Download or read book Molecular Layer Deposition for Tailored Organic Thin Film Materials written by Tetsuzo Yoshimura and published by CRC Press. This book was released on 2023-03-14 with total page 539 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides concepts and experimental demonstrations for various types of molecular layer deposition (MLD) and organic multiple quantum dots (organic MQDs), which are typical tailored organic thin-film materials. Possible applications of MLD to optical interconnects, energy conversion systems, molecular targeted drug delivery, and cancer therapy are also proposed. First, the author reviews various types of MLD processes including vapor-phase MLD, liquid-phase MLD, and selective MLD. Next, he introduces organic MQDs, which are typical tailored organic thin-film materials produced by MLD. The author then describes the design of light modulators/optical switches, predicts their performance, and discusses impacts of the organic MQDs on them. He then also discusses impacts of the organic MQDs on optical interconnects within computers and on optical switching systems. Finally, the author presents MLD applications to molecular targeted drug delivery, photodynamic therapy, and laser surgery for cancer therapy. This book is intended for researchers, engineers, and graduate students in optoelectronics, photonics, and any other field where organic thin-film materials can be applied.

Download or read book Thin Film Organic Photonics written by Tetsuzo Yoshimura and published by CRC Press. This book was released on 2017-12-19 with total page 490 pages. Available in PDF, EPUB and Kindle. Book excerpt: Among the many atomic/molecular assembling techniques used to develop artificial materials, molecular layer deposition (MLD) continues to receive special attention as the next-generation growth technique for organic thin-film materials used in photonics and electronics. Thin-Film Organic Photonics: Molecular Layer Deposition and Applications describes how photonic/electronic properties of thin films can be improved through MLD, which enables precise control of atomic and molecular arrangements to construct a wire network that achieves "three-dimensional growth". MLD facilitates dot-by-dot—or molecule-by-molecule—growth of polymer and molecular wires, and that enhanced level of control creates numerous application possibilities. Explores the wide range of MLD applications in solar energy and optics, as well as proposed uses in biomedical photonics This book addresses the prospects for artificial materials with atomic/molecular-level tailored structures, especially those featuring MLD and conjugated polymers with multiple quantum dots (MQDs), or polymer MQDs. In particular, the author focuses on the application of artificial organic thin films to: Photonics/electronics, particularly in optical interconnects used in computers Optical switching and solar energy conversion systems Bio/ medical photonics, such as photodynamic therapy Organic photonic materials, devices, and integration processes With its clear and concise presentation, this book demonstrates exactly how MLD enables electron wavefunction control, thereby improving material performance and generating new photonic/electronic phenomena.

Download or read book Molecular Layer Deposition for Tailored Organic Thin Film Materials written by Tetsuzo Yoshimura and published by CRC Press. This book was released on 2023-03-14 with total page 429 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reviews various types of MLD processes including vapor-phase MLD, liquid-phase MLD, and selective MLD. Introduces organic multiple quantum dots (Organic MQDs) that are typical tailored organic thin-film materials produced by MLD. Designs light modulators/optical switches, predicts their performance, and discusses impacts of the organic MQDs on them. Discusses impacts of the organic MQDs on optical interconnects within computers and on optical switching systems. Presents proposals of MLD applications to energy conversion systems, molecular targeted drug delivery, photodynamic therapy, and laser surgery for cancer therapy.

Download or read book Thin Film Organic Photonics written by Tetsuzo Yoshimura and published by CRC Press. This book was released on 2017-12-19 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt: Among the many atomic/molecular assembling techniques used to develop artificial materials, molecular layer deposition (MLD) continues to receive special attention as the next-generation growth technique for organic thin-film materials used in photonics and electronics. Thin-Film Organic Photonics: Molecular Layer Deposition and Applications describes how photonic/electronic properties of thin films can be improved through MLD, which enables precise control of atomic and molecular arrangements to construct a wire network that achieves "three-dimensional growth". MLD facilitates dot-by-dot—or molecule-by-molecule—growth of polymer and molecular wires, and that enhanced level of control creates numerous application possibilities. Explores the wide range of MLD applications in solar energy and optics, as well as proposed uses in biomedical photonics This book addresses the prospects for artificial materials with atomic/molecular-level tailored structures, especially those featuring MLD and conjugated polymers with multiple quantum dots (MQDs), or polymer MQDs. In particular, the author focuses on the application of artificial organic thin films to: Photonics/electronics, particularly in optical interconnects used in computers Optical switching and solar energy conversion systems Bio/ medical photonics, such as photodynamic therapy Organic photonic materials, devices, and integration processes With its clear and concise presentation, this book demonstrates exactly how MLD enables electron wavefunction control, thereby improving material performance and generating new photonic/electronic phenomena.

Download or read book Molecular Engineering for Thin film Applications written by Jie Huang and published by . This book was released on 2014 with total page 228 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this dissertation, two different approaches to employ organic molecules for thin-film applications will be discussed. One is based on modification of substrates using self-assembled monolayers (SAMs) to prevent (or enhance) nucleation of atomic layer deposition (ALD). We demonstrate area-selective deposition using electron-beam lithography (EBL) patterned octadecyltrichlorosilane (OTS) SAM as a nucleation inhibition layer followed by titanium oxide (TiO2) deposition using ALD. It was found that the e-beam dosage determined the resolution of individual line width, while the accelerating voltage dominated the minimum pitch dimension of dense line patterns achievable. Eventually, using the optimal e-beam parameters, nano-line patterns with sub-30 nm resolution and 50 nm pitch were achieved. This study offers a new approach to fabricate close-packed nano-patterns for IC devices without any challenging etching process. The other approach is direct implementation of small molecules as molecular precursors to deposit self-limiting organic multi-layers which eventually allows layer-by-layer deposition like ALD. Two types of organic molecules, 7-octenytrichlorosilane (7-OTS) and hydroquinone (HQ), were applied as backbones of these multi-layers. Conventional inorganic ALD precursors, such as trimethylaluminum (TMA) and diethylzinc (DEZ), were applied as linkers between the organic layers to form organic-inorganic hybrid thin films and nano-laminates. It was found that resulting materials characteristics can be varied from insulating to semi-conducting by altering the organic component from alkane to aromatic based molecules. This methodology provides a new route to build 2D nano-sheets with unique properties.

Download or read book Precursor Chemistry of Advanced Materials written by Roland A. Fischer and published by Springer Science & Business Media. This book was released on 2005-09-29 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.

Download or read book Handbook of Silicon Based MEMS Materials and Technologies written by Markku Tilli and published by William Andrew. This book was released on 2015-09-02 with total page 827 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Silicon Based MEMS Materials and Technologies, Second Edition, is a comprehensive guide to MEMS materials, technologies, and manufacturing that examines the state-of-the-art with a particular emphasis on silicon as the most important starting material used in MEMS. The book explains the fundamentals, properties (mechanical, electrostatic, optical, etc.), materials selection, preparation, manufacturing, processing, system integration, measurement, and materials characterization techniques, sensors, and multi-scale modeling methods of MEMS structures, silicon crystals, and wafers, also covering micromachining technologies in MEMS and encapsulation of MEMS components. Furthermore, it provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques, shows how to protect devices from the environment, and provides tactics to decrease package size for a dramatic reduction in costs. - Provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques - Shows how to protect devices from the environment and decrease package size for a dramatic reduction in packaging costs - Discusses properties, preparation, and growth of silicon crystals and wafers - Explains the many properties (mechanical, electrostatic, optical, etc.), manufacturing, processing, measuring (including focused beam techniques), and multiscale modeling methods of MEMS structures - Geared towards practical applications rather than theory

Download or read book Molecular Layer Deposition written by David S. Bergsman and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: In recent years, many technological advancements in medicine, renewable energy, water purification, and semiconductor processing have resulted from access to nanotechnology. Though we have many methods for creating nano-sized features, our current nanomaterials toolkit must continue to expand in order to meet the increasing demand for smaller features, more complex architectures, and reduced defect frequencies required by these applications. Molecular layer deposition (MLD) is a promising new method for expanding that toolkit, allowing for the incorporation of organic components into ultrathin materials and nanostructures through a vapor-phase, layer-by-layer synthesis approach. Although a decade and a half of development has already gone into MLD, there is still a significant gap in our understanding of the mechanisms behind MLD growth and the microscopic properties of the resulting films, such as their molecular-level structure. This dissertation presents work to better understand these fundamental properties of MLD and use that understanding to control the thermal, mechanical, and catalytic properties of these materials. In the first half of this work, a study of the structure and growth behavior of organic MLD films is performed. First, the properties of polyurea films are explored as a function of backbone flexibility. Our results suggest that changes in growth rate between the most rigid and most flexible backbones (4 Å/cycle vs 1 Å/cycle) are not caused by differences in the length of molecular precursors, chain orientation (~25° on average for each backbone), or film density (1.0 -- 1.2 g/cm3), but instead are caused by an increased frequency of terminations in the more flexible chemistries. Measurement of the crystallinity and growth angle further suggest that polyurea MLD films exhibit multiple domains, with some chains adopting horizontally packed structures and some chains growing more out-of-plane, leading to an average growth angle of 25°. Interestingly, the observed terminations do not result in the complete cessation of film growth, suggesting that precursors may be absorbing into the film through non-covalent linkages. To observe these absorptions events, MLD is performed on surfaces whose reaction sites have been intentionally eliminated. These terminations are shown to be effective at reducing the growth rate of MLD, suggesting that MLD growth rates are heavily dependent on the number of reaction sites. However, after several cycles, the film growth rate is able to recover, suggesting that monomers have absorbed into the films to reintroduce new reaction sites. A model of growth is developed based on a site balance which suggests that roughly 3% of the chains are terminated by double reactions every cycle. Taken as a whole, this work provides a new paradigm for the growth of MLD films, showing that the films do not adopt the simple layer-by-layer covalent network that is typically portrayed for MLD. MLD has many potential applications in energy and semiconductor manufacturing. In the second half of this thesis, two studies related to the development of MLD are explored. First, a relatively unstudied "manganicone" manganese hybrid MLD chemistry is synthesized using bis(ethylcyclopentadienyl)manganese and ethylene glycol for use as an electrochemically-relevant catalyst material. Characterization of the composition and crystal structure of these films shows them to grow as manganese alkoxides, which partially degrade upon exposure to air into manganese carboxylates. Annealing the hybrid films to remove the carbon is shown to eliminate any porosity introduced through the incorporation of the organic components. However, annealed hybrid films are shown to be less prone to restructuring than ALD-grown MnOx, making them potentially desirable materials for electrodes in thin film batteries. Second, an investigation of the self-assembly of dodecanethiols from the vapor phase onto copper oxide was performed. Dodecanethiols are often used as a blocking layer in area-selective ALD and MLD. The thiols are shown to etch the surface of the CuO to create well-ordered copper-thiolate multilayers several nanometers thick, with crystallites oriented parallel and perpendicular to the substrate surface. In addition, after exposure to air for several days, the multilayer films ripen into particles several microns wide and several hundred nanometers high over the course of several days. This ripening has never before been observed for thiols deposited on copper or copper oxide Finally, a conclusion is presented with several perspectives on the possible use of MLD in the future.

Download or read book Molecular Layer Deposition of Polymeric Thin Films for Applications in Semiconductor Fabrication written by Han Zhou and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The electronics industry has been developing improvements in its products at a rapid pace for five decades, an achievement that stems from its ability to continuously decrease the smallest feature sizes in microelectronic devices. To keep step with the miniaturization of next-generation devices, the constituent polymeric films of microelectronics need to meet requirements such as providing conformal, uniform, pinhole-free and ultrathin coatings. Molecular layer deposition (MLD), as an analogue to atomic layer deposition, is a layer-by-layer technique that utilizes sequential, self-limiting reactions of organic precursors to deposit films with one molecular unit at a time, which in turn allows for fine tuning of the position and concentration of various functionalities in the deposited film. Hence MLD can be a powerful method for deposition of polymer films used in semiconductor device fabrication. In this thesis, novel MLD processes are developed for fabricating ultrathin films and improving the film properties with applications in semiconductor manufacturing. The first part of this thesis explores the application of MLD films as chemically amplified photoresist materials. Acid-labile groups are embedded in the backbone of the precursor and incorporated into the photoresist film with a uniform distribution. Two methods of incorporating photo acid generator (PAG) are employed. The first method is to directly soak the PAG into the resist film after deposition and the second approach is to form in-situ polymer-bound PAG. By this novel synthetic approach, several polyurea films were deposited by MLD and tested for patterning, including an aromatic polyurea film with a soaked-in PAG, an aromatic polyurea film with an in-situ polymer-bound PAG, and an aliphatic polyurea film with soaked-in PAG. All these films were successfully deposited and characterized for both materials properties and resist response. Ellipsometry measurements show that the film thicknesses have a linear dependence on the number of MLD cycles. The presence of the urea linkage is confirmed by infrared (IR) spectroscopy, and x-ray photoelectron spectroscopy (XPS) show that the films are deposited with stoichiometric composition. Both of the aromatic films show cross-linking behavior under e-beam exposure, probably due to reaction at the aromatic rings. Moreover, the in-situ polymer-bound aromatic PAG has a lower activity than the soaked-in aromatic PAG, likely due to a lower photoacid yield. Finally, among the three MLD films studied, the aliphatic film performs best as a photoresist material and good sensitivity and resolution are achieved. To be applied in semiconductor device fabrication, polymeric thin films need to be thermally stable. Two approaches are investigated to improve the thermal stability of the MLD films. First, a series of cross-linked polyurea thin films are deposited by using multifunctional precursors. The cross-linked films show constant growth rate, urea chemical bonding, and stoichiometric compositions. More importantly, they exhibit higher film density and thermal stability compared to the non-cross-linked polyurea film. Second, a MLD process for depositing inorganic-organic hybrid carbosiloxane films is developed. Characteristic MLD growth behavior such as a constant growth rate and saturation behaviors are observed with this process as well. Significant improvement of film stability is achieved with the carbosiloxane films. This thesis concludes with thoughts and perspectives on the future of MLD in semiconductor device fabrication.

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Download or read book Photonics Volume 2 written by David L. Andrews and published by John Wiley & Sons. This book was released on 2015-01-28 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: Discusses the basic physical principles underlying thescience and technology of nanophotonics, its materials andstructures This volume presents nanophotonic structures and Materials.Nanophotonics is photonic science and technology that utilizeslight/matter interactions on the nanoscale where researchers arediscovering new phenomena and developing techniques that go wellbeyond what is possible with conventional photonics andelectronics.The topics discussed in this volume are: CavityPhotonics; Cold Atoms and Bose-Einstein Condensates; Displays;E-paper; Graphene; Integrated Photonics; Liquid Crystals;Metamaterials; Micro-and Nanostructure Fabrication; Nanomaterials;Nanotubes; Plasmonics; Quantum Dots; Spintronics; Thin FilmOptics Comprehensive and accessible coverage of the whole of modernphotonics Emphasizes processes and applications that specifically exploitphoton attributes of light Deals with the rapidly advancing area of modern optics Chapters are written by top scientists in their field Written for the graduate level student in physical sciences;Industrial and academic researchers in photonics, graduate studentsin the area; College lecturers, educators, policymakers,consultants, Scientific and technical libraries, governmentlaboratories, NIH.

Download or read book New Chemistries and Applications in Molecular Layer Deposition written by Richard Gene Closser and published by . This book was released on 2019 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent advancements in nanotechnologies have highlighted the need for thin film deposition capabilities that allow for fine thickness and compositional control. One technique that could help meet these needs is molecular layer deposition (MLD). MLD is a vapor-to-surface organic deposition method that utilizes sequential, self-limiting surface reactions, whereby thin film polymers can be grown. Since its inception, there has been significant progress in MLD synthesis capability, but certain challenges remain. Due to its vapor-phase nature, MLD is unable to utilize solvents and catalysts available to solution phase chemistry. This constraint has limited the variety of polymers that can be grown by MLD, including those formed by carbon-carbon bond synthesis. Another challenge for MLD is to enable area selective (AS) deposition, a process of significant interest in the semiconductor industry because of its potential to reduce fabrication processing steps and facilitate the scale-down of device feature sizes. The first portion of this work discusses a technique allowing for enhanced selectivity in AS-MLD. To achieve these highly selective depositions, a self-assembled monolayer (SAM) layer is used to act as a resist towards MLD. A chemical lift-off step is also employed, which is shown to significantly increase the overall selectivity of the AS-MLD process. Next, a new method for MLD of a silicon oxycarbide (SiOC) material is introduced. SiOC films are typically made with highly oxidizing reactants at elevated temperatures, causing film degradation during the deposition. The new MLD process, however, utilizes mild reactants at room temperature, thereby eliminating degradation problems, resulting in well defined SiOC films. The SiOC films crosslink during the deposition forming a robust film with exceptional thermal stability. The films show a low dielectric (k) constant, supporting their potential use in semiconductor devices where thermally resistant coatings with low-k properties are needed. Lastly, the development of a new MLD polymer is introduced. By utilizing UV light for radical polymerization, direct formation of carbon-carbon bonds is enabled in a photoactivated MLD (pMLD) synthesis. An alternating hydrocarbon-fluorocarbon copolymer, grown via pMLD using iodo-ene coupling, polymerizes by new carbon-carbon bond formation. The fluoropolymer exhibits high thermal stability and chemical resistance as well as the ability to be patterned using a photomask. The pMLD film also shows the ability to be used as a resist for selective deposition. The continued development of thin film techniques such as MLD is essential for progress to be made in nanoscale technologies and could have significant impact towards increasing energy efficiency, providing clean air and water, and improving healthcare. The focus of this work, therefore, is to advance the capabilities of MLD, allowing for new materials and applications.

Download or read book Atomic Layer Deposition written by Tommi Kääriäinen and published by John Wiley & Sons. This book was released on 2013-05-28 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Download or read book Atomic Layer Deposition ALD written by Callisto Joan MacIsaac and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Modern society demands smaller, more precise devices for both microelectronic and energy technologies. The development of methods and processes that can deposit reliably uniform, conformal thin films on the nanoscale is essential to fields as diverse as catalysts and solar cells. Therefore, atomic layer deposition (ALD), a thin-film deposition technique that accomplishes these goals by using self-limiting sequential reactions between alternating precursors to achieve atomic precision over the product film, is an important tool for the modern era. Combining ALD with molecular layer deposition (MLD), which follows the same principles as ALD but deposits entire organic molecules to build films, results in a powerful system that enables the deposition of inorganic, organic, and hybrid inorganic-organic materials. Understanding the nucleation mechanisms, surface reaction chemistry, and applications of these materials and ALD/MLD processes is essential to commercialization and wider use. Through in situ Fourier transform infrared (FTIR) spectroscopy, we studied the zinc-tin-oxide (ZTO) system, a ternary ALD process that is a combination of the zinc oxide and tin oxide binary ALD processes. Previous research had indicated that the ternary system is characterized by non-idealities in the ALD growth, and we identify as a potential cause of these effects incomplete removal of the ligands from the tetrakis(dimethylamino)tin precursor, which leads to a nucleation delay when depositing ZnO on SnO2. A significant fraction of the ligands remain on the surface during the ALD of SnO2 and endure when the process is switched to ZnO ALD. This result suggests that the occupation of surface reactive sites by these persisting ligands may be the cause of the observed nucleation delay with potential ramifications for many other binary and ternary systems where persisting ligands may be present. In addition, we studied the mechanism of ALD-grown MoS2 thin films. It was observed by atomic force microscopy (AFM), grazing incidence small angle X-ray scattering (GISAXS), and X-ray reflectivity (XRR) that nucleation proceeds by the formation of small islands that coalesce into a complete film in under 100 cycles, with further film growth failing to occur after coalescence. This inertness is attributed to the chemical inactivity of the basal planes of MoS2. It was found that the final thickness of the as-grown film is not determined by the number of ALD cycles as per the normal regime, but by the temperature that the film is deposited at. This self-limiting layer synthesis (SLS) has been reported in the literature for higher temperature depositions of MoS2, but this is the first report of the effect in a low temperature, amorphous MoS2 ALD system. The thickness of films growth by ALD with the precursors Mo(CO)6 and H2S was found to saturate at around 7 nm on both native oxide-covered silicon and bulk crystalline MoS2 substrates, which may indicate that the SLS behavior is inherent to the ALD process and not substantially a product of the substrate surface potential. Finally, we demonstrated a new ALD/MLD hybrid process that used the MoS2 ALD precursor Mo(CO)6 and the counter reagent 1,2-ethanedithiol to create a MoS2-like material with organic domains. This Mo-thiolate possesses many properties that link it to MoS2, such as activity towards the hydrogen evolution reaction (HER) and similar Raman modes, but has a significantly lower density, optical transparency, and higher geometric surface area. It was found that the process has a 1.3 Å growth per cycle and can catalyze the HER reaction at an overpotential of 294 mV at -10 mA/cm2 , which is superior to planar MoS2 and ranks the as-deposited catalyst with the best nanostructured MoS2-based catalysts. We propose that this activity comes from the higher surface area induced by the incorporation of organic chains into the films. In summary, we explored the mechanisms and nucleation behavior of several ALD systems of interest to energy applications using both in situ and ex situ analysis techniques. These studies demonstrated the importance of understanding ALD surface chemistry to the overall chemical composition of the resultant films, the ramifications of different nucleation regimes in determining morphologies, and the power of ALD/MLD in creating analogues to previously known species with improved physical properties.

Download or read book Self Organized 3D Integrated Optical Interconnects written by Tetsuzo Yoshimura and published by CRC Press. This book was released on 2021-03-09 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt: Currently, light waves are ready to come into boxes of computers in high-performance computing systems like data centers and super computers to realize intra-box optical interconnects. For inter-box optical interconnects, light waves have successfully been introduced by OE modules, in which discrete bulk-chip OE/electronic devices are assembled using the flip-chip-bonding-based packaging technology. OE modules, however, are not applicable to intra-box optical interconnects, because intra-box interconnects involve “short line distances of the cm–mm order” and “large line counts of hundreds-thousands.” This causes optics excess, namely, excess components, materials, spaces, fabrication efforts for packaging, and design efforts. The optics excess raises sizes and costs of intra-box optical interconnects enormously when they are built using conventional OE modules. This book proposes the concept of self-organized 3D integrated optical interconnects and the strategy to reduce optics excess in intra-box optical interconnects.

Download or read book Growth Characterization and Post processing of Inorganic and Hybrid Organic inorganic Thin Films Deposited Using Atomic and Molecular Layer Deposition Techniques written by Aziz Ilmutdinovich Abdulagatov and published by . This book was released on 2015 with total page 313 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition (ALD) and molecular layer deposition (MLD) are advanced thin film coating techniques developed for deposition of inorganic and hybrid organic-inorganic films respectively. Decreasing device dimensions and increasing aspect ratios in semiconductor processing has motivated developments in ALD. The beginning of this thesis will cover study of new ALD chemistry for high dielectric constant Y 2 O3 . In addition, the feasibility of conducting low temperature ALD of TiN and TiAlN is explored using highly reactive hydrazine as a new nitrogen source. Developments of these ALD processes are important for the electronics industry. As the search for new materials with more advanced properties continues, attention has shifted toward exploring the synthesis of hierarchically nanostructured thin films. Such complex architectures can provide novel functions important to the development of state of the art devices for the electronics industry, catalysis, energy conversion and memory storage as a few examples. Therefore, the main focus of this thesis is on the growth, characterization, and post-processing of ALD and MLD films for fabrication of novel composite (nanostructured) thin films. Novel composite materials are created by annealing amorphous ALD oxide alloys in air and by heat treatment of hybrid organic-inorganic MLD films in inert atmosphere (pyrolysis). The synthesis of porous TiO2 or Al2 O3 supported V2 O5 for enhanced surface area catalysis was achieved by the annealing of inorganic TiVx Oy and AlV x Oy ALD films in air. The interplay between phase separation, surface energy difference, crystallization, and melting temperature of individual oxides were studied for their control of film morphology. In other work, a class of novel metal oxide-graphitic carbon composite thin films was produced by pyrolysis of MLD hybrid organic-inorganic films. For example, annealing in argon of titania based hybrid films enabled fabrication of thin films of intimately mixed TiO2 and nanographitized carbon. The graphitized carbon in the film was formed as a result of the removal of hydrogen by pyrolysis of the organic constituency of the MLD film. The presence of graphitic carbon allowed a 14 orders of magnitude increase in the electrical conductivity of the composite material compared fully oxidized rutile TiO2 .

Download or read book Optoelectronic Organic Inorganic Semiconductor Heterojunctions written by Ye Zhou and published by CRC Press. This book was released on 2021-01-19 with total page 382 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optoelectronic Organic-Inorganic Semiconductor Heterojunctions summarizes advances in the development of organic-inorganic semiconductor heterojunctions, points out challenges and possible solutions for material/device design, and evaluates prospects for commercial applications. Introduces the concept and basic mechanism of semiconductor heterojunctions Describes a series of organic-inorganic semiconductor heterojunctions with desirable electrical and optical properties for optoelectronic devices Discusses typical devices such as solar cells, photo-detectors, and optoelectronic memories Outlines the materials and device challenges as well as possible strategies to promote the commercial translation of semiconductor heterojunctions-based optoelectronic devices Aimed at graduate students and researchers working in solid-state materials and electronics, this book offers a comprehensive yet accessible view of the state of the art and future directions.