Download or read book Telegraph Noise in Amorphous Silicon written by Lisa Marie Lust and published by . This book was released on 1995 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Amorphous Silicon Technology written by and published by . This book was released on 1996 with total page 946 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Conductance Fluctuations in Hydrogenated Amorphous Silicon written by Craig Edward Parman and published by . This book was released on 1992 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Non Gaussian Noise in Hydrogenated Amorphous Silicon written by Gautam Mohan Khera and published by . This book was released on 1996 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Properties of Amorphous Silicon written by and published by INSPEC. This book was released on 1989 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Noise in Nanoscale Semiconductor Devices written by Tibor Grasser and published by Springer Nature. This book was released on 2020-04-26 with total page 724 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book summarizes the state-of-the-art, regarding noise in nanometer semiconductor devices. Readers will benefit from this leading-edge research, aimed at increasing reliability based on physical microscopic models. Authors discuss the most recent developments in the understanding of point defects, e.g. via ab initio calculations or intricate measurements, which have paved the way to more physics-based noise models which are applicable to a wider range of materials and features, e.g. III-V materials, 2D materials, and multi-state defects. Describes the state-of-the-art, regarding noise in nanometer semiconductor devices; Enables readers to design more reliable semiconductor devices; Offers the most up-to-date information on point defects, based on physical microscopic models.
Download or read book Silicon film related Random Telegraph Noise in UTBOX Silicon on insulator NMOSFETs written by and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Thermoelectric Effects in Amorphous Silicon written by Harold Mahase Chandra Dyalsingh and published by . This book was released on 1996 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Uncooled Infrared Imaging Arrays and Systems written by and published by Academic Press. This book was released on 1997-11-24 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first book to describe an emerging but already growing technology of thermal imaging based on uncooled infrared imaging arrays and systems, which are the most exciting new developments in infrared technology today. This technology is of great importance to developers and users of thermal images for military and commercial applications. The chapters, prepared by world leaders in the technology, describe not only the mainstream efforts, but also exciting new approaches and fundamental limits applicable to all. Unified approach to technology development based on fundamental limits Individual chapters written by world leaders in each technology Novel potential approaches, allowing for the reduction of costs, described in detail Descriptive and analytical Provides details of the mainstream approaches--resistive bolometric, pyroelectric/field enhanced pyroelectric, thermoelectric Provides insight into a unified approach to development of all types of thermal imaging arrays Features state-of-the-art and selected new developments
Download or read book Amorphous and Heterogeneous Silicon Thin Films written by and published by . This book was released on 2002 with total page 840 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Amorphous Silicon Technology 1996 Volume 420 written by Michael Hack and published by . This book was released on 1996-12-31 with total page 946 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book from the highly successful series on amorphous-silicon science and devices reflects the increasing range of applications for a-Si technology. Advances in solar cells incorporating microcrystalline silicon absorber layers are discussed, and a new manufacturing facility for amorphous-silicon-based tandem solar cells is highlighted. Progress towards realizing both higher resolution and improved visibility in active-matrix liquid crystal displays is featured. And while work on raising the deposition rate for amorphous-silicon transistors is also outlined, it is expected that advances in devices and manufacturing will be accelerated when several fundamental puzzles regarding amorphous silicon's structure and optoelectronic properties are resolved. Topics include: solar cells; thin-film transistors and flat-panel displays; sensors, detectors and novel devices; device physics; deposition technologies; studies of growth processes; hydrogen and structure a-Si:H; defects and equilibration in a-Si:H; fundamental issues in defect processes; transport and recombination processes; thin films for photovoltaic and related device applications.
Download or read book The Physics and Chemistry of SiO2 and the Si SiO2 Interface 2 written by B.E. Deal and published by Springer Science & Business Media. This book was released on 2013-11-09 with total page 505 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first international symposium on the subject "The Physics and Chemistry of Si02 and the Si-Si02 Interface," organized in association with the Electrochemical Society, Inc. , was held in Atlanta, Georgia on May 15- 20, 1988. This symposium contained sixty papers and was so successful that the sponsoring divisions decided to schedule it on a regular basis every four years. Thus, the second symposium on "The Physics and Chemistry of Si02 and the Si02 Interface was held May 18-21, 1992 in St. Louis, Missouri, again sponsored by the Electronics and Dielectrics Science and Technology Divisions of The Electrochemical Society. This volume contains manuscripts of most of the fifty nine papers presented at the 1992 symposium, and is divided into eight chapters - approximating the organization of the symposium. Each chapter is preceded with an introduction by the session organizers. It is appropriate to provide a general assessment of the current status and understanding of the physics and chemistry of Si02 and the Si02 interface before proceeding with a brief overview of the individual chapters. Semiconductor devices have continued to scale down in both horizontal and vertical dimensions. This has resulted in thinner gate and field oxides as well as much closer spacing of individual device features. As a result, surface condition, native oxide composition, and cleaning and impurity effects now provide a much more significant contribution to the properties of oxides and their interfaces.
Download or read book The Physics and Technology of Amorphous SiO2 written by Roderick A.B. Devine and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 552 pages. Available in PDF, EPUB and Kindle. Book excerpt: The contents of this volume represent most of the papers presented either orally or as posters at the international conference held in Les rd th Arcs, Savoie, from June 29 to July 3 1987. The declared objective of the conference was to bring together specialists working in various fields, both academic and applied, to examine the state of our under standing of the physics of amorphous sioz from the point of view of its structure, defects (both intrinsic and extrinsic), its ability to trans port current and to trap charges, its sensitivity to irradiation, etc. For this reason, the proceedings is divided, as was the conference schedule, into a number of sections starting from a rather academic viewpoint of the internal structure of idealized Si0 and progressing 2 towards subjects of increasing technological importance such as charge transport and trapping and breakdown in thin films. The proceedings terminates with a section on novel applications of amorphous SiOz and in particular, buried oxide layers formed by ion implantation. Although every effort was made at the conference to ensure that each presentation occured in its most obvious session, in editing the proceedings we have taken the liberty of changing the order where it seems that a paper was in fact more appropriate to an alternative section. In any event, because of the natural overlap of subjects, many papers could have been suitably placed in several different sections.
Download or read book Conductance Fluctuations in Doped Hydrogenated Amorphous Silicon written by Peter William West and published by . This book was released on 1999 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Amorphous and Heterogeneous Silicon Thin Films written by Howard M. Branz and published by . This book was released on 1999 with total page 924 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Amorphous and Microcrystalline Silicon Technology written by and published by . This book was released on 1999 with total page 1046 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Structure and Imperfections in Amorphous and Crystalline Silicon Dioxide written by R. A. B. Devine and published by John Wiley & Sons. This book was released on 2000-05-18 with total page 538 pages. Available in PDF, EPUB and Kindle. Book excerpt: Structure and Imperfections in Amorphous and Crystalline Silicon Dioxide Edited by R. A. B. Devine, University of New Mexico, USA J.-P. Duraud, ESRF, Grenoble, France and E. Dooryhée, ESRF, Grenoble, France Silicon dioxide is one of the most common naturally occurring materials. Its applications range from nuclear waste storage to optical fibre communications to silicon microelectronics. Experts from America, Europe and Japan have written chapters covering both the amorphous and the crystalline phases of the material with particular reference to its structure and defects. The book is divided into four sections: Topological Models for the Crystalline and Amorphous Phases Electronic Structure Macroscopic and Point Defects Processing and Applications of Crystalline and Amorphous Phases Engineers, researchers and postgraduate students of materials science, physics and engineering will all find this an extremely useful addition to their libraries.
