Download or read book High rate growth of hydrogenated amorphous and microcrystalline silicon for thin film silicon solar cells using dynamic very high frequency plasma enhanced chemical vapor deposition written by Thomas Zimmermann and published by Forschungszentrum Jülich. This book was released on 2013 with total page 143 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Amorphous and Microcrystalline Silicon Solar Cells Modeling Materials and Device Technology written by Ruud E.I. Schropp and published by Springer. This book was released on 2016-07-18 with total page 215 pages. Available in PDF, EPUB and Kindle. Book excerpt: Amorphous silicon solar cell technology has evolved considerably since the first amorphous silicon solar cells were made at RCA Laboratories in 1974. Scien tists working in a number of laboratories worldwide have developed improved alloys based on hydrogenated amorphous silicon and microcrystalline silicon. Other scientists have developed new methods for growing these thin films while yet others have developed new photovoltaic (PV) device structures with im proved conversion efficiencies. In the last two years, several companies have constructed multi-megawatt manufacturing plants that can produce large-area, multijunction amorphous silicon PV modules. A growing number of people be lieve that thin-film photovoltaics will be integrated into buildings on a large scale in the next few decades and will be able to make a major contribution to the world's energy needs. In this book, Ruud E. I. Schropp and Miro Zeman provide an authoritative overview of the current status of thin film solar cells based on amorphous and microcrystalline silicon. They review the significant developments that have occurred during the evolution of the technology and also discuss the most im portant recent innovations in the deposition of the materials, the understanding of the physics, and the fabrication and modeling of the devices.
Download or read book Crystalline and Non crystalline Solids written by Pietro Mandracci and published by BoD – Books on Demand. This book was released on 2016-06-29 with total page 186 pages. Available in PDF, EPUB and Kindle. Book excerpt: The structural properties of materials play a fundamental role in the determination of their suitability for a specific application. This book is intended as a contribution to the efforts to increase the knowledge of the influence exerted on the properties of materials by their crystalline or amorphous structure. To this aim, some of the materials that are most promising for their use in different technological fields have been studied, namely graphene, titanium oxide, several types of functional metal oxides, porphyrinic crystalline solids, plasma deposited polymers, amorphous silicon, as well as hydrogenated amorphous carbon. These materials have been presented by the authors for their use in different applications, including microelectronics, photonics, and biomedicine.
Download or read book Light Trapping with Plasmonic Back Contacts in Thin Film Silicon Solar Cells written by Ulrich Wilhelm Paetzold and published by Forschungszentrum Jülich. This book was released on 2013 with total page 195 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ab Initio Investigation of Ground states and Ionic Motion in Particular in Zirconia based Solid oxide Electrolytes written by Julian Arndt Hirschfeld and published by Forschungszentrum Jülich. This book was released on 2013 with total page 161 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Long Term Stability and Permeability of Mixed Ion Conducting Membranes under Oxyfuel Conditions written by Xiaoyu Li and published by Forschungszentrum Jülich. This book was released on 2014-03-20 with total page 161 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keine Angaben
Download or read book IEK 3 Report 2013 Durable Electrochemical Process Engineering written by Forschungszentrum Jülich Institut für Energie- und Klimaforschung Elektrochemische Verfahrenstechnik and published by Forschungszentrum Jülich. This book was released on 2013 with total page 188 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Applied Science Technology Index written by and published by . This book was released on 2000 with total page 1688 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1997 with total page 1860 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Plasma Deposition of Amorphous Silicon Based Materials written by Pio Capezzuto and published by Elsevier. This book was released on 1995-10-10 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Download or read book International Aerospace Abstracts written by and published by . This book was released on 1998 with total page 920 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Remote Plasma Chemical Vapor Deposition for High Efficiency Heterojunction Solar Cells on Low Cost Ultra thin Semiconductor on metal Substrates written by Emmanuel U. Onyegam and published by . This book was released on 2014 with total page 242 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the crystalline Si solar cell industry, there is a push to reduce module cost through a combination of thinner substrates and increased cell efficiency. Achieving solar cells with sub-100 [greek small letter mu]m substrates cost-effectively is a formidable task because such thin substrates impose stringent handling requirements and thermal budget due to their flexibility, ease of breakage, and low yield. Moreover, as the substrate thickness decreases the surface passivation quality dictates the performance of the cells. Crystalline Si heterojunction (HJ) solar cells based on hydrogenated amorphous silicon (a-Si:H) have attracted significant interest in recent years due to their excellent surface passivation properties, potential for high efficiency, low thermal budget and low cost. HJ cells with ultra-passivated surfaces showing > 700 mV open-circuit voltages (Voc) and > 20% conversion efficiency have been demonstrated. In these cells, it has been identified that high-quality a-Si:H films deposited by a low-damage plasma process is key to achieving such high cell performance. However, the options for low-damage plasma deposition process are limited. The main objectives of this work are to develop a low-plasma damage a-Si:H thin film deposition process based on remote plasma chemical vapor deposition (RPCVD) and to demonstrate high efficiency HJ solar cells on bulk substrates as well as on ultra-thin silicon and germanium substrates obtained by a novel, low-cost semiconductor-on-metal (SOM) technology. This manuscript presents a detailed description of the RPCVD system and the process leading to the realization of high quality a-Si:H thin films and high efficiency HJ solar cells. First, p-type a-Si:H thin films are developed and optimized, then HJ solar cells are subsequently fabricated on bulk and ultra-thin Si and Ge SOM substrates without intrinsic a-Si:H passivation. Single HJ cells on ~ 500 μm bulk Si and ~25 μm ultra-thin substrates exhibited conversion efficiencies of [greek small letter eta] = 16% (Voc = 615 mV, Jsc = 34 mA/cm2, and FF = 77%) and [greek small letter eta] = 11.2% (Voc = 605 mV, Jsc = 29.6 mA/cm2, and FF = 62.8%), respectively. The performance of the ~25 [greek small letter mu] m cell was further improved to [greek small letter eta] = 13.4% (Voc = 645 mV, Jsc = 31.4 mA/cm2, and FF = 66.2%) by implementing the dual HJ architecture without front side i-layer passivation. For single HJ cells based on Ge substrates, the results were [greek small letter eta] = 1.78 % (Voc = 148 mV, Jsc = 35.1 mA/cm2, and FF = 1.78%) on ~500 [greek small letter mu]m bulk Ge, compared to [greek small letter eta] =5.3% (Voc = 203 mV, Jsc = 44.7 mA/cm2, and FF = 5.28%) on ~ 50 μm Ge SOM substrates. Respectively, the results obtained on ultra-thin SOM substrates are among the highest reported in literature for based on comparable architecture and substrate thickness. In order to achieve improved cell performance, dual HJ cells with i-layer passivation of both surfaces were fabricated. First, optimized RPCVD-based i-layer films were developed by varying the deposition temperature and H2 dilution ratio (R). It was found that excellent surface passivation on planar substrates with as-deposited minority carrier lifetimes > 1 ms is achievable by using deposition temperature of 200 oC and moderate dilution ratio 0.5 ≤ R ≤ 1, even without the more rigorous RCA pre-cleaning process typically used in literature for achieving comparable results. Subsequently, dual HJ solar cells with i-layer films were demonstrated on planar and textured bulk Si substrates showing improved conversion efficiencies of [greek small letter eta] = 17.3% (Voc = 664 mV, Jsc = 34.34 mA/cm2 and FF = 76%) and [greek small letter eta] = 19.4% (Voc = 643 mV, Jsc = 38.99 mA/cm2, and FF = 77.5%), respectively.
Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1420 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Development of Large area Amorphous Silicon Photovoltaic Cells on a Flexible Substrate written by John Frederick Currie and published by . This book was released on 1989 with total page 348 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Hydrogenated Microcrystalline Silicon Deposited by VHF GD for Thin Film Solar Cells written by Pedro Torres and published by . This book was released on 1999 with total page 86 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Science Abstracts written by and published by . This book was released on 1992 with total page 1228 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book High Density Plasma Enhanced Chemical Vapor Deposition of Si Based Materials for Solar Cell Applications written by H. P. Zhou and published by . This book was released on 2016 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: High-quality and low-cost fabrication of Si-based materials, in which many fundamental and technology problems still remain, have attracted tremendous interests due to their wide applications in solar cell area. Low-frequency inductively coupled plasma (LFICP) provides a new and competitive solution, thanks to its inherent advantages of high-density plasma, low sheath potential, and low electron temperature, et cetera The plasma characteristic-dependent microstructures, optical and electronic properties of the LFICP CVD-based hydrogenated amorphous/microcrystalline silicon and silicon oxides are systematically studied. Remote-LFICP combing the high-density plasma nature of ICP and mild ion bombardment on growing surface in remote plasma allows the deposition of high-quality Si-based materials providing excellent c-Si surface passivation. The mechanism of surface passivation by LFICP CVD Si-based materials, interaction between plasma species and growing surface are analyzed in terms of the plasma properties. These results pave the way for LFICP CVD utilization in Si-based high-efficiency and low-cost solar cell fabrication.
