Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.

Download or read book Transient Modeling of Selective Chemical Vapor Deposition of Tungsten During a Via Filling Process written by Yeongdae Shon and published by . This book was released on 1992 with total page 394 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Modeling and Validation of Chemical Vapor Deposition for Tungsten Fiber Reinforced Tungsten written by Leonard Raumann and published by . This book was released on 2020 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Modeling Chemical Vapor Deposition of Thin Solid Films written by Michel E. Jabbour and published by . This book was released on 2000 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Mathematical Modeling of Chemical Vapor Deposition Processes and Its Application to Thin Film Technology written by Norman W. Loney and published by . This book was released on 1991 with total page 162 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma enhanced Chemical Vapor Deposition and Characterization of Tungsten Films written by John Ka-ngai Chu and published by . This book was released on 1982 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.

Download or read book Plasma Enhanced Chemical Vapor Deposition of Tungsten Films written by J. K. Chu and published by . This book was released on 1982 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Principles of Chemical Vapor Deposition written by Daniel Dobkin and published by Springer Science & Business Media. This book was released on 2003-04-30 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Download or read book Modeling of Chemical Vapor Deposition on Glass written by Joseph G. Lawrence and published by . This book was released on 2002 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Multiscale Modeling of Chemical Vapor Deposition and Plasma Etching written by Seth Thomas Rodgers and published by . This book was released on 2000 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma Enhanced Chemical Vapor Deposition of Stress Free Tungsten Films written by David Perese and published by . This book was released on 1996 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book New Methods Mechanisms and Models of Vapor Deposition Volume 616 written by Haydn N. G. Wadley and published by Mrs Proceedings. This book was released on 2000-09-25 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Download or read book Detailed Kinetic Modeling of the Chemical Vapor Deposition of Silicon Dioxide and Tin Oxide Films written by Carmen Joseph Giunta and published by . This book was released on 1988 with total page 209 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma enhanced Chemical Vapor Deposition and Plasma Etching of Tungsten Films written by Ching Cheong Tang and published by . This book was released on 1983 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Chemical Vapor Deposition of Refractory Metals and Ceramics Volume 168 Materials Research Society Symposium Proceedings Held in Boston Massachusetts on 29 November 1 December 1989 written by Theodore M. Besmann and published by . This book was released on 1990 with total page 422 pages. Available in PDF, EPUB and Kindle. Book excerpt: Contents: Fundamentals/Modeling; Diagnostics; Process-Microstructure Relationships; Microstructure-Mechanical Property Relationships; Novel/Large-Scale Technologies; Metal-Organic Chemical Vapor Deposition. Keywords: Chemical vapor, Gas phase reactions, Thin alumina films, Tungsten films, Glass. (KR).