Download or read book Surface Modifications of Silicon Induced by Low Energy Reactive Ion Bombardment written by Wayne Harold Chang and published by . This book was released on 1993 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Surface Modifications of Silicon Induced by Low Energy Reactive Ion Bombardment written by Wayne Harold Chang and published by . This book was released on 1993 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2003 with total page 784 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Near Surface Modification of Silicon During Dry Processing written by Peter Kamil Charvat and published by . This book was released on 1988 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Surface Morphology Evolution During Low Energy Ion Bombardment of Silicon and Gallium Antimonide written by Gözde Özaydin-İnce and published by . This book was released on 2008 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: Ion bombardment is a widely used technique to modify the properties of materials for technological applications. In recent years, surface evolution during ion bombardment has also attracted considerable fundamental interest because of the desire to better understand the physical processes occurring at the surface and the frequent instability of surfaces to the spontaneous formation of nanostructures during bombardment. In this research, the surface morphology evolution of Silicon(100) and Gallium Antimonide(100) during low energy Argon ion bombardment was studied using real-time grazing-incidence small angle X-ray scattering and ex-situ atomic force microscopy. The surface morphology evolution of Si during ion bombardment as a function of substrate temperature was examined. Although, the surface was amorphized during bombardment at room temperature, above approximately 400°C a transition from amorphous to crystalline structure occurred. Above 500°C, the surface remained crystalline and the growing corrugations exhibited dynamic scaling with power law growth in amplitude and characteristic length scale. The ripple formation by off normal incidence low energy ion bombardment and ripple smoothening by normal incidence ion bombardment at room temperature were studied. Using real-time X-ray scattering, an exponential growth of the intensities during ripple formation was observed confirming that the early time kinetics obeyed the Bradley-Harper model. However, at later times the growth slowed and deviated from the predictions of the linear model. Ripple smoothening experiments, on the other hand, showed that the ripple structures eroded during normal incidence ion bombardment, possibly due to an additional lateral atomic smoothening mechanism active at these incidence angles. The real-time measurements showed that the small length scales decayed faster than the large length scales as predicted by the linear model, however the decay mechanisms were more complex than expected from existing linear theory. It was observed that, although Si surfaces remained smooth during bombardment at room temperature when a small amount of Molybdenum atoms was supplied to the surface during ion bombardment, correlated structures with two different characteristic length scales developed. The shorter length scale features ("dots") coarsened with time until they reached a constant spatial wavelength. The longer length scale corrugations associated with kinetic roughening, however, continued to grow in amplitude during bombardment. The evolution of this kinetic roughening could be described by the Family-Vicsek scaling hypothesis. A new noise term associated with inhomogeneities in local relaxation was proposed to quantitatively explain the early time kinetics. In addition, in-situ wafer curvature measurements were performed during ion bombardment to study the real-time stress state of the surface. The measurements showed that initially a compressive stress developed during bombardment, likely due to amorphization of the surface. However, seeding caused a larger tensile stress to develop with further bombardment, possibly due to the formation of higher density regions around the Mo seed atoms on the surface. The effects of this large tensile stress on the surface instability and the formation of the nanodots were also examined. Simulations of existing continuum equations of surface morphology evolution during normal incidence ion bombardment at room temperature were performed to study the effects of individual terms on the surface morphology, as well as their relations with each other. It was observed that the noisy Kuramoto-Sivashinsky model could only qualitatively predict the surface evolution, but could not reproduce all of the experimental results. Finally, the morphology evolution of GaSb(100) surfaces during ion bombardment at different energies was also studied. Formation of correlated nanodots with a length scale of approximately 30 nm was observed during bombardment at room temperature without seeding.
Download or read book Ion Beam Modification of Materials written by J.S. Williams and published by Newnes. This book was released on 2012-12-02 with total page 1157 pages. Available in PDF, EPUB and Kindle. Book excerpt: This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.
Download or read book Surface Coatings Technology written by B. D. Sartwell and published by Elsevier. This book was released on 2016-06-03 with total page 665 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface & Coatings Technology, Volumes 59–60 presents the proceedings of the Third International Conference on Plasma Surface Engineering, held in Garmisch-Partenkirchen, Germany, on October 26–29, 1992. This book discusses the widespread applications of plasma and particle beam assisted methods in surface and thin film technology. Volume 59 is organized into 11 parts encompassing 69 chapters while Volume 60 is comprised of eight parts encompassing 49 chapters. This compilation of papers begins with an overview of the kinetic modelling of low pressure high frequency discharges. This text then examines the effect of various deposition parameters on the growth of chamber wall deposits. Other chapters consider the physiochemical behavior of ceramic materials for space applications. This book discusses as well the economic aspects of the application of plasma surface technologies. The reader is also introduced to the environmental aspects of physical vapor deposition coating technology. This book is a valuable resource for plasma surface engineers, technologists, and researchers.
Download or read book Science and Technology of Defects in Silicon written by C.A.J. Ammerlaan and published by Elsevier. This book was released on 2014-01-01 with total page 518 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume reviews recent developments in the materials science of silicon. The topics discussed range from the fundamental characterization of the physical properties to the assessment of materials for device applications, and include: crystal growth; process-induced defects; topography; hydrogenation of silicon; impurities; and complexes and interactions between impurities.In view of its key position within the conference scope, several papers examine process induced defects: defects due to ion implantation, silicidation and dry etching, with emphasis being placed on the device aspects. Special attention is also paid to recent developments in characterization techniques on epitaxially grown silicon, and silicon-on-insulators.
Download or read book Chemical Modification of Surfaces Via Low Energy Electron Bombardment written by Roderick R. Kunz and published by . This book was released on 1988 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ion Solid Interactions written by Michael Nastasi and published by Cambridge University Press. This book was released on 1996-03-29 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: Comprehensive guide to an important materials science technique for students and researchers.
Download or read book Chemical Abstracts written by and published by . This book was released on 2002 with total page 2540 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Dry Etching for VLSI written by A.J. van Roosmalen and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 247 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.
Download or read book Surface Modification of Metals by Ion Beams 7 written by and published by . This book was released on 1992 with total page 590 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1992 with total page 1572 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Low Energy Ion Irradiation of Materials written by Bernd Rauschenbach and published by Springer Nature. This book was released on 2022-08-19 with total page 763 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive introduction to all aspects of low-energy ion–solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion–solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.
Download or read book Advanced Polyimide Materials written by Shi-Yong Yang and published by Elsevier. This book was released on 2018-04-20 with total page 499 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advanced Polyimide Materials: Synthesis, Characterization and Applications summarizes and reviews recent research and developments on several key PI materials. A wide array of PI materials are included, including high performance PI films for microelectronic fabrication and packaging, display and space applications, fiber-reinforced PI composites for structural applications in aerospace and aviation industries, and PI photoresists for integrated circuit packaging. The chemical features of PI are also described, including semi-alicyclic PIs, fluorinated PIs, phosphorous-containing PIs, silicon-containing PIs and other new varieties, providing a comprehensive overview on PI materials while also summarizing the latest research. The book serves as a valuable reference book for engineers and students working on polymer materials, microelectronics manufacturing and packaging in industries such as aerospace and aviation. - Reviews the latest research, development and future prospective of polyimides - Describes the progress made in the research on polyimide materials, including polyimide films, matrices for carbon fiber composites, coatings for microelectronics and display devices, forms and fibers - Presents a highly organized work that is composed of different sections that are easily compared
Download or read book Energy Research Abstracts written by and published by . This book was released on 1988 with total page 752 pages. Available in PDF, EPUB and Kindle. Book excerpt:
