Download or read book The Influence of Sputter Gas Pressure on the Hardness and Modulus of Tantalum Thin Films written by Shangchen Han and published by . This book was released on 2013 with total page 63 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sputter deposited tantalum (Ta) thin films can form in 2 phases: the metastable tetragonal phase ([beta]-Ta) and the bulk bcc phase ([alpha]-Ta), both of which have wide applications. Producing Ta films with desired structure and properties is important, e.g. Ta films used for x-ray masks are required to have low stress; diffusion barriers between Cu and Si for semiconductors prefer [alpha]-Ta over [beta]-Ta. Varying sputter pressure while keeping other sputter parameters constant can be an effective way to tune both structure and properties of Ta films. It has been shown that, under good control of sputter parameters, we can get consistent variations in structure (stress, grain size) in [beta]-Ta films with increasing Ar gas pressure. This thesis shows that stress has little effect on [beta]-Ta indentation properties while variations in hardness can be well explained by the variation in grain size. All the metastable [beta]-Ta films transformed into [alpha]-Ta after thermally cycled to 700[MASCULINE ORDINAL INDICATOR]C. Nanoindentation results showed that both the hardness and indentation modulus are affected by the unique film structure of [alpha]-Ta films, which is characterized as having continuous orientation gradients and discontinuous grain boundary structure.
Download or read book Tantalum Thin Films written by William Dickson Westwood and published by . This book was released on 1975 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterization of Tantalum Nitride Thin Films Synthesized by Magnetron Sputtering written by Anna Zaman and published by . This book was released on 2014 with total page 78 pages. Available in PDF, EPUB and Kindle. Book excerpt: Tantalum Nitride is chemically inert, oxidation resistant and hard. TaN finds applications as a protective coating due to its excellent wear properties. It has become a very promising diffusion barrier material in Cu interconnect technology in microelectronics. TaN has not been analyzed as much as other transition metal nitrides like the TiN system because TaN exhibits various stable and metastable phases. The emergence of these phases and the different physical, chemical and mechanical properties depend on the growth technique and deposition conditions. TaN thin films were deposited using magnetron PVD sputtering in the SaNEL lab. The aim of this study was to identify the effect of processing parameters like N2/Ar ratio, substrate bias and temperature on the emergence of the different phases present in TaN thin films and the effect of deposition conditions on the mechanical properties of these films. The phases present in the films, deposited at various conditions were explored via low angle X-Ray Diffraction (XRD), hardness response by using Nanoindentation and tribological testing out to assess their frictional and wear behavior. It was observed that at high percentage of Nitrogen in the gas mixture (10% - 25%) the main phase present was FCC TaN and as the Nitrogen content was decreased a mixture of phases was present in these films. The hardness of the films increases as we decrease the Nitrogen content, yielding a film with a hardness of 37.1 GPa at 3% N2 in the gas mixture with a substrate bias voltage of -100 V.
Download or read book Thin Films Stresses and Mechanical Properties IX Volume 695 written by Materials Research Society. Meeting and published by . This book was released on 2002-04 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Download or read book High Entropy Alloys written by B.S. Murty and published by Elsevier. This book was released on 2019-03-16 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: High-Entropy Alloys, Second Edition provides a complete review of the current state of the field of high entropy alloys (HEA). Building upon the first edition, this fully updated release includes new theoretical understandings of these materials, highlighting recent developments on modeling and new classes of HEAs, such as Eutectic HEAs and Dual phase HEAs. Due to their unique properties, high entropy alloys have attracted considerable attention from both academics and technologists. This book presents the fundamental knowledge, the spectrum of various alloy systems and their characteristics, key focus areas, and the future scope of the field in terms of research and technological applications. Provides an up-to-date, comprehensive understanding on the current status of HEAs in terms of theoretical understanding and modeling efforts Gives a complete idea on alloy design criteria of various classes of HEAs developed so far Discusses the microstructure property correlations in HEAs in terms of structural and functional properties Presents a comparison of HEAs with other multicomponent systems, like intermetallics and bulk metallic glasses
Download or read book In Situ Phase Evolution Study in Magnetron Sputtered Tantalum Thin Films written by and published by . This book was released on 2002 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The design and construction of a planar magnetron-sputter deposition system with a beryllium chamber was accomplished to perform in-situ x-ray diffracUon growth study of refractory coatings. The deposition system was set on top of a laboratory 26 x-ray diffractometer. A two-dimensional array detector was interfaced for observation of the Debye nngs during growth. Integration along the 20 and directions allows fast phase and texture determination. The system was built to study effects of sputter deposition parameters on the structural properties of tantalum on steel, silicon, and glass substrates without exposing the system to atmosphere pressure. Two sputter depositions of tantalum films onto glass substrate in argon gas are reported here, one was deposited at 25-mm target-detector distance, 3.9 Pascal argon gas, and the other at 108-mm target-detector distance and 1.3 Pasc% argon gas. The first film grew to 250-nm in 39 minutes at an average growth rate of 6.4-nm/minute. It consisted of 45-nm of interface layer, which showed no crystalline structure, and was most likely amorphous film. It was followed by 15-nm growth of Beta-tantalum, and then followed by 190-nm growth of alpha-tantalum. From the full-width half maximum of the plot, it was determined that the p-tantalum region was 002 textured, and the a-tantalum region was 110 textured, and grew more textured with deposition time. The second film grew to 36-nm in 22 minutes at an average growth rate of 1 .6-nm/minute. It consisted of 31-nm of layer, which showed no crystalline structure, and was most likely amorphous film. It was followed by 5-nm of surface layer of p- and a-tantalum. Ex-situ grazing incidence x-ray diffraction performed on the film surface confirmed the in-situ results. Ex-situ pole figure analysis showed 110 fiber texture in a- tantalum, and highly 002 texture in p-tantalum.
Download or read book Engineering Aspects of Shape Memory Alloys written by T W Duerig and published by Butterworth-Heinemann. This book was released on 2013-10-22 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt: Engineering Aspects of Shape Memory Alloys provides an understanding of shape memory by defining terms, properties, and applications. It includes tutorials, overviews, and specific design examples—all written with the intention of minimizing the science and maximizing the engineering aspects. Although the individual chapters have been written by many different authors, each one of the best in their fields, the overall tone and intent of the book is not that of a proceedings, but that of a textbook. The book consists of five parts. Part I deals with the mechanism of shape memory and the alloys that exhibit the effect. It also defines many essential terms that will be used in later parts. Part II deals primarily with constrained recovery, but to some extent with free recovery. There is an introductory paper which defines terms and principles, then several specific examples of products based on constrained recovery. Both Parts III and IV deal with actuators. Part III introduces engineering principles while Part IV presents several of the specific examples. Finally, Part V deals with superelasticity, with an introductory paper and then several specific examples of product engineering.
Download or read book Thin Film Materials written by L. B. Freund and published by Cambridge University Press. This book was released on 2004-01-08 with total page 772 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin film mechanical behavior and stress presents a technological challenge for materials scientists, physicists and engineers. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation, surface evolution and allied effects in thin film materials. Physical phenomena are examined from the continuum down to the sub-microscopic length scales, with the connections between the structure of the material and its behavior described. Theoretical concepts are underpinned by discussions on experimental methodology and observations. Fundamental scientific concepts are embedded through sample calculations, a broad range of case studies with practical applications, thorough referencing, and end of chapter problems. With solutions to problems available on-line, this book will be essential for graduate courses on thin films and the classic reference for researchers in the field.
Download or read book Handbook of Tribology written by Bharat Bhushan and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook seeks to present authoritative coverage of tribology, including: physics of materials; an overview of soft, solid-lubricants and hard, wear-resistant coatings and their deposition techniques; and surface treatment techniques and the latest engineering specifications. It provides data, mostly in tabular form, on friction and wear characteristics of bulk materials, allowing the user to decide the appropriate course of action for selecting the proper coating material, as well as surface treatment techniques for maximum friction and wear reduction.
Download or read book Stress Analysis and Mechanical Characterization of Thin Films for Microelectronics and MEMS Applications written by Patrick Waters and published by . This book was released on 2008 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: ABSTRACT: Thin films are used for a variety of applications, which can include electronic devices, optical coatings and decorative parts. They are used for their physical, electrical, magnetic, optical and mechanical properties, and many times these properties are required simultaneously. Obtaining these desired properties starts with the deposition process and they are verified by a number of analysis techniques after deposition. A DC magnetron sputter system was used here to deposit tungsten films, with film thickness and residual stress uniformity being of primary interest. The film thickness was measured to vary by up to 45 % from the center to outer edge of a 4" wafer. Ar pressure was found to influence the thin film residual stress with lower Ar pressures leading to compressive residual stress ( -1.5 GPa) and higher Ar pressures leading to tensile residual stress (1 GPa). Residual stress measurements of the tungsten films were made using a wafer curvature technique and X-ray diffraction. The results of the two techniques were compared and found to be within 20 %. Nanoindentation was used to analyze the mechanical properties of several types of thin films that are commonly used in microelectronic devices. Thin film reduced modulus, hardness, interfacial toughness and fracture toughness were some of the mechanical properties measured. Difficulties with performing shallow indents (less than 100 nm) were addressed, with proper calibration procedures for the indentation equipment and tip area function detailed. Pile-up during the indentation of soft films will lead to errors in the indentation contact depth and area, leading to an overestimation of the films' reduced modulus and hardness. A method was developed to account for pile-up in determining the indentation contact depth and calculating a new contact area for improving the analysis of reduced modulus and hardness. Residual stresses in thin films are normally undesired because in extreme cases they may result in thru-film cracking or interfacial film delamination. With the use of lithography techniques to pattern wafers with areas of an adhesion reducing layer, thin film delamination was controlled. The patterned delamination microchannels may be used as an alternative method of creating microchannels for fluid transport in MEMS devices. Delamination morphology was influenced by the amount of residual stress in the film and the critical buckling stress, which was primarily controlled by the width of the adhesion reducing layers.
Download or read book Thin Film Analysis by X Ray Scattering written by Mario Birkholz and published by John Wiley & Sons. This book was released on 2006-05-12 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.
Download or read book Properties of Thick Sputtered Tantalum Used for Protective Gun Tube Coatings written by and published by . This book was released on 2001 with total page 22 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thick tantalum coatings were deposited on the bore surfaces of 25-mm inner diameter cylindrical gun steel substrates using a high-rate triode-sputtering apparatus. Sputtering parameters affecting the tantalum phase and microstructure were investigated. Prior work has indicated that the sputtering gas species and substrate temperature during deposition affect the characteristics of the tantalum coatings. In the work presented here, we report on experimental studies aimed at evaluating additional phase and microstructural effects resulting from changes in sputtering gas species and substrate bias during the deposit. Tantalum deposits of 75 to 140 micrometers thickness were evaluated using x-ray diffraction, optical microscopy, and microindentation hardness measurements. Coatings deposited using krypton gas, a 200 deg C substrate temperature, and 3.5 mTorr gas pressure also showed little variation when deposited at substrate biases ranging from 50 to 150 V. However, the tantalum coatings produced under similar conditions with an unbiased (floating) substrate were found to be the beta phase of the material and had a columnar microstructure. Beta-phase tantalum was produced at low substrate biases (
Download or read book Advanced Techniques for Surface Engineering written by W. Gissler and published by Springer Science & Business Media. This book was released on 2013-04-17 with total page 402 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today's shortages of resources make the search for wear and corrosion resistant materials one of the most important tasks of the next century. Since the surface of a material is the location where any interaction occurs, it is that there the hardest requirements on the material are imposed: to be wear resistant for tools and bearings; to be corrosion resistant for turbine blades and tubes in the petrochemical industry; to be antireflecting for solar cells; to be decorative for architectural panels and to combine several of these properties in other applications. Surface engineering is the general term that incorporates all the techniques by which a surface modification can be accomplished. These techniques include both coating and modification of the surface by ion implantation and laser beam melting. In recent years a continuously growing number of these techniques were developed to the extent that it became more and more difficult to maintain an overlook and to understand which of these highly differentiated techniques might be applied to resolve a given surface engineering problem. A similar development is also occuring for surface characterization techniques. This volume contains contributions from renowned scientists and engineers to the Eurocourse the aim of which was to inform about the various techniques and to give a comprehensive survey of the latest development on this subject.
Download or read book The Effect of Deposition Pressure on Stress in Sputtered Molybdenum Thin Films written by Scott Sheppard and published by . This book was released on 1998 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: It is known that deposition parameters such as pressure, geometry, and deposition device affect the state of stress in a thin film (Thornton and Hoffman). We decided to find the stress vs. deposition pressure curve for a sputtered metal thin film. All other deposition variables remained the same for each film deposited. We looked at measuring the stress incurred in the thin film by x-ray diffraction and geometrical techniques. Measuring this stress dependence on pressure for sputtered thin films has been done for many metals already. It has been found that at low sputter pressures the stress tends to be compressive. As the sputter pressure is increased the stress gradually approaches the critical pressure. i.e, the pressure at which the thin film has zero stress. The stress then becomes tensile as the pressure is increased beyond the critical pressure. The tensile stress will peak at a certain pressure and eventually level off at a low tensile stress as the pressure is increased further. We are attempting to find this curve for a metal this hasn't been done for yet. A new technique for measuring the stress by geometrical optics is also being tested by comparing the results to x-ray stress measurements.
Download or read book Cathodic Arcs written by André Anders and published by Springer Science & Business Media. This book was released on 2009-07-30 with total page 555 pages. Available in PDF, EPUB and Kindle. Book excerpt: Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.
Download or read book Handbook of Physical Vapor Deposition PVD Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Download or read book Reactive Sputter Deposition written by Diederik Depla and published by Springer Science & Business Media. This book was released on 2008-06-24 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
