Download or read book Characterization of Homoepitaxial Diamond Thin Films Grown by Hot Filament Assisted Chemical Vapor Deposition written by William Brock Alexander and published by . This book was released on 1995 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Hot Filament Assisted Chemical Vapor Deposition and Characterization of Diamond Films written by Suzette Renae Burckhard and published by . This book was released on 1993 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Synthesis and Characterization of Diamond Films Grown by the Hot Filament Chemical Vapor Deposition Technique written by Quan You and published by . This book was released on 1997 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Diamond Films written by Koji Kobashi and published by Elsevier. This book was released on 2010-07-07 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt: - Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Download or read book Growth and Characterization of Diamond Thin Films written by Sattar Mirzakuchaki and published by . This book was released on 1996 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposited (CVD) diamond thin films grown homoepitaxially as well as on non-diamond substrates have been the subject of intense investigation since the beginning of the last decade. Diamond's remarkable properties such as physical hardness, chemical inertness, high thermal conductivity, high breakdown voltage, and high carrier mobility are the main factors for the attention it has received from many researchers around the world. Although these properties are somewhat degraded in polycrystalline diamond films, they are still superior to many other materials. One of the most potentially useful applications of diamond thin films is in the semiconductor industry. Although a few prototype devices such as field effect transistors and Schottky diodes have been fabricated on diamond, some major obstacles remain to be overcome before full scale commercial applications of diamond as a semiconductor is possible. The high cost of large area monocrystalline diamond substrates has forced researchers to look for alternative substrates for the heteroepitaxial growth of diamond. So far only marginal results have been reported on the growth of highly oriented diamond films and on the heteroepitaxial growth involving substrates that are as costly as diamond. Silicon, as the dominant material in semiconductor industry, has been the subject of much research as a substrate for the growth of polycrystalline diamond. Another problem in development of diamond as a semiconductor is the effective doping of diamond, particularly for n-type conductivity. Although many researchers have studied boron-doped (p-type) diamond thin films in the past several years, there have been few reports on the effects of doping diamond films with phosphorous (n-type). Once these two issues have been solved, other fabrication steps such as oxidation, etching, masking, etc. may be attempted. The present work is a study directed toward solving some of these problems by looking at in-situ doping of n-type hot filament CVD (HFCVD) grown diamond films on silicon substrates. The study includes electrical characterization, stable metallic contacts, effect of silicon substrate surface pretreatment, and selective area deposition. A number of different techniques for inducing diamond nucleation on Si substrates are studied and the resulting diamond films characterized by common techniques such as Raman spectroscopy, X-ray diffraction, optical and scanning electron microscopy, and profilometery. The effect of doping the diamond films with different concentrations of phosphorous as well as calculation of the activation energy by temperature measurement was also carried out in this work. A new technique is presented for the selective deposition of diamond films onto silicon substrates.
Download or read book Electrical and Structural Characterization of Diamond Thin Films Grown by Chemical Vapor Deposition written by Ashish Shrotriya and published by . This book was released on 1993 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Growth and Characterization of Diamond and Diamond like Films by Filament assisted Chemical Vapor Deposition written by Yijian Jin and published by . This book was released on 1993 with total page 146 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Codeposition and Characterization of Diamond and BCN Films by Hot Filament Assisted Chemical Vapor Deposition written by Zhiyong Xie and published by . This book was released on 1996 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Thin Film Diamond I written by Christopher Nebel and published by Academic Press. This book was released on 2003-12-12 with total page 481 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume reviews the state of the art of thin film diamond, a very promising new semiconductor that may one day rival silicon as the material of choice for electronics. Diamond has the following important characteristics; it is resistant to radiation damage, chemically inert and biocompatible and it will become "the material" for bio-electronics, in-vivo applications, radiation detectors and high-frequency devices. Thin-Film Diamond is the first book to summarize state of the art of CVD diamond in depth. It covers the most recent results regarding growth and structural properties, doping and defect characterization, hydrogen in and on diamond as well as surface properties in general, applications of diamond in electrochemistry, as detectors, and in surface acoustic wave devices.· Accessible by both experts and non-experts in the field of semi-conductors research and technology, each chapter is written in a tutorial format· Helping engineers to manufacture devices with optimized electronic properties· Truly international, this volume contains chapters written by recognized experts representing academic and industrial institutions from Europe, Japan and the US
Download or read book The characterization of diamond thin films grown by chemical vapour deposition written by Andr Venter and published by . This book was released on 1996 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Diamond Based Materials written by Qiang Hu and published by . This book was released on 2011 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The studies covered in this dissertation concentrate on the various forms of diamond films synthesized by chemical vapor deposition (CVD) method, including microwave CVD and hot filament CVD. According to crystallinity and grain size, a variety of diamond forms primarily including microcrystalline (most commonly referred to as polycrystalline) and nanocrystalline diamond films, diamond-like carbon (DLC) films were successfully synthesized. The as-grown diamond films were optimized by changing deposition pressure, volume of reactant gas hydrogen (H2) and carrier gas argon (Ar) in order to get high-quality diamond films with a smooth surface, low roughness, preferred growth orientation and high sp3 bond contents, etc. The characterization of diamond films was carried out by metrological and analytical techniques such as scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM) and Raman spectroscopy. The results of characterization served as feedback to optimize experimental parameters, so as to improve the quality of diamond films. A good understanding of the diamond film properties such as mechanical, electrical, optical and biological properties, which are determined by the qualities of diamond films, is necessary for the selection of diamond films for different applications. The nanocrystalline diamond nanowires grown by a combination of vapor-liquid-solid (VLS) method and CVD method in two stages, and the graphene grown on silicon substrate with nickel catalytic thin film by single CVD method were also investigated in a touch-on level.
Download or read book Chemical Vapor Deposited Boron Doped Polycrystalline Diamond Thin Film Growth on Silicon and Sapphire Growth Doping Metallization and Characterization written by Hassan Golestanian and published by . This book was released on 1997 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond's unique properties are potentially superior among the existing substrate materials for electronic applications. Among these properties, diamond's physical hardness, molar density, thermal conductivity, and sound velocity are the highest while its thermal expansion coefficient, compressibility, and bulk modules are the lowest. Because of this unique combination of properties, diamond has diverse applications in electronics, optics, and material coatings. Scientists around the world have been studying possible applications of diamond and its synthesis by chemical vapor deposition (CVD) in the semiconductor industry for almost the latter half of this century. The use of bulk crystals severely limits semiconductor applications of diamond due to difficulty in doping, device integration, high cost, and small area of bulk diamond. Therefore, a great deal of effort has been undertaken by researchers around the world on diamond synthesis by chemical vapor deposition (CVD). With some of the same limitations, homoepitaxial growth of diamond is not considered to be a feasible solution. As a result, heteroepitaxial growth of diamond is being considered to be an attractive possibility. Heteroepitaxial diamond growth has been the main subject of research since the first successful growth of diamond thin films on foreign substrates was reported. Polycrystalline and highly oriented diamond thin films grown on various substrates, especially silicon, have been reported over the years. There also have been reports of device fabrication on diamond such as diamond based point contact transistors, Schottky diodes, and field effect transistors at a laboratory level. The technology has been very challenging and there remain many obstacles to overcome before diamond based devices are to become part of the semiconductor industry. For example, epitaxial growth of CVD diamond, selective doping, n-type doping, and metallization of the grown films are not totally understood due to the polycrystalline nature of CVD diamond films. The objective of this work is the study of hot-filament chemical vapor deposited boron doped polycrystalline diamond thin films grown on both silicon and sapphire. A new horizontal gas flow configuration rather than the typical vertical gas flow configuration is utilized to provide larger area and better quality films grown on these substrates. The study includes characterization of grown films using scanning electron microscopy, Raman spectroscopy, X-ray diffraction analysis, and electrical characterization. Two types of contacts to the films grown on silicon substrates are fabricated enabling various electrical measurements. However, on sapphire substrates, low volume resistivity diamond films are grown despite severe adhesion problems. The effects of various substrate pre-treatments, growth conditions, and doping concentrations are presented.
Download or read book Diamond Thin Films An Emerging Technology Past Present and Future written by Ashok Kumar Dua and published by Trans Tech Publications Ltd. This book was released on 2004-08-08 with total page 110 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond, as well as being a precious gem, is a versatile material par excellence. No other material comes anywhere near to matching its properties, which are both extreme, and also expressed in rare combinations. However, natural diamonds, and those synthesised under high sandpressure temperatures, are too expensive or small for many technological applications. These limitations can be overcome by using large-area diamond coatings; chemically bonded to inexpensive non-diamond surfaces. The consequent economic advantages provide the driving force for much diamond-related research and technology.
Download or read book Thin Film Diamond written by A.H. Lettington and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt: This work, written by leading international authorities, deals with nucleation growth and processing, characterization and electrical, thermal, optical and mechanical properties of thin film diamond. The final chapters are devoted to the broad range of applications of this material.
Download or read book A Study of the Factors Influencing the Morphology of Diamond Thin Films Grown Via Hot Filament Chemical Vapor Deposition written by Prabhjot Mehta and published by . This book was released on 1997 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Growth and Characterization of Diamond Films Fabricated Using Hot Filament Chemical Vapor Desposition written by Ramakrishnan Bashyam and published by . This book was released on 1996 with total page 318 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1992 with total page 1572 pages. Available in PDF, EPUB and Kindle. Book excerpt:
