Download or read book Characterization of Amorphous Silicon Thin Films and PV Devices written by Philip Craig Taylor and published by . This book was released on 1999 with total page 20 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterization of Amorphous Silicon Thin Films and PV Devices Phase I Annual Technical Report January 1998 January 1999 written by and published by . This book was released on 1999 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Major accomplishments of the previous year include (1) an evaluation of the potential for n-type doping of a-SiSx:H and a-SiSex:H alloys, (2) an investigation of the optically induced metastabilities in a-SiSx:H and a-SiSex:H alloys with regard to their potential use in photovoltaic applications, and (3) a more detailed understanding of the kinetics of light-induced electron spin resonance (ESR)due to carriers trapped in localized band-tail states in a-Si:H. Also of importance are preliminary measurements of the defects and metastabilities in hot-wire samples of a-Si:H and in samples of a-Si:H made under strong hydrogen dilution. The preliminary measurements on hydrogen dilution suggest that the production of neutral silicon dangling bonds is not suppressed from the standard materialeven though there appears to be an improvement in the stability of cells made using the hydrogen-dilution process. The new three-chamber, load-locked plasma-enhanced chemical vapor deposition system is functioning and producing intrinsic and doped films of a-Si:H. Plans for the next year include the production of high quality devices using this new deposition system.
Download or read book Characterization of Amorphous Silicon Thin Films and PV Devices written by and published by . This book was released on 2002 with total page 59 pages. Available in PDF, EPUB and Kindle. Book excerpt: This report describes the most significant results of the three phases: (1) development of a second harmonic detection technique for electron spin resonance (ESR) and optically excited ESR (LESR) in a-Si:H and related alloys, (2) discovery of universal kinetics for the decay of optically excited electrons and holes in a-Si:H and related alloys at low temperatures, (3) first detection of optically excited band-tail electrons and holes in hydrogenated amorphous germanium (a-Ge:H), (4) first ESR study of the kinetics for the production of silicon dangling bonds in a-Si:H at low temperatures, and (5) determination from 1H NMR that there exists an order of magnitude more molecular hydrogen (H2) in a-Si:H than previously measured.
Download or read book Characterization of Amorphous Silicon Thin Films and PV Devices written by Philip Craig Taylor and published by . This book was released on 2002 with total page 54 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterization of Amorphous Silicon Thin Films and PV Devices written by and published by . This book was released on 1999 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: Major accomplishments of the previous year include: (1) an evaluation of the potential for n-type doping of a-SiS(subscript x):H and a-SiSe(subscript x):H alloys, (2) an investigation of the optically induced metastabilities in a-SiS(subscript x):H and a-SiSe(subscript x):H alloys with regard to their potential use in photovoltaic applications, and (3) a more detailed understanding of the kinetics of light-induced electron spin resonance (ESR) due to carriers trapped in localized band-tail states in a-Si:H. Also of importance are preliminary measurements of the defects and metastabilities in hot-wire samples of a-Si:H and in samples of a-Si:H made under strong hydrogen dilution. The preliminary measurements on hydrogen dilution suggest that the production of neutral silicon dangling bonds is not suppressed from the standard material even though there appears to be an improvement in the stability of cells made using the hydrogen-dilution process. The new three-chamber, load-locked plasma-enhanced chemical vapor deposition system is functioning and producing intrinsic and doped films of a-Si:H. Plans for the next year include the production of high quality devices using this new deposition system.
Download or read book Atomic scale Characterization of Hydrogenated Amorphous silicon Films and Devices written by Alan C. Gallagher and published by . This book was released on 1998 with total page 19 pages. Available in PDF, EPUB and Kindle. Book excerpt: The research is concerned with improving the electronic properties of hydrogenated amorphous silicon (a-Si:H) films and of photovoltaic (PV) cells that use these films. Two approaches toward this goal are being taken. One is to establish the character of silicon particle growth in the rf glow discharges that are used to make the films and PV cells, and to understand the particle incorporation into the films. The ultimate goal of this effort is to find mitigation techniques that minimize the particle incorporation. During this contract period, we developed a novel particle light-scattering technique that provides a detailed and sensitive diagnostic of small (8-60-nm diameter) particles suspended in the discharge. We used this to measure the particle growth rates and densities, versus conditions in pure-silane discharges. The second program is directed toward measuring the electronic properties of thin-film PV cells, as a function of depth within the cell. The approach being taken is to use a scanning tunneling microscope (STM) to measure the depth-dependent electronic properties of cross-sectioned PV cells. During the present period, measurements on single and tandem amorphous silicon cells have been carried out. Using STM current-voltage spectroscopy, these measurements distinguish the boundaries between the highly conducting and intrinsic layers, and should allow one to deduce the chemical potential versus depth in the cell.
Download or read book Atomic scale Characterization of Hydrogenated Amorphous silicon Films and Devices written by and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Our research is concerned with improving the electronic properties of hydrogenated amorphous silicon (a-Si:H) films and of photovoltaic (PV) cells that use these films. Two approaches toward this goal are being taken. One is to establish the character of silicon particle growth in the rf glow discharges that are used to make the films and PV cells, and to understand the particle incorporation into the films. The ultimate goal of this effort is to find mitigating techniques that minimize the particle incorporation. During this contract period, we have developed a novel particle light-scattering technique that provides a very detailed and sensitive diagnostic of the particles suspended in the discharge, The second program is directed toward measuring the electronic properties of these thin-film PV cells, as a function of depth within the cell. The approach being taken is to use a scanning tunneling microscope to measure the depth-dependent electronic properties of cross-sectioned PV cells. During the present period, cell cleaving and cross-section locating methods, both in a ultrahigh vacuum environment, have been successfully developed.
Download or read book Atomic scale Characterization of Hydrogenated Amorphous silicon Films and Devices written by Alan C. Gallagher and published by . This book was released on 1997 with total page 18 pages. Available in PDF, EPUB and Kindle. Book excerpt: Our research is concerned with improving the electronic properties of hydrogenated amorphous silicon (a-Si:H) films and of photovoltaic (PV) cells that use these films. Two approaches toward this goal are being taken. One is to establish the character of silicon particle growth in the rf glow discharges that are used to make the films and PV cells, and to understand the particle incorporation into the films. The ultimate goal of this effort is to find mitigating techniques that minimize the particle incorporation. During this contract period, we have developed a novel particle light-scattering technique that provides a very detailed and sensitive diagnostic of the particles suspended in the discharge, The second program is directed toward measuring the electronic properties of these thin-film PV cells, as a function of depth within the cell. The approach being taken is to use a scanning tunneling microscope to measure the depth-dependent electronic properties of cross-sectioned PV cells. During the present period, cell cleaving and cross-section locating methods, both in a ultrahigh vacuum environment, have been successfully developed.
Download or read book Amorphous Thin Films for Solar cell Applications written by RCA Laboratories and published by . This book was released on 1979 with total page 56 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Preparation and Characterization of Hydrogenated Amorphous Silicon Thin Films and Thin Film Solar Cells Produced by Ion Plating Techniques Final Report 1 January 1979 31 May 1980 written by and published by . This book was released on 1980 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion plating techniques for the preparation of hydrogenated amorphous silicon thin films have been successfully developed. The technique involves essentially the evaporation of elemental silicon through a d.c. produced hydrogen plasma. In this way hydrogen has been successfully incorporated into amorphous silicon films in concentrations as high as 30 atomic percent. Infrared spectroscopy indicates the usual SiHx stretching mode at approximately 2000 cm−1. Further evidence for the bonding of hydrogen was obtained from ESR measurement of hydrogenated and unhydrogenated samples. The measured unpaired spin density was a factor of 25 less in the hydrogenated sample. The optical absorption edges of the hydrogenated films fell in the usual range between 1.7 and 1.9 eV. Electrical conductivity measurements indicated a substantial reduction in the density of defect states in the gap as expected. It was also shown that hydrogenated amorphous silicon prepared by ion-plating could be doped by co-evaporation of the dopant element during film deposition. Both co-evaporated phosphorous and co-evaporated bismuth have been found to substantially increase the dark conductivity of a-Si:H while shifting the Fermi level towards the conduction band edge. An x-ray method for estimating the density and hydrogen content of a-Si:H has been developed. The measurement of strain in a-Si:H thin films is discussed. (WHK).
Download or read book Atomic scale Characterization of Hydrogenated Amorphous silicon Films and Devices Annual Subcontract Report 14 February 1994 14 April 1995 written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Properties of the hydrogenated amorphous silicon (a-Si:H) films used in photovoltaic (PV) panels are reported. The atomic-scale topology of the surface of intrinsic a-Si:H films, measured by scanning tunneling microscopy (STM) as a function of film thickness, are reported and diagnosed. For 1-500-nm-thick films deposited under normal device-quality conditions from silane discharges, most portions of these surfaces are uniformly hilly without indications of void regions. However, the STM images indicate that 2-6-nm silicon particulates are continuously deposited into the growing film from the discharge and fill approximately 0.01% of the film volume. Although the STM data are not sensitive to the local electronic properties near these particulates, it is very likely that the void regions grow around them and have a deleterious effect on a-Si:H photovoltaics. Preliminary observations of particulates in the discharge, based on light scattering, confirm that particulates are present in the discharge and that many collect and agglomerate immediately downstream of the electrodes. Progress toward STM measurements of the electronic properties of cross-sectioned a-Si:H PV cells is also reported.
Download or read book Polycrystalline And Amorphous Thin Films And Devices written by Lawrence Kazmerski and published by Elsevier. This book was released on 2012-12-02 with total page 321 pages. Available in PDF, EPUB and Kindle. Book excerpt: Polycrystalline and Amorphous Thin Films and Devices is a compilation of papers that discusses the electronic, optical, and physical properties of thin material layers and films. This compilation reviews the different applications of thin films of various materials used as protective and optical coatings, thermal transfer layers, and selective membranes from submicron- area VLSI memory units to large-area energy conservation devices. Some papers discuss the basic properties, such as growth, structure, electrical, and optical mechanisms that are encountered in amorphous and polycrystalline thin semiconductor films. For example, experiments on electronic structure of dislocations have led to a model for the intrinsic properties of grain boundaries in polycrystalline semiconductor thin films that can have an impact on the designs of high-efficiency, thin-film solar cells. Other papers review the problems encountered in these thin layers in active semiconductor devices and passive technologies. Techniques in film growth and control variables of source, substrate temperature, and substrate properties will determine the successful performance of the devices installed with these thin film layers. This compilation can prove valuable for chemists, materials engineers, industrial technologists, and researchers in thin-film technology.
Download or read book Amorphous and Heterogeneous Silicon Thin Films written by Howard M. Branz and published by . This book was released on 1999 with total page 924 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Deposition of Amorphous Silicon Based Materials written by Pio Capezzuto and published by Elsevier. This book was released on 1995-10-10 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Download or read book Semiconductor Material and Device Characterization written by Dieter K. Schroder and published by John Wiley & Sons. This book was released on 2015-06-29 with total page 800 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Third Edition updates a landmark text with the latest findings The Third Edition of the internationally lauded Semiconductor Material and Device Characterization brings the text fully up-to-date with the latest developments in the field and includes new pedagogical tools to assist readers. Not only does the Third Edition set forth all the latest measurement techniques, but it also examines new interpretations and new applications of existing techniques. Semiconductor Material and Device Characterization remains the sole text dedicated to characterization techniques for measuring semiconductor materials and devices. Coverage includes the full range of electrical and optical characterization methods, including the more specialized chemical and physical techniques. Readers familiar with the previous two editions will discover a thoroughly revised and updated Third Edition, including: Updated and revised figures and examples reflecting the most current data and information 260 new references offering access to the latest research and discussions in specialized topics New problems and review questions at the end of each chapter to test readers' understanding of the material In addition, readers will find fully updated and revised sections in each chapter. Plus, two new chapters have been added: Charge-Based and Probe Characterization introduces charge-based measurement and Kelvin probes. This chapter also examines probe-based measurements, including scanning capacitance, scanning Kelvin force, scanning spreading resistance, and ballistic electron emission microscopy. Reliability and Failure Analysis examines failure times and distribution functions, and discusses electromigration, hot carriers, gate oxide integrity, negative bias temperature instability, stress-induced leakage current, and electrostatic discharge. Written by an internationally recognized authority in the field, Semiconductor Material and Device Characterization remains essential reading for graduate students as well as for professionals working in the field of semiconductor devices and materials. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department.
Download or read book Amorphous and Heterogeneous Silicon Thin Films 2000 Volume 609 written by Robert W. Collins and published by . This book was released on 2001-04-10 with total page 1118 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Download or read book Science And Technology Of Thin Films written by Francesco Cino Matacotta and published by World Scientific. This book was released on 1995-10-31 with total page 369 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book brings together detailed discussions by leading experts on the various innovative aspects of thin films growth, deposition and characterization techniques, and new thin film materials and devices. It addresses through the different viewpoints of the contributors, the major problem of thin films science - the relation between the energy of the condensing species and the resulting properties of the films. Some of the issues considered include energetic condensation, bombardment stabilization, pulsed electron beam ablation, orientation and self-organization of organic, ferroelectric and nanoparticle thin films. Several chapters focus on applications such as the recent developments in organic optoelectronics, large area electronic technology and superconducting thin film devices.
