Download or read book Plasma Enhanced Chemical Vapor Deposition of Tungsten written by Matthew A. Mahowald and published by . This book was released on 1986 with total page 132 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Enhanced Chemical Vapor Deposition of Tungsten Films written by J. K. Chu and published by . This book was released on 1982 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma enhanced Chemical Vapor Deposition of Tungsten Silicide written by Andris Edgar Petriceks and published by . This book was released on 1986 with total page 326 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma enhanced Chemical Vapor Deposition and Characterization of Tungsten Films written by John Ka-ngai Chu and published by . This book was released on 1982 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Enhanced Chemical Vapor Deposition of Stress Free Tungsten Films written by David Perese and published by . This book was released on 1996 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma enhanced Chemical Vapor Deposition and Plasma Etching of Tungsten Films written by Ching Cheong Tang and published by . This book was released on 1983 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Synthesis of Carbon and Tungsten Based Thin Films by Plasma Enhanced Chemical Vapor Deposition written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Enhanced Chemical Vapor Deposition of Beta Tungsten a Metastable Phase written by C. C. Tang and published by . This book was released on 1984 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma-enhanced chemical vapor deposition of a metastable phase of tungsten (beta-W) is performed using tungsten hexafluoride and hydrogen as source gases. At 350 C, the as-deposited resistivity of these films is about 50 micron omega cm. After heat treatments between 650 and 750 C in forming gas, the resistivity drops below 11 micron omega cm. Concomitant with this resistivity change is a phase change to alpha-W, the equilibrium, body-centered-cubic form. Additional keywords: reprint; and Army research.
Download or read book Evaluation of Electrochromic Tungsten Oxide Prepared by Plasma Enhanced Chemical Vapor Deposition PECVD written by George J. Sacks and published by . This book was released on 1996 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electrochromic Evaluation of Tungsten Oxide Deposited by Plasma Enhanced Chemical Vapor Deposition PECVD written by Namrata K. Jobalia and published by . This book was released on 1997 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Plasma enhanced Chemical Vapour Deposition of Tungsten for VLSI Applications written by and published by . This book was released on 1989 with total page 201 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of Deposition Technologies for Films and Coatings written by Peter M. Martin and published by William Andrew. This book was released on 2009-12-01 with total page 932 pages. Available in PDF, EPUB and Kindle. Book excerpt: This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.
Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Download or read book Application of Chemical Vapor Deposition to the Production of Tungsten Tubing written by and published by . This book was released on 1967 with total page 27 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Download or read book Remote Plasma atom Assisted Chemical Vapor Deposition of Tungsten Aluminum and Their Oxides written by Mathieu J. Freeman and published by . This book was released on 1995 with total page 250 pages. Available in PDF, EPUB and Kindle. Book excerpt:
