Download or read book Optimal Control of Chemical Vapor Deposition Reactor written by University of Minnesota. Institute for Mathematics and Its Applications and published by . This book was released on 1996 with total page 23 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optimal Control Problems in Chemical Vapor Deposition written by Lijuan Song and published by . This book was released on 1997 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proper Orthogonal Decomposition for Flow Calculations and Optimal Control in a Horizontal CVD Reactor written by and published by . This book was released on 1998 with total page 32 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) processes use a chemical reaction in the gas phase above the surface of the film to deposit desired materials onto a susceptor. CVD is a key element in a wide variety of industrial applications, ranging from the fabrication of microelectronic circuits, solar cells, and optical devices to the deposition of wear resistant coatings onto high performance machine tools. In a typical CVD reactor, a mixture of reactants and carrier gas is forced to flow across a heated susceptor. The temperature field from the heated susceptor induces gas phase reactions to produce activated species which then diffuse to the surface reaction layer and decompose to produce a thin film.
Download or read book Optimal Control of a CVD Reactor for Prescribed Temperature Behavior written by and published by . This book was released on 1995 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optimal Control of Complex Structures written by K.-H. Hoffmann and published by Birkhäuser. This book was released on 2012-12-06 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt: Interest in the area of control of systems defined by partial differential Equations has increased strongly in recent years. A major reason has been the requirement of these systems for sensible continuum mechanical modelling and optimization or control techniques which account for typical physical phenomena. Particular examples of problems on which substantial progress has been made are the control and stabilization of mechatronic structures, the control of growth of thin films and crystals, the control of Laser and semi-conductor devices, and shape optimization problems for turbomachine blades, shells, smart materials and microdiffractive optics. This volume contains original articles by world reknowned experts in the fields of optimal control of partial differential equations, shape optimization, numerical methods for partial differential equations and fluid dynamics, all of whom have contributed to the analysis and solution of many of the problems discussed. The collection provides a state-of-the-art overview of the most challenging and exciting recent developments in the field. It is geared towards postgraduate students and researchers dealing with the theoretical and practical aspects of a wide variety of high technology problems in applied mathematics, fluid control, optimal design, and computer modelling.
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Research Directions in Distributed Parameter Systems written by Ralph C. Smith and published by SIAM. This book was released on 2003-01-01 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt: Written by the plenary speakers for the Conference on Future Directions in Distributed Parameter Systems (October 2000), the volume addresses the state of the art, open questions, and important research directions in applications modeled by partial differential equations and delay systems. Topics include electromagnetic theory for dielectric and conductive materials, flow control, cardiovascular and respiratory models, homogenization and systems theory, optimal and geometric control, reduced-order models for large-scale systems, smart materials, and nondestructive evaluation and structural health monitoring for systems, including nuclear power plants.
Download or read book Modeling and Control of Thin Film Growth in a Chemical Vapor Deposition Reactor written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This work describes the development of a mathematical model of ahigh-pressure chemical vapor deposition (HPCVD) reactor and nonlinearfeedback methodologies for control of the growth of thin films in thisreactor. Precise control of the film thickness and composition is highlydesirable, making real-time control of the deposition process veryimportant. The source vapor species transport is modeled by the standardgas dynamics partial differential equations, with species decomposition reactions, reduced down to a small number of ordinary differential equationsthrough use of the proper orthogonal decomposition technique. This systemis coupled with a reduced order model of the reactions on the surfaceinvolved in the source vapor decomposition and film deposition on thesubstrate wafer. Also modeled is the real-time observation technique usedto obtain a partial measurement of the deposition process. The utilization of reduced order models greatly simplifies the mathematical formulation of the physical process so it can be solved quickly enough to beused for real-time model-based feedback control. This control problem isfairly complicated, however, because the surface reactions render the modelnonlinear. Several control methodologies for nonlinear systems are studiedin this work to determine which performs best on test examples similar tothe HPCVD problem. One chosen method is extended to a tracking control toforce certain film growth properties to follow desired trajectories. Thenonlinear control method is used also in the development of a stateestimator which uses the nonlinear partial observation of the nonlinearsystem to create an estimate of the actual state, which the feedback controlformula then can use to guide the HPCVD system. The nonlinear trackingcontrol and estimator techniques are implemented on the HPCVD model and theresults analyzed as to the effectiveness of the reduced order model andnonlinear control.
Download or read book Optimal Control of a Batch Chemical Reactor written by Barbara Pollack Uhrmacher and published by . This book was released on 1966 with total page 78 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book On line Multivariable Optimal Control of a Chemical Reactor written by Hak Nae Kim and published by . This book was released on 1975 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Principles of Chemical Vapor Deposition written by D.M. Dobkin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Download or read book An investigation of the optimal control of a chemical reactor written by Carlos Mário Siffert de Paula e Silva and published by . This book was released on 1964 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Advanced Computational Methods in Science and Engineering written by Barry Koren and published by Springer Science & Business Media. This book was released on 2010-04-29 with total page 501 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of the present book is to show, in a broad and yet deep way, the state of the art in computational science and engineering. Examples of topics addressed are: fast and accurate numerical algorithms, model-order reduction, grid computing, immersed-boundary methods, and specific computational methods for simulating a wide variety of challenging problems, problems such as: fluid-structure interaction, turbulent flames, bone-fracture healing, micro-electro-mechanical systems, failure of composite materials, storm surges, particulate flows, and so on. The main benefit offered to readers of the book is a well-balanced, up-to-date overview over the field of computational science and engineering, through in-depth articles by specialists from the separate disciplines.
Download or read book The Optimal Control of a Chemical Reactor with Material Recycle written by William Leonard Wallace and published by . This book was released on 1967 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book 24th European Symposium on Computer Aided Process Engineering written by and published by Elsevier. This book was released on 2014-06-20 with total page 1966 pages. Available in PDF, EPUB and Kindle. Book excerpt: The 24th European Symposium on Computer Aided Process Engineering creates an international forum where scientific and industrial contributions of computer-aided techniques are presented with applications in process modeling and simulation, process synthesis and design, operation, and process optimization. The organizers have broadened the boundaries of Process Systems Engineering by inviting contributions at different scales of modeling and demonstrating vertical and horizontal integration. Contributions range from applications at the molecular level to the strategic level of the supply chain and sustainable development. They cover major classical themes, at the same time exploring a new range of applications that address the production of renewable forms of energy, environmental footprints and sustainable use of resources and water.
Download or read book Modeling and Model Reduction for Control and Optimization of Epitaxial Growth in a Commercial Rapid Thermal Chemical Vapor Deposition Reactor written by and published by . This book was released on 1998 with total page 64 pages. Available in PDF, EPUB and Kindle. Book excerpt: In December 1996, a project was initiated at the Institute for Systems Research (ISR), under an agreement between Northrop Grumman Electronic Sensors and Systems Division (ESSD) and the ISR, to investigate the epitaxial growth of silicon[germanium (Si[Ge) heterostructures in a commercial rapid thermal chemical vapor deposition (RTCVD) reactor. This report provides a detailed account of the objectives and results of work done on this project as of September 1997. The report covers two main topics - modeling and model reduction. Physics[based models are developed for thermal, fluid, and chemical mechanisms involved in epitaxial growth. Experimental work for model validation and determination of growth parameters is described. Due to the complexity and high computational demands of the models, we investigate the use of model reduction techniques to reduce the model complexity, leading to faster simulation and facilitating the use of standard control and optimization strategies.
Download or read book Adaptive Control of a Chemical Vapor Deposition Reactor Simulation written by William C. Tetley (P.E.) and published by . This book was released on 1996 with total page 131 pages. Available in PDF, EPUB and Kindle. Book excerpt:
