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Book Physics of Submicron Devices

    Book Details:
  • Author : David K. Ferry
  • Publisher : Springer Science & Business Media
  • Release : 2012-12-06
  • ISBN : 1461532841
  • Pages : 409 pages

Download or read book Physics of Submicron Devices written by David K. Ferry and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 409 pages. Available in PDF, EPUB and Kindle. Book excerpt: The purposes of this book are many. First, we must point out that it is not a device book, as a proper treatment of the range of important devices would require a much larger volume even without treating the important physics for submicron devices. Rather, the book is written principally to pull together and present in a single place, and in a (hopefully) uniform treatment, much of the understanding on relevant physics for submicron devices. Indeed, the understand ing that we are trying to convey through this work has existed in the literature for quite some time, but has not been brought to the full attention of those whose business is the making of submicron devices. It should be remarked that much of the important physics that is discussed here may not be found readily in devices at the 1.0-JLm level, but will be found to be dominant at the O.I-JLm level. The range between these two is rapidly being covered as technology moves from the 256K RAM to the 16M RAM chips.

Book EDN

Download or read book EDN written by and published by . This book was released on 1984 with total page 1832 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Advances in Integrated Optics

Download or read book Advances in Integrated Optics written by M. Bertolotti and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volwne contains the Proceedings of a two-week summer conference titled "Advances in Integrated Optics" held June 1-9, 1993, in Erice, Sicily. This was the 18th annual course organized by the International School of Quantum Electronics, under the auspices of the "Ettore Majorana" Centre for Scientific Culture. The term Integrated Optics signifies guided-wave optical circuits consisting of two or more devices on a single substrate. Since its inception in the late 1960's, Integrated Optics has evolved from a specialized research topic into a broad field of work, ranging from basic research through commercial applications. Today many devices are available on market while a big effort is devolved to research on integrated nonlinear optical devices. This conference was organized to provide a comprehensive survey of the frontiers of this technology, including fundamental concepts, nonlinear optical materials, devices both in the linear and nonlinear regimes, and selected applications. These Proceedings update and augment the material contained in a previous ISQE volume, "Integrated Optics: Physics and Applications", S. Martellucci and A. N. Chester, Eds. , NATO ASI Series B, Vol. 91 (Plenum, 1983). For some closely related technology, the reader many also wish to consult the ISQE volumes: "Optical Fiber Sensors", A. N. Chester, S. Martellucci and A. M. Scheggi, Eds. , NATO ASI Series E, Vol. 132 (Nijhoff, 1987) ; and, "Nonlinear Optics and Optical Computing", S. Martellucci and A. N. Chester, Eds. , E. Majorana Int'! Science Series, Vol. 49 (plenum, 1990).

Book Advances in Resist Technology and Processing

Download or read book Advances in Resist Technology and Processing written by and published by . This book was released on 1995 with total page 932 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Nanofabrication

    Book Details:
  • Author : Ampere A. Tseng
  • Publisher : World Scientific
  • Release : 2008
  • ISBN : 9812700765
  • Pages : 583 pages

Download or read book Nanofabrication written by Ampere A. Tseng and published by World Scientific. This book was released on 2008 with total page 583 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students.Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices.

Book Physics Briefs

Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 888 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Science and Technology of Thin Film Superconductors 2

Download or read book Science and Technology of Thin Film Superconductors 2 written by R.D. McConnell and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 601 pages. Available in PDF, EPUB and Kindle. Book excerpt: This conference is the second on the Science and Technology of Thin Film Superconductors. It proved to be an excellent forum for these specialists in thin film superconductivity. The conference, held April 30-May 4, 1990, in Denver, Colorado, hosted 170 researchers from 17 countries. The response to the conference again emphasized the need for a meeting devoted to the science and technology of thin film superconductors. The breadth of artic1es and advances made in this technology since the first conference in November 1988, reflect on the maturity of the topic. These proceedings contain artic1es on deposition methods by sputtering, e1ectron beam evaporation, resistive evaporation, laser ablation, chemical vapor deposition and electrodeposition, and on other studies related to substrates, thermodynamics of formation, grain boundaries and weak links, characterization, and some practical applications. The program committee was pleased with the quality of the publications and contributed articles. This conference was highlighted by a fuU day dedicated to presentations from the federallaboratories, discussing a wide range of topics on the fabrication, characterization, and theory of high-temperature superconductor thin films. Other highlights at the conference dealt with (1) critical parameters or problems in measuring critical current density and other important parameters, and (2) problems of scale-up, reproducibility, and amenability to device fabrication. It became evident from the presentations that three issues were developing into critical issues for the ultimate practical application of high temperature superconductor thin films.

Book Nanostructure Physics and Fabrication

Download or read book Nanostructure Physics and Fabrication written by Mark A. Reed and published by Elsevier. This book was released on 2012-12-02 with total page 538 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanostructure Physics and Fabrication contains the contributions of an interdisciplinary group of specialists in nanometer scale fabrication, physics of mesoscopic systems, electronic transport, and materials science brought together to discuss the current status of nanometer scale electronic structures. These articles provide the most current assessment of this active and growing area of interest. The introductory chapter provides comments and background material for those somewhat unfamiliar with this new area of research and serves as a condensed overview and summary of the contributions that follow. - Most current assessment of the field - Articles by experts in the field - Results presented here will impact the future of microelectronics

Book Advances in Resist Technology and Processing IV

Download or read book Advances in Resist Technology and Processing IV written by M. J. Bowden and published by . This book was released on 1987 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Dry Etching for Microelectronics

Download or read book Dry Etching for Microelectronics written by R.A. Powell and published by Elsevier. This book was released on 2012-12-02 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters.

Book Nanofabrication

Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.

Book Science Abstracts

Download or read book Science Abstracts written by and published by . This book was released on 1995 with total page 1360 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book FY     US Air Force Plan for Defense Research Sciences

Download or read book FY US Air Force Plan for Defense Research Sciences written by and published by . This book was released on 1986 with total page 184 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Handbook of Thin Film Deposition

Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2001-02-01 with total page 659 pages. Available in PDF, EPUB and Kindle. Book excerpt: New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques.Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Book Nanofabrication Using Focused Ion and Electron Beams

Download or read book Nanofabrication Using Focused Ion and Electron Beams written by Ivo Utke and published by Oxford University Press. This book was released on 2012-05-01 with total page 840 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.

Book Handbook of Thin Film Deposition Techniques Principles  Methods  Equipment and Applications  Second Editon

Download or read book Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon written by Krishna Seshan and published by CRC Press. This book was released on 2002-02-01 with total page 658 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec

Book Ferroelectric Crystals for Photonic Applications

Download or read book Ferroelectric Crystals for Photonic Applications written by Pietro Ferraro and published by Springer Science & Business Media. This book was released on 2013-11-20 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book deals with the latest achievements in the field of ferroelectric domain engineering and characterization at micro- and nano-scale dimensions and periods. The book collects the results obtained in the last years by world scientific leaders in the field, thus providing a valid and unique overview of the state-of-the-art and also a view to future applications of those engineered and used materials in the field of photonics. The second edition covers the major aspects of ferroelectric domain engineering and combines basic research and latest updated applications such as challenging results by introducing either new as well as extended chapters on Photonics Crystals based on Lithium Niobate and Lithium Tantalate crystals; generation, visualization and controlling of THz radiation; latest achievements on Optical Parametric Oscillators for application in precise spectroscopy. Further more recent advancements in characterization by probe scanning microscopy and optical methods with device and technological orientation. A state-of-the-art report on periodically poled processes and their characterization methods are provided on different materials (LiNbO3, KTP) furnishing update research on ferroelectric crystal by extending materials research and applications.