Download or read book Reactive Ion Etching of Photoresist masked N Polysilicon Surface Features in a Molecular Chlorine oxygen Plasma written by Stephanie Nadine Chanat and published by . This book was released on 1995 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Feature Profile Evolution During the High Density Plasma Etching of Polysilicon written by Arpan Pravin Mahorowala and published by . This book was released on 1998 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma Etching and Reactive Ion Etching written by J. W. Coburn and published by . This book was released on 1982 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma Processing written by R. G. Frieser and published by . This book was released on 1981 with total page 380 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1997 with total page 1860 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Science Abstracts written by and published by . This book was released on 1992 with total page 1228 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Physics Briefs written by and published by . This book was released on 1994 with total page 1162 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Highly Selective Reactive Ion Etching of Polysilicon with Bromine Plasma written by Ali M. El-Husseini and published by . This book was released on 1991 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Ion Beam Etching and Reactive Ion Etching on SBN Thin Films on MgO Crystal written by Yoo-Mi Lee and published by . This book was released on 1995 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Dry Etching Technology for Semiconductors written by Kazuo Nojiri and published by Springer. This book was released on 2014-10-25 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.

Download or read book Plasma Processing of Semiconductors written by Paul Williams and published by Springer Science & Business Media. This book was released on 1997-05-31 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.

Download or read book The Ion assisted Etching and Profile Development of Silicon in Molecular and Atomic Chlorine written by Joshua Aaron Levinson and published by . This book was released on 1999 with total page 318 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Semiconductor Manufacturing Handbook 2E PB written by Hwaiyu Geng and published by McGraw Hill Professional. This book was released on 2017-10-06 with total page 560 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thoroughly Revised, State-of-the-Art Semiconductor Design, Manufacturing, and Operations Information Written by 70 international experts and reviewed by a seasoned technical advisory board, this fully updated resource clearly explains the cutting-edge processes used in the design and fabrication of IC chips, MEMS, sensors, and other electronic devices. Semiconductor Manufacturing Handbook, Second Edition, covers the emerging technologies that enable the Internet of Things, the Industrial Internet of Things, data analytics, artificial intelligence, augmented reality, and and smart manufacturing. You will get complete details on semiconductor fundamentals, front- and back-end processes, nanotechnology, photovoltaics, gases and chemicals, fab yield, and operations and facilities. •Nanotechnology and microsystems manufacturing •FinFET and nanoscale silicide formation •Physical design for high-performance, low-power 3D circuits •Epitaxi, anneals, RTP, and oxidation •Microlithography, etching, and ion implantations •Physical, chemical, electrochemical, and atomic layer vapor deposition •Chemical mechanical planarization •Atomic force metrology •Packaging, bonding, and interconnects •Flexible hybrid electronics •Flat-panel,flexible display electronics, and photovoltaics •Gas distribution systems •Ultrapure water and filtration •Process chemicals handling and abatement •Chemical and slurry handling systems •Yield management, CIM, and factory automation •Manufacturing execution systems •Advanced process control •Airborne molecular contamination •ESD controls in clean-room environments •Vacuum systems and RF plasma systems •IC manufacturing parts cleaning technology •Vibration and noise design •And much more

Download or read book Optimization of Reactive Ion Etching to Fabricate Silicon Nitride Stencil Masks in SF6 Plasma written by Prithvi Basu and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Stencil masks are used to print ultra-high resolution patterns using helium ion/atom beam lithography and are often manufactured from thin, free-standing silicon nitride membranes. The masks have sub-200nm openings etched through the thickness of the membrane using a reactive ion etch (RIE) process that determine the printed pattern. This project deals with the optimization of a sulfur hexafluoride and oxygen RIE. In this process, 0.5μm thick silicon nitride membranes are coated with 20nm of copper (hard mask) and 200nm of poly (methyl methacrylate) (resist). The desired patterns are then formed in the resist by electron beam lithography, and the patterns are transferred through copper by argon milling. A mixture of 0.8 millitorr of sulfur hexafluoride and 0.2 millitorr of oxygen is used in an RIE step at a power of 15 watts to transfer them through the thickness of the membrane. The process allows for the patterning of extremely straight features (anisotropic etch), has excellent selectivity (200) between silicon nitride and copper, suffers from minimal RIE lag, and is generally very robust. The challenges associated with this process lie in etch non-uniformity due to membrane heating and pattern fidelity in the milling step. Solutions to these problems have been explored and stencil masks with sub-200 nm etched openings have been successfully fabricated

Download or read book Ceramic Abstracts written by American Ceramic Society and published by . This book was released on 1995 with total page 1150 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Study of Plasma surface Kinetics and Simulation of Feature Profile Evolution in Chlorine Etching of Patterened Polysilicon written by Jane Pei-chen Chang and published by . This book was released on 1998 with total page 218 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Plasma Processing of Materials written by National Research Council and published by National Academies Press. This book was released on 1991-02-01 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.