Download or read book Deposition and Characterization of Silicon Nitride gallium Arsenide Metal Insulator Semiconductor Structures With Heteroepitaxial Interlayers written by Dae-Gyu Park and published by . This book was released on 1997 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Deposition and Characterization of Silicon Nitride Gallium Arsenide Metal Insulator Semiconductor Structures with Heteroepitaxial Interlayers written by Dae-Gyu Park and published by . This book was released on 1997 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Abstracts written by and published by . This book was released on 2002 with total page 2540 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book An Experimental Study for the Characterization of Silicon Nitride Films Deposited on Gallium Arsenide Substrates by the R f Sputtering Technique Using MIS Structures written by Mustafa M. El-Muradi and published by . This book was released on 1983 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Growth and Electronic Properties of Gallium Arsenide and Germanium Metal Insulator Semiconductor Structures written by John Charles Reed and published by . This book was released on 1994 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The metal insulator semiconductor (MIS) structure is arguably the most technologically important type of solid in existence. The microelectronics revolution of the last thirty years is made possible largely due to the ability to realize extremely high quality metal/SiO$sb2$/Si metal oxide semiconductor (MOS) structures. Unfortunately, silicon does not stand out in its ability to pass charge carriers with the highest speed. Significant improvements in the performance of many areas of electronics would result if another, high mobility semiconductor could be implemented into a high quality MIS structure. In this thesis, MIS structures incorporating two high-mobility semiconductors, GaAs and Ge, are investigated. An in situ, plasma-enhanced chemical vapor deposition system has been constructed which allows deposition of Si-based insulators and group IV semiconductors on the pristine GaAs or Ge surface. For the GaAs MIS system, a thin Si/Ge interlayer between the insulator and GaAs surface is found to improve the insulator/GaAs interface. This has allowed the realization of high transconductance GaAs metal insulator semiconductor field effect transistors (MISFETs). For the Ge MIS system, the growth of Ge on GaAs at 250$spcirc$C while maintaining a low interface trap density at the insulator/Ge interface is shown to be possible. The high hole mobility of Ge and high electron mobility of GaAs suggest possible uses of this structure for high performance complementary metal insulator semiconductor (CMIS) applications.
Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Download or read book Characterization of Silicon and Gallium Arsenide MOS Structures with Titanium Oxide as Dielectric Layer written by 林士豪 and published by . This book was released on 2006 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electrical Characterization of Aluminum Nitride on Silicon Carbide Metal Insulator Semiconductor Structures written by William Bowes Hageman and published by . This book was released on 2002 with total page 156 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Metal insulator semiconductor Structures and AlGaN GaN Hetero junctions Based on Cubic Group III Nitrides written by Alexander Zado and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Metal insulator semiconductor Structures and AlGaN GaN Hetero junctions Based on Cubic Group III Nitrides written by Alexander Zado and published by . This book was released on 2015 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Cubic AlGaN/GaN hetero-junction field effect transistor structures were fabricated by plasma assisted molecular beam epitaxy on 3C-SiC (001) substrates. The structural quality of the layers was controlled in-situ by reflection high energy electron diffraction and ex-situ by high resolution x-ray diffraction, atomic force microscopy and time of flight secondary ion mass spectroscopy. Metal-Insulator-Semiconductor structures were realized using plasma assisted molecular beam epitaxy and plasma enhanced chemical vapour deposition. The characterization of the structures was performed using electrical techniques like capacitance-voltage-, current-voltage-, Hall effect-measurements and admittance spectroscopy.To improve the gate characteristics an insulating layer is required. Insulating SiO2 and Si3N4 layers were produced using plasma enhanced chemical vapour deposition. An in-situ method of deposition of Si3N4 directly inside the molecular beam epitaxy chamber is discussed. The metal-insulator-hetero-junction-semiconductor-structures were characterized by capacitance-voltage- and admittance-spectroscopy-measurements.Several techniques were analysed to electrically isolate the conductive substrate from the active transistor device. For the free standing high conductive 3C-SiC substrate to drop the conductivity of the cubic GaN buffer layer carbon doping was used. Due to a large conduction band offset between cubic GaN and cubic AlN asymmetric multi quantum well structures were grown to prohibit current flow towards the substrate. Using several assembly techniques transistor devices were fabricated. A cubic GaN field effect transistor operation is presented. Metal-insulator-semiconductor-hetero-junction field effect transistors with normally-on and normally-off characteristic were realized. ; eng
Download or read book American Doctoral Dissertations written by and published by . This book was released on 1999 with total page 848 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ceramic Abstracts written by American Ceramic Society and published by . This book was released on 1996 with total page 1000 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Two dimensional Materials written by Pramoda Kumar Nayak and published by BoD – Books on Demand. This book was released on 2016-08-31 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt: There are only a few discoveries and new technologies in materials science that have the potential to dramatically alter and revolutionize our material world. Discovery of two-dimensional (2D) materials, the thinnest form of materials to ever occur in nature, is one of them. After isolation of graphene from graphite in 2004, a whole other class of atomically thin materials, dominated by surface effects and showing completely unexpected and extraordinary properties, has been created. This book provides a comprehensive view and state-of-the-art knowledge about 2D materials such as graphene, hexagonal boron nitride (h-BN), transition metal dichalcogenides (TMD) and so on. It consists of 11 chapters contributed by a team of experts in this exciting field and provides latest synthesis techniques of 2D materials, characterization and their potential applications in energy conservation, electronics, optoelectronics and biotechnology.
Download or read book Physics Briefs written by and published by . This book was released on 1992 with total page 1332 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Engineering Index Annual written by and published by . This book was released on 1992 with total page 2264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since its creation in 1884, Engineering Index has covered virtually every major engineering innovation from around the world. It serves as the historical record of virtually every major engineering innovation of the 20th century. Recent content is a vital resource for current awareness, new production information, technological forecasting and competitive intelligence. The world?s most comprehensive interdisciplinary engineering database, Engineering Index contains over 10.7 million records. Each year, over 500,000 new abstracts are added from over 5,000 scholarly journals, trade magazines, and conference proceedings. Coverage spans over 175 engineering disciplines from over 80 countries. Updated weekly.
Download or read book Wafer Bonding written by Marin Alexe and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 510 pages. Available in PDF, EPUB and Kindle. Book excerpt: The topics include bonding-based fabrication methods of silicon-on-insulator, photonic crystals, VCSELs, SiGe-based FETs, MEMS together with hybrid integration and laser lift-off. The non-specialist will learn about the basics of wafer bonding and its various application areas, while the researcher in the field will find up-to-date information about this fast-moving area, including relevant patent information.
Download or read book Oxide Electronics written by Asim K. Ray and published by John Wiley & Sons. This book was released on 2021-04-12 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxide Electronics Multiple disciplines converge in this insightful exploration of complex metal oxides and their functions and properties Oxide Electronics delivers a broad and comprehensive exploration of complex metal oxides designed to meet the multidisciplinary needs of electrical and electronic engineers, physicists, and material scientists. The distinguished author eschews complex mathematics whenever possible and focuses on the physical and functional properties of metal oxides in each chapter. Each of the sixteen chapters featured within the book begins with an abstract and an introduction to the topic, clear explanations are presented with graphical illustrations and relevant equations throughout the book. Numerous supporting references are included, and each chapter is self-contained, making them perfect for use both as a reference and as study material. Readers will learn how and why the field of oxide electronics is a key area of research and exploitation in materials science, electrical engineering, and semiconductor physics. The book encompasses every application area where the functional and electronic properties of various genres of oxides are exploited. Readers will also learn from topics like: Thorough discussions of High-k gate oxide for silicon heterostructure MOSFET devices and semiconductor-dielectric interfaces An exploration of printable high-mobility transparent amorphous oxide semiconductors Treatments of graphene oxide electronics, magnetic oxides, ferroelectric oxides, and materials for spin electronics Examinations of the calcium aluminate binary compound, perovoksites for photovoltaics, and oxide 2Degs Analyses of various applications for oxide electronics, including data storage, microprocessors, biomedical devices, LCDs, photovoltaic cells, TFTs, and sensors Suitable for researchers in semiconductor technology or working in materials science, electrical engineering, and physics, Oxide Electronics will also earn a place in the libraries of private industry researchers like device engineers working on electronic applications of oxide electronics. Engineers working on photovoltaics, sensors, or consumer electronics will also benefit from this book.
