Download or read book Handbook of Critical Dimension Metrology and Process Control written by Kevin M. Monahan and published by . This book was released on 1994 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Handbook of Silicon Semiconductor Metrology written by Alain C. Diebold and published by CRC Press. This book was released on 2001-06-29 with total page 703 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay

Download or read book Handbook of Critical Dimension Metrology and Process Control written by Kevin M. Monahan and published by SPIE-International Society for Optical Engineering. This book was released on 1994 with total page 376 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Download or read book A Century of Excellence in Measurements Standards and Technology written by David R. Lide and published by CRC Press. This book was released on 2018-02-06 with total page 872 pages. Available in PDF, EPUB and Kindle. Book excerpt: Established by Congress in 1901, the National Bureau of Standards (NBS), now the National Institute of Standards and Technology (NIST), has a long and distinguished history as the custodian and disseminator of the United States' standards of physical measurement. Having reached its centennial anniversary, the NBS/NIST reflects on and celebrates its first century with this book describing some of its seminal contributions to science and technology. Within these pages are 102 vignettes that describe some of the Institute's classic publications. Each vignette relates the context in which the publication appeared, its impact on science, technology, and the general public, and brief details about the lives and work of the authors. The groundbreaking works depicted include: A breakthrough paper on laser-cooling of atoms below the Doppler limit, which led to the award of the 1997 Nobel Prize for Physics to William D. Phillips The official report on the development of the radio proximity fuse, one of the most important new weapons of World War II The 1932 paper reporting the discovery of deuterium in experiments that led to Harold Urey's1934 Nobel Prize for Chemistry A review of the development of the SEAC, the first digital computer to employ stored programs and the first to process images in digital form The first paper demonstrating that parity is not conserved in nuclear physics, a result that shattered a fundamental concept of theoretical physics and led to a Nobel Prize for T. D. Lee and C. Y. Yang "Observation of Bose-Einstein Condensation in a Dilute Atomic Vapor," a 1995 paper that has already opened vast new areas of research A landmark contribution to the field of protein crystallography by Wlodawer and coworkers on the use of joint x-ray and neutron diffraction to determine the structure of proteins

Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and published by . This book was released on 1997 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Handbook of Microlithography Micromachining and Microfabrication Microlithography written by P. Rai-Choudhury and published by IET. This book was released on 1997 with total page 784 pages. Available in PDF, EPUB and Kindle. Book excerpt: Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.

Download or read book National Semiconductor Metrology Program Semiconductor Electronics Division NIST List Of Publications LP 103 March 1999 written by and published by . This book was released on 1999 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book National Semiconductor Metrology Program NIST List OF Publications LP 103 May 2000 written by and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Lithography Process Control written by Harry J. Levinson and published by SPIE Press. This book was released on 1999 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.

Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2017-12-19 with total page 1720 pages. Available in PDF, EPUB and Kindle. Book excerpt: Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Download or read book Handbook of Photomask Manufacturing Technology written by Syed Rizvi and published by CRC Press. This book was released on 2018-10-03 with total page 728 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.

Download or read book Applied Scanning Probe Methods I written by Bharat Bhushan and published by Springer Science & Business Media. This book was released on 2014-02-26 with total page 485 pages. Available in PDF, EPUB and Kindle. Book excerpt: Examining the physical and technical foundation for recent progress with this technique, Applied Scanning Probe Methods offers a timely and comprehensive overview of SPM applications, now that industrial applications span topographic and dynamical surface studies of thin-film semiconductors, polymers, paper, ceramics, and magnetic and biological materials. First it lays the theoretical background of static and dynamic force microscopies, including sensor technology and tip characterization, contributions detail applications such as macro- and nanotribology, polymer surfaces, and roughness investigations. The final part on industrial research addresses special applications of scanning force nanoprobes such as atomic manipulation and surface modification, as well as single electron devices based on SPM.

Download or read book NIST Special Publication written by and published by . This book was released on 1988 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Integrated Circuit Metrology Inspection and Process Control written by Kevin M. Monahan and published by . This book was released on 1987 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Metrology Inspection and Process Control for Microlithography written by and published by . This book was released on 2001 with total page 914 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.