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Book The Aqueous Etching of Silicon 100

Download or read book The Aqueous Etching of Silicon 100 written by Ian T. Clark and published by . This book was released on 2008 with total page 125 pages. Available in PDF, EPUB and Kindle. Book excerpt: An etchant that produces atomically flat or near-atomically flat Si(100) surfaces has been long been sought by the microelectronics industry; however, no such etchant has yet been demonstrated. In the following I describe a combined spectroscopic and morphological investigation of Si(100) surfaces etched in two aqueous etchants: aqueous ammonium fluoride and pure deoxygenated water. For both of these systems, the etch morphology was determined using ex situ ultrahigh vacuum scanning tunneling microscopy. Information on the chemical nature of the surface species was obtained using Fourier transform infrared absorption spectroscopy in the multiple-internal-reflection geometry. A new deconvolution method, which is described here, was applied to the spectroscopic data to maximize the information extracted from these spectra. The spectroscopic data were used in conjunction with morphological data from STM experiments to determine the atomic-scale structure of the etched surfaces. During ammonium fluoride etching, the Si(100) surface was found to achieve a near-atomically-flat steady-state etch morphology characterized by & sim;200-A-wide terraces populated by alternating rows of unstrained silicon dihydrides within 30 sec. In contrast, during H2O etching, the surface structure was found to evolve over the course days, developing a surprisingly homogeneous 4-fold-symmetric morphology dominated by orthogonally oriented "stripes" running along & lang;011 & rang; directions, atomically flat terraces and several-monolayer-height hillocks. The atomic-scale structure of both etch morphologies is described, and the role of inter-adsorbate strain in the formation of the etch morphologies is discussed. Finally, the development of an organic functionalization chemistry suitable for use in silicon-resonator-based frequency-detected chemical sensing is described. The composition of these organic monolayers were characterized using Fourier transform infrared absorption spectroscopy, and the affect of monolayer surface termination on the mechanical properties of single-crystal-silicon micromechanical resonators was determined.

Book The Aqueous Etching of Si 100

Download or read book The Aqueous Etching of Si 100 written by Ian T. Clark and published by . This book was released on 2008 with total page 24 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Anisotropic Etching of Si 100  in Aqueous Solutions

Download or read book Anisotropic Etching of Si 100 in Aqueous Solutions written by Ankush Gupta and published by . This book was released on 2011 with total page 201 pages. Available in PDF, EPUB and Kindle. Book excerpt: The microelectronics industry has long sought an aqueous etchant that could produce atomically flat Si(100) surfaces by anisotropic etching. This dissertation shows that near-atomically-flat Si(100) surfaces can be produced by an aqueous silicon etchant - 40% NH4F (aq.). The etching of Si(100) in 40% NH4F (aq.) produced H2 bubbles as a reaction product, which led to significant roughening of the surface if not removed. A near-atomically flat surface was produced if the bubbles were periodically removed from the etching surface. Analysis of the infrared spectrum of the NH4F-etched surface showed that the surface was H-terminated. A new spectral deconvolution technique led to reinterpretation of the spectral bands and revealed the surface structure that is consistent with the STM images of the surface. Investigations of the bubble-induced roughening of Si(100) surface during NH4F etching revealed a new mechanism of {111} microfacet formation on this surface. To understand the etch kinetics that produced the observed morphologies, a fully atomistic kinetic Monte Carlo simulation of Si(100) etching was developed. The simulations showed that previously postulated models of H/Si(100) etching based solely on bond counting or interadsorbate stress cannot explain the experimental etch morphologies. The simulations suggested mechanisms that lead to the formation of flat stripes, hillocks, and rough morphologies observed on etched Si(100) surfaces. The production of long rows observed on the NH4F-etched Si(100) surface could only be explained by the fast etching of dihydrides bonded to monohydrides - termed as "[alpha]-dihydrides". In addition, a comprehensive study of the vibrational spectrum of various Hterminated Si surfaces produced by NH4F (aq.) etching was performed using density functional theory. The simulations predicted stretch mode energies within 2% of the experimentally observed; however, the accuracy of the calculations was strongly affected by interadsorbate strain. Simulation of point defects on H/Si(100) surfaces provided insights into the origin of large heterogeneous broadening observed on NH4F-etched Si(100) surfaces.

Book Shape and Functional Elements of the Bulk Silicon Microtechnique

Download or read book Shape and Functional Elements of the Bulk Silicon Microtechnique written by Joachim Frühauf and published by Springer Science & Business Media. This book was released on 2005 with total page 252 pages. Available in PDF, EPUB and Kindle. Book excerpt: This methodic manual presents a survey of the form-related and functional elements of the bulk silicon microtechnique. It gives a systematic description of simple shape elements and of elements for mechanical, fluidic and optical applications. This manual includes practical instructions for the use of the relevant techniques and an extensive collection of examples for the support of the search for applications via photographs, drawings and references. It serves as a valuable guide to the design of etch masks and processes while summarizing the important properties of silicon, especially aiming at producers of sensors and microtechnical components, as well as producers of components of precision engineering and optical applications.

Book The Chemical and Physical Mechanisms Determining the Morphology of Wet chemically Etched Si 100

Download or read book The Chemical and Physical Mechanisms Determining the Morphology of Wet chemically Etched Si 100 written by Brandon Scott Aldinger and published by . This book was released on 2010 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Because harsh cleaning processes roughen silicon wafers, etchants that can produce smooth Si(100) surfaces have been a long-standing goal of the microelectronics industry. In this work, scanning tunneling microscopy was used to investigate the morphologies of wet-chemically-etched Si(100) surfaces, whereas the chemical composition was studied using infrared absorption spectroscopy coupled with a polarization deconvolution technique. Using this combined approach, aqueous ammonium fluoride etching of Si(100) is shown to produce near-atomically flat surfaces consisting of alternating rows of silicon dihydrides. A new assignment of the vibrational modes accounts for the presence of both strained and unstrained adsorbates on the etched surface. This smooth morphology was easily disrupted by the accumulation of hydrogen bubbles on the surface during etching. Roughening mechanisms created raised circular pillars and microfaceted etch pits if bubbles were not removed via one of several bubble-reduction techniques. In addition, density functional theory was used to predict the vibrational modes for a variety of hydrogen-terminated silicon surfaces. The calculated mode energies highlight the sensitivity of vibrational frequencies to interadsorbate strain, though in general, the calculated frequencies were not accurate enough to predict vibrational frequencies without substantial experimental confirmation. Lastly, the pH-dependence of buffered hydrofluoric acid (BHF) etching of Si(100) was examined. Below the critical pH of 7.8, etched surfaces became progressively rougher and covered with hillocks, whereas surfaces etched in solutions above this pH exhibit no change from the flat missing-row structure. Prominent stretching modes for the BHFetched H/Si(100) surfaces were also assigned based on trends observed in the pHmodified Si(100) spectra and previously well-characterized morphologies.

Book Silicon Chemical Etching

    Book Details:
  • Author : J. Grabmaier
  • Publisher : Springer Science & Business Media
  • Release : 2012-12-06
  • ISBN : 3642687652
  • Pages : 234 pages

Download or read book Silicon Chemical Etching written by J. Grabmaier and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the first contribution to this volume we read that the world-wide production of single crystal silicon amounts to some 2000 metric tons per year. Given the size of present-day silicon-crystals, this number is equivalent to 100000 silicon-crystals grown every year by either the Czochralski (80%) or the floating-zone (20%) technique. But, to the best of my knowledge, no coherent and comprehensive article has been written that deals with "the art and science", as well as the practical and technical aspects of growing silicon crystals by the Czochralski technique. The same could be said about the floating-zone technique were it not for the review article by W. Dietze, W. Keller and A. Miihlbauer which was published in the preceding Volume 5 ("Silicon") of this series (and for a monograph by two of the above authors published about the same time). As editor of this volume I am very glad to have succeeded in persuading two scien tists, W. Zulehner and D. Huber, of Wacker-Chemitronic GmbH - the world's largest producer of silicon-crystals - to write a comprehensive article about the practical and scientific aspects of growing silicon-crystals by the Czochralski method and about silicon wafer manufacture. I am sure that many scientists or engineers who work with silicon crystals -be it in the laboratory or in a production environment - will profit from the first article in this volume.

Book Nano  and Micro Electromechanical Systems

Download or read book Nano and Micro Electromechanical Systems written by Sergey Edward Lyshevski and published by CRC Press. This book was released on 2018-10-03 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: Society is approaching and advancing nano- and microtechnology from various angles of science and engineering. The need for further fundamental, applied, and experimental research is matched by the demand for quality references that capture the multidisciplinary and multifaceted nature of the science. Presenting cutting-edge information that is applicable to many fields, Nano- and Micro-Electromechanical Systems: Fundamentals of Nano and Microengineering, Second Edition builds the theoretical foundation for understanding, modeling, controlling, simulating, and designing nano- and microsystems. The book focuses on the fundamentals of nano- and microengineering and nano- and microtechnology. It emphasizes the multidisciplinary principles of NEMS and MEMS and practical applications of the basic theory in engineering practice and technology development. Significantly revised to reflect both fundamental and technological aspects, this second edition introduces the concepts, methods, techniques, and technologies needed to solve a wide variety of problems related to high-performance nano- and microsystems. The book is written in a textbook style and now includes homework problems, examples, and reference lists in every chapter, as well as a separate solutions manual. It is designed to satisfy the growing demands of undergraduate and graduate students, researchers, and professionals in the fields of nano- and microengineering, and to enable them to contribute to the nanotechnology revolution.

Book Fundamentals of Microfabrication

Download or read book Fundamentals of Microfabrication written by Marc J. Madou and published by CRC Press. This book was released on 2018-10-08 with total page 764 pages. Available in PDF, EPUB and Kindle. Book excerpt: MEMS technology and applications have grown at a tremendous pace, while structural dimensions have grown smaller and smaller, reaching down even to the molecular level. With this movement have come new types of applications and rapid advances in the technologies and techniques needed to fabricate the increasingly miniature devices that are literally changing our world. A bestseller in its first edition, Fundamentals of Microfabrication, Second Edition reflects the many developments in methods, materials, and applications that have emerged recently. Renowned author Marc Madou has added exercise sets to each chapter, thus answering the need for a textbook in this field. Fundamentals of Microfabrication, Second Edition offers unique, in-depth coverage of the science of miniaturization, its methods, and materials. From the fundamentals of lithography through bonding and packaging to quantum structures and molecular engineering, it provides the background, tools, and directions you need to confidently choose fabrication methods and materials for a particular miniaturization problem. New in the Second Edition Revised chapters that reflect the many recent advances in the field Updated and enhanced discussions of topics including DNA arrays, microfluidics, micromolding techniques, and nanotechnology In-depth coverage of bio-MEMs, RF-MEMs, high-temperature, and optical MEMs. Many more links to the Web Problem sets in each chapter

Book Manufacturing Techniques for Microfabrication and Nanotechnology

Download or read book Manufacturing Techniques for Microfabrication and Nanotechnology written by Marc J. Madou and published by CRC Press. This book was released on 2011-06-13 with total page 672 pages. Available in PDF, EPUB and Kindle. Book excerpt: Designed for science and engineering students, this text focuses on emerging trends in processes for fabricating MEMS and NEMS devices. The book reviews different forms of lithography, subtractive material removal processes, and additive technologies. Both top-down and bottom-up fabrication processes are exhaustively covered and the merits of the different approaches are compared. Students can use this color volume as a guide to help establish the appropriate fabrication technique for any type of micro- or nano-machine.

Book RF MEMS Switches and Integrated Switching Circuits

Download or read book RF MEMS Switches and Integrated Switching Circuits written by Ai-Qun Liu and published by Springer Science & Business Media. This book was released on 2010-08-09 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microelectromechanical Systems (MEMS) stand poised for the next major breakthrough in the silicon revolution that began with the transistor in the 1960s and has revolutionized microelectronics. MEMS allow one to not only observe and process information of all types from small scale systems, but also to affect changes in systems and the environment at that scale. “RF MEMS Switches and Integrated Switching Circuits” builds on the extensive body of literature that exists in research papers on analytical and numerical modeling and design based on RF MEMS switches and micromachined switching circuits, and presents a unified framework of coverage. This volume includes, but is not limited to, RF MEMS approaches, developments from RF MEMS switches to RF switching circuits, and MEMS switch components in circuit systems. This book also: -Presents RF Switches and switching circuit MEMS devices in a unified framework covering all aspects of engineering innovation, design, modeling, fabrication, control and experimental implementation -Discusses RF switch devices in detail, with both system and component-level circuit integration using micro- and nano-fabrication techniques -Includes an emphasis on design innovation and experimental relevance rather than basic electromagnetic theory and device physics “RF MEMS Switches and Integrated Switching Circuits” is perfect for engineers, researchers and students working in the fields of MEMS, circuits and systems and RFs.

Book Fundamentals of Microfabrication and Nanotechnology  Three Volume Set

Download or read book Fundamentals of Microfabrication and Nanotechnology Three Volume Set written by Marc J. Madou and published by CRC Press. This book was released on 2018-12-14 with total page 1992 pages. Available in PDF, EPUB and Kindle. Book excerpt: Now in its third edition, Fundamentals of Microfabrication and Nanotechnology continues to provide the most complete MEMS coverage available. Thoroughly revised and updated the new edition of this perennial bestseller has been expanded to three volumes, reflecting the substantial growth of this field. It includes a wealth of theoretical and practical information on nanotechnology and NEMS and offers background and comprehensive information on materials, processes, and manufacturing options. The first volume offers a rigorous theoretical treatment of micro- and nanosciences, and includes sections on solid-state physics, quantum mechanics, crystallography, and fluidics. The second volume presents a very large set of manufacturing techniques for micro- and nanofabrication and covers different forms of lithography, material removal processes, and additive technologies. The third volume focuses on manufacturing techniques and applications of Bio-MEMS and Bio-NEMS. Illustrated in color throughout, this seminal work is a cogent instructional text, providing classroom and self-learners with worked-out examples and end-of-chapter problems. The author characterizes and defines major research areas and illustrates them with examples pulled from the most recent literature and from his own work.

Book Proceedings of the Third International Symposium on Microstructures and Microfabricated Systems

Download or read book Proceedings of the Third International Symposium on Microstructures and Microfabricated Systems written by Peter J. Hesketh and published by The Electrochemical Society. This book was released on 1997 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Understanding the Morphological Evolution of SI 111  Surfaces During Aqueous Etching

Download or read book Understanding the Morphological Evolution of SI 111 Surfaces During Aqueous Etching written by Jaroslav Flidr and published by . This book was released on 1999 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Properties of Crystalline Silicon

Download or read book Properties of Crystalline Silicon written by Robert Hull and published by IET. This book was released on 1999 with total page 1054 pages. Available in PDF, EPUB and Kindle. Book excerpt: A unique and well-organized reference, this book provides illuminating data, distinctive insight and expert guidance on silicon properties.

Book Handbook of Silicon Based MEMS Materials and Technologies

Download or read book Handbook of Silicon Based MEMS Materials and Technologies written by Markku Tilli and published by William Andrew. This book was released on 2015-09-02 with total page 827 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Silicon Based MEMS Materials and Technologies, Second Edition, is a comprehensive guide to MEMS materials, technologies, and manufacturing that examines the state-of-the-art with a particular emphasis on silicon as the most important starting material used in MEMS. The book explains the fundamentals, properties (mechanical, electrostatic, optical, etc.), materials selection, preparation, manufacturing, processing, system integration, measurement, and materials characterization techniques, sensors, and multi-scale modeling methods of MEMS structures, silicon crystals, and wafers, also covering micromachining technologies in MEMS and encapsulation of MEMS components. Furthermore, it provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques, shows how to protect devices from the environment, and provides tactics to decrease package size for a dramatic reduction in costs. - Provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques - Shows how to protect devices from the environment and decrease package size for a dramatic reduction in packaging costs - Discusses properties, preparation, and growth of silicon crystals and wafers - Explains the many properties (mechanical, electrostatic, optical, etc.), manufacturing, processing, measuring (including focused beam techniques), and multiscale modeling methods of MEMS structures - Geared towards practical applications rather than theory

Book Silicon Wet Bulk Micromachining for MEMS

Download or read book Silicon Wet Bulk Micromachining for MEMS written by Prem Pal and published by CRC Press. This book was released on 2017-04-07 with total page 315 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microelectromechanical systems (MEMS)-based sensors and actuators have become remarkably popular in the past few decades. Rapid advances have taken place in terms of both technologies and techniques of fabrication of MEMS structures. Wet chemical–based silicon bulk micromachining continues to be a widely used technique for the fabrication of microstructures used in MEMS devices. Researchers all over the world have contributed significantly to the advancement of wet chemical–based micromachining, from understanding the etching mechanism to exploring its application to the fabrication of simple to complex MEMS structures. In addition to its various benefits, one of the unique features of wet chemical–based bulk micromachining is the ability to fabricate slanted sidewalls, such as 45° walls as micromirrors, as well as freestanding structures, such as cantilevers and diaphragms. This makes wet bulk micromachining necessary for the fabrication of structures for myriad applications. This book provides a comprehensive understating of wet bulk micromachining for the fabrication of simple to advanced microstructures for various applications in MEMS. It includes introductory to advanced concepts and covers research on basic and advanced topics on wet chemical–based silicon bulk micromachining. The book thus serves as an introductory textbook for undergraduate- and graduate-level students of physics, chemistry, electrical and electronic engineering, materials science, and engineering, as well as a comprehensive reference for researchers working or aspiring to work in the area of MEMS and for engineers working in microfabrication technology.

Book MEMS and Nanotechnology for Gas Sensors

Download or read book MEMS and Nanotechnology for Gas Sensors written by Sunipa Roy and published by CRC Press. This book was released on 2017-12-19 with total page 217 pages. Available in PDF, EPUB and Kindle. Book excerpt: How Can We Lower the Power Consumption of Gas Sensors? There is a growing demand for low-power, high-density gas sensor arrays that can overcome problems relative to high power consumption. Low power consumption is a prerequisite for any type of sensor system to operate at optimum efficiency. Focused on fabrication-friendly microelectromechanical systems (MEMS) and other areas of sensor technology, MEMS and Nanotechnology for Gas Sensors explores the distinct advantages of using MEMS in low power consumption, and provides extensive coverage of the MEMS/nanotechnology platform for gas sensor applications. This book outlines the microfabrication technology needed to fabricate a gas sensor on a MEMS platform. It discusses semiconductors, graphene, nanocrystalline ZnO-based microfabricated sensors, and nanostructures for volatile organic compounds. It also includes performance parameters for the state of the art of sensors, and the applications of MEMS and nanotechnology in different areas relevant to the sensor domain. In addition, the book includes: An introduction to MEMS for MEMS materials, and a historical background of MEMS A concept for cleanroom technology The substrate materials used for MEMS Two types of deposition techniques, including chemical vapour deposition (CVD) The properties and types of photoresists, and the photolithographic processes Different micromachining techniques for the gas sensor platform, and bulk and surface micromachining The design issues of a microheater for MEMS-based sensors The synthesis technique of a nanocrystalline metal oxide layer A detailed review about graphene; its different deposition techniques; and its important electronic, electrical, and mechanical properties with its application as a gas sensor Low-cost, low-temperature synthesis techniques An explanation of volatile organic compound (VOC) detection and how relative humidity affects the sensing parameters MEMS and Nanotechnology for Gas Sensors provides a broad overview of current, emerging, and possible future MEMS applications. MEMS technology can be applied in the automotive, consumer, industrial, and biotechnology domains.