Download or read book High power Extreme Ultraviolet Source Based on Gas Jets written by and published by . This book was released on 1998 with total page 11 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authors report on the development of a high power laser plasma Extreme Ultraviolet (EUV) source for Extreme Ultraviolet Lithography. The source is based on the plasma emission of a recycled jet beam of large Xe clusters and produces no particulate debris. The source will be driven by a pulsed laser delivering 1,500 W of focused average power to the cluster jet target. To develop condensers and to optimize source performance, a low power laboratory cluster jet prototype has been used to study the spectroscopy, angular distributions, and EUV source images of the cluster jet plasma emission. In addition, methods to improve the reflectance lifetimes of nearby plasma facing condenser mirrors have been developed. The resulting source yields EUV conversion efficiencies up to 3.8% and mirror lifetimes of 109 plasma pulses.
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Download or read book Soft X Rays and Extreme Ultraviolet Radiation written by David Attwood and published by Cambridge University Press. This book was released on 2007-02-22 with total page 611 pages. Available in PDF, EPUB and Kindle. Book excerpt: This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Download or read book Future Trends in Microelectronics written by Serge Luryi and published by John Wiley & Sons. This book was released on 2013-06-13 with total page 370 pages. Available in PDF, EPUB and Kindle. Book excerpt: Leaders in the field predict the future of the microelectronics industry This seventh volume of Future Trends in Microelectronics summarizes and synthesizes the latest high-level scientific discussions to emerge from the Future Trends in Microelectronics international workshop, which has occurred every three years since 1995. It covers the full scope of cutting-edge topics in microelectronics, from new physical principles (quantum computing, correlated electrons), to new materials (piezoelectric nanostructures, terahertz plasmas), to emerging device technologies (embedded magnetic memories, spin lasers, and biocompatible microelectronics). An ideal book for microelectronics professionals and students alike, this volume of Future Trends in Microelectronics: Identifies the direction in which microelectronics is headed, enabling readers to move forward with research in an informed, efficient, and profitable manner Includes twenty-nine contributor chapters by international authorities from leading universities, major semiconductor companies, and government laboratories Provides a unified, cohesive exploration of various trends in microelectronics, looking to future opportunities, rather than past successes
Download or read book Supersonic Cluster Jet Source for Debris free Extreme Ultraviolet Production written by and published by . This book was released on 1997 with total page 14 pages. Available in PDF, EPUB and Kindle. Book excerpt: The supersonic cluster jet has been developed and characterized for use as a target medium to produce a clean source of extreme ultraviolet radiation for extreme ultraviolet lithography and other applications. Spectroscopic characterization of the laser plasma emission produced from Xe, O2 and Kr cluster gas targets has been performed. Xe is the most efficient target gas, exhibiting a conversion efficiency at 13.5 nm of 0.8% into the relevant 2.5% spectral bandwidth. The other target gases are less efficient in the spectral region of interest and, in the case of oxygen, emit (approximately)5 times less off-band radiation. The angular distribution of the Xe plasma emission has also been characterized.
Download or read book Nanofabrication written by Ampere A. Tseng and published by World Scientific. This book was released on 2008 with total page 583 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students.Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices.
Download or read book Extreme Ultraviolet EUV Holographic Metrology for Lithography Applications written by Sang-hun Yi and published by . This book was released on 2000 with total page 332 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 838 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 2005 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A Source of Extreme Ultraviolet Light Based on High Harmonic Generation in Noble Gases written by Peter Šušnjar and published by . This book was released on 2016 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Technologies for Extreme Ultraviolet and Soft X ray Coherent Sources written by Federico Canova and published by Springer. This book was released on 2015-08-17 with total page 205 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Download or read book High Energy and Short Pulse Lasers written by Richard Viskup and published by BoD – Books on Demand. This book was released on 2016-09-07 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book gives the readers an introduction to experimental and theoretical knowledge acquired by large-scale laser laboratories that are dealing with extra-high peak power and ultrashort laser pulses for research of terawatt (TW), petawatt (PW), or near-future exawatt (EW) laser interactions, for soft X-ray sources, for acceleration of particles, or for generation of hot dense thermal plasma for the laser fusion. The other part of this book is dealing with the small-scale laser laboratories that are using for its research on commercial sources of laser radiation, nanosecond (ns), picosecond (ps), or femtosecond (fs) laser pulses, either for basic research or for more advanced applications. This book is divided into six main sections dealing with short and ultrashort laser pulses, laser-produced soft X-ray sources, large-scale high-power laser systems, free-electron lasers, fiber-based sources of short optical pulse, and applications of short pulse lasers. In each chapter readers can find fascinating topics related to the high energy and/or short pulse laser technique. Individual chapters should serve the broad spectrum of readers of different expertise, layman, undergraduate and postgraduate students, scientists, and engineers, who may in this book find easily explained fundamentals as well as advanced principles of particular subjects related to these phenomena.
Download or read book Enhancement Cavities for the Generation of Extreme Ultraviolet and Hard X Ray Radiation written by Henning Carstens and published by Springer. This book was released on 2018-06-22 with total page 103 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis discusses the power scaling of ultrashort pulses in enhancement cavities, utilized in particular for frequency conversion processes, such as Thomson scattering and high-harmonic generation. Using custom optics for ultrashort-pulse enhancement cavities, it demonstrates for the first time that at the envisaged power levels, the mitigation of thermal effects becomes indispensable even in cavities comprising solely reflective optics. It also studies cavities with large beams, albeit with low misalignment sensitivity, as a way to circumvent intensity-induced mirror damage. Average powers of several hundred kilowatts are demonstrated, which benefit hard x-ray sources based on Thomson scattering. Furthermore, pulses as short as 30 fs were obtained at more than 10 kW of average power and employed for high-harmonic generation with photon energies exceeding 100 eV at 250 MHz repetition rate, paving the way for frequency comb spectroscopy in this spectral region.
Download or read book Soft X ray and EUV Imaging Systems written by and published by . This book was released on 2001 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Characterization of the Critical Dimension Error Budget for Extreme Ultraviolet Lithography written by Jason Phillip Cain and published by . This book was released on 2004 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Download or read book Recent Advances in Nanofabrication Techniques and Applications written by Bo Cui and published by BoD – Books on Demand. This book was released on 2011-12-02 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
