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Book Preparation and Characterization of Reactive RF Sputtered Nitride Thin Films

Download or read book Preparation and Characterization of Reactive RF Sputtered Nitride Thin Films written by Geok Loo Chen and published by . This book was released on 1999 with total page 226 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Preparation and Characterization of Dielectric Thin Films by RF Magnetron Sputtering with Ba0 3Sr0 7 Zn1 3Nb2 3 O3 Ceramic Target

Download or read book Preparation and Characterization of Dielectric Thin Films by RF Magnetron Sputtering with Ba0 3Sr0 7 Zn1 3Nb2 3 O3 Ceramic Target written by Feng Shi and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Preparation and Characterization of Dielectric Thin Films by RF Magnetron-Sputtering with (Ba0.3Sr0.7)(Zn1/3Nb2/3)O3 Ceramic Target.

Book Fabrication of Zinc Nitride Thin Films Using RF Magnetron Sputtering Deposition for Optoelectronic Applications

Download or read book Fabrication of Zinc Nitride Thin Films Using RF Magnetron Sputtering Deposition for Optoelectronic Applications written by Ting Wen and published by . This book was released on 2012 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt: Zinc nitride thin films possess a small optical band gap with direct transition, low resistivity, high mobility and carrier concentration. Therefore, it may be suitable as an optoelectronic material for infrared sensors, smart windows and energy conversion devices. The objective of this work is to grow zinc nitride thin films using RF magnetron sputtering, understand its mechanical, optical, and electrical properties, and investigate its performance as light sensing devices. Synthesis and characterization of zinc nitride thin films has been investigated in this work. An RF magnetron sputtering deposition was employed to synthesize zinc nitride thin films using pure metal zinc target in either N2-Ar or N2-Ar-H2 mixtures. The microstructural, optical and electrical characterizations of the representative films were investigated with stylus profilometry, XRD, AFM, SEM, TEM, UV-VIS-NIR double beam spectrometry, and Hall effect measurement. The photoresponse of the zinc nitride photoconductors was also studied under the irradiation of white light and NIR light. The as-deposited zinc nitride thin films were relatively soft and densely packed with smooth surface. It possesses a narrow optical band gap in the NIR range with direct transition. The zinc nitride showed n-type conductivity with low resistivity and high carrier concentration. To study the RF discharge power effect, the zinc nitride thin films were synthesized at different discharge powers densities. With discharge power density increasing, the film deposition rate increased, and the zinc nitride films acquired better crystalline structure, smaller optical band gap and less oxygen contaminations. After thermal annealing at moderate temperatures in either air or O2, the annealed zinc nitride thin films were photoconductive under irradiation of both NIR light and white light. The largest photoresponse and fastest response times were measured at the room temperature for the zinc nitride thin films annealed at 300 degree in the air. Hydrogen inclusion can modify the electrical and optical properties of crystalline semiconductor films by introducing impurity donor states. The ZnNx:H films deposited in N2-Ar-H2 mixture acquired less oxygen contamination and higher relative nitrogen atom concentration than the ZnNx films deposited in N2-Ar mixture. The as-deposited ZnNx:H films showed a clear photonic behavior under white light irradiation, and the annealed ZnNx:H films exhibited a pronounced change in resistance under both white light and NIR light irradiation comparing to the annealed ZnNx films. This was the first time to report photoresponse of zinc nitride thin films fabricated by reactive sputtering method. The photoconductivity was gradually improved by optimization of deposition conditions, annealing conditions and film compositions.

Book Silicon Nitride Based Coatings Grown by Reactive Magnetron Sputtering

Download or read book Silicon Nitride Based Coatings Grown by Reactive Magnetron Sputtering written by Tuomas Hänninen and published by Linköping University Electronic Press. This book was released on 2018-02-13 with total page 73 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon nitride and silicon nitride-based ceramics have several favorable material properties, such as high hardness and good wear resistance, which makes them important materials for the coating industry. This thesis focuses the synthesis of silicon nitride, silicon oxynitride, and silicon carbonitride thin films by reactive magnetron sputtering. The films were characterized based on their chemical composition, chemical bonding structure, and mechanical properties to link the growth conditions to the film properties. Silicon nitride films were synthesized by reactive high power impulse magnetron sputtering (HiPIMS) from a Si target in Ar/N2 atmospheres, whereas silicon oxynitride films were grown by using nitrous oxide as the reactive gas. Silicon carbonitride was synthesized by two different methods. The first method was using acetylene (C2H2) in addition to N2 in a Si HiPIMS process and the other was co-sputtering of Si and C, using HiPIMS for Si and direct current magnetron sputtering (DCMS) for graphite targets in an Ar/N2 atmosphere. Langmuir probe measurements were carried out for the silicon nitride and silicon oxynitride processes and positive ion mass spectrometry for the silicon nitride processes to gain further understanding on the plasma conditions during film growth. The target current and voltage waveforms of the reactive HiPIMS processes were evaluated. The main deposition parameter affecting the nitrogen concentration of silicon nitride films was found to be the nitrogen content in the plasma. Films with nitrogen contents of 50 at.% were deposited at N2/Ar flow ratios of 0.3 and above. These films showed Si-N as the dominating component in Si 2p X-ray photoelectron spectroscopy (XPS) core level spectra and Si–Si bonds were absent. The substrate temperature and target power were found to affect the nitrogen content to a lower extent. The residual stress and hardness of the films were found to increase with the film nitrogen content. Another factors influencing the coating stress were the process pressure, negative substrate bias, substrate temperature, and HiPIMS pulse energy. Silicon nitride coatings with good adhesion and low levels of compressive residual stress were grown by using a pressure of 600 mPa, a substrate temperature below 200 °C, pulse energies below 2.5 Ws, and negative bias voltages up to 100 V. The elemental composition of silicon oxynitride films was shown to depend on the target power settings as well as on the nitrous oxide flow rate. Silicon oxide-like films were synthesized under poisoned target surface conditions, whereas films deposited in the transition regime between poisoned and metallic conditions showed higher nitrogen concentrations. The nitrogen content of the films deposited in the transition region was controlled by the applied gas flow rate. The applied target power did not affect the nitrogen concentration in the transition regime, while the oxygen content increased at decreasing target powers. The chemical composition of the films was shown to range from silicon-rich to effectively stoichiometric silicon oxynitrides, where no Si–Si contributions were found in the XPS Si 2p core level spectra. The film optical properties, namely the refractive index and extinction coefficient, were shown to depend on the film chemical bonding, with the stoichiometric films displaying optical properties falling between those of silicon oxide and silicon nitride. The properties of silicon carbonitride films were greatly influenced by the synthesis method. The films deposited by HiPIMS using acetylene as the carbon source showed silicon nitride-like mechanical properties, such as a hardness of ~ 20 GPa and compressive residual stresses of 1.7 – 1.9 GPa, up to film carbon contents of 30 at.%. At larger film carbon contents the films had increasingly amorphous carbon-like properties, such as densities below 2 g/cm3 and hardnesses below 10 GPa. The films with more than 30 at.% carbon also showed columnar morphologies in cross-sectional scanning electron microscopy, whereas films with lower carbon content showed dense morphologies. Due to the use of acetylene the carbonitride films contained hydrogen, up to ~ 15 at.%. The co-sputtered silicon carbonitride films showed a layered SiNx/CNx structure. The hardness of these films increased with the film carbon content, reaching a maximum of 18 GPa at a film carbon content of 12 at.%. Comparatively hard and low stressed films were grown by co-sputtering using a C target power of 1200 W for a C content around 12 at.%, a negative substrate bias less than 100 V, and a substrate temperature up to 340 °C.

Book RF Sputtered Cadmium Oxide Thin Films for Gas Sensing Application

Download or read book RF Sputtered Cadmium Oxide Thin Films for Gas Sensing Application written by Anil Kumar Gadipelly and published by LAP Lambert Academic Publishing. This book was released on 2015-02-04 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.

Book Modified Reactive Sputter Deposition of Titanium Nitride Thin Films Via HiPIMS with Kick pulse and Improvement of the Structure zone Model

Download or read book Modified Reactive Sputter Deposition of Titanium Nitride Thin Films Via HiPIMS with Kick pulse and Improvement of the Structure zone Model written by Andrew J. Miceli and published by . This book was released on 2023 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Direct current (DC) and radio frequency (RF) sputtering methods have been commonplace in industry for several decades and widely studied in literature. Hard films of nitrides, such as titanium nitride (TiN), have been deposited using reactive DC sputtering onto cutting tools and medical devices extensively as well. For these applications, the films require excellent adhesion, high density, and high hardness. High-Power Impulse Magnetron Sputtering (HIPIMS) has emerged over the last several years as a method to produce films with increased density and mechanical properties. Process-structure-property relationships for reactive HIPIMS are not yet well developed. Additionally, conventional HIPIMS suffers from relatively low deposition rates, which becomes a challenge or barrier of adoption for applied TiN coatings that are typically greater than several microns in thickness. This work aims to look at increasing this deposition rate while maintaining the beneficial effects of HIPIMS by utilizing the short duration "kick-pulse" in the voltage/current cycle, leading to higher instantaneous deposition rates and increased adatom energy level. TiN films are deposited onto silicon (Si) wafers under varied reactive sputtering conditions, including DC, HIPIMS, and HIPIMS with kick-pulse. Structural characterizations are performed using scanning electron microscopy (SEM) and X-ray diffraction (XRD). Optical properties of the resulting films are also characterized using reflection UV-Vis spectroscopy. The deposition rate, morphology, and chemical composition of the films are highly affected by the processing conditions, with the kick-pulse producing significant increase in deposition rate and observed grain size. Further investigation will aim to develop a modified structural zone model to include HIPIMS with and without kick-pulse.

Book Forward Recoil Spectrometry

    Forward Recoil Spectrometry

    Book Details:
  • Author : Y. Serruys
  • Publisher : Springer Science & Business Media
  • Release : 2012-12-06
  • ISBN : 1461303532
  • Pages : 451 pages

Download or read book Forward Recoil Spectrometry written by Y. Serruys and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 451 pages. Available in PDF, EPUB and Kindle. Book excerpt: The practical properties of many materials are dominated by surface and near-surface composition and structure. An understanding of how the surface region affects material properties starts with an understanding of the elemental composition of that region. Since the most common contaminants are light elements (for example, oxygen, nitrogen, carbon, and hydrogen), there is a clear need for an analytic probe that simultaneously and quantitatively records elemental profiles of all light elements. Energy recoil detection using high-energy heavy ions is unique in its ability to provide quantitative profiles of light and medium mass elements. As such this method holds great promise for the study of a variety of problems in a wide range of fields. While energy recoil detection is one of the newest and most promising ion beam analytic techniques, it is also the oldest in terms of when it was first described. Before discussing recent developments in this field, perhaps it is worth reviewing the early days of this century when the first energy recoil detection experiments were reported.

Book Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods Processes Properties and Applications

Download or read book Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods Processes Properties and Applications written by Filipe Vaz and published by Bentham Science Publishers. This book was released on 2013-06-21 with total page 363 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through optoelectronics) to corrosion resistance. Developing a better understanding of the relationships between deposition processes, structure and composition of the deposited films is critical to the continued evolution of these applications. This e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes. Its contents are spread in twelve main and concise chapters through which the book thoroughly reviews the bases of oxynitride thin film technology and deposition processes, sputtering processes and the resulting behaviors of these oxynitride thin films. More importantly, the solutions for the growth of oxynitride technology are given in detail with an emphasis on some particular compounds. This is a valuable resource for academic learners studying materials science and industrial coaters, who are concerned not only about fundamental aspects of oxynitride synthesis, but also by their innate material characteristics.

Book Diamond Based Composites

Download or read book Diamond Based Composites written by Mark A. Prelas and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond-based composites, with their advantages of hardness, high Young's modulus and the like, have demonstrated new and unusual features, such as stability to high temperatures and pressure shocks and a large internal surface that can be controlled to offer customised electrical, magnetic and optical properties, leading to efficient filters, absorbents, sensors and other tools for environmental control and monitoring. The current book covers the synthesis of materials, their characterization and properties, trends in high pressure and high temperature technologies, low pressure technologies, basic principles of DBC material science, and future developments in electronics, optics, industrial tools and components, biotechnology, and medicine. Wide band-gap materials are considered, ranging from molecular clusters, nanophase materials, growth, processing and synthesis. The processing of composite based materials can be classified into six basic methods: in situ growth, high pressure/high temperature catalytic conversion; mix and sinter (c-BN plus metal-ceramic polymer mix); direct sintering; direct polymorphic conversion; shock detonation; and SHS sintering.

Book Preparation and Characterization of Carbon Nitride Thin Films

Download or read book Preparation and Characterization of Carbon Nitride Thin Films written by Lian Wan and published by . This book was released on 1995 with total page 144 pages. Available in PDF, EPUB and Kindle. Book excerpt: