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Book Er doped Amorphous and Crystalline Al sub 2 O sub 3  and La sub 2 O sub 3  Films Grown with Low Energy Ions from an ECR Plasma

Download or read book Er doped Amorphous and Crystalline Al sub 2 O sub 3 and La sub 2 O sub 3 Films Grown with Low Energy Ions from an ECR Plasma written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The effects of low energy ions from a biased electron cyclotron resonance plasma during growth of Al[sub 2]O[sub 3] and La[sub 2]O[sub 3] are used to modify the density and crystalline quality of these oxide films. The type of phase formed for Al[sub 2]O[sub 3] is varied with the ion-assisted growth from amorphous to crystalline[gamma]-Al[sub 2]O[sub 3]. The photoluminescence (PL) properties of different Er-doped Al- and La-oxide phases are examined and through comparison of the PL spectra, the local environment of Er in these oxide materials is discussed.

Book Er doped Amorphous and Crystalline Al2O3 and La2O3 Films Grown with Low Energy Ions from an ECR Plasma

Download or read book Er doped Amorphous and Crystalline Al2O3 and La2O3 Films Grown with Low Energy Ions from an ECR Plasma written by and published by . This book was released on 1996 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: The effects of low energy ions from a biased electron cyclotron resonance plasma during growth of Al2O3 and La2O3 are used to modify the density and crystalline quality of these oxide films. The type of phase formed for Al2O3 is varied with the ion-assisted growth from amorphous to crystalline [gamma]-Al2O3. The photoluminescence (PL) properties of different Er-doped Al- and La-oxide phases are examined and through comparison of the PL spectra, the local environment of Er in these oxide materials is discussed.

Book ECR Plasma assisted Deposition of Al sub 2 O sub 3  and Dispersion strengthened AlO sub 2

Download or read book ECR Plasma assisted Deposition of Al sub 2 O sub 3 and Dispersion strengthened AlO sub 2 written by and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron cyclotron resonance (ECR) O[sub 2] plasmas, in conjunction with electron-beam evaporation of Al, were used to grow thick AlO[sub x] films were varying but controlled composition and microstructure. The ion energy was varied from 30 to 190 eV, and growth temperatures varied from 35[degrees]C to 400[degrees]C. The ECR-film compositions were varied from AlO[sub 0.1] to Al[sub 2]O[sub 3] by controlling the plasma parameters and Al deposition rate. The Al-rich alloys exhibited a fine-grain (10-100 nm) fcc Al microstructure with [gamma]-Al[sub 2]O[sub 3] precipitates ([approximately]1 nm), similar to that found in the gigapascal-strength O-implanted Al. The measured hardness of the ECR Al-O alloys ([approximately]3 GPa) was also similar to the ion-implanted alloys which implies that the yield strength of the ECR material is [approximately]1 GPa. Moreover, the Al-O alloys retain much of the elasticity of the Al metal matrix. As-deposited stoichiometric Al[sub 2]O[sub 3] samples grown with an applied bias of -140 to -160 V at 400[degrees]C were fine-grain polycrystalline [gamma]-Al[sub 2]O[sub 3]. The amorphous films crystallized into the [gamma]-Al[sub 2]O[sub 3] phase upon vacuum annealing to 800[degrees]C.

Book Atomic Layer Deposition for Semiconductors

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Book Electrical   Electronics Abstracts

Download or read book Electrical Electronics Abstracts written by and published by . This book was released on 1997 with total page 1904 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book ECR Plasma assisted Deposition of Al2O3 and Dispersion strengthened AlO2

Download or read book ECR Plasma assisted Deposition of Al2O3 and Dispersion strengthened AlO2 written by and published by . This book was released on 1995 with total page 25 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book The Engineering Index Annual

Download or read book The Engineering Index Annual written by and published by . This book was released on 1994 with total page 2398 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since its creation in 1884, Engineering Index has covered virtually every major engineering innovation from around the world. It serves as the historical record of virtually every major engineering innovation of the 20th century. Recent content is a vital resource for current awareness, new production information, technological forecasting and competitive intelligence. The world?s most comprehensive interdisciplinary engineering database, Engineering Index contains over 10.7 million records. Each year, over 500,000 new abstracts are added from over 5,000 scholarly journals, trade magazines, and conference proceedings. Coverage spans over 175 engineering disciplines from over 80 countries. Updated weekly.

Book High Growth Rate Deposition of Hydrogenated Amorphous Silicon Germanium Films and Devices Using ECR PECVD

Download or read book High Growth Rate Deposition of Hydrogenated Amorphous Silicon Germanium Films and Devices Using ECR PECVD written by and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Hydrogenated amorphous silicon germanium films (a-SiGe:H) and devices have been extensively studied because of the tunable band gap for matching the solar spectrum and mature the fabrication techniques. a-SiGe:H thin film solar cells have great potential for commercial manufacture because of very low cost and adaptability to large-scale manufacturing. Although it has been demonstrated that a-SiGe:H thin films and devices with good quality can be produced successfully, some issues regarding growth chemistry have remained yet unexplored, such as the hydrogen and inert-gas dilution, bombardment effect, and chemical annealing, to name a few. The alloying of the SiGe introduces above an order-of-magnitude higher defect density, which degrades the performance of the a-SiGe:H thin film solar cells. This degradation becomes worse when high growth-rate deposition is required. Preferential attachment of hydrogen to silicon, clustering of Ge and Si, and columnar structure and buried dihydride radicals make the film intolerably bad. The work presented here uses the Electron-Cyclotron-Resonance Plasma-Enhanced Chemical Vapor Deposition (ECR-PECVD) technique to fabricate a-SiGe:H films and devices with high growth rates. Helium gas, together with a small amount of H[sub 2], was used as the plasma species. Thickness, optical band gap, conductivity, Urbach energy, mobility-lifetime product, I-V curve, and quantum efficiency were characterized during the process of pursuing good materials. The microstructure of the a-(Si, Ge):H material was probed by Fourier-Transform Infrared spectroscopy. They found that the advantages of using helium as the main plasma species are: (1) high growth rate--the energetic helium ions break the reactive gas more efficiently than hydrogen ions; (2) homogeneous growth--heavy helium ions impinging on the surface promote the surface mobility of the reactive radicals, so that heteroepitaxy growth as clustering of Ge and Si, columnar structure are reduced; (3) surface hydrogen removal--heavier and more energetic helium ions break the Si-H much easier than hydrogen ions. The preferential attachment of Si-H to Ge-H is reduced. They also found that with the small amount of hydrogen put into the plasma, the superior properties of a-(Si, Ge):H made from pure hydrogen dilution plasma were still maintained. These hydrogen ions help to remove the subsurface weakly bonded hydrogen and buried hydrogen. They also help to passivate the Ge-dangling bond.

Book Ceramic Abstracts

    Book Details:
  • Author : American Ceramic Society
  • Publisher :
  • Release : 1996
  • ISBN :
  • Pages : 1000 pages

Download or read book Ceramic Abstracts written by American Ceramic Society and published by . This book was released on 1996 with total page 1000 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Physics Briefs

Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1420 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Morphology and Microstructure of  111  Crystalline CeO sub 2  Films Grown on Amorphous SiO sub 2  Substrates by Pulsed laser Ablation

Download or read book Morphology and Microstructure of 111 Crystalline CeO sub 2 Films Grown on Amorphous SiO sub 2 Substrates by Pulsed laser Ablation written by and published by . This book was released on 1994 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: The surface morphology and microstructure of (111)-oriented CeO2 thin films, grown on amorphous fused silica (SiO2 substrates by low-energy-ion-beam assisted pulsed laser ablation, have been studied by atomic force microscopy (AFM) and x-ray diffraction (XRD). These CeO2 films are aligned with respect to a single in-plane axis despite being deposited on an amorphous substrate. There is a honeycomb-like growth morphology to the films and island-growth can be observed in thicker films. These islands, inside of which are high density of honeycomb-like clusters, are separated by a void network with ∼700 nm width. However, on the surface of the thinnest film (∼3 nm), only very small clusters (diameter

Book International Aerospace Abstracts

Download or read book International Aerospace Abstracts written by and published by . This book was released on 1997 with total page 940 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book The Growth and Doping of Al As Sb by Metal organic Chemical Vapor Deposition

Download or read book The Growth and Doping of Al As Sb by Metal organic Chemical Vapor Deposition written by and published by . This book was released on 1996 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book MO PECVD  metal organic Plasma Enhanced Chemical Vapour Deposition  of Erbium doped Hydrogenated and Deuterated Amorphous Carbon

Download or read book MO PECVD metal organic Plasma Enhanced Chemical Vapour Deposition of Erbium doped Hydrogenated and Deuterated Amorphous Carbon written by Raymond Tsai and published by . This book was released on 2008 with total page 182 pages. Available in PDF, EPUB and Kindle. Book excerpt: Erbium-doped hydrogenated and deuterated amorphous carbon (a-C:H(Er) and a-C:D(Er)) is fabricated through controlled thermal evaporation of metal-organic compounds in a hydrocarbon discharge generated by the DC saddle-field plasma enhanced chemical vapour deposition system. Er photoluminescence (PL) is successfully demonstrated for the first time in Er-doped deuterated amorphous carbon (a-C:D(Er)). Uniform distribution of optically active Er 3+ ions is attained by using tris(2,2,6,6-tetramethyl-3-5-heptanedionato) Erbium(III) (Er(tmhd)3) compound as revealed by XPS analysis. Er(tmhd) 3 is observed to be a preferred dopant over Erbium(III) 2,4-pentanedionate (Er(acac)3). Deuteration of amorphous carbon has effectively removed the PL quenching effect caused by non-radiative C-H and O-H vibrational transitions. An improvement factor of 4.4 is observed in the minimum doping level of Er required to attain PL in a-C:D(Er), compared to a-C:H(Er). The results of this thesis suggest that a-C:D(Er) material can potentially be used for silicon-compatible opto-electronics applications in 1.5 mum region.

Book Oriented Niobate Ferroelectric Thin Films for Electrical and Optical Devices and Method of Making Such Films

Download or read book Oriented Niobate Ferroelectric Thin Films for Electrical and Optical Devices and Method of Making Such Films written by and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Sr.sub.x Ba.sub. 1-x Nb.sub. 2 O.sub. 6, where x is greater than 0.25 and less than 0.75, and KNbO.sub. 3 ferroelectric thin films metalorganic chemical vapor deposited on amorphous or crystalline substrate surfaces to provide a crystal axis of the film exhibiting a high dielectric susceptibility, electro-optic coefficient, and/or nonlinear optic coefficient oriented preferentially in a direction relative to a crystalline or amorphous substrate surface. Such films can be used in electronic, electro-optic, and frequency doubling components.

Book Photovoltaic and Photoactive Materials

Download or read book Photovoltaic and Photoactive Materials written by Joseph M. Marshall and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 361 pages. Available in PDF, EPUB and Kindle. Book excerpt: The primary objective of this NATO Advanced Study Institute (ASI) was to present an up-to-date overview of various current areas of interest in the field of photovoltaic and related photoactive materials. This is a wide-ranging subject area, of significant commercial and environmental interest, and involves major contributions from the disciplines of physics, chemistry, materials, electrical and instrumentation engineering, commercial realisation etc. Therefore, we sought to adopt an inter disciplinary approach, bringing together recognised experts in the various fields while retaining a level of treatment accessible to those active in specific individual areas of research and development. The lecture programme commenced with overviews of the present relevance and historical development of the subject area, plus an introduction to various underlying physical principles of importance to the materials and devices to be addressed in later lectures. Building upon this, the ASI then progressed to more detailed aspects of the subject area. We were also fortunately able to obtain a contribution from Thierry Langlois d'Estaintot of the European Commission Directorate, describing present and future EC support for activities in this field. In addition, poster sessions were held throughout the meeting, to allow participants to present and discuss their current activities. These were supported by what proved to be very effective feedback sessions (special thanks to Martin Stutzmann), prior to which groups of participants enthusiastically met (often in the bar) to identify and agree topics of common interest.