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Book In Situ Alignment System for Phase shifting Point diffraction Interferometry

Download or read book In Situ Alignment System for Phase shifting Point diffraction Interferometry written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A device and method to facilitate the gross alignment of patterned object- and image-plane masks in optical systems such as the phase-shifting point diffraction interferometer are provided. When an array of similar pinholes or discreet mask fields is used, confusion can occur over the alignment of the focused beams within the field. Adding to the mask pattern a circumscribed or inscribed set of symbols that are identifiable in situ facilitates the unambiguous gross alignment of the object- and/or image-plane masks. Alternatively, a system of markings can be encoded directly into the window shape to accomplish this same task.

Book EUV Lithography

    Book Details:
  • Author : Vivek Bakshi
  • Publisher : SPIE Press
  • Release : 2009
  • ISBN : 0819469645
  • Pages : 704 pages

Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

Book Null Test Fourier Domain Alignment Technique for Phase shifting Point Diffraction Interferometer

Download or read book Null Test Fourier Domain Alignment Technique for Phase shifting Point Diffraction Interferometer written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Alignment technique for calibrating a phase-shifting point diffraction interferometer involves three independent steps where the first two steps independently align the image points and pinholes in rotation and separation to a fixed reference coordinate system, e.g, CCD. Once the two sub-elements have been properly aligned to the reference in two parameters (separation and orientation), the third step is to align the two sub-element coordinate systems to each other in the two remaining parameters (x, y) using standard methods of locating the pinholes relative to some easy to find reference point.

Book Official Gazette of the United States Patent and Trademark Office

Download or read book Official Gazette of the United States Patent and Trademark Office written by United States. Patent and Trademark Office and published by . This book was released on 2000 with total page 1384 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Analyzing Algorithms for Nonlinear and Spatially Nonuniform Phase Shifts in the Liquid Crystal Point Diffraction Interferometer  1998 Summer Research Program for High School Juniors at the University of Rochester s Laboratory for Laser Energetics

Download or read book Analyzing Algorithms for Nonlinear and Spatially Nonuniform Phase Shifts in the Liquid Crystal Point Diffraction Interferometer 1998 Summer Research Program for High School Juniors at the University of Rochester s Laboratory for Laser Energetics written by and published by . This book was released on 1999 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt: Phase-shifting interferometry has many advantages, and the phase shifting nature of the Liquid Crystal Point Diffraction Interferometer (LCPDI) promises to provide significant improvement over other current OMEGA wavefront sensors. However, while phase-shifting capabilities improve its accuracy as an interferometer, phase-shifting itself introduces errors. Phase-shifting algorithms are designed to eliminate certain types of phase-shift errors, and it is important to chose an algorithm that is best suited for use with the LCPDI. Using polarization microscopy, the authors have observed a correlation between LC alignment around the microsphere and fringe behavior. After designing a procedure to compare phase-shifting algorithms, they were able to predict the accuracy of two particular algorithms through computer modeling of device-specific phase shift-errors.

Book Modern Developments in X Ray and Neutron Optics

Download or read book Modern Developments in X Ray and Neutron Optics written by Alexei Erko and published by Springer Science & Business Media. This book was released on 2008-04-14 with total page 540 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume describes modern developments in reflective, refractive and diffractive optics for short wavelength radiation. It also covers recent theoretical approaches to modelling and ray-tracing the x-ray and neutron optical systems. It is based on the joint research activities of specialists in x-ray and neutron optics, working together under the framework of the European Programme for Cooperation in Science and Technology (COST, Action P7) in the period 2002-2006.

Book Australian Official Journal of Patents

Download or read book Australian Official Journal of Patents written by and published by . This book was released on 2000 with total page 468 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Phase shifting Point Diffraction Interferometer Phase Grating Designs

Download or read book Phase shifting Point Diffraction Interferometer Phase Grating Designs written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Diffraction phase gratings are employed in phase-shifting point diffraction interferometers to improve the interferometric fringe contrast. The diffraction phase grating diffracts a zeroth-order diffraction of light at a first power level to the test-beam window of a mask that is positioned at the image plane and a first-order diffraction at a second power to the reference-beam pinhole. The diffraction phase grating is preferably selected to yield a desired ratio of the first power level to second power level.

Book Phase shifting Point Diffraction Interferometer Grating Designs

Download or read book Phase shifting Point Diffraction Interferometer Grating Designs written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: In a phase-shifting point diffraction interferometer, by sending the zeroth-order diffraction to the reference pinhole of the mask and the first-order diffraction to the test beam window of the mask, the test and reference beam intensities can be balanced and the fringe contrast improved. Additionally, using a duty cycle of the diffraction grating other than 50%, the fringe contrast can also be improved.

Book Applied Optics

Download or read book Applied Optics written by and published by . This book was released on 1998 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Adaptive Optics Systems and Technology

Download or read book Adaptive Optics Systems and Technology written by and published by . This book was released on 1999 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book In process Optical Metrology for Precision Machining

Download or read book In process Optical Metrology for Precision Machining written by Peter Langenbeck and published by . This book was released on 1987 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Optics Letters

Download or read book Optics Letters written by and published by . This book was released on 2006 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Optical Testing and Metrology

Download or read book Optical Testing and Metrology written by C. P. Grover and published by . This book was released on 1986 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Electrical   Electronics Abstracts

Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1997 with total page 2092 pages. Available in PDF, EPUB and Kindle. Book excerpt: