Download or read book Properties of Electron Cyclotron Resonance Plasma Sources written by Aseem Kumar Srivastava and published by . This book was released on 1995 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Macroscopic Properties of a Multipolar Electron Cyclotron Resonance Microwave cavity Plasma Source for Anisotropic Silicon Etching written by Jeffrey Alan Hopwood and published by . This book was released on 1990 with total page 538 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electron Cyclotron Resonance Ion Sources and ECR Plasmas written by R Geller and published by Routledge. This book was released on 2018-12-13 with total page 449 pages. Available in PDF, EPUB and Kindle. Book excerpt: Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour
Download or read book Potential Applications of a New Microwave ECR electron Cyclotron Resonance Multicusp Plasma Ion Source written by and published by . This book was released on 1990 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new microwave electron cyclotron resonance (ECR) multicusp plasma ion source using two ECR plasma production regions and multicusp plasma confinement has been developed at Oak Ridge National Laboratory. This source has been operated to produce uniform and dense plasmas over large areas of 300 to 400 cm2. The plasma source has been operated with continuous argon gas feed and pulsed microwave power. The discharge initiation phenomena and plasma properties have been investigated and studied as functions of discharge parameters. Together with the discharge characteristics observed, a hypothetical discharge mechanism for this plasma source is reported and discussed. Potential applications, including plasma and ion-beam processing for manufacturing advanced microelectronics and for space electric propulsion, are discussed. 7 refs., 6 figs.
Download or read book High Density Plasma Sources written by Oleg A. Popov and published by Elsevier. This book was released on 1996-12-31 with total page 467 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Download or read book Characteristics of Plasma Produced by Thermionic Cathodes with Radial Electric Fields written by J. S. Martin and published by . This book was released on 1972 with total page 64 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characteristics and Potential Applications of an ORNL Microwave ECR Multicusp Plasma Ion Source written by and published by . This book was released on 1990 with total page 22 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new microwave electron cyclotron resonance (ECR) multicusp plasma ion source that has two ECR plasma production regions and uses multicusp plasma confinement has been developed at Oak Ridge National Laboratory. This source has been operated to produce uniform and dense plasma over large areas of 300 to 400 cm2 and could be scaled up to produce uniform plasma over 700 cm2 or larger. The plasma source has been operated with continuous argon gas feed and pulsed microwave power. The working gases used were argon, helium, hydrogen, and oxygen. The discharge initiation phenomena and plasma properties have been investigated and studied as functions of the discharge parameters. The discharge characteristics and a hypothetical discharge mechanism for this plasma source are described and discussed. Potential applications, including plasma and ion-beam sources for manufacturing advanced microelectronics, for space electric propulsion, and for fusion research, are discussed. 10 refs., 10 figs.
Download or read book Low Pressure Plasmas and Microstructuring Technology written by Gerhard Franz and published by Springer Science & Business Media. This book was released on 2009-04-09 with total page 743 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].
Download or read book Microwave Discharges written by Carlos M. Ferreira and published by Springer Science & Business Media. This book was released on 2013-11-21 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992
Download or read book Surface Electron Cyclotron Waves in Plasmas written by Volodymyr Girka and published by Springer. This book was released on 2019-04-30 with total page 198 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is the first of its kind devoted to surface waves propagating across an external static magnetic field at harmonics of the electron cyclotron frequency. Based on comprehensive theoretical studies carried out over the course of about forty years, it presents unique material on various characteristics of these transverse waves, namely, dispersion properties and their dependence on numerous design peculiarities of plasma waveguides; damping due to interaction with the plasma surface (the kinetic channel) and collisions between plasma particles (the Ohmic channel); interaction with flows of charged particles moving above the plasma surface; parametric excitation due to the effect of an external radiofrequency field; and their power transfer for sustaining gas discharges. Clarifying numerous complicated mathematical issues it is a valuable resource for postgraduate students and experts in plasma physics, electromagnetic waves, and the kinetic theory of plasmas.
Download or read book Oxidation of Silicon in an Electron Cyclotron Resonance Plasma written by Daniel Arthur Carl and published by . This book was released on 1991 with total page 376 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 2013-10-22 with total page 343 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination
Download or read book Potential Applications of an Electron Cyclotron Resonance Multicusp Plasma Source written by and published by . This book was released on 1990 with total page 15 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterization of Electron Cyclotron Resonance Hydrogen Plasmas written by and published by . This book was released on 1990 with total page 20 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron cyclotron resonance (ECR) plasmas yield low energy and high ion density plasmas. The characteristics downstream of an ECR hydrogen plasma were investigated as a function of microwave power and magnetic field. A fast-injection Langmuir probe and a carbon resistance probe were used to determine plasma potential (V{sub p}), electron density (N{sub e}), electron temperature (T{sub e}), ion energy (T{sub i}), and ion fluence. Langmuir probe results showed that at 17 cm downstream from the ECR chamber the plasma characteristics are approximately constant across the center 7 cm of the plasma for 50 Watts of absorbed power. These results gave V{sub p} = 30 {plus minus} 5 eV, N{sub e} = 1 x 108 cm−3, and T{sub e} = 10--13 eV. In good agreement with the Langmuir probe results, carbon resistance probes have shown that T{sub i} (less-than or equal to) 50 eV. Also, based on hydrogen chemical sputtering of carbon, the hydrogen (ion and energetic neutrals) fluence rate was determined to be 1 x 1016/cm2-sec. at a pressure of 1 x 10−4 Torr and for 50 Watts of absorbed power. 19 refs.
Download or read book Electron Cyclotron Resonance Ion Sources and ECR Plasmas written by R Geller and published by Routledge. This book was released on 2018-12-13 with total page 351 pages. Available in PDF, EPUB and Kindle. Book excerpt: Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour
Download or read book Encyclopedia of Plasma Technology Two Volume Set written by J. Leon Shohet and published by CRC Press. This book was released on 2016-12-12 with total page 3082 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Download or read book Electron Cyclotron Resonance Plasma Enhanced Chemical Vapour Deposition of Sioxny written by Pavel Victorovich Bulkin and published by . This book was released on 1994 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt:
