Download or read book Investigation of Electron Beam Nanolithography Processes Mechanisms and Applications written by Mohammad A. Mohammad and published by . This book was released on 2013 with total page 258 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron beam lithography (EBL) is the leading technology for versatile two dimensional patterning at the deep (10-100 nm) nanoscale. In addition to its reputation as an enabling technology for next generation advances in industry, its ease of use, accuracy, and cost has made it the technology of choice for rapid sub-micron prototyping in academia and research institutes worldwide. Advances in EBL processing have enabled sub-10 nm fabrication using a variety of materials under limited conditions. Repeatable processing at the deep nanoscale, particularly for dense nanostructure fabrication, requires a systematic quantitative study of all processing steps and their intricate interdependencies. In addition, developing future nanofabrication strategies with features approaching molecular length scales, requires a thorough examination of the molecular interactions taking place in EBL processing. This research project investigates EBL processing using PMMA and ZEP resists through an in-depth quantitative study and analysis of process windows for dense grating fabrication. The effect of processing parameters from each EBL stage on process windows is thoroughly investigated. Through the study of process windows and contrast curves, EBL processing strategies are developed and high resolution processing limits in PMMA and ZEP resists are explored. Furthermore, the EBL development stage involving resist-solvent interactions is studied using molecular dynamics simulations in Accelrys Materials Studio software package, and analyzed using the Flory-Huggins polymer physics theory. Finally, optimized processing strategies for dense grating fabrication are demonstrated and techniques are employed for the fabrication of record ultra-narrow (8 nm) suspended SiCN cantilever structures and high aspect ratio polymer fabrication using novel SML resist.
Download or read book Electron Beam Lithography Process Optimization written by Rohan Handa and published by GRIN Verlag. This book was released on 2011-12 with total page 37 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical Report from the year 2011 in the subject Design (Industry, Graphics, Fashion), University of Southern California, language: English, abstract: Currently, nanowires have aroused intensive attention due to their interesting electric and optical properties as well as potentially wide application (For example, nanowires can be used as a promising structure for transistor channels). For compound semiconductor nanowires, Nanoscale Selective Area MOCVD (Metalorganic Chemical Vapor Deposition), or NS‐SAG, is a very attractive growth technique for the fabrication of sophisticated nanowire structure, because by using this technique, diameter and location of wires are controllable, with no incorporation of unwanted metals. It is achieved by deposition of a nano‐openingarray ‐patterned dielectric mask above the substrate. Since crystals cannot be formed on dielectric mask, nanowire growth only occurs at openings, with desired diameters and locations, as shown in Fig 1. Pattern of nano opening arrays is of vital importance since it governs the size, location and density of nanowires as wells as growth rate and behavior.
Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Download or read book Electron Beam Lithography Process Optimization written by Rohan Handa and published by GRIN Verlag. This book was released on 2011-12-14 with total page 17 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical Report from the year 2011 in the subject Design (Industry, Graphics, Fashion), University of Southern California, language: English, abstract: Currently, nanowires have aroused intensive attention due to their interesting electric and optical properties as well as potentially wide application (For example, nanowires can be used as a promising structure for transistor channels). For compound semiconductor nanowires, Nanoscale Selective Area MOCVD (Metalorganic Chemical Vapor Deposition), or NS‐SAG, is a very attractive growth technique for the fabrication of sophisticated nanowire structure, because by using this technique, diameter and location of wires are controllable, with no incorporation of unwanted metals. It is achieved by deposition of a nano‐openingarray ‐patterned dielectric mask above the substrate. Since crystals cannot be formed on dielectric mask, nanowire growth only occurs at openings, with desired diameters and locations, as shown in Fig 1. Pattern of nano opening arrays is of vital importance since it governs the size, location and density of nanowires as wells as growth rate and behavior.
Download or read book Mechanisms of Direct Electron Beam Nanolithography and Nanostructure Fabrication Methods written by Giin-Shan Chen and published by . This book was released on 1994 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanolithography written by M Feldman and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next? and "How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
Download or read book Nanolithography written by M. Gentili and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Download or read book Nanostructure Engineering Using Electron Beam Lithography written by Paul Bernard Fischer and published by . This book was released on 1993 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Ph. D. thesis addresses nanostructure fabrication techniques based on electron beam lithography and their application to: the creation of ultra-fast metal-semiconductor-metal photodetectors and quantum effect transistors, the investigation of light emission from silicon, and the enhancement of resolution in magnetic force microscopy. Specifically, this thesis covers the following topics. (1) The implementation and characterization of an ultra-high resolution electron beam lithography (EBL) system created by modifying a scanning electron microscope. (2) The exploration of minimum achievable feature sizes using ultra-high resolution EBL and a lift-off process with polymethyl-methacrylate resists. 10 nm features, which are among the smallest ever achieved using EBL, have been obtained using a double shadow evaporation technique, a ultra-high resolution EBL technique, and a technique utilizing EBL, reactive ion etching, and subsequent wet etching. (3) The application of ultra-high resolution EBL technology to the fabrication of ultra-fast metal-semiconductor-metal (MSM) photodetectors. The fastest response time reported to date has been achieved in this project. (4) The fabrication and characterization of modulation doped field effect transistors. Quantum effects have been observed in a point contact device. (5) The fabrication of sub-50 nm Si structures using EBL, reactive ion etching (RIE) and subsequent wet etching for the study of photoluminescence (PL) from Si. PL has been observed from an array of 20 nm diameter pillars. And finally, (6) the application of high resolution EBL to the study of magnetic materials. Single domain magnetic particles and novel MFM tips have been fabricated.
Download or read book Nanofabrication Using Electron Beam Lithography written by Arwa Abbas and published by . This book was released on 2013 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis addresses nanostructure fabrication techniques based on electron beam lithography, which is the most widely employed nanofabrication techniques for R & D and for the prototyping or production of photo-mask or imprint mold. The focus is on the study of novel resist and development process, as well as pattern transfer procedure after lithography. Specifically, this thesis investigates the following topics that are related to either electron beam resists, their development, or pattern transfer process after electron beam lithography: (1) The dry thermal development (contrary to conventional solvent development) of negative electron beam resists polystyrene (PS) to achieve reasonably high contrast and resolution. (2) The solvent development for polycarbonate electron beam resist, which is more desirable than the usual hot aqueous solution of NaOH developer, to achieve a low contrast that is ideal for grayscale lithography. (3) The fabrication of metal nanostructure by electron beam lithography and dry liftoff (contrary to the conventional liftoff using a strong solvent or aqueous solution), to achieved down to ~50 nm resolution. (4) The study a novel electron beam resist poly(sodium 4-styrenesulfonate) (sodium PSS) that is water soluble and water developable, to fabricate the feature size down to ~ 40 nm. And finally, (5) The fabrication of gold nanostructure on a thin membrane, which will be used as an object for novel x-ray imaging, where we developed the fabrication process for silicon nitride membrane, electroplating of gold, and pattern transfer after electron beam lithography using single layer resist and tri-layer resist stack.
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place
Download or read book Nanoimprint Lithography An Enabling Process for Nanofabrication written by Weimin Zhou and published by Springer Science & Business Media. This book was released on 2013-01-04 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Download or read book Experimental Theoretical and Device Application Development of Nanoscale Focused Electron beam induced Deposition written by and published by . This book was released on 2005 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: To elucidate the effects of beam heating in electron beam-induced deposition (EBID), a Monte-Carlo electron-solid interaction model has been employed to calculate the energy deposition profiles in bulk and nanostructured SiO2. Using these profiles, a finite element model was used to predict the nanostructure tip temperatures for standard experimental EBID conditions. Depending on the beam energy, beam current, and nanostructure geometry, the heat generated can be substantial. This heat source can subsequently limit the EBID growth by thermally reducing the mean stay time of the precursor gas. Temperature dependent EBID growth experiments qualitatively verified the results of the electron beam-heating model. Additionally, experimental trends for the growth rate as a function of deposition time supported the conclusion that electron beam-induced heating can play a major role in limiting the EBID growth rate of SiO2 nanostructures. In an EBID application development, two approaches to maskless, direct-write lithography using electron beam-induced deposition (EBID) to produce ultra-thin masking layers were investigated. A single layer process used directly written SiO[subscript x] features deposited from a tetraethoxysilane (TEOS) precursor vapor as a masking layer for amorphous silicon thin films. A bilayer process implemented a secondary masking layer consisting of standard photoresist into which a pattern--directly written by EBID tungsten from WF6 precursor--was transferred. The single layer process was found to be extremely sensitive to the etch selectivity of the plasma etch. As a result, patterns were successfully transferred into silicon, but only to a minimal depth. In the bilayer process, EBID tungsten was written onto photoresist and the pattern transferred by means of an oxygen plasma dry development. A brief refractory descum plasma etch was implemented to remove the peripheral tungsten contamination prior to the development process. Conditions were developed to reduce the spatial spread of electrons in the photoresist layer and obtain minimal linewidths, which enabled patterning of [sim] 35 nm lines. Additionally, an EBID-based technique for field emitter repair was applied to the Digital Electrostatically focused e-beam Array Lithography (DEAL) parallel electron beam lithography configuration. Damaged or missing carbon nanofiber (CNF) emitters are very common in these prototype devices, so there is a need for a deterministic repair process. Relatively carbon-free, high aspect ratio tungsten nanofibers were deposited from a WF6 precursor in a gated cathode and a damaged triode (DEAL) device. The I-V response of the devices during vacuum FE testing indicated stable, cold field emission from the EBID cathodes. The field emission threshold voltage was shown to decrease from -130 V to -90 V after a short initiation period. Finally, lithography was performed using the repaired device to write a series of lines in PMMA with variable focus voltage. Successful focusing of the beam with increased focus voltage was evident in the patterned and developed PMMA. The I-V and lithography results were comparable to CNF-based DEAL devices indicating a successful repair technique.
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Advances in Nanotechnology Research and Application 2011 Edition written by and published by ScholarlyEditions. This book was released on 2012-01-09 with total page 8760 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in Nanotechnology Research and Application: 2011 Edition is a ScholarlyEditions™ eBook that delivers timely, authoritative, and comprehensive information about Nanotechnology. The editors have built Advances in Nanotechnology Research and Application: 2011 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Nanotechnology in this eBook to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Advances in Nanotechnology Research and Application: 2011 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.
Download or read book Recent Awards in Engineering written by and published by . This book was released on 1983 with total page 986 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Naval Research Reviews written by and published by . This book was released on 1997 with total page 228 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book IBM Journal of Research and Development written by and published by . This book was released on 1997 with total page 810 pages. Available in PDF, EPUB and Kindle. Book excerpt:
