Download or read book Electrical and Optical Properties of RF Sputtered ZnO Thin Films written by Farkhund Shakeel Mahmood and published by . This book was released on 1996 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Structural and Electrical Properties of Radio Frequency Sputtered Fluorine Doped Zinc Oxide Films written by Adam S. Bowen and published by . This book was released on 2009 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt: Deposits, by radio frequency magnetron sputtering disposition, thin films of fluorine doped zinc oxide onto polyethylene naphthalate and glass substrates at room temperature. Studies of the effects of post disposition annealing by argon and a gas mixture of argon and hydrogen on the structural and electrical properties of the films deposited on polyethylene naphthalate and glass.

Download or read book Optical Properties of Zinc Oxide ZnO Thin Film by RF Magnetron Sputtering written by Khairul Nadzrin Rosli and published by . This book was released on 2006 with total page 67 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Investigations of the Electrical and Optical Properties of RF Sputtered Bismuth Oxide Thin Films written by Haydar Mahmoud Salih and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Electrical and Optical Properties of RF Sputtered Tin Oxide Films written by Sarah Eunkyung Kim and published by . This book was released on 1993 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book ZnO Thin Films written by Paolo Mele and published by . This book was released on 2019 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Zinc oxide (ZnO) is an n-type semiconductor with versatile applications such as optical devices in ultraviolet region, piezoelectric transducers, transparent electrode for solar cells and gas sensors. This book "ZnO Thin Films: Properties, Performance and Applications" gives a deep insight in the intriguing science of zinc oxide thin films. It is devoted to cover the most recent advances and reviews the state of the art of ZnO thin films applications involving energy harvesting, microelectronics, magnetic devices, photocatalysis, photovoltaics, optics, thermoelectricity, piezoelectricity, electrochemistry, temperature sensing. It serves as a fundamental information source on the techniques and methodologies involved in zinc oxide thin films growth, characterization, post-deposition plasma treatments and device processing. This book will be invaluable to the experts to consolidate their knowledge and provide insight and inspiration to beginners wishing to learn about zinc oxide thin films.

Download or read book ZnO Thin Films for Optoelectronic Applications written by Prasada Rao Talakonda and published by LAP Lambert Academic Publishing. This book was released on 2013 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt: Zinc oxide (ZnO) thin films have good electro-optical properties suitable for opto-electronic applications. The present study explains the deposition and characterization of n-type and p-type ZnO thin films by spray pyrolysis. The films were characterized by different methods to understand their structural, optical and electrical properties. Gallium was chosen as the impurity dopant in ZnO films to improve the electrical properties. The electrical conductivity, carrier concentration and mobility of Ga doped ZnO (GZO) films were highly improved in comparison to undoped ZnO films. The GZO films showed good optical transmittance in the visible region. The electrical and optical results suggest that the GZO films are suitable to use as a TCO in optoelectronic industries. The p-type ZnO thin films were successesfully realized using dual acceptor method. The Hall measurements and room temperature photolumiscence results were supported p-type nature of (Li, N): ZnO thin films.

Download or read book Nanostructured Metal Oxides and Devices written by M. K. Jayaraj and published by Springer Nature. This book was released on 2020-04-16 with total page 348 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book primarily covers the fundamental science, synthesis, characterization, optoelectronic properties, and applications of metal oxide nanomaterials. It discusses the basic aspects of synthetic procedures and fabrication technologies, explains the related experimental techniques and also elaborates on the current status of nanostructured oxide materials and related devices. Two major aspects of metal oxide nanostructures – their optical and electrical properties – are described in detail. The first five chapters focus on the optical characteristics of semiconducting materials, especially metal oxides at the nanoscale. The following five chapters discuss the electrical properties observed in metal oxide-based semiconductors and the status quo of device-level developments in a variety of applications such as sensors, transistors, dilute magnetic semiconductors, and dielectric materials. The basic science and mechanism behind the optoelectronic phenomena are explained in detail, to aid readers interested in the structure–property symbiosis in semiconducting nanomaterials. In short, the book offers a valuable reference guide for researchers and academics in the areas of material science and semiconductor technology, especially nanophotonics and electronics.

Download or read book Ion Beam Modification of Solids written by Werner Wesch and published by Springer. This book was released on 2016-07-14 with total page 547 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. It provides a review of the physical basics of ion-solid interaction and on ion-beam induced structural modifications of solids. Ion beams are widely used to modify the physical properties of materials. A complete theory of ion stopping in matter and the calculation of the energy loss due to nuclear and electronic interactions are presented including the effect of ion channeling. To explain structural modifications due to high electronic excitations, different concepts are presented with special emphasis on the thermal spike model. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed. The effect of nuclear and electronic energy loss on structural modifications of solids such as damage formation, phase transitions and amorphization is reviewed for insulators and semiconductors. Finally some selected applications of ion beams are given.

Download or read book A Fundamental Study of the Electrical and Optical Properties of Thin film R f sputter deposited Cu doped ZnTe written by Timothy Arthur Gessert and published by . This book was released on 1996 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Structural Optical and Electrical Properties of RF Sputtered Hg0 5Cd0 25 Te Thin Films written by Philip William Diodato and published by . This book was released on 1980 with total page 348 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Spectrochemical Analysis written by James D. Ingle and published by . This book was released on 1988 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Sr/Grad-level text on analytical spectrometric methods. Emphasizes general principles and quantitative expressions for signals and signal-to-noise ratio. Instrumentation methodology and performance characteristics for all major optical, atomic, and molecular techniques are discussed.

Download or read book Optical Properties of AI doped ZnO AZO Thin Film Prepared by RF Magnetron Sputtering written by Siti Rosmariam Mohd. Bokry and published by . This book was released on 2009 with total page 52 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Zinc Oxide Bulk Thin Films and Nanostructures Processing Properties and Applications written by Chennupati Jagadish and published by Elsevier Science. This book was released on 2006-09 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: With an in-depth exploration of the following topics, this book covers the broad uses of zinc oxide within the fields of materials science and engineering: - Recent advances in bulk, thin film and nanowire growth of ZnO (including MBE, MOCVD and PLD), - The characterization of the resulting material (including the related ternary systems ZgMgO and ZnCdO), - Improvements in device processing modules (including ion implantation for doping and isolation, Ohmic and Schottky contacts, wet and dry etching), - The role of impurities and defects on materials properties - Applications of ZnO in UV light emitters/detectors, gas, biological and chemical-sensing, transparent electronics, spintronics and thin film

Download or read book Structural Electrical and Optical Properties of Transparent Conducting Si doped ZnO Thin Films Grown by Pulsed Laser Deposition written by and published by . This book was released on 2009 with total page 98 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Electrical Properties of Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering written by ld Siti Maryam Ghazali and published by . This book was released on 2009 with total page 78 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book An Investigation of the Performance and Stability of Zinc Oxide Thin film Transistors and the Role of High k Dielectrics written by Ngwashi Divine Khan and published by . This book was released on 2010 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Transparent oxide semiconducting films have continued to receive considerable attention, from a fundamental and application-based point of view, primarily because of their useful fundamental properties. Of particular interest is zinc oxide (ZnO), an n-type semiconductor that exhibits excellent optical, electrical, catalytic and gas-sensing properties, and has many applications in various fields. In this work, thin film transistor (TFT) arrays based on ZnO have been prepared by reactive radio frequency (RF) magnetron sputtering. Prior to the TFT fabrication, ZnO layers were sputtered on to glass and silicon substrates, and the deposition parameters optimised for electrical resistivities suitable for TFT applications. The sputtering process was carried out at room temperature with no intentional heating. The aim of this work is to prepare ZnO thin films with stable semiconducting electrical properties to be used as the active channel in TFTs; and to understand the role of intrinsic point defects in device performance and stability. The effect of oxygen (O2) adsorption on TFT device characteristics is also investigated. The structural quality of the material (defect type and concentration), electrical and optical properties (transmission/absorption) of semiconductor materials are usually closely correlated. Using the Vienna ab-initio simulation package (VASP), it is predicted that O2 adsorption may influence film transport properties only within a few atomic layers beneath the adsorption site. These findings were exploited to deposit thin films that are relatively stable in atmospheric ambient with improved TFT applications. TFTs incorporating the optimised layer were fabricated and demonstrated very impressive performance metrics, with effective channel mobilities as high as 30 cm2/V-1s-1, on-off current ratios of 107 and sub-threshold slopes of 0.9? 3.2 V/dec. These were found to be dependent on film thickness (~15? 60 nm) and the underlying dielectric (silicon dioxide (SiO2), gadolinium oxide (Gd2O3), yttrium oxide (Y2O3) and hafnium oxide (HfO2)). In this work, prior to sputtering the ZnO layer (using a ZnO target of 99.999 % purity), the sputtering chamber was evacuated to a base pressure ~4 x 10-6 Torr. Oxygen (O2) and argon (Ar) gas (with O2/Ar ratio of varying proportions) were then pumped into the chamber and the deposition process optimised by varying the RF power between 25 and 500 W and the O2/Ar ratio between 0.010 to 0.375. A two-level factorial design technique was implemented to test specific parameter combinations (i.e. RF power and O2/Ar ratio) and then statistical analysis was utilised to map out the responses. The ZnO films were sputtered on glass and silicon substrates for transparency and resistivity measurements, and TFT fabrication respectively. For TFT device fabrication, ZnO films were deposited onto thermally-grown silicon dioxide (SiO2) or a high-k dielectric layer (HfO2, Gd2O3 and Y2O3) deposited by a metal-organic chemical deposition (MOCVD) process. Also, by using ab initio simulation as implemented in the?Vienna ab initio simulation package (VASP)?, the role of oxygen adsorption on the electrical stability of ZnO thin film is also investigated. The results indicate that O2 adsorption on ZnO layers could modify both the electronic density of states in the vicinity of the Fermi level and the band gap of the film. This study is complemented by studying the effects of low temperature annealing in air on the properties of ZnO films. It is speculated that O2 adsorption/desorption at low temperatures (150? 350 0C) induces variations in the electrical resistance, band gap and Urbach energy of the film, consistent with the trends predicted from DFT results.