Download or read book Inductively Coupled Plasma Reactive Ion Etching ICP RIE Nanofabrication Tool for High Resolution Pattern Transfer written by and published by . This book was released on 2001 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: High resolution lithography and directional ion etching are increasingly important for the fabrication of nanostructures. As part of this equipment proposal, a reactive ion etching system was purchased from Oxford Instruments for $305,000. The Army Research Office provided $274,000, and Caltech cost share amounted to $31,500. This instrument was connected and etching conditions were optimized for the fabrication of nanostructures in silicon, silicon dioxide and gallium arsenide. In this final progress report, we will present some examples of functional devices which have been defined by using this very capable ion etching system.
Download or read book Inductively coupled Plasma Reactive Ion Etching ICP RIE with HBR and Other Etch Chemistries of SI SIGE based Resonant Interband Tunnel Diodes Grown by Low Temperature Molecular Beam Epitaxy LT MBE written by Si-Young Park and published by . This book was released on 2006 with total page 156 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: The International Technology Roadmap for Semiconductors (ITRS) forecasts that current semiconductor technology based on the mainstream silicon CMOS platform is approaching its scaling of limit. One emerging technology which may augment CMOS and extend its operational lifetime is tunneling devices together with transistors. Tunnel diode based circuits have superior performance regarding high speed operation concurrently with low power consumption. Si-based resonant interband tunnel diodes (RITD) developed by this research group that are grown epitaxially using low temperature molecular beam epitaxy (LT-MBE), now enable monolithic integration with Si CMOS and SiGe technology. This thesis focuses on the study of the plasma damage from inductively- coupled plasma reactive ion etching (ICP-RIE) processes using several different process gases, various ICP powers and substrate bias powers compared to wet etching techniques on Si-based diodes grown using low temperature molecular beam epitaxial (LT-MBE). Of particular interest and promise is an HBr etch chemistry that provides hydrogen passivation while etching. The minimization from incident ion damage and residual surface contamination during dry plasma etching is one of the key issues in modern VLSI manufacturing, especially as transistors/devices are scaled to below 50 nm lengths. Many researchers, therefore, are still developing many advanced techniques to reduce and minimize plasma damage created by dry plasma etching process.
Download or read book Nanotechnology Characterization Tools for Environment Health and Safety written by Challa S.S.R. Kumar and published by Springer Nature. This book was released on 2019-11-21 with total page 357 pages. Available in PDF, EPUB and Kindle. Book excerpt: Tenth volume of a 40 volume series on nanoscience and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about Nanotechnology Characterization Tools for Environment, Health, and Safety. Modern applications and state-of-the-art techniques are covered and make this volume an essential reading for research scientists in academia and industry.
Download or read book Inductively Coupled Plasma Etching of InP written by Hsin-Yi Chen and published by . This book was released on 2000 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Inductively coupled plasma (ICP) etching is a promising low-pressure high-density process for pattern transfer required during microelectronic and opto-electronic fabrication. In this work, an ICP system has been successfully constructed for the purpose of etching InP, a highly attractive material for applications in optical communication and high-speed integrated circuits. Different types of gas mixtures including CH4/H2, CH 4/H2/Ar, CH4/H2/N2, H 2/N2 and H2/Ar were used as plasma precursors. The influence of gas composition, RF power, total flow rate and pressure on etch rate, etch profile and surface morphology (roughening and stoichiometry) was studied. CH4/H2-based plasmas provided an anisotropic etching process with high selectivity. Surface roughening and phosphorous-depletion were yielded on etched surfaces due to an imbalance in removal of In and P. ICP etching of InP using H2/NL was demonstrated for the first time. Mirrorlike etched surfaces were obtained. A common occurrence of overcut was found on mesa sidewalls, believed to be due to SiO2 masks erosion.
Download or read book Chlorine based Plasma Etching of GaN written by and published by . This book was released on 1997 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: The wide band gap group-III nitride materials continue to generate interest in the semiconductor community with the fabrication of green, blue, and ultraviolet light emitting diodes (LEDs), blue lasers, and high temperature transistors. Realization of more advanced devices requires pattern transfer processes which are well controlled, smooth, highly anisotropic and have etch rates exceeding 0.5 [mu]m/min. The utilization of high-density chlorine-based plasmas including electron cyclotron resonance (ECR) and inductively coupled plasma (ICP) systems has resulted in improved GaN etch quality over more conventional reactive ion etch (RIE) systems.
Download or read book Nanofabrication Handbook written by Stefano Cabrini and published by CRC Press. This book was released on 2012-02-24 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt: While many books are dedicated to individual aspects of nanofabrication, there is no single source that defines and explains the total vision of the field. Filling this gap, Nanofabrication Handbook presents a unique collection of new and the most important established approaches to nanofabrication. Contributors from leading research facilities and academic institutions around the world define subfields, offer practical instructions and examples, and pave the way for future research. Helping readers to select the proper fabricating technique for their experiments, the book provides a broad vision of the most critical problems and explains how to solve them. It includes basic definitions and introduces the main underlying concepts of nanofabrication. The book also discusses the major advantages and disadvantages of each approach and offers a wide variety of examples of cutting-edge applications. Each chapter focuses on a particular method or aspect of study. For every method, the contributors describe the underlying theoretical basis, resolution, patterns and substrates used, and applications. They show how applications at the nanoscale require a different process and understanding than those at the microscale. For each experiment, they elucidate key solutions to problems relating to materials, methods, and surface considerations. A complete resource for this rapidly emerging interdisciplinary field, this handbook provides practical information for planning the experiments of any project that employs nanofabrication techniques. It gives readers a foundation to enter the complex world of nanofabrication and inspires the scientific community at large to push the limits of nanometer resolution.
Download or read book Scanning Microscopy for Nanotechnology written by Weilie Zhou and published by Springer Science & Business Media. This book was released on 2007-03-09 with total page 533 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents scanning electron microscopy (SEM) fundamentals and applications for nanotechnology. It includes integrated fabrication techniques using the SEM, such as e-beam and FIB, and it covers in-situ nanomanipulation of materials. The book is written by international experts from the top nano-research groups that specialize in nanomaterials characterization. The book will appeal to nanomaterials researchers, and to SEM development specialists.
Download or read book Dry Etching Technology for Semiconductors written by Kazuo Nojiri and published by Springer. This book was released on 2014-10-25 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
Download or read book Silicon Micromachining written by Miko Elwenspoek and published by Cambridge University Press. This book was released on 2004-08-19 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive overview of the key techniques used in the fabrication of micron-scale structures in silicon; for graduate students and researchers.
Download or read book MEMS Materials and Processes Handbook written by Reza Ghodssi and published by Springer Science & Business Media. This book was released on 2011-03-18 with total page 1211 pages. Available in PDF, EPUB and Kindle. Book excerpt: MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.
Download or read book Advances in CMP Polishing Technologies written by Toshiro Doi and published by William Andrew. This book was released on 2011-12-06 with total page 330 pages. Available in PDF, EPUB and Kindle. Book excerpt: CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering community. Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience. Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries. Demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering Explores stock removal mechanisms in CMP and polishing, and the challenges involved in predicting the outcomes of abrasive processes in high-precision environments The authors bring together the latest innovations and research from the USA and Japan
Download or read book Dry Etching for Microelectronics written by R.A. Powell and published by Elsevier. This book was released on 2012-12-02 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters.
Download or read book Photonic Microresonator Research and Applications written by Ioannis Chremmos and published by Springer. This book was released on 2010-06-09 with total page 515 pages. Available in PDF, EPUB and Kindle. Book excerpt: The technology surrounding the design and fabrication of optical microresonators has matured to a point where there is a need for commercialization. Consequently, there is a need for device research involving more advanced architectures and more esoteric operating principles. Photonic Microresonator Research and Applications explores advances in the fabrication process that enable nanometer waveguide separations, exceptionally smooth surfaces essential to reach Q factors in the order of 106- 108 and high index contrast materials.
Download or read book MEMS written by Mohamed Gad-el-Hak and published by CRC Press. This book was released on 2005-11-29 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: As our knowledge of microelectromechanical systems (MEMS) continues to grow, so does The MEMS Handbook. The field has changed so much that this Second Edition is now available in three volumes. Individually, each volume provides focused, authoritative treatment of specific areas of interest. Together, they comprise the most comprehensive collection
Download or read book Nanofabrication written by Zheng Cui and published by Springer Science & Business Media. This book was released on 2009-01-01 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides the reader with the most up-to-date information and development in the Nanofabrication area. It presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. Principles of each technology are introduced and illustrated with minimum mathematics involved. The book serves as a practical guide and first hand reference for those working in nanostructure fabrication.
Download or read book Nano and Microfabrication for Industrial and Biomedical Applications written by Regina Luttge and published by William Andrew. This book was released on 2016-06-12 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nano- and Microfabrication for Industrial and Biomedical Applications, Second Edition, focuses on the industrial perspective on micro- and nanofabrication methods, including large-scale manufacturing, the transfer of concepts from lab to factory, process tolerance, yield, robustness, and cost. The book gives a history of miniaturization and micro- and nanofabrication, and surveys industrial fields of application, illustrating fabrication processes of relevant micro and nano devices. In this second edition, a new focus area is nanoengineering as an important driver for the rise of novel applications by integrating bio-nanofabrication into microsystems. In addition, new material covers lithographic mould fabrication for soft-lithography, nanolithography techniques, corner lithography, advances in nanosensing, and the developing field of advanced functional materials. Luttge also explores the view that micro- and nanofabrication will be the key driver for a "tech-revolution" in biology and medical research that includes a new case study that covers the developing organ-on-chip concept. Presents an interdisciplinary approach that makes micro/nanofabrication accessible equally to engineers and those with a life science background, both in academic settings and commercial R&D Provides readers with guidelines for assessing the commercial potential of any new technology based on micro/nanofabrication, thus reducing the investment risk Updated edition presents nanoengineering as an important driver for the rise of novel applications by integrating bio-nanofabrication into microsystems
Download or read book Optical Microresonators written by John Heebner and published by Springer Science & Business Media. This book was released on 2008 with total page 275 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical Micro-Resonators are an exciting new field of research that has gained prominence in the past few years due to the emergence of new fabrication technologies. This book is the first detailed text on the theory, fabrication, and applications of optical micro-resonators, and will be found useful by both graduate students and researchers in the field.
