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Download or read book Symposium Of North Eastern Accelerator Personnel Sneap 30 written by Robert J Schneider and published by World Scientific. This book was released on 1998-05-12 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt: SNEAP is a community of personnel involved with particle accelerators and their use. Founded in 1968, the organization gathers annually to discuss and exchange information to the benefit of all who attend. The topics covered include ion sources, electrostatic accelerators, telemetry and control systems, safety issues and many other topics relevant to the operation of small to medium-sized electrostatic accelerator laboratories. For SNEAP 30 a special session will be devoted to interdisciplinary applications of accelerators.
Download or read book Index to Conferences Relating to Nuclear Science written by Willie E. Clark and published by . This book was released on 1968 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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Download or read book Surface Modification Technologies XVIII Proceedings of the Eighteenth International Conference on Surface Modification Technologies Held in Dijon France November 15 17 2004 v 18 written by T.S. Sudarshan and published by CRC Press. This book was released on 2023-05-31 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains the Proceedings of the Eighteenth International Conference on Surface Modification Technologies Held in Dijon, France November 15-17, 2004. Delegates from thirty countries were represented at this meeting and these proceedings are a complete compilation of all the papers that were presented.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
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