Download or read book Micro and Nano Fabrication by Metal Assisted Chemical Etching written by Lucia Romano and published by MDPI. This book was released on 2021-01-13 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Download or read book Micro and Nano Fabrication by Metal Assisted Chemical Etching written by Lucia Romano and published by . This book was released on 2021 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates--Si, Ge, poly-Si, GaAs, and SiC--and using different catalysts--Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale--nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Download or read book Semiconductor Nanofabrication Via Metal assisted Chemical Etching written by Thomas S. Wilhelm and published by . This book was released on 2019 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The increasing demand for complex devices that utilize three-dimensional nanostructures has incentivized the development of adaptable and versatile semiconductor nanofabrication strategies. Without the introduction and refinement of methodologies to overcome traditional processing constraints, nanofabrication sequences risk becoming obstacles that impede device evolution. Crystallographic wet-chemical etching (e.g., Si in KOH) has historically been sufficient to produce textured Si surfaces with smooth sidewalls, though it lacks the ability to yield high aspect-ratio features. Physical and chemical plasma etching (e.g., reactive-ion etching) evolved to allow for the creation of vertical structures within integrated circuits; however, the high energy ion bombardment associated with dry etching can cause lattice and sidewall damage that is detrimental to device performance, particularly as structures progress within the micro- and nano-scale regimes. Metal-assisted chemical etching (MacEtch) provides an alternative processing scheme that is both solution-based and highly anisotropic. This fabrication method relies on a suitable catalyst (e.g., Au, Ag, Pt, or Pd) to induce semiconductor etching in a solution containing an oxidant and an etchant. The etching would otherwise be inert without the presence of the catalyst. The MacEtch process is modelled after a galvanic cell, with cathodic and anodic half reactions occurring at the solution/catalyst and catalyst/semiconductor interfaces, respectively. The metal catalyzes the reduction of oxidant species at the cathode, thereby generating charge carriers (i.e., holes) that are locally injected into the semiconductor at the anode. The solution interacts with the ionized substrate, which creates an oxide that is preferentially attacked by the etchant. Thus, MacEtch offers a nanofabrication alternative that combines the advantages of both wet- and dry-etching, while also overcoming many of their accompanying limitations. This provides a tunable semiconductor processing platform using controlled top-down catalytic etching, affording engineers greater processing control and versatility over conventional methodologies. Here, Au-enhanced MacEtch of the ternary alloys InGaP and AlGaAs is demonstrated for the first time, and processes are detailed for the formation of suspended III-V nanofoils and ordered nanopillar arrays. Next, a lithography-free and entirely solution-based method is outlined for the fabrication of black GaAs with solar-weighted reflectance of ~4%. Finally, a comparison between Au- and CNT-enhanced Si MacEtch is presented towards CMOS-compatibility using catalysts that do not introduce deep level traps. Sample preparation and etching conditions are shown to be adaptable to yield an a priori structural design, through a modification of injected hole distributions. Critical process parameters that guide the MacEtch mechanisms are considered at length, including heteroepitaxial effects, ternary material composition, etching temperature, and catalyst type, size, and deposition technique. This work extends the range of MacEtch materials and its fundamental mechanics for fabrication of micro- and nano-structures with applications in optoelectronics, photovoltaics, and nanoelectronics."--Abstract.
Download or read book Manufacturing Techniques for Microfabrication and Nanotechnology written by Marc J. Madou and published by CRC Press. This book was released on 2011-06-13 with total page 672 pages. Available in PDF, EPUB and Kindle. Book excerpt: Designed for science and engineering students, this text focuses on emerging trends in processes for fabricating MEMS and NEMS devices. The book reviews different forms of lithography, subtractive material removal processes, and additive technologies. Both top-down and bottom-up fabrication processes are exhaustively covered and the merits of the different approaches are compared. Students can use this color volume as a guide to help establish the appropriate fabrication technique for any type of micro- or nano-machine.
Download or read book Micro and Nanofabrication for Beginners written by Eiichi Kondoh and published by CRC Press. This book was released on 2022-06-13 with total page 239 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book, the fundamentals of micro- and nanofabrication are described on the basis of the concept of “using gases as a fabrication tool.” Unlike other books available on the subject, this volume assumes only entry-level mathematics, physics, and chemistry of undergraduates or high-school students in science and engineering courses. Necessary theories are plainly explained to help the reader learn about this new attractive field and enable further reading of specialized books. The book is an attractive guide for students, young engineers, and anyone getting involved in micro- and nanofabrication from various fields including physics, electronics, chemistry, and materials sciences.
Download or read book Photovoltaic Manufacturing written by Monika Freunek Muller and published by John Wiley & Sons. This book was released on 2021-08-16 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt: PHOTOVOLTAIC MANUFACTURING This book covers the state-of-the-art and the fundamentals of silicon wafer solar cells manufacturing, written by world-class researchers and experts in the field. High quality and economic photovoltaic manufacturing is central to realizing reliable photovoltaic power supplies at reasonable cost. While photovoltaic silicon wafer manufacturing is at a mature, industrial and mass production stage, knowing and applying the fundamentals in solar manufacturing is essential to anyone working in this field. This is the first book on photovoltaic wet processing for silicon wafers, both mono- and multi-crystalline. The comprehensive book provides information for process, equipment, and device engineers and researchers in the solar manufacturing field. The authors of the chapters are world-class researchers and experts in their field of endeavor. The fundamentals of wet processing chemistry are introduced, covering etching, texturing, cleaning and metrology. New developments, innovative approaches, as well as current challenges are presented. Benefits of reading the book include: The book includes a detailed discussion of the important new development of black silicon, which is considered to have started a new wave in photovoltaics and become the new standard while substantially lowering the cost. Photovoltaics are central to any country’s “New Green Deal” and this book shows how to manufacture competitively. The book’s central goal is to show photovoltaic manufacturing can be done with enhanced quality and lowering costs. Audience Engineers, chemists, physicists, process technologists, in both academia and industry, that work with photovoltaics and their manufacture.
Download or read book Integrated Fabrication of Micro and Nano scale Structures for Silicon Devices Enabled by Metal assisted Chemical Etch written by Raul Marcel Lema Galindo and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon device manufacturing, at both the micro and nanoscales, is largely performed using plasma etching techniques such as Reactive Ion Etching. Deep Reactive Ion Etching (DRIE) can be used to create high-aspect ratio nanostructures in silicon. The DRIE process suffers from low throughput, only one wafer can be processed at a time; high cost, the necessary tools and facilities for implementation are expensive; and surface defects such as sidewall taper and scalloping as a consequence of the cycling process required for high-aspect-ratio manufacturing. A potential solution to these issues consists of implementing wet-etching techniques, which do not require expensive equipment and can be implemented at a batch scale. Metal Assisted Chemical Etch is a wet-etch process that uses a metal catalyst to mediate silicon oxidation and removal in a diffusion-based process. This process has been demonstrated to work for both micro and nanoscale feature manufacturing on silicon substrates. To date, however, a single study aimed at identifying experimental conditions for successful multi-scale (integrated micro- and nanoscale) manufacturing is lacking in the literature. This mixed micro-nanoscale etching process (IMN-MACE) can enable a wide variety of applications including, for example, development of point-of-care medical diagnostic devices which rely on micro- and nano-fluidic sample processing, a growing field in the area of preventive medicine. This work developed multi-scale MACE by a systematic experimental exploration of the process space. A total of 54 experiments were performed to study the effects of the following process parameters: (i) surface silicon dioxide, (ii) metal catalyst stack, (iii) etchant solution concentration, and (iv) pre-etch sample preparation. Of these 54 experiments, 18 experiments were based on exploring nanopatterning of 100nm pillars, and the remaining 36 explored the fabrication of micropillars with a diameter between 10μm and 50μm in 5μm increments. It was determined that a single catalyst stack consisting of ~3nm Ag underneath a ~15nm Au metal layer can be used to etch high quality features at both the micro and nanoscales on a silicon substrate pre-treated with hydrogen fluoride to remove the native oxide layer from the surface. Future steps for micro-nano scale integration were also proposed
Download or read book Materials for Advanced Packaging written by Daniel Lu and published by Springer. This book was released on 2016-11-18 with total page 969 pages. Available in PDF, EPUB and Kindle. Book excerpt: Significant progress has been made in advanced packaging in recent years. Several new packaging techniques have been developed and new packaging materials have been introduced. This book provides a comprehensive overview of the recent developments in this industry, particularly in the areas of microelectronics, optoelectronics, digital health, and bio-medical applications. The book discusses established techniques, as well as emerging technologies, in order to provide readers with the most up-to-date developments in advanced packaging.
Download or read book Microfabrication and Nanomanufacturing written by Mark J. Jackson and published by CRC Press. This book was released on 2005-11-10 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology, seen as the next leap forward in the industrial revolution, requires that manufacturers develop processes that revolutionize the way small products are made. Microfabrication and Nanomanufacturing focuses on the technology of fabrication and manufacturing of engineering materials at these levels. The book provides an overview of techniques used in the semiconductor industry. It also discusses scaling and manufacturing processes operating at the nanoscale for non-semiconductor applications; the construction of nanoscale components using established lithographic techniques; bulk and surface micromachining techniques used for etching, machining, and molding procedures; and manufacturing techniques such as injection molding and hot embossing. This authoritative compilation describes non-traditional micro and nanoscale processing that uses a newly developed technique called pulsed water jet machining as well as the efficient removal of materials using optical energy. Additional chapters focus on the development of nanoscale processes for producing products other than semiconductors; the use of abrasive particles embedded in porous tools; and the deposition and application of nanocrystalline diamond. Economic factors are also presented and concern the promotion and commercialization of micro and nanoscale products and how demand will eventually drive the market.
Download or read book The Fabrication of Silicon Nanostructures Using Metal assisted Chemical Etching and Their Applications in Biomedicine written by Hashim Ziad Alhmoud and published by . This book was released on 2015 with total page 225 pages. Available in PDF, EPUB and Kindle. Book excerpt: The main aim of this thesis was to develop novel nano-scale silicon structures with useful functions for biomedicine. Metal-assisted chemical etching (MACE) of silicon offered low fabrication cost, ease of implementation, and an inherent compatibility with various patterning technologies. For these reasons, MACE was used as the primary platform of fabrication for this work. Furthermore, nanostructure patterning was mainly carried out via self-assembled nanosphere lithography, which is a low-cost and reliable method for patterning surfaces on the sub-micrometer scale.
Download or read book Micro and Nanomanufacturing written by Mark J. Jackson and published by Springer Science & Business Media. This book was released on 2007-06-19 with total page 708 pages. Available in PDF, EPUB and Kindle. Book excerpt: This, the corrected second printing of Jackson’s authoritative volume on the subject, provides a comprehensive treatment of established micro and nanofabrication techniques. It addresses the needs of practicing manufacturing engineers by applying established and research laboratory manufacturing techniques to a wide variety of materials. Nanofabrication and nanotechnology present a great challenge to engineers and researchers as they manipulate atoms and molecules to produce single artifacts and submicron components and systems. The book provides up-to-date information on a number of subjects of interest to engineers who are seeking more knowledge of how nano and micro devices are designed and fabricated. They will learn about manufacturing and fabrication techniques at the micro and nanoscales; using bulk and surface micromachining techniques, and LiGA, and deep x-ray lithography to manufacture semiconductors. Also covered are subjects including producing master molds with micromachining, the deposition of thin films, pulsed water drop machining, and nanomachining.
Download or read book Introduction to Microfabrication written by Sami Franssila and published by John Wiley & Sons. This book was released on 2010-10-29 with total page 534 pages. Available in PDF, EPUB and Kindle. Book excerpt: This accessible text is now fully revised and updated, providing an overview of fabrication technologies and materials needed to realize modern microdevices. It demonstrates how common microfabrication principles can be applied in different applications, to create devices ranging from nanometer probe tips to meter scale solar cells, and a host of microelectronic, mechanical, optical and fluidic devices in between. Latest developments in wafer engineering, patterning, thin films, surface preparation and bonding are covered. This second edition includes: expanded sections on MEMS and microfluidics related fabrication issues new chapters on polymer and glass microprocessing, as well as serial processing techniques 200 completely new and 200 modified figures more coverage of imprinting techniques, process integration and economics of microfabrication 300 homework exercises including conceptual thinking assignments, order of magnitude estimates, standard calculations, and device design and process analysis problems solutions to homework problems on the complementary website, as well as PDF slides of the figures and tables within the book With clear sections separating basic principles from more advanced material, this is a valuable textbook for senior undergraduate and beginning graduate students wanting to understand the fundamentals of microfabrication. The book also serves as a handy desk reference for practicing electrical engineers, materials scientists, chemists and physicists alike. www.wiley.com/go/Franssila_Micro2e
Download or read book Nanofabrication written by Zheng Cui (author) and published by Springer Nature. This book was released on with total page 418 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Micro Nanofabrication written by Zheng Cui and published by Springer. This book was released on 2010-10-14 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book is a collection of the author’s years of experience and research findings, as well as the latest development, in micro-nanofabrication technologies. It gives a detailed introduction on the basics of micro-nanofabrication, including optical lithography, electron beam lithography, focused ion beam technique, X-ray lithography, various etching and replication techniques. For each of the fabrication technology it introduces, the emphasis is on clear explanation of the basic principle, the essential steps in the processes, various process conditions and typical process parameters. The advantages and disadvantages of each technique are also analysed. The applications of micro-nanofabrication technologies focus on manufacturing of very large scale integrated circuits (VLSI), nanoelectronics, optoelectronics, high density magnetic storage, micro-electro-mechanical system or MEMS, biochip or lab-on-chip and nanotechnology. Each of the applications is accompanied by practical examples to demonstrate how particular fabrication techniques are applied. There is an extensive list of references following each chapter for readers to explore further. The book is not only a good supplementary reading material for university undergraduates or postgraduates who are novices in this field, but also a good reference book for experienced engineering professionals who wish to know other fabrication techniques outside their own field.
Download or read book Handbook of Porous Silicon written by Leigh Canham and published by Springer. This book was released on 2021-01-14 with total page 1000 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Porous Silicon brings together the expertise of a large, international team of almost 100 academic researchers, engineers, and product developers from industry across electronics, medicine, nutrition and consumer care to summarize the field in its entirity with 150 chapters and 5000 references. The volume presents 5 parts which cover fabrication techniques, material properties, characterization techniques, processing and applications. Much attention was given in the the past to its luminescent properties, but increasingly it is the biodegradability, mechanical, thermal and sensing capabilities that are attracting attention. The volume is divided into focussed data reviews with, wherever possible, quantitative rather than qualitative descriptions of both properties and performance. The book is targeted at undergraduates, postgraduates, and experienced researchers.
Download or read book Noble Metals written by Yen-Hsun Su and published by BoD – Books on Demand. This book was released on 2012-02-01 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a broad spectrum of insights into the optical principle, resource, fabrication, nanoscience, and nanotechnology of noble metal. It also looks at the advanced implementation of noble metal in the field of nanoscale materials, catalysts and biosystem. This book is ideal not only for scientific researchers but also as a reference for professionals in material science, engineering, nonascience and plasmonics.
Download or read book State of the Art Program on Compound Semiconductors 50 SOTAPOCS 50 and Processes at the Semiconductor Solution Interface 3 written by A. G. Baca and published by The Electrochemical Society. This book was released on 2009-05 with total page 447 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue of ECS Transactions contain the most recent developments in compound semiconductors encompassing advanced devices, materials growth, characterization, processing, device fabrication, reliability, and other related topics, as well as the most recent developments in processes at the semiconductor/solution interface including etching, oxidation, passivation, film growth, electrochemical and photoelectrochemical processes, electroluminescence, photoluminescence, and other related topics.
