Download or read book Selected Papers on Resolution Enhancement Techniques in Optical Lithography written by F. M. Schellenberg and published by SPIE-International Society for Optical Engineering. This book was released on 2004 with total page 910 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical lithography for integrated circuits is undergoing a renaissance with the adoption of Resolution Enhancement Technology (RET). Some RET concepts have become routine in manufacturing. This volume gathers together seminal RET papers.
Download or read book Selected Papers on Resolution Enhancement Techniques in Optical Lithography written by F. M. Schellenberg and published by . This book was released on 2004-03-30 with total page 896 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical lithography for integrated circuits is undergoing a renaissance with the adoption of resolution enhancement techniques (RET). Some RET concepts have become routine in manufacturing, almost two decades after the original applications were conceived. This volume gathers together seminal RET papers. Since many of the first applications were announced by Japanese authors well before the material was presented in English, some of the original Japanese papers are included plus their English translations.
Download or read book Resolution Enhancement Techniques in Optical Lithography written by Alfred Kwok-Kit Wong and published by SPIE Press. This book was released on 2001 with total page 238 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers
Download or read book Superresolution Optical Microscopy written by Barry R. Masters and published by Springer Nature. This book was released on 2020-03-21 with total page 415 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents a comprehensive and coherent summary of techniques for enhancing the resolution and image contrast provided by far-field optical microscopes. It takes a critical look at the body of knowledge that comprises optical microscopy, compares and contrasts the various instruments, provides a clear discussion of the physical principles that underpin these techniques, and describes advances in science and medicine for which superresolution microscopes are required and are making major contributions. The text fills significant gaps that exist in other works on superresolution imaging, firstly by placing a new emphasis on the specimen, a critical component of the microscope setup, giving equal importance to the enhancement of both resolution and contrast. Secondly, it covers several topics not typically discussed in depth, such as Bessel and Airy beams, the physics of the spiral phase plate, vortex beams and singular optics, photoactivated localization microscopy (PALM), stochastic optical reconstruction microscopy (STORM), structured illumination microscopy (SIM), and light-sheet fluorescence microscopy (LSFM). Several variants of these techniques are critically discussed. Noise, optical aberrations, specimen damage, and artifacts in microscopy are also covered. The importance of validation of superresolution images with electron microscopy is stressed. Additionally, the book includes translations and discussion of seminal papers by Abbe and Helmholtz that proved to be pedagogically relevant as well as historically significant. This book is written for students, researchers, and engineers in the life sciences, medicine, biological engineering, and materials science who plan to work with or already are working with superresolution light microscopes. The volume can serve as a reference for these areas while a selected set of individual chapters can be used as a textbook for a one-semester undergraduate or first-year graduate course on superresolution microscopy. Moreover, the text provides a captivating account of curiosity, skepticism, risk-taking, innovation, and creativity in science and technology. Good scientific practice is emphasized throughout, and the author’s lecture slides on responsible conduct of research are included as an online resource which will be of interest to students, course instructors, and scientists alike.
Download or read book Advances in FDTD Computational Electrodynamics written by Allen Taflove and published by Artech House. This book was released on 2013 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in photonics and nanotechnology have the potential to revolutionize humanitys ability to communicate and compute. To pursue these advances, it is mandatory to understand and properly model interactions of light with materials such as silicon and gold at the nanoscale, i.e., the span of a few tens of atoms laid side by side. These interactions are governed by the fundamental Maxwells equations of classical electrodynamics, supplemented by quantum electrodynamics. This book presents the current state-of-the-art in formulating and implementing computational models of these interactions. Maxwells equations are solved using the finite-difference time-domain (FDTD) technique, pioneered by the senior editor, whose prior Artech House books in this area are among the top ten most-cited in the history of engineering. This cutting-edge resource helps readers understand the latest developments in computational modeling of nanoscale optical microscopy and microchip lithography, as well as nanoscale plasmonics and biophotonics.
Download or read book Optical Imaging in Projection Microlithography written by Alfred Kwok-Kit Wong and published by SPIE Press. This book was released on 2005 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Download or read book Optical Imaging and Metrology written by Wolfgang Osten and published by John Wiley & Sons. This book was released on 2012-09-10 with total page 471 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive review of the state of the art and advances in the field, while also outlining the future potential and development trends of optical imaging and optical metrology, an area of fast growth with numerous applications in nanotechnology and nanophysics. Written by the world's leading experts in the field, it fills the gap in the current literature by bridging the fields of optical imaging and metrology, and is the only up-to-date resource in terms of fundamental knowledge, basic concepts, methodologies, applications, and development trends.
Download or read book Selected Papers on Optical Microlithography written by Harry L. Stover and published by . This book was released on 1992 with total page 708 pages. Available in PDF, EPUB and Kindle. Book excerpt: SPIE Milestones are collections of seminal papers from the world literature covering important discoveries and developments in optics and photonics.
Download or read book EDA for IC Implementation Circuit Design and Process Technology written by Luciano Lavagno and published by CRC Press. This book was released on 2018-10-03 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presenting a comprehensive overview of the design automation algorithms, tools, and methodologies used to design integrated circuits, the Electronic Design Automation for Integrated Circuits Handbook is available in two volumes. The second volume, EDA for IC Implementation, Circuit Design, and Process Technology, thoroughly examines real-time logic to GDSII (a file format used to transfer data of semiconductor physical layout), analog/mixed signal design, physical verification, and technology CAD (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability at the nanoscale, power supply network design and analysis, design modeling, and much more. Save on the complete set.
Download or read book Handbook of Algorithms for Physical Design Automation written by Charles J. Alpert and published by CRC Press. This book was released on 2008-11-12 with total page 1024 pages. Available in PDF, EPUB and Kindle. Book excerpt: The physical design flow of any project depends upon the size of the design, the technology, the number of designers, the clock frequency, and the time to do the design. As technology advances and design-styles change, physical design flows are constantly reinvented as traditional phases are removed and new ones are added to accommodate changes in
Download or read book Scanning Probe Microscopy written by Sergei V. Kalinin and published by Springer Science & Business Media. This book was released on 2007-04-03 with total page 1002 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume will be devoted to the technical aspects of electrical and electromechanical SPM probes and SPM imaging on the limits of resolution, thus providing technical introduction into the field. This volume will also address the fundamental physical phenomena underpinning the imaging mechanism of SPMs.
Download or read book Advanced Microlithography Technologies written by Yangyuan Wang and published by SPIE-International Society for Optical Engineering. This book was released on 2005 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Download or read book Fast Simulation Methods for Non planar Phase and Multilayer Defects in DUV and EUV Photomasks for Lithography written by Michael Christopher Lam and published by . This book was released on 2005 with total page 436 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Annual Review of Materials Research written by and published by . This book was released on 2009 with total page 520 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanofabrication Using Focused Ion and Electron Beams written by Ivo Utke and published by OUP USA. This book was released on 2012-05 with total page 830 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Download or read book Digitally Assisted Analog and Analog Assisted Digital IC Design written by Xicheng Jiang and published by Cambridge University Press. This book was released on 2015-07-23 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: Discover cutting-edge techniques for next-generation integrated circuit design, and learn how to deliver improved speed, density, power, and cost.
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
