Download or read book Growth and Characterization of Amorphous Ultrathin Ruthenium Metal Films written by Daniel Edgar Bost and published by . This book was released on 2017 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt: Copper interconnect systems in modern microelectronics require the use of one or more liner layers and a capping layer in order to prevent copper diffusion into the other materials of the device. Ruthenium has been suggested as a replacement for the currently-standard Ta/TaN stack used for this purpose due to its low bulk diffusivity of copper and its good adhesion to both substrate materials and copper, but at very low thicknesses the polycrystalline nature of pure Ru allows for diffusion of copper along grain boundaries, resulting in the failure of the barrier. Because amorphous metal alloys do not form grains, amorphous Ru alloys have been examined as a way to eliminate the grain boundary diffusion of copper across the film. Early attempts to produce such films with phosphorus as an alloying element by chemical vapor deposition (CVD) using Ru3(CO)12 and organic phosphorus precursors such as trimethylphosphine have performed well relative to Ta/TaN as a barrier layer at 5 nm thickness. However, high concentrations of carbon were incorporated into the films during CVD by the P precursors. Carbon increases the resistivity of Ru(P) and adds an unnecessary element to the calculated structure of the amorphous alloy. To reduce resistivity, lower-carbon Ru(P) alloy films are grown at 250 °C using Ru3(CO)12 and a hydride gas (PH3) as the P precursor. Diborane (B2H6) is used to grow an alternate alloy, Ru(B). Ru(P) and Ru(B) alloys are predicted by first-principles calculations to be amorphous above 20 at.% P for Ru(P) and 10 at.% B for Ru(B). Growth studies revealed amorphous Ru(P) above 17 at.% P and amorphous Ru(B) above 10 at.% B, with polycrystalline films formed at lower concentrations. Both Ru(P) and Ru(B) are found to deposit as smooth, continuous films at the 3 nm thickness. Metal-insulator-semiconductor (MIS) capacitor structures consisting of copper / amorphous alloy / SiO2 / Si / Al stacks were used to test barrier performance under electrical stress. This testing confirms that the amorphous Ru films perform adequately as Cu diffusion barriers.

Download or read book Growth and Characterization of Ultrathin Films of Iron Oxide written by Lawrence E. Scipioni and published by . This book was released on 1996 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Growth of Ultra thin Ruthenium and Ruthenium Alloy Films for Copper Barriers written by Wen Liao and published by . This book was released on 2016 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Growth and Characterization of Ru Films Deposited by Chemical Vapor Deposition written by Kelly Marriott Thom and published by . This book was released on 2009 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt: As device dimensions in integrated circuits scale down, there is an increasing need to deposit ultra-thin, smooth, continuous films for use in applications such as the liner in back end processing. The liner must have good adhesion to both Cu and the dielectric, act as a Cu diffusion barrier, and be conductive enough to allow the electroplating of Cu. Ruthenium (Ru) has been considered as a possible material to be implemented into the liner due to its low electrical resistivity, high thermal and chemical stability, and negligible solubility with copper. Chemical vapor deposition (CVD) is an attractive growth technique for Ru films because it allows conformal deposition in high-aspect ratio features. However, there are some limitations that must be overcome in the deposition of Ru films. CVD Ru films suffer from poor nucleation on oxide and nitride substrates. Poor nucleation leads to rough, large-grained polycrystalline columnar films, which may not coalesce into a continuous film until the thickness greatly exceeds the requirements for the liner. This dissertation presents surface chemistry and film growth studies involving Ru CVD and focuses on improving the nucleation and properties of Ru films. In situ surface analysis techniques including X-ray photoelectron spectroscopy (XPS) and temperature programmed desorption (TPD) were used to study the fundamental adsorption behavior of the Ru precursor, (2,4- dimethylpentadienyl)(ethylcyclopentadienyl)Ru or DER, on polycrystalline Ta, both with and without iodine adsorbed on the Ta. Based upon these results, CVD films were grown using DER/O2, and it was shown that nucleation and film properties can be improved by the addition of methyl iodide. Ru films grown using DER/O2 show sparse nucleation, which leads to very rough surface topography and large polycrystalline columnar grains. The addition of methyl iodide during growth significantly improves nucleation and results in smoother, smaller-grained films. Iodine adsorbs on the initially-formed Ru islands and continuously segregates through the film to the surface during the entire deposition. In addition, CVD films grown with Ru3(CO)12 were studied. Use of the Ru3(CO)12 precursor results in thin, ultra-smooth films that show little to no columnar grain structure.

Download or read book Controlling Nucleation and Growth of Ultra thin Ruthenium Films in Chemical Vapor Deposition written by Wen Liao (Ph. D.) and published by . This book was released on 2016 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt: As feature sizes in microelectronic devices decrease, ultra-thin (

Download or read book Preparation and Characterization of Amorphous Transition Metal rare Earth Thin Films written by Philip Richard Frausto and published by . This book was released on 1988 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Growth and Characterization of Ultra Thin Vanadium Oxide Films written by Fangfang Song and published by . This book was released on 2014 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Growth Epitaxy and Reactivity of Ultrathin Metal Films on a Metal Oxide Surface written by Lei Zhang and published by . This book was released on 1999 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 1044 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Metals Abstracts written by and published by . This book was released on 1996 with total page 1628 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Advanced Metallization Conference in written by and published by . This book was released on 2007 with total page 730 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Dissertation Abstracts International written by and published by . This book was released on 2008 with total page 1006 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1180 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Bell Laboratories Talks and Papers written by Bell Telephone Laboratories. Libraries and Information Systems Center and published by . This book was released on 1979 with total page 462 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Advances in Metal Oxides and Their Composites for Emerging Applications written by Sagar D. Delekar and published by Elsevier. This book was released on 2022-08-26 with total page 745 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in Metal Oxides and their Composites for Emerging Applications reviews key properties of metal-oxide based composites, including their structural, physicochemical, optical, electrical components and resulting performance in a wide range of diverse applications. Synthetic protocols used to create metal oxides with desirable morphologies, properties and performance for applications in solar energy harvesting, energy storage and environmental remediation are emphasized. Emerging technologies that address important global challenges such as energy shortage, the hazardous effects of non-renewable energy sources, unaffordable energy technologies, and the contaminants present in air and water are also covered. This book is an ideal resource for materials scientists and engineers working in academia and R&D. In addition, it's appropriate for those who either need an introduction to potential research directions or for experienced researchers and practitioners looking for a key reference on the latest advances. - Introduces the fundamental properties of metal oxide-based composites, paying special attention to physicochemical, optical, electrical and structural characteristics - Provides an overview of the synthetic protocols used to design and tune the properties of metal oxide-based composites for key emerging applications - Discusses metal oxide-based composites and their use in energy applications such as energy storage, energy harvesting and environmental remediation

Download or read book BTL Talks and Papers written by Bell Telephone Laboratories, inc. Technical Information Libraries and published by . This book was released on 1979 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt: