Download or read book Optical Emission Spectroscopy Studies of Plasma in Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition written by Daniel S. Vanslette and published by . This book was released on 1996 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition written by S Neralla and published by BoD – Books on Demand. This book was released on 2016-08-31 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Download or read book Current Research in Thin Film Deposition written by Ross Birney and published by MDPI. This book was released on 2021-06-03 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology.
Download or read book Parameter Measurements of a Germane Electron Cyclotron Resonance Plasma written by Matthew Jason DeFreese and published by . This book was released on 2000 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis deals with research on optical and electrical characterizations of ECR (Electron Cyclotron Resonance) plasma processes used to deposit films of Germanium and its alloys. A semi-quantitative technique, optical emission spectroscopy (OES) is used to identify a characteristic peak (GeH) of germane plasmas. This is the first time ever that this peak has been seen in optical spectroscopy of germane plasmas. This peak is demonstrated to be correlated with film growth, and can be used to control the plasma process. The effects of changing deposition parameters, such as pressure, hydrogen or helium dilution ratios, and microwave power on film deposition rates and on electron and ion temperatures and electron densities in the plasma have been studied. A novel Langmuir probe technique, using a heated probe, was developed to measure these effects. The data obtained from the Langmuir probe have been correlated with the data obtained from OES measurements.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1993 with total page 1052 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiannual, with semiannual and annual indexes. References to all scientific and technical literature coming from DOE, its laboratories, energy centers, and contractors. Includes all works deriving from DOE, other related government-sponsored information, and foreign nonnuclear information. Arranged under 39 categories, e.g., Biomedical sciences, basic studies; Biomedical sciences, applied studies; Health and safety; and Fusion energy. Entry gives bibliographical information and abstract. Corporate, author, subject, report number indexes.
Download or read book CVD XV written by Mark Donald Allendorf and published by The Electrochemical Society. This book was released on 2000 with total page 826 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Tenth Symposium on Plasma Processing written by Electrochemical Society. Dielectric Science and Technology Division and published by The Electrochemical Society. This book was released on 1994 with total page 622 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Film Deposition by Plasma Techniques written by Mitsuharu Konuma and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt: Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.
Download or read book JJAP written by and published by . This book was released on 2000 with total page 574 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the International Symposium on Thin Film Materials Processes Reliability and Applications Thin Film Processes written by G. S. Mathad and published by The Electrochemical Society. This book was released on 1998 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Third International Symposium on Diamond Materials written by John P. Dismukes and published by The Electrochemical Society. This book was released on 1993 with total page 1126 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ceramic Abstracts written by and published by . This book was released on 1998 with total page 1040 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Amorphous Carbon State Of The Art Proceedings Of The 1st International Specialist Meeting On Amorphous Carbon Smac 97 written by S R P Silva and published by World Scientific. This book was released on 1998-05-30 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond-like carbon is amorphous carbon with a high degree of sp3 bonding, and is widely used for hard coatings and field emission cathodes. This book contains reviews by leading workers in the field, covering the topics of deposition methods, deposition mechanisms, atomic structure, surface atomic structure, electronic structure calculations, Raman, doping, luminescence, electron field emission, mechanical properties and tribology.
Download or read book Optical Emission Diagnostics of Plasmas in Chemical Vapor Deposition of Single crystal Diamond written by and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Here, a key aspect of single crystal diamond growth via microwave plasma chemical vapor deposition is in-process control of the local plasma-substrate environment, that is, plasma gas phase concentrations of activated species at the plasma boundary layer near the substrate surface. Emission spectra of the plasma relative to the diamond substrate inside the microwave plasma reactor chamber have been analyzed via optical emission spectroscopy. The spectra of radical species such as CH, C2, and H (Balmer series) important for diamond growth were found to be more depndent on operating pressure than on microwave power. Plasma gas temperatures were calculated from measurements of the C2 Swan band (d3[Pi] → a3[Pi] transition) system. The plasma gas temperature ranges from 2800 to 3400 K depending on the spatial location of the plasma ball, microwave power and operating pressure. Addition of Ar into CH4 + H2 plasma input gas mixture has little influence on the H[alpha], H[beta], and H[gamma] intensities and single-crystal diamond growth rates.
Download or read book Database Needs for Modeling and Simulation of Plasma Processing written by National Research Council and published by National Academies Press. This book was released on 1996-11-21 with total page 75 pages. Available in PDF, EPUB and Kindle. Book excerpt: In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.
Download or read book Japanese Journal of Applied Physics written by and published by . This book was released on 2002 with total page 1684 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electron Kinetics and Applications of Glow Discharges written by Uwe Kortshagen and published by Springer Science & Business Media. This book was released on 1998-06-30 with total page 553 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book resulted from the NATO Advanced Research Workshop on “Electron Kinetics and Applications of Glow Discharges,” held in St. Petersburg, Russia, on May 19-23, 1997. Glow discharges have found widespread applications in many technological processes from the manufacture of semiconductors, to recent developments in na- technology, to the traditional fields of gas lasers, and discharge lamps. Consequently, the interest in the physics of glow discharges has experienced yet another resurgence of interest. While the non-equilibrium character of glow discharges is widely accepted, the opinion still prevails that the main features can be captured by fluid models, and that kinetic treatments are only required for the understanding of subtle details. The erroneousness of this belief is demonstrated by the failure of fluid models to describe many basic features of glow discharges such as, for instance, electrode phenomena, striations, and collisionless heating effects. An adequate description of glow discharges thus has to be of kinetic nature.
