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Book Investigation of Industrially Suited Processes for Deposition of Oxide Thin Films by High Power Impulse Magnetron Sputtering

Download or read book Investigation of Industrially Suited Processes for Deposition of Oxide Thin Films by High Power Impulse Magnetron Sputtering written by Felipe de Campos Carreri and published by Fraunhofer Verlag. This book was released on 2018 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The scope of this work is to investigate and to develop advanced HIPIMS processes for deposition of oxides, utilizing industrial-scale equipment and technology. Two classes of oxide materials were studied: insulating (aluminum oxide) and conducting oxides (indium-tin oxide and aluminum-doped zinc oxide). The electrical properties of the oxides have a significant influence on the process design, as the issues and approaches for deposition of insulating materials are fairly different from conducting materials. Different types of reactive process control were also investigated, utilizing optical emission spectroscopy to control the oxygen flow and lambda probes to control the discharge power. A non-reactive process was also studied for indium-tin oxide.

Book High Power Impulse Magnetron Sputtering

Download or read book High Power Impulse Magnetron Sputtering written by Daniel Lundin and published by . This book was released on 2019-09-13 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

Book Cathodic Arcs

    Book Details:
  • Author : André Anders
  • Publisher : Springer Science & Business Media
  • Release : 2009-07-30
  • ISBN : 0387791086
  • Pages : 555 pages

Download or read book Cathodic Arcs written by André Anders and published by Springer Science & Business Media. This book was released on 2009-07-30 with total page 555 pages. Available in PDF, EPUB and Kindle. Book excerpt: Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.

Book Multifunctional transition metal diboride thin films grown by magnetron sputtering with metal ion irradiation

Download or read book Multifunctional transition metal diboride thin films grown by magnetron sputtering with metal ion irradiation written by Babak Bakhit and published by Linköping University Electronic Press. This book was released on 2020-04-01 with total page 27 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Carbon Nitride and Carbon Fluoride Thin Films Prepared by HiPIMS

Download or read book Carbon Nitride and Carbon Fluoride Thin Films Prepared by HiPIMS written by and published by . This book was released on 2013 with total page 82 pages. Available in PDF, EPUB and Kindle. Book excerpt: The present thesis focuses on carbon based thin films prepared by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS).

Book Ionized Physical Vapor Deposition

Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *This single source saves time and effort by including comprehensive information at one's finger tips *The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD *The numerous practical applications assist the working engineer to select and refine thin film processes

Book Silicon Nitride Based Coatings Grown by Reactive Magnetron Sputtering

Download or read book Silicon Nitride Based Coatings Grown by Reactive Magnetron Sputtering written by Tuomas Hänninen and published by Linköping University Electronic Press. This book was released on 2018-02-13 with total page 73 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon nitride and silicon nitride-based ceramics have several favorable material properties, such as high hardness and good wear resistance, which makes them important materials for the coating industry. This thesis focuses the synthesis of silicon nitride, silicon oxynitride, and silicon carbonitride thin films by reactive magnetron sputtering. The films were characterized based on their chemical composition, chemical bonding structure, and mechanical properties to link the growth conditions to the film properties. Silicon nitride films were synthesized by reactive high power impulse magnetron sputtering (HiPIMS) from a Si target in Ar/N2 atmospheres, whereas silicon oxynitride films were grown by using nitrous oxide as the reactive gas. Silicon carbonitride was synthesized by two different methods. The first method was using acetylene (C2H2) in addition to N2 in a Si HiPIMS process and the other was co-sputtering of Si and C, using HiPIMS for Si and direct current magnetron sputtering (DCMS) for graphite targets in an Ar/N2 atmosphere. Langmuir probe measurements were carried out for the silicon nitride and silicon oxynitride processes and positive ion mass spectrometry for the silicon nitride processes to gain further understanding on the plasma conditions during film growth. The target current and voltage waveforms of the reactive HiPIMS processes were evaluated. The main deposition parameter affecting the nitrogen concentration of silicon nitride films was found to be the nitrogen content in the plasma. Films with nitrogen contents of 50 at.% were deposited at N2/Ar flow ratios of 0.3 and above. These films showed Si-N as the dominating component in Si 2p X-ray photoelectron spectroscopy (XPS) core level spectra and Si–Si bonds were absent. The substrate temperature and target power were found to affect the nitrogen content to a lower extent. The residual stress and hardness of the films were found to increase with the film nitrogen content. Another factors influencing the coating stress were the process pressure, negative substrate bias, substrate temperature, and HiPIMS pulse energy. Silicon nitride coatings with good adhesion and low levels of compressive residual stress were grown by using a pressure of 600 mPa, a substrate temperature below 200 °C, pulse energies below 2.5 Ws, and negative bias voltages up to 100 V. The elemental composition of silicon oxynitride films was shown to depend on the target power settings as well as on the nitrous oxide flow rate. Silicon oxide-like films were synthesized under poisoned target surface conditions, whereas films deposited in the transition regime between poisoned and metallic conditions showed higher nitrogen concentrations. The nitrogen content of the films deposited in the transition region was controlled by the applied gas flow rate. The applied target power did not affect the nitrogen concentration in the transition regime, while the oxygen content increased at decreasing target powers. The chemical composition of the films was shown to range from silicon-rich to effectively stoichiometric silicon oxynitrides, where no Si–Si contributions were found in the XPS Si 2p core level spectra. The film optical properties, namely the refractive index and extinction coefficient, were shown to depend on the film chemical bonding, with the stoichiometric films displaying optical properties falling between those of silicon oxide and silicon nitride. The properties of silicon carbonitride films were greatly influenced by the synthesis method. The films deposited by HiPIMS using acetylene as the carbon source showed silicon nitride-like mechanical properties, such as a hardness of ~ 20 GPa and compressive residual stresses of 1.7 – 1.9 GPa, up to film carbon contents of 30 at.%. At larger film carbon contents the films had increasingly amorphous carbon-like properties, such as densities below 2 g/cm3 and hardnesses below 10 GPa. The films with more than 30 at.% carbon also showed columnar morphologies in cross-sectional scanning electron microscopy, whereas films with lower carbon content showed dense morphologies. Due to the use of acetylene the carbonitride films contained hydrogen, up to ~ 15 at.%. The co-sputtered silicon carbonitride films showed a layered SiNx/CNx structure. The hardness of these films increased with the film carbon content, reaching a maximum of 18 GPa at a film carbon content of 12 at.%. Comparatively hard and low stressed films were grown by co-sputtering using a C target power of 1200 W for a C content around 12 at.%, a negative substrate bias less than 100 V, and a substrate temperature up to 340 °C.

Book Tribology of Diamond like Carbon Films

Download or read book Tribology of Diamond like Carbon Films written by Christophe Donnet and published by Springer Science & Business Media. This book was released on 2007-12-06 with total page 673 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book highlights some of the most important structural, chemical, mechanical and tribological characteristics of DLC films. It is particularly dedicated to the fundamental tribological issues that impact the performance and durability of these coatings. The book provides reliable and up-to-date information on available industrial DLC coatings and includes clear definitions and descriptions of various DLC films and their properties.

Book Chemically Deposited Nanocrystalline Metal Oxide Thin Films

Download or read book Chemically Deposited Nanocrystalline Metal Oxide Thin Films written by Fabian I. Ezema and published by Springer. This book was released on 2022-06-28 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book guides beginners in the areas of thin film preparation, characterization, and device making, while providing insight into these areas for experts. As chemically deposited metal oxides are currently gaining attention in development of devices such as solar cells, supercapacitors, batteries, sensors, etc., the book illustrates how the chemical deposition route is emerging as a relatively inexpensive, simple, and convenient solution for large area deposition. The advancement in the nanostructured materials for the development of devices is fully discussed.

Book Rate Controlled Synthesis of Composition Modulated  Metal oxide Thin Films

Download or read book Rate Controlled Synthesis of Composition Modulated Metal oxide Thin Films written by and published by . This book was released on 1994 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: The development of advanced deposition technologies is continuously evolving for the synthesis of oxide coatings used in optical applications. Recent progress is made in the use of magnetron sputtering to reactively deposit metal-oxide thin films. Sputter deposition parameters are chosen to vary the composition along the film growth direction. The key process parameter to control is the sputtering rate of the target. The shape of the composition profile directly corresponds to the preselected variation of deposition rate. By simply varying the sputtering rate using a working gas that consists of an inert-oxygen mixture, structures are synthesized with composition profiles which can be either abrupt or graded in the growth direction. Result is a compositionally modulated structure of the metal-oxide system. This procedure for composition modulated synthesis is demonstrated for metals which are highly reactive with oxygen as well as for those metals which are not. The development of this deposition methodology will facilitate the design of metal oxide films for optical applications, as in gradient-index filters for example. Results are presented for the reactive sputter deposition of metal oxide coatings in the Y-O, Mo-O, and Cu-O systems.

Book High Power Impulse Magnetron Sputtering

Download or read book High Power Impulse Magnetron Sputtering written by Daniel Lundin and published by Elsevier. This book was released on 2019-08-28 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

Book Oxidation of Tungsten

Download or read book Oxidation of Tungsten written by Vincent David Barth and published by . This book was released on 1961 with total page 192 pages. Available in PDF, EPUB and Kindle. Book excerpt: The report presents a detailed review of available information on the oxidation of W and its alloys. W is relatively inert below 700 C. As the temperature is increased above this level, however, oxidation becomes progressively more rapid, reaching catastrophic rates at temperatures around 1200 C and above. Various theories for the mechanism and rates of W oxidation at different temperatures are reviewed, and the effect of pressure and water vapor on the stability of W oxides is discussed in detail. The elevatedtemperature reactions of W with other materials, such as refractory oxides, and with gases other than oxygen also are covered. Information on the protection of W by alloying and coating is included. (Author).

Book Chemically Deposited Nanocrystalline Metal Oxide Thin Films

Download or read book Chemically Deposited Nanocrystalline Metal Oxide Thin Films written by Fabian I. Ezema and published by Springer Nature. This book was released on 2021-06-26 with total page 926 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book guides beginners in the areas of thin film preparation, characterization, and device making, while providing insight into these areas for experts. As chemically deposited metal oxides are currently gaining attention in development of devices such as solar cells, supercapacitors, batteries, sensors, etc., the book illustrates how the chemical deposition route is emerging as a relatively inexpensive, simple, and convenient solution for large area deposition. The advancement in the nanostructured materials for the development of devices is fully discussed.

Book Encyclopedia of Tribology

Download or read book Encyclopedia of Tribology written by Q. Jane Wang and published by Springer. This book was released on 2013-09-26 with total page 4139 pages. Available in PDF, EPUB and Kindle. Book excerpt: TRIBOLOGY – the study of friction, wear and lubrication – impacts almost every aspect of our daily lives. The Springer Encyclopedia of Tribology is an authoritative and comprehensive reference covering all major aspects of the science and engineering of tribology that are relevant to researchers across all engineering industries and related scientific disciplines. This is the first major reference that brings together the science, engineering and technological aspects of tribology of this breadth and scope in a single work. Developed and written by leading experts in the field, the Springer Encyclopedia of Tribology covers the fundamentals as well as advanced applications across material types, different length and time scales, and encompassing various engineering applications and technologies. Exciting new areas such as nanotribology, tribochemistry and biotribology have also been included. As a six-volume set, the Springer Encyclopedia of Tribology comprises 1630 entries written by authoritative experts in each subject area, under the guidance of an international panel of key researchers from academia, national laboratories and industry. With alphabetically-arranged entries, concept diagrams and cross-linking features, this comprehensive work provides easy access to essential information for both researchers and practicing engineers in the fields of engineering (aerospace, automotive, biomedical, chemical, electrical, and mechanical) as well as materials science, physics, and chemistry.

Book The Synthesis  Characterisation and Application of Transparent Conducting Thin Films

Download or read book The Synthesis Characterisation and Application of Transparent Conducting Thin Films written by M. R. Waugh and published by . This book was released on 2011 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Transparent conducting thin films of metal oxides, doped metal oxides, and carbon nanotubes (CNTs), have been produced using various deposition techniques, including: Aerosol Assisted Chemical Vapour Deposition (AACVD), Atmospheric Pressure Chemical Vapour Deposition (APCVD), and Spray Coating. The resultant thin films were tested for their performance in a number of applications, including: Low emissivity ('Low-E') glazing, photovoltaic electrode materials, gas sensing and photocatalysis. AACVD was shown as a viable, and attractive, deposition technique for the synthesis of tin oxide, and doped tin oxide thin films, which allows for controllable doping levels, crystallinity, and surface structure. The tailoring of these physical attributes allows for enhanced performance of the functional properties of the films, whereby, a lower growth temperature produced highly transparent, highly conductive coatings with a low haze value for 'Low-E' applications, whereas, higher growth temperatures produced the high electrical conductivity, transparency, and light scattering properties required for high performance electrodes in thin film photovoltaics. In addition, a dual coating methodology was developed using both AACVD, and APCVD, to grow tin oxide thin films in a rapid timescale, but with modified surface structures showing changes to the short range waviness, kurtosis, and the surface area. Growth of carbon nanotubes, using CVD, was investigated over a range of metal catalysts, with varying Pauling electronegativity values, and over a range of temperature, methane, and hydrogen conditions. A growth mechanism has been postulated, whereby, the electronegativity of the metal catalyst, and the solubility and diffusion of the carbon through that catalyst, affects the type and properties of the carbon structure produced. To the authors knowledge, this is the first reported growth of MWCNTs using a chromium solo-metal catalyst, and the first reported growth of the unique 'carbon nanofibres' which were produced using gold and silver metal catalysts. Functionalisation of SWCNTs using a microwave reflux process was shown to yield sulphonate and sulphone modified nanotubes, which are highly soluble in water and able to undergo spray coating to produce carbon nanotube, nanonet transparent conducting thin films. The functionalisation process was shown to be reversible upon heating of the modified nanotubes. AACVD has been deemed unable to produced doped zinc oxide transparent conducting films. However, undoped zinc oxide films were produced. They displayed a high photocatalytic action in the degredation of stearic acid, and a UV light induced superhydrophilicity. The modification and deposition techniques, established throughout this work, were utilised to form transparent, hybrid, metal oxide-CNT coatings, for gas sensing. The hybrid materials displayed enhanced response times to combustible target gases, which has been attributed to the catalytic effects of the exposed carbon nanotube surfaces; and to the spillover of adsorbed oxygen from the active nanotubes to the metal oxide surface.

Book Synthesis of Silver diamond Like Carbon Thin Films by Magnetron Sputtering

Download or read book Synthesis of Silver diamond Like Carbon Thin Films by Magnetron Sputtering written by Venkatesh Majji and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond-like carbon thin films are been used in wide range of applications due to their attractive tribological properties. Metal-doped DLC films have significant properties which make them compatible to use in larger variety of applications. The present study examines the dispersion and their effect on various tribological properties when Ag is incorporated into the DLC thin films. These Ag-DLC nanocomposite films were synthesized by a hybrid CVD and magnetron sputtering process in a discharge composed of CH4, and Ar atmosphere. These DLC and Ag-DLC films were characterized by Transmission Electron Microscopy (TEM), Fourier Transform Infrared Spectroscopy (FTIR), X-ray Photoelectron Spectroscopy (XPS) and Raman Spectroscopy. Tribological tests were carried out to measure the frictional and wear behavior of the Ag-DLC films as a function of Ag content. The TEM cross sectional studies revealed that Ag is present as Ag nanoparticles that were distributed uniformly throughout an amorphous DLC matrix. XPS analysis confirmed that Ag in the nanoparticles was present in the metallic form. Increasing the Ag content in the film, reduced its sp3 content. The incorporation of these nanoparticles causes a reduction in hardness in Ag-DLC when compared with pure DLC films. Microhardness of DLC films exhibits values up to a maximum of 16 GPa and gradually decreases with increasing in Ag content. FTIR and Raman studies confirmed that the films contain a significant amount of hydrogen, and with an increase in the Ag content in the DLC film results in an increase in sp2 carbon content. Finally, the friction behavior of the Ag-DLC films showed a comparable performance with that of DLC films with a coefficient of friction as low as 0.1. The DLC films exhibited a lower wear rate of 5.51x10−8 mm3/Nm than Ag-DLC films. The wear rate in the Ag-DLC films gradually increased with increasing Ag content but it remained at low levels (i.e., up to 1.7x10−7 mm3/Nm). This is consistent with the higher sp2 content of the Ag-DLC films.