Download or read book Pulsed and Pulsed Bias Sputtering written by Edward V. Barnat and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 151 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topography that is encountered in the processing of integrated circuits. (Not to scale) these sub-micron sized features is depicted in Fig. 2. The role of the diffusion barrier is to prevent the diffusion of metallic ions into the interlayer dielectric (lLD). Depending on the technology, in particular the choice of the ILD and the metal interconnect, the diffusion barrier may be Ti, Ta, TiN, TaN, or a multi-layered structure of these materials. The adhesion of the barrier to the dielectric, the conformality of the barrier to the feature, the physical structure of the film, and the chemical composition of the film are key issues that are determined in part by the nature of the deposition process. Likewise, after the growth of the barrier, a conducting layer (the seed layer) is needed for subsequent filling of the trench by electrochemical deposition. Again, the growth process must be able to deposit a film that is continuous along the topography of the sub-micron sized features. Other factors of concern are the purity and the texture of the seed layer, as both of these factors influence the final resistivity of the metallic interconnect. Sputter-deposited coatings are also commonly employed for their electro-optical properties. For example, an electrochromic glazing is used to control the flux of light that is transmitted through a glazed material.
Download or read book Pulsed and Pulsed Bias Sputtering written by Edward V. Barnat and published by . This book was released on 2014-09-01 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Cathodic Arcs written by André Anders and published by Springer Science & Business Media. This book was released on 2009-07-30 with total page 555 pages. Available in PDF, EPUB and Kindle. Book excerpt: Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.
Download or read book High Power Impulse Magnetron Sputtering written by Daniel Lundin and published by . This book was released on 2019-09-13 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications
Download or read book Surface Coatings Technology written by B. D. Sartwell and published by Elsevier. This book was released on 2016-06-03 with total page 665 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface & Coatings Technology, Volumes 59–60 presents the proceedings of the Third International Conference on Plasma Surface Engineering, held in Garmisch-Partenkirchen, Germany, on October 26–29, 1992. This book discusses the widespread applications of plasma and particle beam assisted methods in surface and thin film technology. Volume 59 is organized into 11 parts encompassing 69 chapters while Volume 60 is comprised of eight parts encompassing 49 chapters. This compilation of papers begins with an overview of the kinetic modelling of low pressure high frequency discharges. This text then examines the effect of various deposition parameters on the growth of chamber wall deposits. Other chapters consider the physiochemical behavior of ceramic materials for space applications. This book discusses as well the economic aspects of the application of plasma surface technologies. The reader is also introduced to the environmental aspects of physical vapor deposition coating technology. This book is a valuable resource for plasma surface engineers, technologists, and researchers.
Download or read book Industrial Plasma Technology written by Yoshinobu Kawai and published by John Wiley & Sons. This book was released on 2010-04-26 with total page 467 pages. Available in PDF, EPUB and Kindle. Book excerpt: Clearly structured in five major sections on applications, this monograph covers such hot technologies as nanotechnology, solar cell technology, biomedical and clinical applications, and sustainability. Since the topic, applications and readers are highly interdisciplinary, the book bridges materials science, industrial chemistry, physics, and engineering -- making it a must-have for researchers in industry and academia, as well as those working in application-oriented plasma technology.
Download or read book High Power Impulse Magnetron Sputtering written by Daniel Lundin and published by Elsevier. This book was released on 2019-08-28 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications
Download or read book Introduction to Nanoscience and Nanotechnology written by Gabor L. Hornyak and published by CRC Press. This book was released on 2008-12-22 with total page 1791 pages. Available in PDF, EPUB and Kindle. Book excerpt: The maturation of nanotechnology has revealed it to be a unique and distinct discipline rather than a specialization within a larger field. Its textbook cannot afford to be a chemistry, physics, or engineering text focused on nano. It must be an integrated, multidisciplinary, and specifically nano textbook. The archetype of the modern nano textbook
Download or read book Glow Discharge Processes written by Brian Chapman and published by Wiley-Interscience. This book was released on 1980 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
Download or read book Thermal Control Thin Films written by Jia-wen Qiu and published by Walter de Gruyter GmbH & Co KG. This book was released on 2021-11-08 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book presents up-to-date thermal control film materials, technologies and applications in spacecraft. Commonly used thermal control film materials and devices for spacecraft are discussed in detail, including single-structure passive thermal control film materials, composite structure passive thermal control film materials, intelligent thermal control film materials, and microstructure thermal control thin film devices.
Download or read book Intelligent Energy Field Manufacturing written by Wenwu Zhang and published by CRC Press. This book was released on 2018-10-03 with total page 729 pages. Available in PDF, EPUB and Kindle. Book excerpt: Edited by prominent researchers and with contributions from experts in their individual areas, Intelligent Energy Field Manufacturing: Interdisciplinary Process Innovations explores a new philosophy of engineering. An in-depth introduction to Intelligent Energy Field Manufacturing (EFM), this book explores a fresh engineering methodology that not only integrates but goes beyond methodologies such as Design for Six Sigma, Lean Manufacturing, Concurrent Engineering, TRIZ, green and sustainable manufacturing, and more. This book gives a systematic introduction to classic non-mechanical manufacturing processes as well as offering big pictures of some technical frontiers in modern engineering. The book suggests that any manufacturing process is actually a process of injecting human intelligence into the interaction between material and the various energy fields in order to transfer the material into desired configurations. It discusses technological innovation, dynamic M-PIE flows, the generalities of energy fields, logic functional materials and intelligence, the open scheme of intelligent EFM implementation, and the principles of intelligent EFM. The book takes a highly interdisciplinary approach that includes research frontiers such as micro/nano fabrication, high strain rate processes, laser shock forming, materials science and engineering, bioengineering, etc., in addition to a detailed treatment of the so called "non-traditional" manufacturing processes, which covers waterjet machining, laser material processing, ultrasonic material processing, EDM/ECM, etc. Filled with illustrative pictures, figures, and tables that make technical materials more absorbable, the book cuts across multiple engineering disciplines. The majority of books in this area report the facts of proven knowledge, while the behind-the-scenes thinking is usually neglected. This book examines the big picture of manufacturing in depth before diving into the deta
Download or read book Ion Beam Modification of Materials written by J.S. Williams and published by Newnes. This book was released on 2012-12-02 with total page 1157 pages. Available in PDF, EPUB and Kindle. Book excerpt: This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.
Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *This single source saves time and effort by including comprehensive information at one's finger tips *The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD *The numerous practical applications assist the working engineer to select and refine thin film processes
Download or read book Atomic Layer Processing written by Thorsten Lill and published by John Wiley & Sons. This book was released on 2021-06-28 with total page 306 pages. Available in PDF, EPUB and Kindle. Book excerpt: Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Download or read book Thin Film Materials Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2004-05-10 with total page 533 pages. Available in PDF, EPUB and Kindle. Book excerpt: An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.
Download or read book Protective Thin Coatings Technology written by Sam Zhang and published by CRC Press. This book was released on 2021-08-08 with total page 375 pages. Available in PDF, EPUB and Kindle. Book excerpt: Hard or protective coatings are widely used in conventional and modern industries and will continue to play a key role in future manufacturing, especially in the micro and nano areas. Protective Thin Coatings Technology highlights the developments and advances in the preparation, characterization, and applications of protective micro-/nanoscaled films and coatings. This book Covers technologies for sputtering of flexible hard nanocoatings, deposition of solid lubricating films, and multilayer transition metal nitrides Describes integrated nanomechanical characterization of hard coatings, corrosion and tribo-corrosion of hard coatings, and high entropy alloy films and coatings Investigates thin films and coatings for high-temperature applications, nanocomposite coatings on magnesium alloys, and the correlation between coating properties and industrial applications Features various aspects of hard coatings, covering advanced sputtering technologies, structural characterizations, and simulations, as well as applications This first volume in the two-volume set, Protective Thin Coatings and Functional Thin Films Technology, will benefit industry professionals and researchers working in areas related to semiconductors, optoelectronics, plasma technology, solid-state energy storages, and 5G, as well as advanced students studying electrical, mechanical, chemical, and material engineering.
Download or read book Structural Integrity Considerations In written by Hoeppner and published by World Scientific. This book was released on 2014-07-31 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book deals with the concepts of structural integrity from safe life to damage tolerance to holistic structural integrity processes, which are all part of a reliability-centered closed loop design approach. Volume 1 introduces the concepts of structural integrity and the basics of fatigue design, including the development of safe life fatigue design concepts based on traditional continuum mechanics. An extensive discussion of discontinuities is presented to illustrate their importance to all deformation mechanisms and especially the mechanisms of fatigue. The historical aspects of fatigue design are also introduced with emphasis on the stress-life and strain-life approaches, along with the many factors that affect fatigue life of structures and their utilization in society. Latter chapters of the book briefly discuss the extraneous effects on fatigue such as corrosion, fretting, wear, creep, and accidental damage. These will be dealt with in more detail in latter volumes. Finally, the book gives many examples of fatigue failures that have occurred in history and cites ways these could have been prevented and the lessons learned from such fatigue failures.
