Download or read book Design for Manufacturability Through Design process Integration II written by and published by . This book was released on 2008 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Design for Manufacturability Through Design process Integration written by Alfred Kwok-Kit Wong and published by SPIE-International Society for Optical Engineering. This book was released on 2007 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Download or read book Recent Topics on Modeling of Semiconductor Processes Devices and Circuits written by Rasit Onur Topaloglu and published by Bentham Science Publishers. This book was released on 2011-09-09 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The last couple of years have been very busy for the semiconductor industry and researchers. The rapid speed of production channel length reduction has brought lithographic challenges to semiconductor modeling. These include stress optimization, transisto"
Download or read book Electronic Design Automation for IC Implementation Circuit Design and Process Technology written by Luciano Lavagno and published by CRC Press. This book was released on 2017-02-03 with total page 798 pages. Available in PDF, EPUB and Kindle. Book excerpt: The second of two volumes in the Electronic Design Automation for Integrated Circuits Handbook, Second Edition, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology thoroughly examines real-time logic (RTL) to GDSII (a file format used to transfer data of semiconductor physical layout) design flow, analog/mixed signal design, physical verification, and technology computer-aided design (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability (DFM) at the nanoscale, power supply network design and analysis, design modeling, and much more. New to This Edition: Major updates appearing in the initial phases of the design flow, where the level of abstraction keeps rising to support more functionality with lower non-recurring engineering (NRE) costs Significant revisions reflected in the final phases of the design flow, where the complexity due to smaller and smaller geometries is compounded by the slow progress of shorter wavelength lithography New coverage of cutting-edge applications and approaches realized in the decade since publication of the previous edition—these are illustrated by new chapters on 3D circuit integration and clock design Offering improved depth and modernity, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology provides a valuable, state-of-the-art reference for electronic design automation (EDA) students, researchers, and professionals.
Download or read book Design for Manufacturability Through Design process Integration V written by Michael L. Rieger and published by . This book was released on 2011 with total page 332 pages. Available in PDF, EPUB and Kindle. Book excerpt: Includes Proceedings Vol. 7821
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 838 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Download or read book Design Rules in a Semiconductor Foundry written by Eitan N. Shauly and published by CRC Press. This book was released on 2022-11-30 with total page 831 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nowadays over 50% of integrated circuits are fabricated at wafer foundries. This book presents a foundry-integrated perspective of the field and is a comprehensive and up-to-date manual designed to serve process, device, layout, and design engineers. It comprises chapters carefully selected to cover topics relevant for them to deal with their work. The book provides an insight into the different types of design rules (DRs) and considerations for setting new DRs. It discusses isolation, gate patterning, S/D contacts, metal lines, MOL, air gaps, and so on. It explains in detail the layout rules needed to support advanced planarization processes, different types of dummies, and related utilities as well as presents a large set of guidelines and layout-aware modeling for RF CMOS and analog modules. It also discusses the layout DRs for different mobility enhancement techniques and their related modeling, listing many of the dedicated rules for static random-access memory (SRAM), embedded polyfuse (ePF), and LogicNVM. The book also provides the setting and calibration of the process parameters set and describes the 28~20 nm planar MOSFET process flow for low-power and high-performance mobile applications in a step-by-step manner. It includes FEOL and BEOL physical and environmental tests for qualifications together with automotive qualification and design for automotive (DfA). Written for the professionals, the book belongs to the bookshelf of microelectronic discipline experts.
Download or read book Design for Manufacturability Through Design process Integration VII written by Mark E. Mason and published by . This book was released on 2013-04-18 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.
Download or read book Design for Manufacturability Through Design process Integration VI written by Mark E. Mason and published by SPIE-International Society for Optical Engineering. This book was released on 2012 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt: Includes Proceedings Vol. 7821
Download or read book Sustainable Design Through Process Integration written by Mahmoud M. El-Halwagi and published by Butterworth-Heinemann. This book was released on 2017-08-08 with total page 618 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sustainable Design through Process Integration: Fundamentals and Applications to Industrial Pollution Prevention, Resource Conservation, and Profitability Enhancement, Second Edition, is an important textbook that provides authoritative, comprehensive, and easy-to-follow coverage of the fundamental concepts and practical techniques on the use of process integration to maximize the efficiency and sustainability of industrial processes. The book is ideal for adoption in process design and sustainability courses. It is also a valuable guidebook to process, chemical, and environmental engineers who need to improve the design, operation, performance, and sustainability of industrial plants. The book covers pressing and high growth topics, including benchmarking process performance, identifying root causes of problems and opportunities for improvement, designing integrated solutions, enhancing profitability, conserving natural resources, and preventing pollution. Written by one of the world’s foremost authorities in integrated process design and sustainability, the new edition contains new chapters and updated materials on various aspects of process integration and sustainable design. The new edition is also packed with numerous new examples and industrial applications. Allows the reader to methodically develop rigorous targets that benchmark the performance of industrial processes then develop cost-effective implementations Contains state-of-the-art process integration and improvement approaches and techniques including graphical, algebraic, and mathematical methods Covers topics and applications that include profitability enhancement, mass and energy conservation, synthesis of innovative processes, retrofitting of existing systems, design and assessment of water, energy, and water-energy-nexus systems, and reconciliation of various sustainability objectives
Download or read book Design for Manufacturability Through Design process Integration IV written by Michael L. Rieger and published by SPIE-International Society for Optical Engineering. This book was released on 2010 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Download or read book Design for Manufacturability written by David M. Anderson and published by CRC Press. This book was released on 2020-05-11 with total page 591 pages. Available in PDF, EPUB and Kindle. Book excerpt: Achieve any cost goals in half the time and achieve stable production with quality designed in right-the-first-time. Design for Manufacturability: How to Use Concurrent Engineering to Rapidly Develop Low-Cost, High-Quality Products for Lean Production is still the definitive work on DFM. This second edition extends the proven methodology to the most advanced product development process with the addition of the following new, unique, and original topics, which have never been addressed previously. These topics show you how to: Cut cost from 1/2 to 1/10 in 9 categories—with ways to remove that much cost from product charges and pricing Commercialize innovation—starting with Manufacturable Research and learning from the new section on scalability, you will learn how to design products and processing equipment to quickly scale up to any needed demand or desired growth. Design product families that can be built "on-demand" in platform cells that also "mass customize" products to-order Make Lean production easier to implement with much more effective results while making build-to-order practical with spontaneous supply chains and eliminating forecasted inventory by including an updated chapter on "Designing Products for Lean Production" The author’s 30 years of experience teaching companies DFM based on pre-class surveys and plant tours is the foundation of this most advanced design process. It includes incorporating dozens of proven DFM guidelines through up-front concurrent-engineering teamwork that cuts the time to stable production in half and curtails change orders for ramps, rework, redesign, substituting cheaper parts, change orders to fix the changes, unstable design specs, part obsolescence, and late discovery of manufacturability issues at periodic design reviews. This second edition is for the whole product development community, including: Engineers who want to learn the most advanced DFM techniques Managers who want to lead the most advanced product development Project team leaders who want to immediately apply all the principles taught in this book in their own micro-climate Improvement leaders and champions who want to implement the above and ensure that the company can design products and versatile processing equipment for low-volume/high-mix product varieties Designing half to a tenth of cost categories can avoid substituting cheap parts, which degrades quality, and encourages standardization and spontaneous supply chains, which will encourage Lean initiatives. Using cellular manufacturing to shift production between lines for mixed production of platforms and build-to-order to offer the fastest order fulfillment can beat any competitors’ delivery time.
Download or read book Design for Manufacturability Through Design process Integration III written by Vivek K. Singh and published by Society of Photo Optical. This book was released on 2009-01-01 with total page 528 pages. Available in PDF, EPUB and Kindle. Book excerpt: Includes Proceedings Vol. 7821
Download or read book Handbook of Nanophysics written by Klaus D. Sattler and published by CRC Press. This book was released on 2010-09-17 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many bottom-up and top-down techniques for nanomaterial and nanostructure generation have enabled the development of applications in nanoelectronics and nanophotonics. Handbook of Nanophysics: Nanoelectronics and Nanophotonics explores important recent applications of nanophysics in the areas of electronics and photonics. Each peer-reviewed c
Download or read book Design for Manufacturability written by Artur Balasinski and published by Springer Science & Business Media. This book was released on 2013-10-05 with total page 283 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book explains integrated circuit design for manufacturability (DfM) at the product level (packaging, applications) and applies engineering DfM principles to the latest standards of product development at 22 nm technology nodes. It is a valuable guide for layout designers, packaging engineers and quality engineers, covering DfM development from 1D to 4D, involving IC design flow setup, best practices, links to manufacturing and product definition, for process technologies down to 22 nm node, and product families including memories, logic, system-on-chip and system-in-package.
Download or read book Design and Analysis of Integrated Manufacturing Systems written by W. Dale Compton and published by National Academies Press. This book was released on 1988-02-01 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: Design and Analysis of Integrated Manufacturing Systems is a fresh look at manufacturing from a systems point of view. This collection of papers from a symposium sponsored by the National Academy of Engineering explores the need for new technologies, the more effective use of new tools of analysis, and the improved integration of all elements of manufacturing operations, including machines, information, and humans. It is one of the few volumes to include detailed proposals for research that match the needs of industry.
Download or read book Tool and Manufacturing Engineers Handbook Design for Manufacturability written by Thomas J. Drozda and published by Society of Manufacturing Engineers. This book was released on 1983 with total page 679 pages. Available in PDF, EPUB and Kindle. Book excerpt: Addresses important topics of DFM, including how it relates to concurrent engineering, management issues, getting started in DFM, how to justify using DFM, applying quality tools and how DFM is affecting computer technology (and vice versa). Covers topics starting with the creative thinking process, to combining DFM with geometric dimensioning and tolerancing. Also includes product design information that designers should know when committing pen to paper or mouse to mat.
