-DSMC solver. The radial momentum at the inlet and radial diffusion characteristics in the flow field are shown to be the most important to achieve an accurate deposition profile. The hybrid model also shows sensitivity to the shape of the CFD region and rarefied regions shows sensitivity to the Knudsen number.The models are also compared to each other and appropriate experimental data to determine which model is most likely to accurately describe PVD coating deposition processes. The Navier-Stokes solvers are expected to yield backflow across the majority of realistic inlet conditions, making their physics unrealistic for PVD flow fields. A DSMC with improved collision model may yield an accurate model, but additional research will first need to be completed to accurately describe the complex intermolecular forces of metals and ceramics. Overall, a hybrid CFD-DSMC solver with an improved equation of state for evaporated PVD materials is recommended to model PVD flow.

Download or read book Implementation of the Direct Simulation Monte Carlo Method for an Exhaust Plume Flowfield in a Parallel Computing Environment written by Thomas R. Furlani and published by . This book was released on 1988 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Navier Stokes Direct Simulation Monte Carlo Modeling of Small Cold Gas Thruster Nozzle and Plume Flows written by and published by . This book was released on 2002 with total page 86 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Monte Carlo Simulation of Near Source Dry Deposition written by RB. Gilbert and published by . This book was released on 1997 with total page 15 pages. Available in PDF, EPUB and Kindle. Book excerpt: Calculations of the dry deposition flux in regional budgets are commonly based on estimates of the dry deposition velocity together with ambient concentration measurements at a reference height for a well-developed one-dimensional boundary layer. Alternate approaches are needed to estimate dry deposition to sensitive systems near major sources. In this study, the dry deposition flux is calculated using a steady-state Gaussian plume model that includes dry deposition. Cumulative frequency distributions of five required environmental variables and covariance relationships between variables are determined in order to perform Monte Carlo simulations of ambient concentrations and deposition fluxes near an area source.

Download or read book The Modeling of Homogeneous Condensation in Free expanding Plumes with the Direct Simulation Monte Carlo Method written by Jiaqiang Zhong and published by . This book was released on 2005 with total page 181 pages. Available in PDF, EPUB and Kindle. Book excerpt: The direct simulation Monte Carlo (DSMC) method is considered as the main tool in this work for the numerical modeling of homogeneous condensation in free-expanding plumes. To simulate condensation flow, we must address the processes of cluster nucleation, growth, decay and collisions with other clusters and monomers as well as the gas kinetics. Therefore, microscopic models including nucleation, sticking and non-sticking collision, and evaporation models need to be specifically developed and integrated into the traditional DSMC code to simulate condensation behavior in this work.