Download or read book Continuation of Research in the Development of High Sensitivity X Ray and Electron Beam Resists Processes written by Alexis Bell and published by . This book was released on 1987 with total page 99 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron beam lithography is used for mask making, and offers promise for fabrication of high density integrated circuits since it does not have the inherent limitations of optical lithography. Investigations were conducted to obtain a better understanding of e beam resist dissolution with a direct application to the image transfer step in e beam lithography. Studies were performed with poly(methyl methacrylate), PMMA, which is a commonly used electron beam resist. The studies included the monitoring of resist swelling and dissolution kinetics using in-situ ellipsometry, and modeling efforts to describe the basic physics of resist dissolution.
Download or read book Development of High Sensitivity X Ray and Electron Beam Resist Processes written by D. W. Hess and published by . This book was released on 1985 with total page 27 pages. Available in PDF, EPUB and Kindle. Book excerpt: The lithographic performance of a polymer resist material is determined by several processes. First, uniform and controllable films of the resist must be reproducibly applied to the surface of substrates. Second, the radiation/polymer interaction is important since it affects the sensitivity of the resist. Third, the development or dissolution process is crucial because this step determines the ability to create useable patterns in the resist film. Finally, for Very Large Scale Integration (VLSI), dry etching processes are replacing liquid techniques; thus, the interaction of resists with glow discharges can often determine the utility of specific materials. Under AFOSR Grant 80-0078, various aspects of the above criteria were studied in order to gain fundamental understanding of these important process steps.
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1990 with total page 252 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Download or read book Government Reports Announcements Index written by and published by . This book was released on 1993 with total page 1258 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Advances in Resist Technology and Processing written by and published by . This book was released on 2003 with total page 834 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Technical Abstract Bulletin written by and published by . This book was released on 1982 with total page 80 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place
Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 980 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book U S Government Research Reports written by and published by . This book was released on 1963 with total page 516 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Publications written by United States. National Bureau of Standards and published by . This book was released on 1978 with total page 804 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Publications of the National Institute of Standards and Technology Catalog written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1991 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Research Awards Index written by and published by . This book was released on 1989 with total page 742 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Trends and Opportunities in Materials Research written by and published by . This book was released on 1984 with total page 36 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Proceedings of the Symposium on Electron Ion and Laser Beam Technology written by and published by . This book was released on 1979 with total page 646 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Handbook of Microscopy for Nanotechnology written by Nan Yao and published by Springer Science & Business Media. This book was released on 2006-07-12 with total page 745 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanostructured materials take on an enormously rich variety of properties and promise exciting new advances in micromechanical, electronic, and magnetic devices as well as in molecular fabrications. The structure-composition-processing-property relationships for these sub 100 nm-sized materials can only be understood by employing an array of modern microscopy and microanalysis tools. Handbook of Microscopy for Nanotechnology aims to provide an overview of the basics and applications of various microscopy techniques for nanotechnology. This handbook highlights various key microcopic techniques and their applications in this fast-growing field. Topics to be covered include the following: scanning near field optical microscopy, confocal optical microscopy, atomic force microscopy, magnetic force microscopy, scanning turning microscopy, high-resolution scanning electron microscopy, orientational imaging microscopy, high-resolution transmission electron microscopy, scanning transmission electron microscopy, environmental transmission electron microscopy, quantitative electron diffraction, Lorentz microscopy, electron holography, 3-D transmission electron microscopy, high-spatial resolution quantitative microanalysis, electron-energy-loss spectroscopy and spectral imaging, focused ion beam, secondary ion microscopy, and field ion microscopy.
Download or read book Catalog of National Bureau of Standards Publications 1966 1976 pt 1 Citations and abstracts v 2 pt 1 Key word index A through L v 2 pt 2 Key word index M through Z written by United States. National Bureau of Standards. Technical Information and Publications Division and published by . This book was released on 1978 with total page 804 pages. Available in PDF, EPUB and Kindle. Book excerpt:
