Download or read book Copper Area Selective Atomic Layer Deposition for Plasmonic Metallic Nanostructures written by Chengwu Zhang and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasmonics, a flourishing emergent science and technology, is about the interactions between electromagnetic radiation and electrons at metallic nanoparticles. It opens a new pathway for controlling chemical reactions on metallic nanostructures. Plasmonic dimers, especially with sub-10 nm nanogaps, can greatly enhance local electric field intensity through excitations of surface plasmons, which are collective oscillations of electrons excited by light. Previous studies to fabricate plasmonic dimers with sub-10 nm nanogaps include techniques such as electromigration, electroless gold plating, self-assembly, and high resolution electron beam lithography. However, these methods are limited either in pattern design or low yield for scaling up. To attain more flexibility and reliability in fabrication, there is a need for scalable methods to fabricate plasmonic dimers with sub-10 nm nanogaps, which is crucial for their use in practical applications. Atomic layer deposition (ALD) is a thin-film deposition technique capable of producing conformal thin films with precise control of thickness and composition at the atomic level. Area-selective ALD (AS-ALD) is a bottom-up process for direct deposition of materials only on desired regions of a substrate. In this study, we have explored incident light excitations and plasmonic resonances matching to achieve localized surface plasmon resonances (LSPRs) in the area-selective atomic layer deposition (AS-ALD) process. We have applied copper AS-ALD to tune gap sizes of layered and mixed plasmonic dimer arrays and electrically connected dipole-line arrays to sub-10 nm. Results demonstrate that AS-ALD is a reliable and flexible method to achieve sub-10 nm gaps on large area arrays.

Download or read book Selectivity and Nucleation Effects in Atomic Layer Deposition of Copper for Plasmonic Nanostructures written by Jie Qi and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: As device requirements keep pushing toward smaller and higher aspect ratio structures, atomic layer deposition (ALD) has become a promising technique for the deposition of nanometer dielectric and metallic thin films with applications in semiconductors, nanotechnology, catalysis, and energy. Meanwhile, the field of plasmonics has gained attention, driven by a variety of exciting applications including chemical and biological sensors, solar energy harvesting devices, spectroscopy, and photocatalytic conversion. A key feature of nanoscale plasmonic materials is a strong dependence of the plasmon resonance on size, shape, composition, and surroundings of the nanostructures. ALD offers an effective means to tune the morphology, composition, and particle-particle junctions of nanostructures with precise control at an atomic level. However, successful application of ALD to plasmonics requires detailed understanding of selective growth, nucleation process, and their dependence on growth conditions for nanostructures. In this Cu ALD study, we identified optimal process parameters to achieve conformal deposition on nanostructures with good nucleation. A selectivity window was also defined to help establish a set of relations between selective deposition and growth conditions. Furthermore, we demonstrated that the plasmon resonance can be tuned significantly by Cu ALD and provided a deeper understanding of this process for applications such as plasmonic rectenna. It makes a remarkable contribution to process optimization and device design to enable widespread utilization of this technology in photonics and nanoelectronics.

Download or read book Plasmonic Activity of Metallic Nanostructures Grown by Atomic Layer Deposition written by 柯忠廷 and published by . This book was released on 2014 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Download or read book Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices written by Thomas Wächtler and published by Thomas Waechtler. This book was released on 2010 with total page 247 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Atomic Layer Deposition Applications 13 written by F. Roozeboom and published by The Electrochemical Society. This book was released on with total page 128 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book Bimetallic Nanostructures written by Ya-Wen Zhang and published by John Wiley & Sons. This book was released on 2018-05-16 with total page 738 pages. Available in PDF, EPUB and Kindle. Book excerpt: Systematically summarizes the current status and recent advances in bimetallic structures, their shape-controlled synthesis, properties, and applications Intensive researches are currently being carried out on bimetallic nanostructures, focusing on a number of fundamental, physical, and chemical questions regarding their synthesis and properties. This book presents a systematic and comprehensive summary of the current status and recent advances in this field, supporting readers in the synthesis of model bimetallic nanoparticles, and the exploration and interpretation of their properties. Bimetallic Nanostructures: Shape-Controlled Synthesis for Catalysis, Plasmonics and Sensing Applications is divided into three parts. Part 1 introduces basic chemical and physical knowledge of bimetallic structures, including fundamentals, computational models, and in situ characterization techniques. Part 2 summarizes recent developments in synthetic methods, characterization, and properties of bimetallic structures from the perspective of morphology effect, including zero-dimensional nanomaterials, one-dimensional nanomaterials, and two-dimensional nanomaterials. Part 3 discusses applications in electrocatalysis, heterogeneous catalysis, plasmonics and sensing. Comprehensive reference for an important multidisciplinary research field Thoroughly summarizes the present state and latest developments in bimetallic structures Helps researchers find optimal synthetic methods and explore new phenomena in surface science and synthetic chemistry of bimetallic nanostructures Bimetallic Nanostructures: Shape-Controlled Synthesis for Catalysis, Plasmonics and Sensing Applications is an excellent source or reference for researchers and advanced students. Academic researchers in nanoscience, nanocatalysis, and surface plasmonics, and those working in industry in areas involving nanotechnology, catalysis and optoelectronics, will find this book of interest.

Download or read book Atomic Layer Deposition written by Tommi Kääriäinen and published by John Wiley & Sons. This book was released on 2013-05-28 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Download or read book Noble and Precious Metals written by Mohindar Seehra and published by BoD – Books on Demand. This book was released on 2018-07-04 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of copper, silver, gold and platinum in jewelry as a measure of wealth is well known. This book contains 19 chapters written by international authors on other uses and applications of noble and precious metals (copper, silver, gold, platinum, palladium, iridium, osmium, rhodium, ruthenium, and rhenium). The topics covered include surface-enhanced Raman scattering, quantum dots, synthesis and properties of nanostructures, and its applications in the diverse fields such as high-tech engineering, nanotechnology, catalysis, and biomedical applications. The basis for these applications is their high-free electron concentrations combined with high-temperature stability and corrosion resistance and methods developed for synthesizing nanostructures. Recent developments in all these areas with up-to-date references are emphasized.

Download or read book Multiscale Simulation of Metallic Copper and Copper Oxide Atomic Layer Deposition from Cu Beta diketonates written by Xiao Hu and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.

Download or read book Understanding Inhibitor based Area Selective Atomic Layer Deposition for Dielectric on dielectric Growth written by Dara A. Bobb-Semple and published by . This book was released on 2020 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Electronic device fabrication today is based on 'top-down' processes with multiple lithography and etching steps. As semiconductor dimensions shrink and adopt more complex architectures, these processes are reaching their limits. One promising solution is area-selective atomic layer deposition (AS-ALD), which combines a surface modification technique and atomic layer deposition (ALD) in a 'bottom-up' approach to nanopatterning. A common approach for achieving AS-ALD involves the use of densely-packed self-assembled monolayers (SAMs) as inhibiting layers against undesired ALD growth. Incorporating this technique into fabrication schemes requires an understanding of how SAMs interact with different surfaces and how this in turn affects the ability of the SAM to act as an effective inhibitor against ALD reactions. In the first part of this thesis, a comparative study of octadecylphosphonic acid (ODPA) SAM formation on four technologically relevant metals-- Cu, Co, W and Ru--was carried out. Following SAM deposition, zinc oxide (ZnO) and aluminum oxide (Al2O3) model ALD processes were performed to assess the blocking ability of the SAM layer formed on each substrate. Surface characterization of these samples revealed that ODPA-treated Cu, Co and W inhibited the growth of ZnO and Al2O3 ALD to varying degrees, while no inhibition was observed on ODPA-treated Ru. Specifically, the ODPA-treated W prevented the growth of at least 17 nm of ZnO, compared to less than half this amount on Co and Cu. Similarly, 3-4 times more Al2O3 ALD was blocked using ODPA on W versus Cu and Co. The reaction mechanism of ODPA SAM formation and how surface properties, such as the roughness and the Lewis acid nature of the substrate, could impact that SAM's formation and in turn ALD inhibition is discussed. In the second part, a series of spectroscopic analyses were performed which provide details about the structure and coverage of the ODPA layer formed on each substrate. It was determined that the average tilt angle of the ODPA chains formed on Co, Cu and W are ~66° from the surface plane of the substrate, indicating that (on average) the molecules are oriented upright. Conversely, ODPA chains on the Ru substrate were found to be disordered. Further, it was determined that ODPA on Co and Cu formed a densely packed 'crystal-like' structure while on W and Ru, the ODPA molecules appeared to exhibit a more 'liquid-like' structure. The data indicate that although ODPA forms an incomplete layer on W, it still provides the best blocking against ZnO and Al2O3. The results highlight the importance of the chemical nature of the substrate surface in achieving SAM-based AS-ALD. Finally, since the overarching goal of this research is to achieve AS-ALD on metal/dielectric patterns (which mimic interconnect devices), the selective growth of ZnO and Al2O3 was demonstrated on Cu/SiO2 and Co/SiO2 2D-patterned substrates. Challenges in achieving SAM-assisted selective ALD and methods to improve the process on smaller feature sizes are also discussed.

Download or read book Surface Organometallic Chemistry Molecular Approaches to Surface Catalysis written by Jean-Marie Basset and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface organometallic chemistry is a new field bringing together researchers from organometallic, inorganic, and surface chemistry and catalysis. Topics ranging from reaction mechanisms to catalyst preparation are considered from a molecular basis, according to which the "active site" on a catalyst surface has a supra-molecular character. This. the first book on the subject, is the outcome of a NATO Workshop held in Le Rouret. France, in May. 1986. It is our hope that the following chapters and the concluding summary of recommendations for research may help to provide a definition of surface organometallic chemistry. Besides catalysis. the central theme of the Workshop, four main topics are considered: 1) Reactions of organometallics with surfaces of metal oxides, metals. and zeolites; 2) Molecular models of surfaces, metal oxides, and metals; 3) Molecular approaches to the mechanisms of surface reactions; 4) Synthesis and modification of zeolites and related microporous solids. Most surface organometallic chemistry has been carried out on amorphous high-surf ace-area metal oxides such as silica. alumina. magnesia, and titania. The first chapter. contributed by KNOZINGER. gives a short summary of the structure and reactivity of metal oxide surfaces. Most of our understanding of these surfaces is based on acid base and redox chemistry; this chemistry has developed from X-ray and spectroscopic data, and much has been inferred from the structures and reactivities of adsorbed organic probe molecules. There are major opportunities for extending this understanding by use of well-defined (single crystal) oxide surfaces and organometallic probe molecules.

Download or read book Inductively Coupled Hydrogen Plasma assisted Copper Atomic Layer Deposition on Metallic and Dielectric Surfaces written by Christopher John Jezewski and published by . This book was released on 2004 with total page 116 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Download or read book TMS 2021 150th Annual Meeting Exhibition Supplemental Proceedings written by Minerals, Metals and Materials Society. Annual Meeting and published by . This book was released on 2021 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This collection presents papers from the 150th Annual Meeting & Exhibition of The Minerals, Metals & Materials Society.

Download or read book Nanoplasmonics written by Grégory Barbillon and published by BoD – Books on Demand. This book was released on 2017-06-21 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoplasmonics is a young topic of research, which is part of nanophotonics and nano-optics. Nanoplasmonics concerns to the investigation of electron oscillations in metallic nanostructures and nanoparticles. Surface plasmons have optical properties, which are very interesting. For instance, surface plasmons have the unique capacity to confine light at the nanoscale. Moreover, surface plasmons are very sensitive to the surrounding medium and the properties of the materials on which they propagate. In addition to the above, the surface plasmon resonances can be controlled by adjusting the size, shape, periodicity, and materials' nature. All these optical properties can enable a great number of applications, such as biosensors, optical modulators, photodetectors, and photovoltaic devices. This book is intended for a broad audience and provides an overview of some of the fundamental knowledges and applications of nanoplasmonics.

Download or read book UV VIS and Photoluminescence Spectroscopy for Nanomaterials Characterization written by Challa S.S.R. Kumar and published by Springer Science & Business Media. This book was released on 2013-02-19 with total page 604 pages. Available in PDF, EPUB and Kindle. Book excerpt: Second volume of a 40-volume series on nanoscience and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about UV-visible and photoluminescence spectroscopy for the characterization of nanomaterials. Modern applications and state-of-the-art techniques are covered and make this volume essential reading for research scientists in academia and industry in the related fields.