Download or read book Behavior of Excited Argon Atoms in Inductively Driven Plasmas written by and published by . This book was released on 1999 with total page 47 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser induced fluorescence has been used to measure the spatial distribution of the two lowest energy argon excited states, 1s5 and 1s4, in inductively driven plasmas containing argon, chlorine and boron trichloride. The behavior of the two energy levels with plasma conditions was significantly different, probably because the 1s5 level is metastable and the 1s4 level is radiatively coupled to the ground state but is radiation trapped. The argon data is compared with a global model to identify the relative importance of processes such as electron collisional mixing and radiation trapping. The trends in the data suggest that both processes play a major role in determining the excited state density. At lower rfpower and pressure, excited state spatial distributions in pure argon were peaked in the center of the discharge, with an approximately Gaussian profile. However, for the highest rfpowers and pressures investigated, the spatial distributions tended to flatten in the center of the discharge while the density at the edge of the discharge was unaffected. The spatially resolved excited state density measurements were combined with previous line integrated measurements in the same discharge geometry to derive spatially resolved, absolute densities of the 1s5 and 1s4 argon excited states and gas temperature spatial distributions. Fluorescence lifetime was a strong fi.mction of the rf power, pressure, argon fraction and spatial location. Increasing the power or pressure resulted in a factor of two decrease in the fluorescence lifetime while adding Cl2 or BCl3 increased the fluorescence lifetime. Excited state quenching rates are derived from the data. When Cl2 or BCl3 was added to the plasma, the maximum argon metastable density depended on the gas and ratio. When chlorine was added to the argon plasma, the spatial density profiles were independent of chlorine fraction. While it is energetically possible for argon excited states to dissociate some of the molecular species present in this discharge, it does not appear to be a significant source of dissociation. The major source of interaction between the argon and the molecular species BCl3 and Cl2 appears to be through modification of the electron density.
Download or read book Low Pressure Plasmas and Microstructuring Technology written by Gerhard Franz and published by Springer Science & Business Media. This book was released on 2009-04-09 with total page 743 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].
Download or read book Radiative Behavior of Shock Heated Argon Plasma Flows written by Kenneth Porter Horn and published by . This book was released on 1966 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Excitation of Argon Atoms by Electron Impact written by James Knoxford Ballou and published by . This book was released on 1973 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Liquid Sample Introduction in ICP Spectrometry written by José-Luis Todoli and published by Elsevier. This book was released on 2011-04-18 with total page 301 pages. Available in PDF, EPUB and Kindle. Book excerpt: Inductively coupled plasma atomic or mass spectrometry is one of the most common techniques for elemental analysis. Samples to be analyzed are usually in the form of solutions and need to be introduced into the plasma by means of a sample introduction system, so as to obtain a mist of very fine droplets. Because the sample introduction system can be a limiting factor in the analytical performance, it is crucial to optimize its design and its use. It is the purpose of this book to provide fundamental knowledge along with practical instructions to obtain the best out of the technique. Fundamental as well as practical character Troubleshooting section Flow charts with optimum systems to be used for a given application
Download or read book An Experimental Study of Excited State Level Populations in the Argon Inductively Coupled Plasma written by Zane Harry Walker and published by . This book was released on 1986 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Electronics written by Toshiaki Makabe and published by CRC Press. This book was released on 2014-08-27 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental
Download or read book Opacity Measurements in Shock generated Argon Plasmas written by and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Dense plasmas having uniform and constant density and temperature are generated by passage of a planar shock wave through gas. The opacity of the plasma is accurately measured versus wavelength by recording the risetime of emitted light. This technique is applicable to a wide variety of species and plasma conditions. Initial experiments in argon have produced plasmas with 2 eV temperatures, 0.004--0.04 g/cm[sup 3] densities, and coupling parameters [Gamma] [approximately]0.3--0.7. Measurements in visible light are compared with calculations using the HOPE code. An interesting peak in the capacity at 400 nm is observed for the first time and is identified with the 4s-5p transition in excited neutral argon atoms.
Download or read book Advances in Atomic Molecular and Optical Physics written by and published by Academic Press. This book was released on 2018-06-09 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in Atomic, Molecular, and Optical Physics, Volume 67, provides a comprehensive compilation of recent developments in a field that is in a state of rapid growth. Topics covered include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics, with timely articles written by distinguished experts that contain relevant review materials and detailed descriptions of important developments in the field. Presents the work of international experts in the field Contains comprehensive articles that compile recent developments in a field that is experiencing rapid growth, with new experimental and theoretical techniques emerging Ideal for users interested in optics, excitons, plasmas and thermodynamics Topics covered include atmospheric science, astrophysics, and surface and laser physics, amongst others
Download or read book Spatial Profile Studies of Atomic and Ionic Species in an Inductively Coupled Argon Plasma written by Michael Edward Dowling and published by . This book was released on 1987 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2005-04-08 with total page 795 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
Download or read book Absorption and Emission Coefficients for Argon Plasmas written by R. W. Liebermann and published by . This book was released on 1973 with total page 29 pages. Available in PDF, EPUB and Kindle. Book excerpt: In order to calculate spectral absorptivities of argon as a function of temperature, calculations have been made of the composition of argon plasmas for pressures of up to 1000 atmospheres and temperatures of up to 25,000K. Account is taken of deviations from that of an ideal gas by use of the second virial coefficient and it is found that the maximum deviation of behavior from that of a perfect gas is 12%. Calculations indicate that equilibrium mole fractions of the molecular ion A2(+) are generally less than 0.001. Computer programs have been developed to calculate continuum radiation using the calculated equilibrium composition. Radiation from the continuum produced by electrons combining with doubly ionized atoms is calculated using the quantum defect method. (Author Modified Abstract).
Download or read book Plasma Aided Nanofabrication written by Ken Ostrikov and published by John Wiley & Sons. This book was released on 2007-09-24 with total page 315 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this single work to cover the use of plasma as nanofabrication tool in sufficient depth internationally renowned authors with much experience in this important method of nanofabrication look at reactive plasma as a nanofabrication tool, plasma production and development of plasma sources, as well as such applications as carbon-based nanostructures, low-dimensional quantum confinement structures and hydroxyapatite bioceramics. Written principally for solid state physicists and chemists, materials scientists, and plasma physicists, the book concludes with the outlook for such applications.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1994-06 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 880 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Download or read book Documentation of Plasma Physics Pt 1 Experimental Plasma Physics and Theoretical Plasma Physics written by and published by . This book was released on 1980 with total page 554 pages. Available in PDF, EPUB and Kindle. Book excerpt:
