Download or read book Characterization of Modulation doped Field effect Transistors with Gate Lengths Down to 600 Angstroms written by Paul Raymond De la Houssaye and published by . This book was released on 1988 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Design Fabrication and Characterization of Modulation doped Field effect Transistors written by Hyunchang Park and published by . This book was released on 1989 with total page 198 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fabrication and Characterization of Modulation Doped Field Effect Transistors for Quantum Waveguide Structures written by Wipawan Yindeepol and published by . This book was released on 1990 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt: Split and normal gate A1GaAs /GaAs MODFETs were fabricated along with the ohmic test structures and the Hall bar geometries. The DC characteristics of normal gate transistors were evaluated at room temperature and at 77K and the threshold voltages were extracted from the measurements and compared to the theoretical results. The performance of normal gate transistors was reasonable. The sheet carrier density and the mobility extracted from Hall measurements using the Hall bar geometry showed increase of carrier density with increasing gate voltage and an increase of mobility with increasing carrier density. The contact resistance obtained from the ohmic test structure was high and not uniform within the sample.
Download or read book Characterization of Enhanced Schottky Barrier InGaAs AlxGa 1 x As Strained Channel Modulation Doped Field Effect Transistors written by James A. Lott and published by . This book was released on 1987 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt: Enhanced Schottky-barrier In(0.15)Ga(0.85)As/A1xGa(1-x)As pseudomorphic modulation-doped field-effect transistors (MODFETs) were fabricated with 1.2 micron gate-lengths on MBE-grown substrates. The effective gate Schottky-barrier height was enhanced by adding a thin p(+)-GaAs layer beneath the gate. A portion of the n-A1(0.15)Ga(0.85)As barrier layer beneath the p(+)-GaAs surface layer was linearly graded from a mole fraction of 0.15 to 0.30 to further increase the effective Schottky-barrier height. MODFETs of identical dimension and doping density were fabricated without the p(+)-GaAs and/or graded N-A1(x)Ga(1-x)As layers for comparison. The goal was to improve the MODFETs high-frequency performance by reducing the gate leakage current. The effective Schottky-barrier height was shown to increase from 0.9 to 1.6 eV for the p(+)-graded samples. The extrinsic transconductance was as high as 190 mS/mm for the p(+)-grades samples and 311 mS/mm for the graded control samples. The p(+)-graded samples exhibited and f(T) and f(max)of 26 and 54 GHz, respectively, compared to 19 and 28 GHz, respectively, for the graded control samples. The noise figure for the p(+)-graded samples was 1.7 dB at 12 GHz, compared to 1.9 dB for the graded control samples. Overall, the MODFETs with enhanced barriers.
Download or read book Modulation doped Field effect Transistors written by Heinrich Daembkes and published by Institute of Electrical & Electronics Engineers(IEEE). This book was released on 1991 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Modulation Doped GaAs Al Sub XGA Sub 1 x As Layered Structures with Applications to Field Effect Transistors written by Hadis Morkoc and published by . This book was released on 1982 with total page 114 pages. Available in PDF, EPUB and Kindle. Book excerpt: We have established a device fabrication laboratory, dc and rf device testing facilities and materials characterization facilities. Initially, a great deal of effort was spent to improve the molecular beam epitaxial growth of heterojunctions. Later-on the dependence of heterojunction properties on the structural parameters were investigated in detail and in the process, separation of donor and electrons by about 200 A in a modulation doped structure was discovered to lead to extremely high electron mobilities. Transport parallel to the heterointerface in normal and inverted structures was investigated at moderate fields for the first time. Polar optical phonon emission above 200 V/cm field strengths was found to be responsible for mobility reduction. High field transport properties was deduced from the FET performance. Modulation doped field effect transistors with a micron gate length and a 3 micron channel length were fabricated and characterized under dc operating conditions at both 300 and 77 K.A model was also developed to analyze the device operation and performance. Using this model, the heterojunction structures were optimized for high performance field effect transistors. In a different area, a scheme which replaces the Schottky barrier of a MESFET with a n(+)/p(+) structures grown in situ with the channel layer was developed.
Download or read book American Doctoral Dissertations written by and published by . This book was released on 1988 with total page 728 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Power GaN Devices written by Matteo Meneghini and published by Springer. This book was released on 2016-09-08 with total page 383 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents the first comprehensive overview of the properties and fabrication methods of GaN-based power transistors, with contributions from the most active research groups in the field. It describes how gallium nitride has emerged as an excellent material for the fabrication of power transistors; thanks to the high energy gap, high breakdown field, and saturation velocity of GaN, these devices can reach breakdown voltages beyond the kV range, and very high switching frequencies, thus being suitable for application in power conversion systems. Based on GaN, switching-mode power converters with efficiency in excess of 99 % have been already demonstrated, thus clearing the way for massive adoption of GaN transistors in the power conversion market. This is expected to have important advantages at both the environmental and economic level, since power conversion losses account for 10 % of global electricity consumption. The first part of the book describes the properties and advantages of gallium nitride compared to conventional semiconductor materials. The second part of the book describes the techniques used for device fabrication, and the methods for GaN-on-Silicon mass production. Specific attention is paid to the three most advanced device structures: lateral transistors, vertical power devices, and nanowire-based HEMTs. Other relevant topics covered by the book are the strategies for normally-off operation, and the problems related to device reliability. The last chapter reviews the switching characteristics of GaN HEMTs based on a systems level approach. This book is a unique reference for people working in the materials, device and power electronics fields; it provides interdisciplinary information on material growth, device fabrication, reliability issues and circuit-level switching investigation.
Download or read book Fundamentals of Modern VLSI Devices written by Yuan Taur and published by Cambridge University Press. This book was released on 2013-05-02 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Learn the basic properties and designs of modern VLSI devices, as well as the factors affecting performance, with this thoroughly updated second edition. The first edition has been widely adopted as a standard textbook in microelectronics in many major US universities and worldwide. The internationally renowned authors highlight the intricate interdependencies and subtle trade-offs between various practically important device parameters, and provide an in-depth discussion of device scaling and scaling limits of CMOS and bipolar devices. Equations and parameters provided are checked continuously against the reality of silicon data, making the book equally useful in practical transistor design and in the classroom. Every chapter has been updated to include the latest developments, such as MOSFET scale length theory, high-field transport model and SiGe-base bipolar devices.
Download or read book Characterization integration and reliability of HfO2 and LaLuO3 high metal gate stacks for CMOS applications written by Alexander Nichau and published by Forschungszentrum Jülich. This book was released on 2014-04-03 with total page 199 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book The Engineering Index Annual written by and published by . This book was released on 1993 with total page 2264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since its creation in 1884, Engineering Index has covered virtually every major engineering innovation from around the world. It serves as the historical record of virtually every major engineering innovation of the 20th century. Recent content is a vital resource for current awareness, new production information, technological forecasting and competitive intelligence. The world?s most comprehensive interdisciplinary engineering database, Engineering Index contains over 10.7 million records. Each year, over 500,000 new abstracts are added from over 5,000 scholarly journals, trade magazines, and conference proceedings. Coverage spans over 175 engineering disciplines from over 80 countries. Updated weekly.
Download or read book Ceramic Abstracts written by and published by . This book was released on 2001 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Fundamentals of Solid State Electronics written by Chih-Tang Sah and published by World Scientific Publishing Company. This book was released on 1996-09-30 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Solution Manual, a companion volume of the book, Fundamentals of Solid-State Electronics, provides the solutions to selected problems listed in the book. Most of the solutions are for the selected problems that had been assigned to the engineering undergraduate students who were taking an introductory device core course using this book. This Solution Manual also contains an extensive appendix which illustrates the application of the fundamentals to solutions of state-of-the-art transistor reliability problems which have been taught to advanced undergraduate and graduate students. This book is also available as a set with Fundamentals of Solid-State Electronics and Fundamentals of Solid-State Electronics — Study Guide.
Download or read book High k Gate Dielectric Materials written by Niladri Pratap Maity and published by CRC Press. This book was released on 2020-12-18 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.
Download or read book Physical Limitations of Semiconductor Devices written by Vladislav A. Vashchenko and published by Springer Science & Business Media. This book was released on 2008-03-22 with total page 337 pages. Available in PDF, EPUB and Kindle. Book excerpt: Providing an important link between the theoretical knowledge in the field of non-linier physics and practical application problems in microelectronics, the purpose of the book is popularization of the physical approach for reliability assurance. Another unique aspect of the book is the coverage given to the role of local structural defects, their mathematical description, and their impact on the reliability of the semiconductor devices.
Download or read book Introduction to Thin Film Transistors written by S.D. Brotherton and published by Springer Science & Business Media. This book was released on 2013-04-16 with total page 467 pages. Available in PDF, EPUB and Kindle. Book excerpt: Introduction to Thin Film Transistors reviews the operation, application and technology of the main classes of thin film transistor (TFT) of current interest for large area electronics. The TFT materials covered include hydrogenated amorphous silicon (a-Si:H), poly-crystalline silicon (poly-Si), transparent amorphous oxide semiconductors (AOS), and organic semiconductors. The large scale manufacturing of a-Si:H TFTs forms the basis of the active matrix flat panel display industry. Poly-Si TFTs facilitate the integration of electronic circuits into portable active matrix liquid crystal displays, and are increasingly used in active matrix organic light emitting diode (AMOLED) displays for smart phones. The recently developed AOS TFTs are seen as an alternative option to poly-Si and a-Si:H for AMOLED TV and large AMLCD TV applications, respectively. The organic TFTs are regarded as a cost effective route into flexible electronics. As well as treating the highly divergent preparation and properties of these materials, the physics of the devices fabricated from them is also covered, with emphasis on performance features such as carrier mobility limitations, leakage currents and instability mechanisms. The thin film transistors implemented with these materials are the conventional, insulated gate field effect transistors, and a further chapter describes a new thin film transistor structure: the source gated transistor, SGT. The driving force behind much of the development of TFTs has been their application to AMLCDs, and there is a chapter dealing with the operation of these displays, as well as of AMOLED and electrophoretic displays. A discussion of TFT and pixel layout issues is also included. For students and new-comers to the field, introductory chapters deal with basic semiconductor surface physics, and with classical MOSFET operation. These topics are handled analytically, so that the underlying device physics is clearly revealed. These treatments are then used as a reference point, from which the impact of additional band-gap states on TFT behaviour can be readily appreciated. This reference book, covering all the major TFT technologies, will be of interest to a wide range of scientists and engineers in the large area electronics industry. It will also be a broad introduction for research students and other scientists entering the field, as well as providing an accessible and comprehensive overview for undergraduate and postgraduate teaching programmes.
Download or read book CMOS written by R. Jacob Baker and published by John Wiley & Sons. This book was released on 2008 with total page 1074 pages. Available in PDF, EPUB and Kindle. Book excerpt: This edition provides an important contemporary view of a wide range of analog/digital circuit blocks, the BSIM model, data converter architectures, and more. The authors develop design techniques for both long- and short-channel CMOS technologies and then compare the two.
