Download or read book Chemical Vapor Deposition of Titanium Dioxide in a Batch Reactor Using Titanium Tetra isopropoxide and Oxygen written by Allyson K. Shaler Smith and published by . This book was released on 2000 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Transient Chemical Vapor Deposition of Titanium Dioxide Using Titanium Tetra isopropoxide as a Precursor in a Batch Reactor written by Benjamin L. Schauerhamer and published by . This book was released on 2000 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films written by Polly Wanda Chu and published by . This book was released on 1994 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.
Download or read book A Kinetic and Mechanistic Study of the Chemical Vapor Deposition of Titanium Dioxide Using Alkoxide Precursors written by Carl Pete Fictorie and published by . This book was released on 1997 with total page 494 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films written by David Christopher Gilmer and published by . This book was released on 1998 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition Applied to Titanium Dioxide written by Alfred J. Lutz and published by . This book was released on 1983 with total page 70 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Surface Kinetics of Titanium Isopropoxide in Chemical Vapor Deposition of Titanium Dioxide and Barium Titanate written by Michael Oliver Reinke and published by . This book was released on 2016 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: Mots-clés de l'auteur: High Vacuum Chemical Vapor Deposition ; Atomic Layer Deposition ; Surface Kinetics ; Thin Film Deposition ; Titanium Dioxide ; Barium Titanate.
Download or read book Synthesis of Titanium Dioxide Nanorods Using a Continuous Flow Microreactor written by Wei-Liang Yen and published by . This book was released on 2011 with total page 61 pages. Available in PDF, EPUB and Kindle. Book excerpt: The primary goal of this thesis is to synthesize titanium dioxide nanorods using a continuous flow microreactor. Titania powder, one of the most important particulate materials is used for many purposes owing to its excellent optical properties of a high refractive index leading to high hiding power and whiteness of titania paint, high chemical stability, and relatively low production cost. Particularly, one-dimensional inorganic nanostructures (rods, wires and tubes) of TiO2 attract both relevant theoretical and technological interest, because they reveal a wide range of electrical and optical properties that depend on both size and shape. In our research, the growth of anatase TiO2 nanorods was carefully controlled at low reaction temperature (around 100 °C) with oleic acid as a surfactant preventing hydrolysis of titania nuclei in undesired sites. Hinder hydrolysis of titanium alkoxide has been engaged and manipulated by means of a strategy that relies on the chemical modification of the titania precursor (Titanium tetraisopropoxide and Oleic acid) by the carboxylic acid, and on the use of suitable catalysts (trimethylamino-N-oxide dehydrate, TMAO) to promote crystallization in a continues flow microreactor. The X-ray diffraction and raman spectroscopy analysis show that TiO2 produced from the microreactor matched with the products from the batch synthesis. Scanning Transmission electron Microscope (TEM) and High Resolution TEM images show that TiO2 nanoparticles were rod shape, and Fourier transform of the HRTEM image indicates that mineral form of TiO2 corresponds to the standard TiO2 anatase diffraction pattern. Thermal Gravimetric Analysis indicates that TiO2 nanorods produced from the microreactor have more ligands attached to their surface than nanorods made by the batch reactor. The continuous flow microreactor can produce TiO2 nanorods much faster (about 40 to 50 min of residence time) than a batch reactor (with reaction time around 24 hr), and the quality of the TiO2 nanorods from the microreactor is as good as the nanorods from the conventional batch reactor.
Download or read book Mechanistic Studies of Titanium Dioxide and Ruthenium Atomic Layer Deposition by in Situ Techniques written by Rungthiwa Methaapanon and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The demand of smaller, higher capacity and higher performance devices in microelectronics has driven the necessity of uniform, conformal, and pinhole-free thin film production. Furthermore, the design toward more complex structures and higher aspect ratios requires the processes to be highly controllable, down to the nanoscale. Atomic layer deposition (ALD) is a powerful technique that produces thin films with these desired properties, through a series of alternating self-limited surface reactions. The self-saturated nature of the technique allows for precise thickness control at the atomic scale. Despite increasing interest in ALD, there is still a lack of understanding of the mechanisms behind the process at a molecular level. The nucleation and growth fundamentals are crucial for better control and development of the process and, hence, need to be systematically studied. Due to the vulnerability of the reactions to ambient conditions, ex situ analysis techniques alone may not provide complete information on the surface chemistries needed to elucidate the mechanisms governing the processes. In situ analysis techniques, which allow surface investigation without disruption from contaminants and other species, are required. Therefore, in this work we have designed and constructed various in situ systems for this purpose. The in situ systems are ALD reactors integrated with different analysis tools, able to operate as fully functional deposition system so as to replicate the actual conditions of typical ALD reactors. Through in situ X-ray photoelectron spectroscopy (XPS), we studied ALD of TiO2 at 100 °C using titanium tetrachloride (TiCl4) and water (H2O) on two different surfaces. The initial growth rate on hydroxyl-enriched silicon dioxide (SiO2) is found to be higher than on hydrogen-terminated silicon. The XPS results provide evidence of Si-O-Ti bonds on the SiO2 surface and Si-Ti bonds on the hydrogen-terminated Si surface, without a trace of interfacial oxide. However, a silicon oxide layer forms at the interface between Si and TiO2 after vacuum annealing, concurrent with the reduction of TiO2. The results hence suggest TiO2 as an oxygen source for silicon oxidation under these conditions. In addition, we studied ruthenium thermal ALD using a new precursor, bis(2,4-dimethylpentadienyl) ruthenium, and oxygen. The process is achievable at a low operating temperature of 185 °C. Variation in the exposure time and pressure of oxygen has significant effects on the nucleation, growth rate and composition of the deposited ruthenium films. We propose that the subsurface oxygen formation, which involves slow diffusion of oxygen, is a rate-limiting step in the RuO2 formation process. The crystal growth and structures of Ru and RuO2 deposited on amorphous SiO2 by the same ALD process were measured by ex situ and in situ synchrotron X-ray diffraction. Interestingly, in situ XRD studies reveal that RuO2 films initially nucleate as metallic Ru crystallites. The hindered formation of subsurface oxygen in small nanocrystals is hypothesized as the cause that prohibits the growth of the initial oxide. Although metallic ruthenium films are textured with a (002) preference in the growth direction, RuO2 films nucleating on the metallic Ru nanoparticles have no preferential orientation. We also studied surface chemistries of Ru reactions during half ALD cycles via in situ synchrotron photoemission spectroscopy (PES). After long oxygen exposures, Ru oxide and carbon-oxygen species, which localize near the top surface, were detected. The peak intensities of these species noticeably decreased after reaction with the Ru precursor, indicating the reactions of Ru precursor with both O-Ru and O-C species. In brief, we fabricated and utilized in situ ALD/analysis systems, together with ex situ analysis tools, for studies of TiO2 ALD and Ru/RuO2 ALD. The studies not only demonstrate the power of the in situ systems for mechanistic studies, but also provide information on possible bond formation, surface reactions, and nucleation and growth mechanisms in the ALD processes.
Download or read book Low Pressure Metal Organic Chemical Vapor Deposition of Titanium Dioxide Thin Films in Conjunction with Photocatalytic Investigations written by Abon Jason Manuel del Rosario and published by . This book was released on 2003 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Vapor Deposition of Titanium Dioxide Film in Microelectronics written by Y. W. Hsuch and published by . This book was released on 1972 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: With high dielectric constant, titanium dioxide has been used for making a capacitor and field effect transistor in conjunction with silicon dioxide. High transconductance and low threshold voltage were observed.
Download or read book Thin Film Titanium Dioxide by Chemical Vapor Deposition written by Dale Ralph Harbison and published by . This book was released on 1969 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Metal organic chemical vapor deposition and characterization of semiconducting titanium dioxide written by Jeffrey E. Bisberg and published by . This book was released on 1987 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Deposition of Titanium Dioxide by Physical Vapor Deposition written by Nishantha B. Dissanayake and published by . This book was released on 2003 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Metalorganic Chemical Vapor Deposition of Titanium Dioxide and Strontium Titanate for Microelectronics Applications written by Kanchana Vydianathan and published by . This book was released on 1998 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Titanium Dioxide written by Magdalena Janus and published by BoD – Books on Demand. This book was released on 2017-07-26 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: Titanium dioxide is mainly used as a pigment and photocatalyst. It is possible to find it in food, cosmetics, building materials, electric devices, and others. This book contains chapters about characteristics of anatase and rutile crystallographic structure of titanium dioxide and the use of theoretical calculation for photoactivity determination.
Download or read book Chemical Vapor Deposition of Titanium Dioxide as Means of Increasing the Tissue Compatibility of 316L Stainless Steel Orthopedic Implants written by Glenn F. Cueman and published by . This book was released on 1973 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:
