Download or read book Semiconductor Lithography written by Wayne M. Moreau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 937 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Download or read book Lithography written by W. B. Wright and published by . This book was released on 1962 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Lithography written by B. W. Sansom and published by . This book was released on 1960 with total page 67 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Lithography Process Control written by Harry J. Levinson and published by SPIE Press. This book was released on 1999 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
Download or read book Chemistry and Lithography written by Uzodinma Okoroanyanwu and published by SPIE Press. This book was released on 2011-03-08 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.
Download or read book Lithography Principles and Practice written by Benjamin William SANSOM and published by . This book was released on 1960 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Download or read book Nanoimprint Lithography written by Hongbo Lan and published by Nova Science Publishers. This book was released on 2011 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Download or read book Nanotechnology Principles and Practices written by Sulabha K. Kulkarni and published by Springer. This book was released on 2014-11-03 with total page 418 pages. Available in PDF, EPUB and Kindle. Book excerpt: Given the rapid advances in the field, this book offers an up-to-date introduction to nanomaterials and nanotechnology. Though condensed into a relatively small volume, it spans the whole range of multidisciplinary topics related to nanotechnology. Starting with the basic concepts of quantum mechanics and solid state physics, it presents both physical and chemical synthetic methods, as well as analytical techniques for studying nanostructures. The size-specific properties of nanomaterials, such as their thermal, mechanical, optical and magnetic characteristics, are discussed in detail. The book goes on to illustrate the various applications of nanomaterials in electronics, optoelectronics, cosmetics, energy, textiles and the medical field and discusses the environmental impact of these technologies. Many new areas, materials and effects are then introduced, including spintronics, soft lithography, metamaterials, the lotus effect, the Gecko effect and graphene. The book also explains the functional principles of essential techniques, such as scanning tunneling microscopy (STM), atomic force microscopy (AFM), scanning near field optical microscopy (SNOM), Raman spectroscopy and photoelectron microscopy. In closing, Chapter 14, ‘Practicals’, provides a helpful guide to setting up and conducting inexpensive nanotechnology experiments in teaching laboratories.
Download or read book Practical Lithography written by Alfred Seymour and published by . This book was released on 1903 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanofabrication written by Zheng Cui and published by Springer Science & Business Media. This book was released on 2009-01-01 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides the reader with the most up-to-date information and development in the Nanofabrication area. It presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. Principles of each technology are introduced and illustrated with minimum mathematics involved. The book serves as a practical guide and first hand reference for those working in nanostructure fabrication.
Download or read book Handbook of VLSI Microlithography written by William B. Glendinning and published by William Andrew. This book was released on 2012-12-02 with total page 671 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Download or read book Field Guide to Optical Lithography written by Chris A. Mack and published by Society of Photo Optical. This book was released on 2006 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Download or read book Physical Principles of Electron Microscopy written by R.F. Egerton and published by Springer Science & Business Media. This book was released on 2006-04-28 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: Scanning and stationary-beam electron microscopes are indispensable tools for both research and routine evaluation in materials science, the semiconductor industry, nanotechnology and the biological, forensic, and medical sciences. This book introduces current theory and practice of electron microscopy, primarily for undergraduates who need to understand how the principles of physics apply in an area of technology that has contributed greatly to our understanding of life processes and "inner space." Physical Principles of Electron Microscopy will appeal to technologists who use electron microscopes and to graduate students, university teachers and researchers who need a concise reference on the basic principles of microscopy.
Download or read book Radiographic Exposure written by Jerry Ellen Wallace and published by F A Davis Company. This book was released on 1995 with total page 574 pages. Available in PDF, EPUB and Kindle. Book excerpt: Basic math review included Text and workbook in one; includes 124 practice and lab activities -- from lab experiments to crossword puzzles and word searches Activities on perforated pages can be torn out and submitted to instructor Over 500 multiple-choice review questions Numerous illustrations reinforce learning Each chapter begins with an outline and chapter objectives and ends with a summary and multiple-choice review questions
