Download or read book Target Fabrication for Extreme Ultraviolet Laser Produced Plasma Sources written by Evgenia McLoughlin and published by . This book was released on 2009 with total page 58 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Recent Advances in Nanofabrication Techniques and Applications written by Bo Cui and published by IntechOpen. This book was released on 2011-12-02 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book Laser Based Nano Fabrication and Nano Lithography written by Koji Sugioka and published by MDPI. This book was released on 2018-12-07 with total page 155 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a printed edition of the Special Issue "Laser-Based Nano Fabrication and Nano Lithography" that was published in Nanomaterials
Download or read book Recent Advances in Nanofabrication Techniques and Applications written by Bo Cui and published by BoD – Books on Demand. This book was released on 2011-12-02 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Download or read book Plasma Processing of Nanomaterials written by R. Mohan Sankaran and published by CRC Press. This book was released on 2017-12-19 with total page 433 pages. Available in PDF, EPUB and Kindle. Book excerpt: We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.
Download or read book Vacuum Ultraviolet Spectroscopy I written by and published by Academic Press. This book was released on 1998-08-17 with total page 441 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume is for practitioners, experimentalists, and graduate students in applied physics, particularly in the fields of atomic and molecular physics, who work with vacuum ultraviolet applications and are in need of choosing the best type of modern instrumentation. It provides first-hand knowledge of the state-of-the-art equipment sources and gives technical information on how to use it, along with a broad reference bibliography.Key Features* Aimed at experimentalists who are in need of choosing the best type of modern instrumentation in this applied field* Contains a detailed chapter on laboratory sources* Provides an up-to-date description of state-of-the-art equipment and techniques* Includes a broad reference bibliography
Download or read book Efficient Extreme Ultra Violet Mirror Design written by Yen-Min Lee and published by IOP Publishing Limited. This book was released on 2021-09-23 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt: Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method. Key Features Addresses knowledge of extreme ultraviolet (EUV) mirrors and EUV lithography. Establishes a relation between photonic bands and Fresnel's equation. Introduces the high reflectivity EUV mirror design rules. Applies numerical simulation for EUV mirror design. Details efficient finite-difference time-domain (FDTD) approach.
Download or read book Nanofabrication written by Ampere A. Tseng and published by World Scientific. This book was released on 2008 with total page 583 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students.Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 2005 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 852 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Frontiers in High Energy Density Physics written by National Research Council and published by National Academies Press. This book was released on 2003-04-11 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent scientific and technical advances have made it possible to create matter in the laboratory under conditions relevant to astrophysical systems such as supernovae and black holes. These advances will also benefit inertial confinement fusion research and the nation's nuclear weapon's program. The report describes the major research facilities on which such high energy density conditions can be achieved and lists a number of key scientific questions about high energy density physics that can be addressed by this research. Several recommendations are presented that would facilitate the development of a comprehensive strategy for realizing these research opportunities.
Download or read book Frontiers in High Energy Density Physics written by National Research Council and published by National Academies Press. This book was released on 2003-05-11 with total page 177 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent scientific and technical advances have made it possible to create matter in the laboratory under conditions relevant to astrophysical systems such as supernovae and black holes. These advances will also benefit inertial confinement fusion research and the nation's nuclear weapon's program. The report describes the major research facilities on which such high energy density conditions can be achieved and lists a number of key scientific questions about high energy density physics that can be addressed by this research. Several recommendations are presented that would facilitate the development of a comprehensive strategy for realizing these research opportunities.
Download or read book Assessment of Inertial Confinement Fusion Targets written by National Research Council and published by National Academies Press. This book was released on 2013-07-17 with total page 119 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the fall of 2010, the Office of the U.S. Department of Energy's (DOE's) Secretary for Science asked for a National Research Council (NRC) committee to investigate the prospects for generating power using inertial confinement fusion (ICF) concepts, acknowledging that a key test of viability for this concept-ignition -could be demonstrated at the National Ignition Facility (NIF) at Lawrence Livermore National Laboratory (LLNL) in the relatively near term. The committee was asked to provide an unclassified report. However, DOE indicated that to fully assess this topic, the committee's deliberations would have to be informed by the results of some classified experiments and information, particularly in the area of ICF targets and nonproliferation. Thus, the Panel on the Assessment of Inertial Confinement Fusion Targets ("the panel") was assembled, composed of experts able to access the needed information. The panel was charged with advising the Committee on the Prospects for Inertial Confinement Fusion Energy Systems on these issues, both by internal discussion and by this unclassified report. A Panel on Fusion Target Physics ("the panel") will serve as a technical resource to the Committee on Inertial Confinement Energy Systems ("the Committee") and will prepare a report that describes the R&D challenges to providing suitable targets, on the basis of parameters established and provided to the Panel by the Committee. The Panel on Fusion Target Physics will prepare a report that will assess the current performance of fusion targets associated with various ICF concepts in order to understand: 1. The spectrum output; 2. The illumination geometry; 3. The high-gain geometry; and 4. The robustness of the target design. The panel addressed the potential impacts of the use and development of current concepts for Inertial Fusion Energy on the proliferation of nuclear weapons information and technology, as appropriate. The Panel examined technology options, but does not provide recommendations specific to any currently operating or proposed ICF facility.
Download or read book Inertial Fusion Technology Spin offs history Provides a Glimpse of the Future written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The development and demonstration of inertial fusion is incredibly challenging because it requires simultaneously controlling and precisely measuring parameters at extreme values in energy, space, and time. The challenges range from building megajoule (106 J) drivers that perform with percent-level precision to fabricating targets with submicron specifications to measuring target performance at micron scale (10−6 m) with picosecond (10−12 s) time resolution. Over the past 30 years in attempting to meet this challenge, the inertial fusion community around the world has invented new technologies in lasers, particle beams, pulse power drivers, diagnostics, target fabrication, and other areas. These technologies have found applications in diverse fields of industry and science. Moreover, simply assembling the teams with the background, experience, and personal drive to meet the challenging requirements of inertial fusion has led to spin-offs in unexpected directions, for example, in laser isotope separation, extreme ultraviolet (EUV) lithography for microelectronics, compact and inexpensive radars, advanced laser materials processing, and medical technology. It is noteworthy that more than 40 R & D 100 awards, the ''Oscars of applied research'' have been received by members of the inertial fusion community over this period. Not surprisingly, the inertial fusion community has created many new companies based on these advances. The experience of inertial fusion research and development of spinning off technologies has not been unique to any one laboratory or country but has been similar in main research centers in the United States, Europe, and Japan. The capabilities of inertial fusion research have also been exploited in numerous and diverse specific lines of scientific research. Examples include laboratory simulation of astrophysical phenomena; studies of the equation of state (EOS) of matter under conditions relevant to the interior of planets and stars; development of uniquely intense sources of extreme ultraviolet (EUV) to hard x-ray emission, notably the x-ray laser; understanding of the physics of strong field interaction of light and matter; and related new phenomena such as laser-induced nuclear processes and high-field-electron accelerators. Some of these developments have potential themselves for further scientific exploitation such as the scientific use of advanced light sources. There are also avenues for commercial exploitation, for example the use of laser plasma sources in EUV lithography.
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt:
