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Book Electrical Properties of R F  Sputtered Thin Oxide Films

Download or read book Electrical Properties of R F Sputtered Thin Oxide Films written by H. W. Hilou and published by . This book was released on 1985 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Structural and Electrical Properties of Radio Frequency Sputtered Fluorine Doped Zinc Oxide Films

Download or read book Structural and Electrical Properties of Radio Frequency Sputtered Fluorine Doped Zinc Oxide Films written by Adam S. Bowen and published by . This book was released on 2009 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt: Deposits, by radio frequency magnetron sputtering disposition, thin films of fluorine doped zinc oxide onto polyethylene naphthalate and glass substrates at room temperature. Studies of the effects of post disposition annealing by argon and a gas mixture of argon and hydrogen on the structural and electrical properties of the films deposited on polyethylene naphthalate and glass.

Book Electrical and Optical Properties of RF Sputtered Tin Oxide Films

Download or read book Electrical and Optical Properties of RF Sputtered Tin Oxide Films written by Sarah Eunkyung Kim and published by . This book was released on 1993 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Selected Electrical Properties of R f  Sputtered Al2O3 Cr2O3 Thin Films

Download or read book Selected Electrical Properties of R f Sputtered Al2O3 Cr2O3 Thin Films written by Bryant Coffin Bechtold and published by . This book was released on 1975 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Rf Sputtered Aluminum Oxide Films on Silicon

Download or read book Rf Sputtered Aluminum Oxide Films on Silicon written by C. A. T. Salama and published by . This book was released on 1970 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: The physical and electrical properties of aluminum oxide films deposited on silicon by rf sputtering from an alumina target in an argon atmosphere were investigated as a function of sputtering power density in the range from 0.5 to 3 W/sq cm. The deposition rates ranged from 20 to 80 A/min. The density, index of refraction, and dielectric constant of the films increased while the etch rate decreased with increasing power density. The surface charge at the aluminum oxide-silicon interface was typically larger than 10 to the 12th. This charge increased with increasing sputtering power density and could be reduced to 7-8 x 10 to the 11th e/sq cm by annealing. The films exhibited trapping instabilities at room temperature but no polarization was observed under biastemperature stress. The characteristics of composite layers of thermally grown silicon dioxide and sputtered aluminum oxide layers on silicon were also investigated and found to exhibit low surface charge densities, no hysteresis, and a 'contact potential' as well as charge stored at the interface between the two insulators. (Author).

Book The Effect of RF Sputtering Deposition Parameters on the Functional Properties of Chrom Ium Oxide Thin Films

Download or read book The Effect of RF Sputtering Deposition Parameters on the Functional Properties of Chrom Ium Oxide Thin Films written by John Gerald Kavanagh and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: An investigation was made into the effect of rf magnetron deposition parameters on the resulting properties of chromium oxide thin films. The films were sputtered in an argon/ oxygen plasma environment with the main deposition parameters being the argon and oxygen flow rate, chamber pressure, deposition-time and the deposition power (forward and back). Tire effect of the sputter deposition regime which is controlled by the sputtering hysteresis phenomenon i.e. the reactive and metallic regimes, are expected to have a significant effect on the properties of the sputtered films and will have to be taken into account. The films were deposited on a range of substrates such as silicon, glass micro-slides and stainless steel 304 and the composition of the mainly amorphous sputtered films was determined through XPS, EDX and XRD. Optical characterisation and determination of optical constants was undertaken by transmission/reflection spectrophotometry, ellipsometry and Raman and FTIR analysis. Two designs of a solar thermal absorber (multilayer interference and tandem absorber) were designed and fabricated based on the optical constants measured by the methods previously stated and their performance analysed. The surface energy was calculated through measurement of the contact angle with three different liquids and the corrosion resistance of the films measured by OCP, linear sweep and EIS analysis in 3.5wt% NaCI solution. The mechanical properties were measured by nanoindentation, from which the hardness and elastic modulus of the samples could be obtained. The electrical properties were measured using a four point probe to calculate the thin film resistivity and the Kelvin probe analysis was used to measure the work function of the samples.

Book RF  Sputtered Cadmium Oxide Thin Films for Gas Sensing Application

Download or read book RF Sputtered Cadmium Oxide Thin Films for Gas Sensing Application written by Anil Kumar Gadipelly and published by LAP Lambert Academic Publishing. This book was released on 2015-02-04 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.

Book Electrical Properties of RF Magnetron sputtered Insulating Silicon Nitride Thin Films

Download or read book Electrical Properties of RF Magnetron sputtered Insulating Silicon Nitride Thin Films written by Shamshad Akhtar Awan and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Investigation on Electrical Properties of RF Sputtered Deposited BCN Thin Films

Download or read book Investigation on Electrical Properties of RF Sputtered Deposited BCN Thin Films written by Adithya Prakash and published by . This book was released on 2013 with total page 53 pages. Available in PDF, EPUB and Kindle. Book excerpt: The ever increasing advancements in semiconductor technology and continuous scaling of CMOS devices mandate the need for new dielectric materials with low-k values. The interconnect delay can be reduced not only by the resistance of the conductor but also by decreasing the capacitance of dielectric layer. Also cross-talk is a major issue faced by semiconductor industry due to high value of k of the inter-dielectric layer (IDL) in a multilevel wiring scheme in Si ultra large scale integrated circuit (ULSI) devices. In order to reduce the time delay, it is necessary to introduce a wiring metal with low resistivity and a high quality insulating film with a low dielectric constant which leads to a reduction of the wiring capacitance. Boron carbon nitride (BCN) films are prepared by reactive magnetron sputtering from a B4C target and deposited to make metal-insulator-metal (MIM) sandwich structures using aluminum as the top and bottom electrodes. BCN films are deposited at various N2/Ar gas flow ratios, substrate temperatures and process pressures. The electrical characterization of the MIM devices includes capacitance vs. voltage (C-V), current vs voltage, and breakdown voltage characteristics. The above characterizations are performed as a function of deposition parameters.

Book Radio Frequency Sputtered Gallium Tin Zinc Oxide Films and Thin Film Transistors

Download or read book Radio Frequency Sputtered Gallium Tin Zinc Oxide Films and Thin Film Transistors written by Robert A. Alston and published by . This book was released on 2010 with total page 124 pages. Available in PDF, EPUB and Kindle. Book excerpt: Investigates radio frequency sputtered gallium tin zinc oxide (GSZO) thin films for transparent conducting oxides and thin film transistors fabricated using these channel layers. Examines GSZO films sputtered on 7059 glass and polyethylene naphthalate substrates to investigate their electrical and mechanical properties. Studies GSZO thin film transistors and their annealing effects.

Book STRUCTURE AND ELECTRICAL PROPERTIES OF RF SPUTTER DEPOSITED INDIUM ANTIMON IDE THIN FILMS

Download or read book STRUCTURE AND ELECTRICAL PROPERTIES OF RF SPUTTER DEPOSITED INDIUM ANTIMON IDE THIN FILMS written by and published by . This book was released on 1976 with total page 70 pages. Available in PDF, EPUB and Kindle. Book excerpt: During the last few years, sputtering has become a very important industrial technique for depositing thin films. Typical applications include metalization and passivation in the electronics industry, the deposition of complex cermets, glasses, and plastics, and the formation of coatings for corrosion, abrasion, and wear resistance. However, relatively little work has been reported on the growth of compound semiconducting films by sputtering.

Book Springer Handbook of Electronic and Photonic Materials

Download or read book Springer Handbook of Electronic and Photonic Materials written by Safa Kasap and published by Springer. This book was released on 2017-10-04 with total page 1536 pages. Available in PDF, EPUB and Kindle. Book excerpt: The second, updated edition of this essential reference book provides a wealth of detail on a wide range of electronic and photonic materials, starting from fundamentals and building up to advanced topics and applications. Its extensive coverage, with clear illustrations and applications, carefully selected chapter sequencing and logical flow, makes it very different from other electronic materials handbooks. It has been written by professionals in the field and instructors who teach the subject at a university or in corporate laboratories. The Springer Handbook of Electronic and Photonic Materials, second edition, includes practical applications used as examples, details of experimental techniques, useful tables that summarize equations, and, most importantly, properties of various materials, as well as an extensive glossary. Along with significant updates to the content and the references, the second edition includes a number of new chapters such as those covering novel materials and selected applications. This handbook is a valuable resource for graduate students, researchers and practicing professionals working in the area of electronic, optoelectronic and photonic materials.

Book Electrical  Optical and Structural Properties of Indium Tin Oxide Thin Films Deposited on Glass  Pet and Polycarbonate Substrates by Rf Sputtering

Download or read book Electrical Optical and Structural Properties of Indium Tin Oxide Thin Films Deposited on Glass Pet and Polycarbonate Substrates by Rf Sputtering written by Teck-Shiun Lim and published by . This book was released on 199? with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Book Transparent Oxide Electronics

Download or read book Transparent Oxide Electronics written by Pedro Barquinha and published by John Wiley & Sons. This book was released on 2012-03-15 with total page 348 pages. Available in PDF, EPUB and Kindle. Book excerpt: Transparent electronics is emerging as one of the most promising technologies for the next generation of electronic products, away from the traditional silicon technology. It is essential for touch display panels, solar cells, LEDs and antistatic coatings. The book describes the concept of transparent electronics, passive and active oxide semiconductors, multicomponent dielectrics and their importance for a new era of novel electronic materials and products. This is followed by a short history of transistors, and how oxides have revolutionized this field. It concludes with a glance at low-cost, disposable and lightweight devices for the next generation of ergonomic and functional discrete devices. Chapters cover: Properties and applications of n-type oxide semiconductors P-type conductors and semiconductors, including copper oxide and tin monoxide Low-temperature processed dielectrics n and p-type thin film transistors (TFTs) – structure, physics and brief history Paper electronics – Paper transistors, paper memories and paper batteries Applications of oxide TFTs – transparent circuits, active matrices for displays and biosensors Written by a team of renowned world experts, Transparent Oxide Electronics: From Materials to Devices gives an overview of the world of transparent electronics, and showcases groundbreaking work on paper transistors