Download or read book Experimental Measurements of Spatial Particle Removal from Silicon Wafers by Megasonic Energy written by Ching-Hsu Yang and published by . This book was released on 2001 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing written by Jerzy Rużyłło and published by The Electrochemical Society. This book was released on 1998 with total page 668 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2001 with total page 818 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Particle Control for Semiconductor Manufacturing written by Donovan and published by CRC Press. This book was released on 1990-01-26 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: There is something Alice-in-Wonderlandish about powerful and vital computer systems being shut down by a microscopic mote that a hay-feverist wouldn't sneeze at, but as computer chips get smaller, smaller and smaller particles on their surface have a larger and larger effect on their performance. In
Download or read book Ultra Clean Processing of Silicon Surfaces written by and published by . This book was released on 2004 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation written by Michael Liehr and published by . This book was released on 1995 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: Wafer cleaning, microcontamination and surface passivation are the key focus of this proceedings volume, the 3rd in a successful series from MRS. It is a field in which control of surface chemistry and surface morphology, as well as particle and molecular contamination removal, are of critical importance. This volume expands the scope of the topic to include ultraclean technology in a broader sense, emphasizing the identification and characterization of trace contamination, strategies for removal, and equipment considerations, as well as critical limits for impact on devices. Novel processes, such as chemical mechanical polishing (CMP), and their ramifications for contamination removal are also addressed.
Download or read book Journal of the IES written by and published by . This book was released on 1997 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1997 with total page 2304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Particle Adhesion and Removal written by K. L. Mittal and published by John Wiley & Sons. This book was released on 2015-01-06 with total page 482 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book provides a comprehensive and easily accessible reference source covering all important aspects of particle adhesion and removal. The core objective is to cover both fundamental and applied aspects of particle adhesion and removal with emphasis on recent developments. Among the topics to be covered include: 1. Fundamentals of surface forces in particle adhesion and removal. 2. Mechanisms of particle adhesion and removal. 3. Experimental methods (e.g. AFM, SFA,SFM,IFM, etc.) to understand particle-particle and particle-substrate interactions. 4. Mechanics of adhesion of micro- and nanoscale particles. 5. Various factors affecting particle adhesion to a variety of substrates. 6. Surface modification techniques to modulate particle adhesion. 7. Various cleaning methods (both wet & dry) for particle removal. 8. Relevance of particle adhesion in a host of technologies ranging from simple to ultra-sophisticated.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1994-10 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Engineering Index Annual written by and published by . This book was released on 1994 with total page 2398 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since its creation in 1884, Engineering Index has covered virtually every major engineering innovation from around the world. It serves as the historical record of virtually every major engineering innovation of the 20th century. Recent content is a vital resource for current awareness, new production information, technological forecasting and competitive intelligence. The world?s most comprehensive interdisciplinary engineering database, Engineering Index contains over 10.7 million records. Each year, over 500,000 new abstracts are added from over 5,000 scholarly journals, trade magazines, and conference proceedings. Coverage spans over 175 engineering disciplines from over 80 countries. Updated weekly.
Download or read book Handbook of Photovoltaic Silicon written by Deren Yang and published by Springer. This book was released on 2019-11-28 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The utilization of sun light is one of the hottest topics in sustainable energy research. To efficiently convert sun power into a reliable energy – electricity – for consumption and storage, silicon and its derivatives have been widely studied and applied in solar cell systems. This handbook covers the photovoltaics of silicon materials and devices, providing a comprehensive summary of the state of the art of photovoltaic silicon sciences and technologies. This work is divided into various areas including but not limited to fundamental principles, design methodologies, wafering techniques/fabrications, characterizations, applications, current research trends and challenges. It offers the most updated and self-explanatory reference to all levels of students and acts as a quick reference to the experts from the fields of chemistry, material science, physics, chemical engineering, electrical engineering, solar energy, etc..
Download or read book Developments in Surface Contamination and Cleaning written by Rajiv Kohli and published by Elsevier. This book was released on 2008-01-10 with total page 1209 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are ôkiller defectsö today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated.• Excellent reference for a host of technologies and industries ranging from microelectronics to optics to automotive to biomedical.• A single source document addressing everything from the sources of contamination to their removal and prevention.• Amply referenced and profusely illustrated.
Download or read book Colloidal Dispersions written by William Bailey Russel and published by Cambridge University Press. This book was released on 1991 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers the physical side of colloidal science from the individual forces acting between particles smaller than a micrometer that are suspended in a liquid, through the resulting equilibrium and dynamic properties. A variety of internal forces both attractive and repulsive act in conjunction with Brownian motion and the balance between them all decides the phase behaviour. On top of this various external fields, such as gravity or electromagnetic fields, diffusion and non-Newtonian rheology produce complex effects, each of which is of important scientific and technological interest. The authors aim to impart a sound, quantitative understanding based on fundamental theory and experiments with well-characterised model systems. This broad grasp of the fundamentals lends insight and helps to develop the intuitive sense needed to isolate essential features of the technological problems and design critical experiments. The main prerequisites for understanding the book are basic fluid mechanics, statistical mechanics and electromagnetism, though self contained reviews of each subject are provided at appropriate points. Some facility with differential equations is also necessary. Exercises are included at the end of each chapter, making the work suitable as a textbook for graduate courses in chemical engineering or applied mathematics. It will also be useful as a reference for individuals in academia or industry undertaking research in colloid science.
Download or read book Laser Technology written by K. L. Mittal and published by John Wiley & Sons. This book was released on 2018-01-22 with total page 420 pages. Available in PDF, EPUB and Kindle. Book excerpt: The acronym Laser is derived from Light Amplification by Stimulated Emission of Radiation. With the advent of the ruby laser in 1960, there has been tremendous research activity in developing novel, more versatile and more efficient laser sources or devices, as lasers applications are ubiquitous. Today, lasers are used in many areas of human endeavor and are routinely employed in a host of diverse fields: various branches of engineering, microelectronics, biomedical, medicine, dentistry, surgery, surface modification, to name just a few. In this book (containing 10 chapters) we have focused on application of lasers in adhesion and related areas. The topics covered include: Topographical modification of polymers and metals by laser ablation to create superhydrophobic surfaces. Non-ablative laser surface modification. Laser surface modification to enhance adhesion. Laser surface engineering of materials to modulate their wetting behavior. Laser surface modification in dentistry. Laser polymer welding. Laser based adhesion testing technique to measure thin film-substrate interface toughness. Laser surface removal of hard thin ceramic coatings. Laser removal of particles from surfaces. Laser induced thin film debonding for micro-device fabrication applications.
Download or read book Advances in Chemical Mechanical Planarization CMP written by Babu Suryadevara and published by Woodhead Publishing. This book was released on 2021-09-10 with total page 650 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. - Reviews the most relevant techniques and processes for CMP of dielectric and metal films - Includes chapters devoted to CMP for current and emerging materials - Addresses consumables and process control for improved CMP, including post-CMP
Download or read book Chemical Mechanical Planarization of Semiconductor Materials written by M.R. Oliver and published by Springer Science & Business Media. This book was released on 2004-01-26 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.
