Download or read book The Kinetics of Chemical Vapor Deposition of Tungsten written by H. CHEUNG and published by . This book was released on 1971 with total page 14 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Kinetics of Low Pressure Chemical Vapor Deposition of Tungsten written by Kumar P. Krishnamani and published by . This book was released on 1985 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Kinetics of Low Pressure Chemical Vapor Deposition of Tungsten Silicide written by Damodaran Srinivas and published by . This book was released on 1989 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Kinetics of the Chemical Vapor Deposition of Tungsten from Tungsten Hexaflouride by Hydrogen Reduction written by Hugh Wilbur Huggins and published by . This book was released on 1973 with total page 116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Selectivity and Kinetics During the Chemical Vapor Deposition of Tungsten by the Hydrogen Reduction and Silane Reduction of Tungsten Hexafluoride written by Nathan Desatnik and published by . This book was released on 1997 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Kinetics of the Tungsten Hexafluoride silane Reaction for the Chemical Vapor Deposition of Tungsten written by Huseyin Gokce and published by . This book was released on 1991 with total page 462 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition Study written by and published by . This book was released on 1970 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A brief summary of the activities over the last six months is presented. Studies range from the deposition kinetics through the production of CVD tungsten tubes to their analysis via X-rays, mechanical property studies and microstudies.
Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Download or read book Kinetics and Characterization of Tungsten CVD Processes written by Johannes Andreas Maria Ammerlaan and published by Coronet Books. This book was released on 1994-12-01 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book CVD XII written by Klavs F. Jensen and published by . This book was released on 1993 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 1992 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive overview of chemical vapor deposition (CVD), an extremely versatile process for manufacturing coatings, powders, fibers, and monolithic components.
Download or read book Proceedings of the International Conference on Chemical Vapor Deposition written by and published by . This book was released on 1987 with total page 1294 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition written by Srinivasan Sivaram and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
