Download or read book Planar Magnetron Glow Discharge Plasma as an Atom and Ion Source for Atomic Spectroscopy written by Zhan Shi and published by . This book was released on 1993 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Inductively Coupled Plasmas in Analytical Atomic Spectrometry written by Akbar Montaser and published by John Wiley & Sons. This book was released on 1996-12-17 with total page 1044 pages. Available in PDF, EPUB and Kindle. Book excerpt: The broadest source of information on analytical ICP spectrometry available in a coherent, single volume. Renowned contributors define theory, diagnostics, models, instrumentation and applications. They also discuss atomic emission, atomic fluorescence and mass spectrometries based on ICP sources for atomization, excitation and ionization. 'This book is HIGHLY RECOMMENDED.' Analytical Chemistry '... a handy reference for anyone attempting to understand the theory of ICPs and how they work. The detailed discussions of the various types of instrumentation and methods will be quite helpful to students and researchers in the field who want to broaden their understanding of analytical atomic spectroscopy.' Applied Spectroscopy '...Everyone involved in elemental analysis using ICP should have this book. It is useful for both experienced and novice ICP spectroscopists.' Spectroscopy

Download or read book Dissertation Abstracts International written by and published by . This book was released on 1994 with total page 730 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma Physics Index written by and published by . This book was released on 1981 with total page 834 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Glow Discharge Processes written by Brian Chapman and published by Wiley-Interscience. This book was released on 1980 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

Download or read book American Doctoral Dissertations written by and published by . This book was released on 1993 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Documentation of Plasma Physics Pt 1 Experimental Plasma Physics and Theoretical Plasma Physics written by and published by . This book was released on 1981 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book ACS Directory of Graduate Research 1993 written by American Chemical Society. Committee on Professional Training and published by . This book was released on 1993 with total page 1700 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes

Download or read book Handbook of Ion Sources written by Bernhard Wolf and published by CRC Press. This book was released on 1995-08-31 with total page 558 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.

Download or read book High Power Impulse Magnetron Sputtering written by Daniel Lundin and published by Elsevier. This book was released on 2019-08-30 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.

Download or read book Physics Briefs written by and published by . This book was released on 1994 with total page 1146 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book An Introduction to Analytical Atomic Spectrometry written by L. Ebdon and published by John Wiley & Sons. This book was released on 1998-04-08 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt: Das umfassende Handbuch der Atomspektroskopie jetzt in sorgfältig überarbeiteter, noch besser organisierter zweiter Auflage! Ergänzt wurden Kapitel zu wichtigen neuen Verfahren wie der Plasma-Atomemissionsspektroskopie und der ICP-Massenspektrometrie. Fettgedruckte Stichworte, übersichtliche Diagramme und praktische Übungen erleichtern das Erarbeiten und Vertiefen des Stoffes. (02/98)

Download or read book Cathodic Arcs written by André Anders and published by Springer Science & Business Media. This book was released on 2009-07-30 with total page 555 pages. Available in PDF, EPUB and Kindle. Book excerpt: Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.

Download or read book Introduction to Plasma Dynamics written by A. I. Morozov and published by CRC Press. This book was released on 2012-12-06 with total page 828 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the twenty-first century progresses, plasma technology will play an increasing role in our lives, providing new sources of energy, ion-plasma processing of materials, wave electromagnetic radiation sources, space plasma thrusters, and more. Studies of the plasma state of matter not only accelerate technological developments but also improve the

Download or read book Reactive Sputter Deposition written by Diederik Depla and published by Springer Science & Business Media. This book was released on 2008-06-24 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

Download or read book The Foundations of Vacuum Coating Technology written by Donald M. Mattox and published by William Andrew. This book was released on 2018-08-21 with total page 383 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. - History and detailed descriptions of Vacuum Deposition Technologies - Review of Enabling Technologies and their importance to current applications - Extensively referenced text - Patents are referenced as part of the history - Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology - Glossary of Terms for vacuum coating