Download or read book Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices Proceedings of a Conference 26 27 March 1987 Bay Point Florida written by O.J. Glembocki and published by . This book was released on 1987 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices written by O. J. Glembocki and published by SPIE-International Society for Optical Engineering. This book was released on 1987 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices written by O. J. Glembocki and published by . This book was released on 1987 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Characterization of Semiconductors written by Sidney Perkowitz and published by Elsevier. This book was released on 2012-12-02 with total page 229 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first book to explain, illustrate, and compare the most widely used methods in optics: photoluminescence, infrared spectroscopy, and Raman scattering. Written with non-experts in mind, the book develops the background needed to understand the why and how of each technique, but does not require special knowledge of semiconductors or optics. Each method is illustrated with numerous case studies. Practical information drawn from the authors experience is given to help establish optical facilities, including commercial sources for equipment, and experimental details. For industrial scientists with specific problems in semiconducting materials; for academic scientists who wish to apply their spectroscopic methods to characterization problems; and for students in solid state physics, materials science and engineering, and semiconductor electronics and photonics, this book provides a unique overview, bringing together these valuable techniques in a coherent wayfor the first time. Discusses and compares infrared, Raman, and photoluminescence methods Enables readers to choose the best method for a given problem Illustrates applications to help non-experts and industrial users, with answers to selected common problems Presents fundamentals with examples from the semiconductor literature without excessive abstract discussion Features equipment lists and discussion of techniques to help establish characterization laboratories
Download or read book Journal of Research of the National Institute of Standards and Technology written by and published by . This book was released on 1994 with total page 904 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.
Download or read book Semiconductor Material and Device Characterization written by Dieter K. Schroder and published by Wiley-Interscience. This book was released on 1998-06-17 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor Material and Device Characterization is the only book on the market devoted to the characterization techniques used by the modern semiconductor industry to measure diverse semiconductor materials and devices. It covers the full range of electrical and optical characterization methods while thoroughly treating the more specialized chemical and physical techniques. This newly revamped and expanded Second Edition incorporates the many innovations that have come to dominate the field during the past decade. From scanning probe techniques to the detection of metallic impurities in silicon wafers to the use of microwave reflection to measure contactless resistivity, each chapter presents state-of-the-art tools and techniques, most of which were in their infancy or had not yet been developed when the previous edition first came out. Featured here are: * An entirely new chapter on reliability and probe microscopy * Numerous examples and end-of-chapter problems - new to this edition * Five hundred illustrations revised for this edition * Updated bibliography with over 1,200 references * Easy-to-use text including a real-world mix of units rather than strictly MKS units. This practical new edition is ideal for textbook adoptions at the graduate level and is destined to become an essential reference for research and development teams in the semiconductor industry.
Download or read book Optical Characterization Techniques for High performance Microelectronic Device Manufacturing II written by John Lowell and published by Society of Photo Optical. This book was released on 1995 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of Compound Semiconductors written by Paul H. Holloway and published by Cambridge University Press. This book was released on 2008-10-19 with total page 937 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book reviews the recent advances and current technologies used to produce microelectronic and optoelectronic devices from compound semiconductors. It provides a complete overview of the technologies necessary to grow bulk single-crystal substrates, grow hetero-or homoepitaxial films, and process advanced devices such as HBT's, QW diode lasers, etc.
Download or read book Science and Technology of Defects in Silicon written by C.A.J. Ammerlaan and published by Elsevier. This book was released on 2014-01-01 with total page 518 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume reviews recent developments in the materials science of silicon. The topics discussed range from the fundamental characterization of the physical properties to the assessment of materials for device applications, and include: crystal growth; process-induced defects; topography; hydrogenation of silicon; impurities; and complexes and interactions between impurities. In view of its key position within the conference scope, several papers examine process induced defects: defects due to ion implantation, silicidation and dry etching, with emphasis being placed on the device aspects. Special attention is also paid to recent developments in characterization techniques on epitaxially grown silicon, and silicon-on-insulators.
Download or read book Optical Characterization Techniques for High performance Microelectronic Device Manufacturing written by and published by . This book was released on 1996 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Review written by and published by . This book was released on 1988 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Characterization Techniques for High performance Microelectronic Device Manufacturing II written by John Lowell and published by . This book was released on 1995 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Particles on Surfaces 2 written by K.L. Mittal and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles.
Download or read book Spectroscopic Characterization Techniques for Semiconductor Technology written by and published by . This book was released on 1992 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Spectroscopic Characterization Techniques for Semiconductor Technology III written by O. J. Glembocki and published by . This book was released on 1988 with total page 250 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Properties of Semiconductor Nanocrystals written by S. V. Gaponenko and published by Cambridge University Press. This book was released on 1998-10-28 with total page 263 pages. Available in PDF, EPUB and Kindle. Book excerpt: Examines the optical properties of low-dimensional semiconductor structures, a hot research area - for graduate students and researchers.
Download or read book Optical Characterization Techniques for High performance Microelectronic Device Manufacturing written by Jagdish P. Mathur and published by . This book was released on 1994 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt:
