Download or read book Oxide Film Formation from Electron Cyclotron Resonance ECR Plasmas written by and published by . This book was released on 1997 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt: The formation of SiO(subscript x) films and fluorine-doped SiO(subscript x) films using electron cyclotron resonance (ECR) plasma deposition is described. Parametric studies of the film composition and hydrogen content as a function of feed gas composition and RF biasing are presented. By replacing SiH4 with SiF4 in the gas feed, samples with F content from 2 at.% F to 12 at.% F are deposited, and the dielectric constant of the deposited layers decrease linearly with increasing fluorine concentration. The stability of these low dielectric constant SiO(subscript x)F{sub y} layers is examined under hydrating conditions, and conditions typically found for interlayer dielectric processing in microelectronics. The hydrogen content of the SiO2 and F-doped SiO2 is characterized as a function of deposition conditions, and a model is given to describe the thermal release of H from SiO2.
Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 2013-10-22 with total page 343 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination
Download or read book Electron Cyclotron Resonance Ion Sources and ECR Plasmas written by R Geller and published by Routledge. This book was released on 2018-12-13 with total page 351 pages. Available in PDF, EPUB and Kindle. Book excerpt: Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour
Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films written by M. Jamal Deen and published by The Electrochemical Society. This book was released on 1997 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Oxidation of Silicon in an Electron Cyclotron Resonance Plasma written by Daniel Arthur Carl and published by . This book was released on 1991 with total page 376 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Er doped Amorphous and Crystalline Al sub 2 O sub 3 and La sub 2 O sub 3 Films Grown with Low Energy Ions from an ECR Plasma written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The effects of low energy ions from a biased electron cyclotron resonance plasma during growth of Al[sub 2]O[sub 3] and La[sub 2]O[sub 3] are used to modify the density and crystalline quality of these oxide films. The type of phase formed for Al[sub 2]O[sub 3] is varied with the ion-assisted growth from amorphous to crystalline[gamma]-Al[sub 2]O[sub 3]. The photoluminescence (PL) properties of different Er-doped Al- and La-oxide phases are examined and through comparison of the PL spectra, the local environment of Er in these oxide materials is discussed.
Download or read book Oxide Films written by Kurt R. Hebert and published by The Electrochemical Society. This book was released on 2000 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Er doped Amorphous and Crystalline Al2O3 and La2O3 Films Grown with Low Energy Ions from an ECR Plasma written by and published by . This book was released on 1996 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: The effects of low energy ions from a biased electron cyclotron resonance plasma during growth of Al2O3 and La2O3 are used to modify the density and crystalline quality of these oxide films. The type of phase formed for Al2O3 is varied with the ion-assisted growth from amorphous to crystalline [gamma]-Al2O3. The photoluminescence (PL) properties of different Er-doped Al- and La-oxide phases are examined and through comparison of the PL spectra, the local environment of Er in these oxide materials is discussed.
Download or read book To Study the ECR Plasma Assisted Growth of III V Nitride such as GaN and Nanostructures written by Viswas Purohit and published by University of Pune, PhD Dissertation. This book was released on with total page 204 pages. Available in PDF, EPUB and Kindle. Book excerpt: RESEARCH THESIS by Viswas Purohit PhD, Plasma Physics University of Pune, MAH, India “To study the ECR assisted Growth of III-V nitride (such as GaN) and nanostructures”. • The aim of the work carried out was to design and develop a permanent magnet based Electron Cyclotron Resonance (ECR) plasma system as well as to study the plasma assisted material synthesis and modifications with the ECR plasma. Overall the aims were, a) Development of an ECR plasma system b) Carrying out plasma diagnostics using Langmuir double probe and Retarding field analyzer. c) Use of hollow cathode discharge for synthesizing metallic nanomaterials, which spawned two more projects in our department. d) Depositing GaN by MOCVD within an ECR plasma reactor.
Download or read book Fundamentals of Novel Oxide semiconductor Interfaces written by C. R. Abernathy and published by . This book was released on 2004 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Microelectronics Technology and Devices written by and published by The Electrochemical Society. This book was released on 2005 with total page 574 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electrochemical Surface Modification written by Richard C. Alkire and published by John Wiley & Sons. This book was released on 2008-11-21 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this topical volume, the authors provide in-depth coverage of the vital relationship between electrochemistry and the morphology of thin films and surfaces. Clearly divided into four major sections, the book covers nanoscale dielectric films for electronic devices, superconformal film growth, electrocatalytic properties of transition metal macrocycles, and the use of synchrotron techniques in electrochemistry. All the chapters offer a concise introduction to the relevant topic, as well as supplying numerous references for easy access to further reading and the original literature. The result is must-have reading for electrochemists, physical and surface chemists and physicists, as well as materials scientists and engineers active in the field of spectroscopic methods in electrochemistry.
Download or read book JJAP written by and published by . This book was released on 2005 with total page 798 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of Metallurgical Process Design written by George E. Totten and published by CRC Press. This book was released on 2004-05-25 with total page 992 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reviewing an extensive array of procedures in hot and cold forming, casting, heat treatment, machining, and surface engineering of steel and aluminum, this comprehensive reference explores a vast range of processes relating to metallurgical component design-enhancing the production and the properties of engineered components while reducing manufacturing costs. It surveys the role of computer simulation in alloy design and its impact on material structure and mechanical properties such as fatigue and wear. It also discusses alloy design for various materials, including steel, iron, aluminum, magnesium, titanium, super alloy compositions and copper.
Download or read book Physics and Technology of High k Gate Dielectrics 6 written by S. Kar and published by The Electrochemical Society. This book was released on 2008-10 with total page 550 pages. Available in PDF, EPUB and Kindle. Book excerpt: The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Download or read book Film Deposition by Plasma Techniques written by Mitsuharu Konuma and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt: Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.
Download or read book Official Gazette of the United States Patent and Trademark Office written by and published by . This book was released on 1994 with total page 912 pages. Available in PDF, EPUB and Kindle. Book excerpt:
