Download or read book The Preparation and Properties of RF plasma anodized Silicon Dioxide Thin Films and Aluminum silicon Schottky Photodiodes written by Jean Joseph Henri Reche and published by . This book was released on 1973 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Masters Theses in the Pure and Applied Sciences written by Wade H. Shafer and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt: Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by TPRC at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dissemina tion phases of the activity was transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we have concluded that it will be in the interest of all concerned if the printing and distribution of the volume were handled by a well-known publishing house to assure improved service and better communication. Hence, effective with this Volume 18, Masters Theses in the Pure and Applied Sciences will be disseminated on a worldwide basis by Plenum Publishing Corporation of New York. All back issues can also be ordered from Plenum. As we embark on this new partnership with Plenum, we also initiate a new venture in that this important annual reference work now covers Canadian universities as well as those in the United States. We are sure that this broader base will greatly enhance the value of these volumes.
Download or read book Canadian Theses written by National Library of Canada and published by . This book was released on 1980 with total page 720 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Deposition of Amorphous Silicon Based Materials written by Pio Capezzuto and published by Elsevier. This book was released on 1995-10-10 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Download or read book Preparation and Properties of Thin Films of Aluminum Oxide and Iron Oxide on Silicon Substrates written by Carolyn Hannigan and published by . This book was released on 1991 with total page 32 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book National Union Catalog written by and published by . This book was released on 1978 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Plasma Enhances Chemical Vapor Deposition from Diethylsilane and Nitrous Oxide written by Lan Chen and published by . This book was released on 1995 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Preparation of Al2O3 x SiO2 y Thin Films Using Al OSiEt3 3 2 as a Single Source Precursor written by and published by . This book was released on 1992 with total page 34 pages. Available in PDF, EPUB and Kindle. Book excerpt: Aluminum silicates, (Al2O3)x(SiO2)y, are attractive candidates as corrosion and wear-resistant coatings for metals and other substrates, due to their superior properties of creep resistance, thermal expansion, and chemical stability. Recently, it has been proposed that amorphous alumina-silica films would find application as insulators in multilevel interconnections, and as encapsulants for active devices and thin film components, because they do not suffer the temperature instability of alumina films while retaining the desirable insulating characteristics. Thin films of aluminum silicates have been previously prepared by either sol-gel techniques or the pyrolysis of aluminum-silicon containing polymers. However, there remain some difficulties in obtaining homogeneous and continuous films. Metal-organic chemical vapor deposition (MOCVD) offers and attractive alternative to these methods, since contiguous, homogeneous thin films can be deposited at low temperatures with high growth rates.
Download or read book Plasma Deposition of Amorphous Silicon based Materials written by Giovanni Bruno and published by . This book was released on 1995 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Key Features * Focuses on the plasma chemistry of amorphous silicon-based materials * Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced * Features an international group of contributors * Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Download or read book International Aerospace Abstracts written by and published by . This book was released on 1999 with total page 1048 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Influence of RF Power and Hidrogen Dilution on the Optical and Structural Properties of Hydrogenated Silicon Thin Films Deposited by RF Plasma Enhanced Chemical Vapour Deposition written by Chee Han Shi and published by . This book was released on 2008 with total page 382 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Temperature dependent Yield Properties of Passivated Aluminum Thin Films on Silicon Wafers written by Edison Chinghing Chu and published by . This book was released on 1996 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma enhanced Chemical Vapor Deposition of Silicon Dioxide written by Arjen Boogaard and published by . This book was released on 2011 with total page 186 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Advanced Metallization and Processing for Semiconductor Devices and Circuits II Volume 260 written by Avishay Katz and published by . This book was released on 1992-10-28 with total page 1000 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon and Silicon Containing Films written by DW. Hess and published by . This book was released on 1983 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of a radio frequency (rf) glow discharge or plasma has recently come into favor for the deposition of thin films. In plasma-enhanced chemical vapor deposition (PECVD), chemical reactions can be carried out at low (
Download or read book Mechanical Properties of Rf Sputtered Copper Thin Films and Barrier Layers Deposited on Oxidised Silicon Substrates written by Deirdre Beegan and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Anodization of Silicon in an R f Plasma written by Frank Joseph Scholz and published by . This book was released on 1971 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt:
