Download or read book Nanoimprint Lithography Next Generation Nanopatterning Methods for Nanophotonics Fabrication written by Jukka Viheriälä and published by . This book was released on 2010 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint Lithography - Next Generation Nanopatterning Methods for Nanophotonics Fabrication.

Download or read book Recent Optical and Photonic Technologies written by Ki Young Kim and published by IntechOpen. This book was released on 2010-01-01 with total page 468 pages. Available in PDF, EPUB and Kindle. Book excerpt: Research and development in modern optical and photonic technologies have witnessed quite fast growing advancements in various fundamental and application areas due to availability of novel fabrication and measurement techniques, advanced numerical simulation tools and methods, as well as due to the increasing practical demands. The recent advancements have also been accompanied by the appearance of various interdisciplinary topics. The book attempts to put together state-of-the-art research and development in optical and photonic technologies. It consists of 21 chapters that focus on interesting four topics of photonic crystals (first 5 chapters), THz techniques and applications (next 7 chapters), nanoscale optical techniques and applications (next 5 chapters), and optical trapping and manipulation (last 4 chapters), in which a fundamental theory, numerical simulation techniques, measurement techniques and methods, and various application examples are considered. This book deals with recent and advanced research results and comprehensive reviews on optical and photonic technologies covering the aforementioned topics. I believe that the advanced techniques and research described here may also be applicable to other contemporary research areas in optical and photonic technologies. Thus, I hope the readers will be inspired to start or to improve further their own research and technologies and to expand potential applications. I would like to express my sincere gratitude to all the authors for their outstanding contributions to this book.

Download or read book Chapter Nanoimprint Lithography Next Generation Nanopatterning Methods for Nanophotonics Fabrication written by Jukka Viheril and published by . This book was released on 2010 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The application of different electrochemical techniques to surfactant systems, namely polarography and cyclic voltammetry, differential capacitance, chronocoulometry and electrochemical impedance spectroscopy, is reviewed.

Download or read book Micro Nanolithography written by Jagannathan Thirumalai and published by BoD – Books on Demand. This book was released on 2018-05-02 with total page 136 pages. Available in PDF, EPUB and Kindle. Book excerpt: The main objective of this book is to give proficient people a comprehensive review of up-to-date global improvements in hypothetical and experimental evidences, perspectives and prospects of some newsworthy instrumentation and its numerous technological applications for a wide range of lithographic fabrication techniques. The present theme of this book is concomitant with the lithographic ways and means of deposition, optimization parameters and their wide technological applications. This book consists of six chapters comprehending with eminence of lithography, fabrication and reproduction of periodic nanopyramid structures using UV nanoimprint lithography for solar cell applications, large-area nanoimprint lithography and applications, micro-/nanopatterning on polymers, OPC under immersion lithography associated to novel luminescence applications, achromatic Talbot lithography (ATL) and the soft X-ray interference lithography. Individual chapters provide a base for a wide range of readers from different fiels, students and researchers, who may be doing research pertinent to the topics discussed in this book and find basic as well as advanced principles of designated subjects related to these phenomena explained plainly. The book contains six chapters by experts in different fields of lithographic fabrication and technology from over 15 research institutes across the globe.

Download or read book Recent Optical and Photonic Technologies written by Ki Young Kim and published by BoD – Books on Demand. This book was released on 2010-01-01 with total page 470 pages. Available in PDF, EPUB and Kindle. Book excerpt: Research and development in modern optical and photonic technologies have witnessed quite fast growing advancements in various fundamental and application areas due to availability of novel fabrication and measurement techniques, advanced numerical simulation tools and methods, as well as due to the increasing practical demands. The recent advancements have also been accompanied by the appearance of various interdisciplinary topics. The book attempts to put together state-of-the-art research and development in optical and photonic technologies. It consists of 21 chapters that focus on interesting four topics of photonic crystals (first 5 chapters), THz techniques and applications (next 7 chapters), nanoscale optical techniques and applications (next 5 chapters), and optical trapping and manipulation (last 4 chapters), in which a fundamental theory, numerical simulation techniques, measurement techniques and methods, and various application examples are considered. This book deals with recent and advanced research results and comprehensive reviews on optical and photonic technologies covering the aforementioned topics. I believe that the advanced techniques and research described here may also be applicable to other contemporary research areas in optical and photonic technologies. Thus, I hope the readers will be inspired to start or to improve further their own research and technologies and to expand potential applications. I would like to express my sincere gratitude to all the authors for their outstanding contributions to this book.

Download or read book Nanolithography written by M Feldman and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, “What comes next? and “How do we get there? Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics. This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics

Download or read book Nanofabrication written by Ampere A. Tseng and published by World Scientific. This book was released on 2008 with total page 583 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students.Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices.

Download or read book Optically Induced Nanostructures written by Karsten König and published by Walter de Gruyter GmbH & Co KG. This book was released on 2015-05-19 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanostructuring of materials is a task at the heart of many modern disciplines in mechanical engineering, as well as optics, electronics, and the life sciences. This book includes an introduction to the relevant nonlinear optical processes associated with very short laser pulses for the generation of structures far below the classical optical diffraction limit of about 200 nanometers as well as coverage of state-of-the-art technical and biomedical applications. These applications include silicon and glass wafer processing, production of nanowires, laser transfection and cell reprogramming, optical cleaning, surface treatments of implants, nanowires, 3D nanoprinting, STED lithography, friction modification, and integrated optics. The book highlights also the use of modern femtosecond laser microscopes and nanoscopes as novel nanoprocessing tools.

Download or read book Unconventional Nanopatterning Techniques and Applications written by John A. Rogers and published by John Wiley & Sons. This book was released on 2008-11-13 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: Patterning or lithography is at the core of modern science and technology and cuts across all disciplines. With the emergence of nanotechnology, conventional methods based on electron beam lithography and extreme ultraviolet photolithography have become prohibitively expensive. As a result, a number of simple and unconventional methods have been introduced, beginning first with research demonstrations in the mid 1990s. This book focuses on these unconventional patterning techniques and their applications to optics, organic devices, electronic devices, biological devices, and fluidics.

Download or read book Updates in Advanced Lithography written by Sumio Hosaka and published by BoD – Books on Demand. This book was released on 2013-07-03 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.

Download or read book Nanoimprint Lithography An Enabling Process for Nanofabrication written by Weimin Zhou and published by Springer Science & Business Media. This book was released on 2013-01-04 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

Download or read book Nano Lithography written by Stefan Landis and published by John Wiley & Sons. This book was released on 2013-03-04 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is an extremely complex tool – based on the concept of “imprinting” an original template version onto mass output – originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams – in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics, chemistry, mechanics and fluidics, and are now developing the nanoworld with new tools and technologies. Beyond the scientific challenges that are endemic in this miniaturization race, next generation lithography techniques are essential for creating new devices, new functionalities and exploring new application fields. Nanolithography is the branch of nanotechnology concerned with the study and application of fabricating nanometer-scale structures − meaning the creation of patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nm. It is used in the fabrication of leading-edge semiconductor integrated circuits (nanocircuitry) or nanoelectromechanical systems (NEMS). This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography. It is written for engineers or researchers new to the field, and will help readers to expand their knowledge of technologies that are constantly evolving.

Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.

Download or read book Recent Advances in Nanofabrication Techniques and Applications written by Bo Cui and published by BoD – Books on Demand. This book was released on 2011-12-02 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.

Download or read book Nanophotonic Devices Applications and Fabrication by Nanoimprint Lithography written by Shufeng Bai and published by . This book was released on 2007 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Generating Micro and Nanopatterns on Polymeric Materials written by Aránzazu del Campo and published by John Wiley & Sons. This book was released on 2011-04-08 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: New micro and nanopatterning technologies have been developed in the last years as less costly and more flexible alternatives to phtolithograpic processing. These technologies have not only impacted on recent developments in microelectronics, but also in emerging fields such as disposable biosensors, scaffolds for tissue engineering, non-biofouling coatings, high adherence devices, or photonic structures for the visible spectrum. This handbook presents the current processing methods suitable for the fabrication of micro- and nanostructured surfaces made out of polymeric materials. It covers the steps and materials involved, the resulting structures, and is rounded off by a part on applications. As a result, chemists, material scientists, and physicists gain a critical understanding of this topic at an early stage of its development.

Download or read book Self aligned Integrated Nanostructures Fabricated by UV nanoimprint Lithography written by Praveen Joseph and published by . This book was released on 2017 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: Fabricating large-area multilevel integrated nanostructures and 3D nanoshapes are of tremendous importance for applications in the fields of nanoelectronics, nanophotonics, semiconductor memory, biosensors, and high density displays. As the dimensions of such nanostructures are driven-down by design, in order to drive-up the performance of the overall device, we run into challenges such as nanoscale overlay and level-to-level alignment during the lithography process. State-of-the-art nanolithography tools can achieve a certain level of nanoscale overlay with their optical and thermo-mechanical mechanisms. But these tools are expensive and they have a limit to the best possible nanoscale overlay achievable. In particular, if integrated nanostructures are needed on a large area such as an entire wafer (without having to step-and-repeat), or on non-conventional substrates such as flexible substrates, nanoscale alignment cannot be achieved using these tools. Jet and Flash Imprint Lithography (J-FIL) is a high-throughput, inexpensive, mechanical nanopatterning technique that uses a mold or imprint template to create nanostructures by causing a polymer resist to flow into its etched shapes by capillary action. The imprint template is typically fabricated using available lithography techniques and hence there is a limitation on the achievable nanoscale overlay. In this research, methods are developed to fabricate large-area, multilevel nanostructures and 3D nanoshapes on nanoimprint templates without the need for level-to-level alignment and nanoscale overlay. These nanoimprint templates are essential to explore large-area multilevel integrated nanostructures and 3D nanoshapes by J-FIL replication. The general methodology for fabrication of multilevel nanoimprint templates relies on a combination of nanoscale lithography, atomic layer deposition’s (ALD) atomic precision, and choice of highly etch selective materials, to ensure precise self-alignment of multiple levels in the nanoscale. Such templates fabricated in this work are named self-aligned multilevel templates (SAMTs). Five specific self-aligned multilevel fabrication techniques have been demonstrated that result in symmetric multilevel structures, bilaterally symmetric multilevel structures, nanotube structures, asymmetric multilevel structures, and asymmetric sloped structures on SAMTs. When used in conjunction with a nanoimprint lithography process, the SAMTs can enable high-throughput patterning of various nanoelectronic and nanophotonic devices using a single patterning step with perfect alignment and overlay. SAMTs further enable large area patterning, such as wafer-scale patterning and roll-to-roll patterning on flexible substrates, without compromising perfect overlay.