Download or read book Medium Energy Ion Reflection from Solids written by E.S. Mashkova and published by Elsevier. This book was released on 2012-12-02 with total page 463 pages. Available in PDF, EPUB and Kindle. Book excerpt: Medium-Energy Ion Reflection from Solids
Download or read book Sputtering by Particle Bombardment written by Rainer Behrisch and published by Springer Science & Business Media. This book was released on 2007-07-26 with total page 527 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a long-needed survey of new results. Especially welcome is a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields, which is useful for researchers who need sputtering yields for physics research or applied problems. The book offers a critical review of computational methods for calculating sputtering yields and also includes molecular dynamics calculations.
Download or read book Erosion and Growth of Solids Stimulated by Atom and Ion Beams written by G. Kiriakidis and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt: The members of the organising Committee and their colleagues have, for many years been investigating the evol ution of the fas'cinating surface features which develop during sputtering erosion of solids. Such experimental, theoretical and computational studies have also been carried out in many international laboratories and, as well as much cow~onality and agreement, substantial disagreements were unresolved. In view of the increasing importance of such processes in technological applications such as microlitho graphic etching for the patterning of solid state devices and in fusion technology it was felt opportune to hold a meeting in this area. Furthermore the use of energetic atomic and ion fluxes is also becoming of increasing importance in assisting or modifying the growth of thin films in a number of important industrial processes and it was therefore rational to combine the, study of both erosional and growth processes in a single meeting. These proceedings include 16 invited review and 15 oral or poster presented contributions to the NATO Advanced Study Institute on the "Erosion and Growth of Solids Stimulated by Atom and Ion Beams". The review contributions span the range from the fundamental concepts of ballistic sputtering, and how this influences surface morphology evolution, through processes involving entrapment of incident species to mechanisms involved in'the use of chemically reactive ion species. Further reviews outline the influence of energetic irradiation upon surface growth by atomic deposition whilst others discuss technologkal applications of both areas of growth and erosion.
Download or read book Physics Of Novel Materials Proceedings Of The 10th Physics Summer School written by Mukunda Prasad Das and published by World Scientific. This book was released on 1999-03-19 with total page 395 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book contains lectures delivered at the 10th Physics Summer School on “Physics of Novel Materials” at Australian National University by internationally reputed scientists. It covers a wide variety of materials: semiconductors, superconductors, polymers, zeolites, clusters and nanostructures, and transport in novel materials. It is hard to find theoretical and experimental aspects of such diverse topics on novel materials in a single volume.
Download or read book The Physics of Micro Nano Fabrication written by Ivor Brodie and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 661 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.
Download or read book Ion Implantation in Semiconductors 1976 written by Fred Chernow and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 733 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Fifth International Conference on Ion Implantation took place in Boulder, Colorado between the 9th and 13th of August 1976. Papers were delivered by scientists and engineers from 15 countries, and the attendees represented 19 countries. As has become the custom at these conferences, the sessions were intense with the coffee breaks and evenings given to informal meetings among the participants. It was a time to renew old friendships, begin new ones, exchange ideas, personally question authors of papers that appeared in the literature since the last conference and find out what was generally happening in Ion Implantation. In recent years it has beome more difficult to get funding to travel to such meetings. To assist the participating authors financial aid was solicited from industry and the Office of Naval Research. We are most grateful for their positive response to our requests. The success of the conference was in part due to their generous contributions. The Program Committee had the unhappy task of the reviewing of more than 170 abstracts. The result of their labors was well worth their effort. Much thanks goes to them for molding the conference into an accurate representation of activities in the field. Behind the scenes in Boulder, local arrangements were handled ably by Graeme Eldridge. The difficulty of this task cannot be overemphasized. Our thanks to him for a job well done.
Download or read book Ultraviolet Photoelectron and Photoion Spectroscopy Auger Electron Spectroscopy Plasma Excitation in Spectrochemical Analysis written by G. Svehla and published by Elsevier. This book was released on 2012-12-02 with total page 325 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ultraviolet Photoelectron and Photoion Spectroscopy, Auger Electron Spectroscopy, Plasma Excitation in Spectrochemical Analysis
Download or read book Bibliography of Mass Spectroscopy Literature for 1971 written by and published by . This book was released on 1973 with total page 626 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Physics of Microfabrication written by Ivor Brodie and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 518 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Physical Electronics Department of SRI International (formerly Stanford Research Institute) has been pioneering the development of devices fabricated to submicron tolerances for well over 20 years. In 1961, a landmark paper on electron-beam lithography and its associated technologies was published by K. R. Shoulderst (then at SRI), which set the stage for our subsequent efforts in this field. He had the foresight to believe that the building of such small devices was actually within the range of human capabilities. As a result of this initial momentum, our experience in the technologies associated with microfabrication has become remarkably comprehensive, despite the relatively small size of our research activity. We have frequently been asked to deliver seminars or provide reviews on various aspects of micro fabrication. These activities made us aware of the need for a comprehensive overview of the physics of microfabrication. We hope that this book will fill that need.
Download or read book A Review Ultrahigh Vacuum Technology for Electron Microscopes written by Nagamitsu Yoshimura and published by Academic Press. This book was released on 2020-02-15 with total page 575 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Review: Ultrahigh-Vacuum Technology for Electron Microscopes provides information on the fundamentals of ultra-high vacuum systems. It covers the very subtle process that can help increase pressure inside the microscope (or inside any other ultra-high vacuum system) and the different behavior of the molecules contributing to this kind of process. Prof Yoshimura's book offers detailed information on electron microscope components, as well as UHV technology. This book is an ideal resource for industrial microscopists, engineers and scientists responsible for the design, operation and maintenance of electron microscopes. In addition, engineering students or engineers working with electron microscopes will find it useful. - Teaches how to incorporate diffusion pumps for UHV electron microscopy - Presents the work of an author who brings a lifetime of experience working on vacuum technology and electron microscopes
Download or read book Materials Analysis by Ion Channeling written by Leonard C. Feldman and published by Academic Press. This book was released on 2012-12-02 with total page 321 pages. Available in PDF, EPUB and Kindle. Book excerpt: Our intention has been to write a book that would be useful to people with a variety of levels of interest in this subject. Clearly it should be useful to both graduate students and workers in the field. We have attempted to bring together many of the concepts used in channeling beam analysis with an indication of the origin of the ideas within fundamental channeling theory. The level of the book is appropriate to senior under-graduates and graduate students who have had a modern physics course work in related areas of materials science and wish to learn more about the "channeling" probe, its strengths, weaknesses, and areas of further potential application. To them we hope we have explained this apparent paradox of using mega-electron volt ions to probe solid state phenomena that have characteristic energies of electron volts.
Download or read book Advanced Analysis of Nontraditional Machining written by Hong Hocheng and published by Springer Science & Business Media. This book was released on 2012-12-12 with total page 505 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nontraditional machining utilizes thermal, chemical, electrical, mechanical and optimal sources of energy to bind, form and cut materials. Advanced Analysis of Nontraditional Machining explains in-depth how each of these advanced machining processes work, their machining system components, and process variables and industrial applications, thereby offering advanced knowledge and scientific insight. This book also documents the latest and frequently cited research results of a few key nonconventional machining processes for the most concerned topics in industrial applications, such as laser machining, electrical discharge machining, electropolishing of die and mold, and wafer processing for integrated circuit manufacturing.
Download or read book Secondary Emission and Structural Properties of Solids written by U. A. Arifov and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 152 pages. Available in PDF, EPUB and Kindle. Book excerpt: Secondary Ion Emission from a Tungsten-Molybdenum Alloy under the Influence of Slow Ions.- Use of a Thermistor for Recording the Flow of Atoms When Studying Secondary Emission.- Potential Emission of Electrons from the (110) and (111) Faces of a Molybdenum Single Crystal under Ion Bombardment.- Electron Emission of the (110) and (111) Faces of a Molybdenum Single Crystal on Bombardment with Helium and Argon Ions and Atoms.- Negative-Ion Sputtering of Silver on Bombardment with Cs+ Ions.- Negative-Ion Sputtering of Tungsten Bombarded with Alkali Metal Ions.- Secondary Electron Emission from the.
Download or read book Vacuum Manual written by L. Holland and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 445 pages. Available in PDF, EPUB and Kindle. Book excerpt: Vacuum apparatus is widely used in research and industrial establishments for providing and monitoring the working environments required for the operation of many kinds of scientific instruments and process plant. The vacuum conditions needed range from the relatively coarse vacuum requirements in applications covering diverse fields such as food packaging, dentistry (investment casting), vacuum forming, vacuum metallur gical processes, vacuum impregnation, molecular distillation, vacuum drying and freeze drying etc. to the other extreme involving the highest possible vacuum as in particle accelerators, space technology -both in simulation and outer space, and research studies of atomically clean surfaces and pure condensed metal films. Vacua commence with the rough vacuum region, i.e. from atmosphere to 100 Pa * passing 6 through medium vacuum of 100 Pa to 0·1 Pa and high vacuum of 0·1 Pa to 1 J.lPa (10- Pa) until ultra high vacuum is reached below 1 J.lPa to the limit of measurable pressure about 12 I pPa (10- Pa).
Download or read book Some Aspects of Dose Measurement for Accurate Ion Implantation written by Douglas M. Jamba and published by . This book was released on 1977 with total page 52 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Mass Spectrometry written by R A W Johnstone and published by Royal Society of Chemistry. This book was released on 2007-10-31 with total page 370 pages. Available in PDF, EPUB and Kindle. Book excerpt: Specialist Periodical Reports provide systematic and detailed review coverage of progress in the major areas of chemical research. Written by experts in their specialist fields the series creates a unique service for the active research chemist, supplying regular critical in-depth accounts of progress in particular areas of chemistry. For over 80 years the Royal Society of Chemistry and its predecessor, the Chemical Society, have been publishing reports charting developments in chemistry, which originally took the form of Annual Reports. However, by 1967 the whole spectrum of chemistry could no longer be contained within one volume and the series Specialist Periodical Reports was born. The Annual Reports themselves still existed but were divided into two, and subsequently three, volumes covering Inorganic, Organic and Physical Chemistry. For more general coverage of the highlights in chemistry they remain a 'must'. Since that time the SPR series has altered according to the fluctuating degree of activity in various fields of chemistry. Some titles have remained unchanged, while others have altered their emphasis along with their titles; some have been combined under a new name whereas others have had to be discontinued. The current list of Specialist Periodical Reports can be seen on the inside flap of this volume.
Download or read book Lon Implantation in Semiconductors written by James Mayer and published by Elsevier. This book was released on 2012-12-02 with total page 297 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation in Semiconductors: Silicon and Germanium covers the developments in the major basic aspects in ion implantation in silicon and germanium. These aspects include dopant distribution and location, radiant damage, and electrical characteristics. This book is composed of six chapters and begins with a discussion on the factors affecting the electrical characteristics of implanted layers in silicon and germanium, such as range distributions of dopant species, lattice disorder, and location of dopant species on substitutional and interstitial sites in the lattice. The next chapters examine the basic principles of range distributions of implanted atoms and the problem of lattice disorder and radiation damage, which are vital in most implantation work. These topics are followed by an outline of the so-called channeling effect technique and its application in lattice location determination of implanted atoms. A chapter describes the dopant behavior in the layers where the majority of the implanted atoms are located, emphasizing the use of Hall-effect and sheet-resistivity measurements to determine the carrier concentration and mobility. The final chapter considers the primary characteristics of ion-implanted layers in semiconductors. This chapter also presents several rules of thumb, which allow first approximations to be made. This book is an ideal source for semiconductor specialists, researchers, and manufacturers.
