Download or read book Thin Film Deposition of Conducting Polymers and Carbon Allotropes Via Interfacial Solution Processing and Evaporative Vapor Phase Polymerization written by Julio Marcelo D'Arcy and published by . This book was released on 2012 with total page 141 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new solution processing technique is developed for depositing continuously conductive transparent thin films comprised of conducting polymer nanostructures. The deposition mechanism is driven by interfacial surface tension gradients leading to rapid directional fluid flow known as the Marangoni effect. This technique is a universal solution to thin film deposition for coating any type of substrate at ambient conditions within seconds. The versatility of this method of deposition is further explored utilizing Pickering emulsions of carbon allotropes to produce transparent conductive coatings. Film morphology and electrical properties of carbon nanotubes and sheets of both graphite oxide and chemically converted graphene are controlled by solution processing at the liquid/liquid interface. This dissertation reports on harnessing directional fluid flow to afford a simple and scalable thin film deposition technique for both organic and inorganic nanostructured semiconductors. Substrate directed thin film deposition is engineered by forming a liquid-liquid interface on the surface of a target substrate and is accomplished by matching the surface energy of a substrate to the surface tension of solvents utilized for emulsifying solid nanostructures. Flexible substrates such as poly(ethylene terephthalate) and polyvinyl chloride are coated directly by combining solid nanostructured semiconductors, water and a fluorocarbon. The extremely low surface tension of a fluorinated fluid leads to the wetting of plastics and provides a liquid layer on the surface of a plastic substrate that serves as an anchoring layer for attachment of solids and formation of a continuous and conductive thin film. Spreading is shown in a supplementary movie submitted with this dissertation. A new technique for the synthesis of poly(3,4-ethylenedioxythiophene) nanofibers by vapor polymerization of an aqueous droplet of iron(III) chloride without a template is also demonstrated. Nanofibers of high aspect ratio of this conducting polymer could only previously be synthesized with the aid of templating agents such as pre-electrospun nanofibers. Now, by inducing a constant contact area mode of evaporation, polymer morphology is controlled and vapor polymerization of an oxidant droplet results in a highly conductive, stable and robust thick film comprised of intrinsic one-dimensional vertically directed anisotropic nanostructures of high aspect ratio.

Download or read book Chemical Vapor Deposition Polymerization written by Jeffrey B. Fortin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.

Download or read book Environmentally Focused Patterning and Processing of Polymer Thin Films by Initiated Chemical Vapor Deposition iCVD and Oxidative Chemical Vapor Deposition oCVD written by Nathan Jeffrey Trujillo and published by . This book was released on 2010 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt: The new millennium has brought fourth many technological innovations made possible by the advancement of high speed integrated circuits. The materials and energy requirements for a microchip is orders of magnitude higher than that of "traditional" goods, and current materials management requirements for EHS friendly low-k processing require a 10% annual increase in raw materials utilization. Initiated Chemical Vapor Deposition (iCVD) is a low-energy, one step, solvent-free process for producing polymeric thin films This thesis describes the deposition of a novel low-k iCVD precursor, 1,3,5,7-tetravinyltetramethylcylcotetrasiloxane (V4D4). The high degree of organic content in the as-deposited film affords the ability to tune the film's properties by annealing. The incorporation of atmospheric oxygen at high temperatures enhances the mechanical and electrical properties of the films. Films annealed at 410'C have a dielectric constant of 2.15, hardness and modulus of 0.78 GPa and 5.4 GPa, respectively. These values are comparatively better than previously reported results for CVD low-k films. Environmentally friendly low-k processing encompasses materials and energy management in the entire integration process, including lithography. Colloidal lithography was combined with iCVD and capillary force lithography to create spatially addressable grafted polymer pattern nanostructures, without the need for expensive lithography tools. Using this method, we pattern our novel low dielectric constant polymer down to 25 nm without the need for environmentally harmful solvents. Furthermore, these grafted patterns were produced for a broad material set of functional organic, fluorinated, and silicon containing polymers. A variation of this process created amine functionalized biocompatible conducting polymer nanostructure patterns for biosensor applications. These were fabricated using grafting reactions between oxidative chemical vapor deposition (oCVD) PEDOT conducting polymers and amine functionalized polystyrene (PS) colloidal templates. Carboxylate containing oCVD copolymer patterns were used to immobilized fluorescent dyes. Fluorescent colloidal particles were assembled within dyed PEDOT-co-TAA copolymer nanobowl templates to create bifunctional patterns for optical data storage applications. Finally, UV and e-beam lithography were used to pattern covalently tethered vinyl monolayers for resist-free patterning of iCVD and oCVD polymers, using environmentally innocuous solvents.

Download or read book Enabling Integration of Vapor deposited Polymer Thin Films written by Christy Danielle Petruczok and published by . This book was released on 2014 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt: Initiated Chemical Vapor Deposition (iCVD) is a versatile, one-step process for synthesizing conformal and functional polymer thin films on a variety of substrates. This thesis emphasizes the development of tools to further enable the use of iCVD for industrial applications. The ability to pattern polymer thin films is a prerequisite for device fabrication. Two methods were developed for patterning iCVD polymers. The first technique facilitated patterning of nano- and microscale features of any iCVD thin film on planar surfaces. Retention of polymer functionality was demonstrated by incorporating the features into high-resolution resistive sensors. The second method adapted photolithographic techniques to achieve patterning on highly curved surfaces. Non-planar substrates were coated with a uniform layer of a functionalized, photoreactive iCVD polymer and exposed to ultraviolet light through a flexible mask. Exposed regions became insoluble in a developing solvent. The resolution and sensitivity of this iCVD-based negative photoresist were comparable to those of commercial products. Additionally, the patterned polymer was used as a mask for patterning metal on planar and curved surfaces. iCVD is typically a semi-continuous process. A batch process was investigated in order to minimize the use of expensive and corrosive reactants. The chemical functionality and conformality of the films were unaffected by the change in processing mode. Reaction yield was improved by one to two orders of magnitude for several film chemistries. iCVD is also unique in that it enables the deposition of cross-linked polymer films, which are difficult to create using conventional, solution-based methods. To potentially enhance durability, cross-linked poly(divinylbenzene) and poly(4-vinylpyridine-co-divinylbenzene) films were synthesized via iCVD. This is the first vapor-phase synthesis of the copolymer, which is a major component of many commercial ion exchange membranes. The degree of cross-linking was quantified using spectroscopic methods and was tightly controlled by adjusting the flow rate of divinylbenzene. Corresponding changes in the elastic moduli of the films were confirmed using nanoindentation. The first vapor-phase synthesis of poly(vinyl cinnamate) was also demonstrated. The cross-linking density of this polymer increases upon exposure to ultraviolet light and is readily quantifiable. Vinyl cinnamate was incorporated into a copolymer with N-isopropylacrylamide, yielding a temperature and light-responsive thin film.

Download or read book Plasma Polymer Films written by Hynek Biederman and published by World Scientific. This book was released on 2004 with total page 394 pages. Available in PDF, EPUB and Kindle. Book excerpt: Annotation. Plasma Polymer Films examines the current status of the deposition and characterization of fluorocarbon-, hydrocarbon- and silicon-containing plasma polymer films and nanocomposites, with plasma polymer matrix. It introduces plasma polymerization process diagnostics such as optical emission spectroscopy (OES, AOES), and describes special deposition techniques such as atmospheric pressure glow discharge. Important issues for applications such as degradation and stability are treated in detail, and structural characterization, basic electrical and optical properties and biomedical applications are discussed.

Download or read book Polymer Thin Films written by Abbass A. Hashim and published by BoD – Books on Demand. This book was released on 2010-04-01 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a timely overview of a current state of knowledge of the use of polymer thin film for important technological applications. Polymer thin film book covers the scientific principles and technologies that are necessary to implement the use of polymer electronic device. A wide-ranging and definitive coverage of this emerging field is provided for both academic and practicing scientists. The book is intended to enable readers with a specific background, e.g. polymer nanotechnology, to become acquainted with other specialist aspects of this multidisciplinary field. Part A of the book covers the fundamental of the key aspect related to the development and improvement of polymer thin film technology and part B covers more advanced aspects of the technology are dealt with nano-polymer layer which provide an up-to-date survey of current research directions in the area of polymer thin film and its application skills.

Download or read book Deposition of Polypyrrole Thin Films by Advanced Method written by Dušan Kopecký and published by . This book was released on 2011 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The development of new types of electronic devices based on conductive polymers requires precise and controlled deposition of these materials in thin layers. This book examines the latest results in research of deposition of polypyrrole (PPY) thin films by advanced method - Matrix Assisted Pulsed Laser Evaporation (MAPLE). It also provides a brief survey of the laser deposition of conductive polymers, theoretical analysis of the mechanisms of deposition by MAPLE method, definition of both source-PPY properties and deposition conditions necessary for successful thin layer fabrication.

Download or read book Deposition Technologies for Films and Coatings written by Rointan Framroze Bunshah and published by William Andrew. This book was released on 1982 with total page 620 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Glancing Angle Deposition of Thin Films written by Matthew M. Hawkeye and published by John Wiley & Sons. This book was released on 2014-07-03 with total page 435 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a highly practical treatment of Glancing Angle Deposition (GLAD), a thin film fabrication technology optimized to produce precise nanostructures from a wide range of materials. GLAD provides an elegant method for fabricating arrays of nanoscale helices, chevrons, columns, and other porous thin film architectures using physical vapour deposition processes such as sputtering or evaporation. The book gathers existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: Development and description of GLAD techniques for nanostructuring thin films Properties and characterization of nanohelices, nanoposts, and other porous films Design and engineering of optical GLAD films including fabrication and testing, and chiral films Post-deposition processing and integration to optimize film behaviour and structure Deposition systems and requirements for GLAD fabrication A patent survey, extensive relevant literature, and a survey of GLAD's wide range of material properties and diverse applications.

Download or read book Growth and Characterization of Vapor deposited Conjugated Polymer Thin Films written by Katy Ka-Yee Lee and published by . This book was released on 2001 with total page 123 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Conformal Polymer Thin Films on Structurally Complex Surfaces by Initiated Chemical Vapor Deposition written by Chia-Yun (Sharon) Hsieh and published by . This book was released on 2016 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Initiated chemical vapor deposition (iCVD) is a novel CVD technique for forming polymer thin films. Compared to traditional thermal and plasma CVD methods, iCVD operates at low substrate temperature and low power conditions. This has the benefit of enabling well-defined reaction pathways for polymerization that lead to stoichiometric polymers. The iCVD approach has been investigated for many polymer chemistries and the resulting iCVD polymers have been shown to possess analogous structures and properties as bulk polymers from liquid phase synthesis. Among iCVD reactions, free radical polymerization is the most common, where vinyl monomers can be polymerized with peroxide free radical initiators. Recently, cationic ring opening polymerization via iCVD was demonstrated by applying boron trifluoride diethyl etherate as a cationic initiator for the polymerization of ethylene oxide. This work will demonstrate for the first time the iCVD synthesis of polyglycidol (PGL) via cationic ring opening polymerization of glycidol. iCVD PGL shows similar structure and properties as liquid-synthesized PGL reported in literature based on spectroscopic analysis. Furthermore, the iCVD deposition behavior under different modes of iCVD polymerization environment - surface-driven, gas-driven, and supersaturation - will be discussed for forming polyglycidol (PGL), poly(2-hydroxyethyl methacrylate) (PHEMA), poly(tetrafluoroethylene) (PTFE) and polyvinylpyrrolidone (PVP) coatings on structurally complex substrates, including nanopores, nanorods, and microstructures. Two major parameters Pm/Psat that represents the ratio of the partial pressure of the monomer to its saturation pressure, and Knudsen number (Kn) will be evaluated and related with the observed deposition behavior. Surface-driven iCVD of PGL and PHEMA have been found to conformally deposit in nanoporous TiO2 and microcatheters by carefully controlling Pm/Psat over a wide range of Kn. However, with gas-driven iCVD of PTFE, although conformal coatings have been achieved on micropillars and nanorods, coating within nanoporous networks at very large Kn was difficult even with careful control of Pm/Psat. It is believed that the PTFE polymerization is significantly driven by gas phase reactions that are not well controlled with a surface Pm/Psat parameter and, by moving to smaller and more confined features, the gas phase chemistries dominate and interfere with surface polymerization. By controlling Pm/Psat > 1, i.e. in a supersaturated monomer state, a recent iCVD processing discovery was made. Under supersaturation conditions, PVP was found to selectively grow on certain material surfaces and not others. This is believed to be due to differences in wettability of the monomer that dictates where the polymer grows, and enables directed patterning through iCVD. With the ability to deposit polymer coatings on different substrates, this work will illustrate a number of applications that highlight iCVD as an enabling technology. iCVD of PHEMA on ventricular catheters is found to be an effective coating for reducing undesired cell attachment in vitro by 77% after 17 days in cultured media compared to bare catheters, and so has the potential for improving catheter viability and reliability. iCVD of PTFE on silicon micropillars and nickel nanorod arrays is able to produce effective non-wetting (superhydrophobic) surface structures for enhancing latent heat transfer. iCVD of PGL in mesoporous TiO2 nanoparticle networks produces polymer nanocomposites with ultrahigh nanofiller loading (>80 wt%), offering a valuable platform for studying polymer nanocomposites with uniform and ultrahigh loading that exceed conventional processing limits (10-15 wt%) due to filler particle aggregation. As a result, the PGL glass transition temperature is found to increase significantly by 50-60 ℗ʻC compared to bulk PGL films without TiO2 nanofiller. The enhanced glass transition is attributed to appreciable hydrogen bonding interactions between PGL and TiO2.

Download or read book Interfacial Phenomena in Thin Polymer Films written by Andrzej Budkowski and published by . This book was released on 1998 with total page 145 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-20 with total page 255 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *This single source saves time and effort by including comprehensive information at one's finger tips *The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD *The numerous practical applications assist the working engineer to select and refine thin film processes

Download or read book New Chemistries and Applications in Molecular Layer Deposition written by Richard Gene Closser and published by . This book was released on 2019 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent advancements in nanotechnologies have highlighted the need for thin film deposition capabilities that allow for fine thickness and compositional control. One technique that could help meet these needs is molecular layer deposition (MLD). MLD is a vapor-to-surface organic deposition method that utilizes sequential, self-limiting surface reactions, whereby thin film polymers can be grown. Since its inception, there has been significant progress in MLD synthesis capability, but certain challenges remain. Due to its vapor-phase nature, MLD is unable to utilize solvents and catalysts available to solution phase chemistry. This constraint has limited the variety of polymers that can be grown by MLD, including those formed by carbon-carbon bond synthesis. Another challenge for MLD is to enable area selective (AS) deposition, a process of significant interest in the semiconductor industry because of its potential to reduce fabrication processing steps and facilitate the scale-down of device feature sizes. The first portion of this work discusses a technique allowing for enhanced selectivity in AS-MLD. To achieve these highly selective depositions, a self-assembled monolayer (SAM) layer is used to act as a resist towards MLD. A chemical lift-off step is also employed, which is shown to significantly increase the overall selectivity of the AS-MLD process. Next, a new method for MLD of a silicon oxycarbide (SiOC) material is introduced. SiOC films are typically made with highly oxidizing reactants at elevated temperatures, causing film degradation during the deposition. The new MLD process, however, utilizes mild reactants at room temperature, thereby eliminating degradation problems, resulting in well defined SiOC films. The SiOC films crosslink during the deposition forming a robust film with exceptional thermal stability. The films show a low dielectric (k) constant, supporting their potential use in semiconductor devices where thermally resistant coatings with low-k properties are needed. Lastly, the development of a new MLD polymer is introduced. By utilizing UV light for radical polymerization, direct formation of carbon-carbon bonds is enabled in a photoactivated MLD (pMLD) synthesis. An alternating hydrocarbon-fluorocarbon copolymer, grown via pMLD using iodo-ene coupling, polymerizes by new carbon-carbon bond formation. The fluoropolymer exhibits high thermal stability and chemical resistance as well as the ability to be patterned using a photomask. The pMLD film also shows the ability to be used as a resist for selective deposition. The continued development of thin film techniques such as MLD is essential for progress to be made in nanoscale technologies and could have significant impact towards increasing energy efficiency, providing clean air and water, and improving healthcare. The focus of this work, therefore, is to advance the capabilities of MLD, allowing for new materials and applications.

Download or read book Interfacial Synthesis Polymer applications and technology written by Frank Millich and published by . This book was released on 1977 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Initiated Chemical Vapor Deposition of Polymer Thin Films and Coatings for Biological Applications written by Ranjita K. Bose and published by . This book was released on 2011 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advisor: Kenneth Lau.

Download or read book Thin Film Deposition written by Source Wikipedia and published by University-Press.org. This book was released on 2013-09 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt: Please note that the content of this book primarily consists of articles available from Wikipedia or other free sources online. Pages: 60. Chapters: Angel gilding, Atomic layer deposition, Atomic layer epitaxy, Cathodic arc deposition, Chemical bath deposition, Chemical beam epitaxy, Chemical vapor deposition, Combustion chemical vapor deposition, Conformal film, Diamond-like carbon, Dip-coating, Electron beam physical vapor deposition, Electrostatic spray assisted vapour deposition, Evaporation, Evaporation (deposition), Focused ion beam, Homotopotaxy, Hybrid physical-chemical vapor deposition, Hydride vapour phase epitaxy, Ion beam assisted deposition, Ion beam deposition, Ion Layer Gas Reaction, Ion plating, Island growth, Kinetic Monte Carlo surface growth method, Metalorganic vapour phase epitaxy, Molecular beam epitaxy, Plasma-enhanced chemical vapor deposition, Pulsed laser deposition, Silicon on sapphire, Sol-gel, Spin coating, Sputter cleaning, Sputter deposition, Thermal barrier coating, Thermal spraying, Tinning, Triethylgallium, Trimethylgallium, Trimethylindium, Vacuum deposition, Wetting layer. Excerpt: In Materials science, the sol-gel process is a method for producing solid materials from small molecules. The method is used for the fabrication of metal oxides, especially the oxides of silicon and titanium. The process involves conversion of monomers into a colloidal solution (sol) that acts as the precursor for an integrated network (or gel) of either discrete particles or network polymers. Typical precursors are metal alkoxides. In this chemical procedure, the 'sol' (or solution) gradually evolves towards the formation of a gel-like diphasic system containing both a liquid phase and solid phase whose morphologies range from discrete particles to continuous polymer networks. In the case of the colloid, the volume fraction of particles (or particle density) may be so low that a significant amount of fluid may need to be removed initially for the...